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    • 1. 发明申请
    • Magnetic write head having a first magnetic pole with a self aligned stepped notch
    • 磁写头,具有具有自对准阶梯式切口的第一磁极
    • US20070053102A1
    • 2007-03-08
    • US11218701
    • 2005-09-02
    • Bin CaoHung-Chin GuthrieWen-Chien HsiaoJyh-Shuey Lo
    • Bin CaoHung-Chin GuthrieWen-Chien HsiaoJyh-Shuey Lo
    • G11B5/147
    • G11B5/3116G11B5/3163
    • A magnetic write head and method of manufacture thereof that has a first pole structure having a step notched first pole structure. The step notched structure includes a bottom notched portion that is wider than the second notched portion formed thereover. The upper, or narrower, notched portion has a width that is substantially equal to and self aligned with a second pole structure (P2) formed thereover. The invention may also include first and second wing portions formed in the first pole that are recessed from the ABS and that extend laterally from the first notched portions of the first pole. The formation of the winged portions is assisted by an ion mill resistant bump (alumina bump) formed thereover, which acts as a mask during the ion milling operations that are used to form the first and second notches.
    • 一种磁写头及其制造方法,其具有第一极结构,具有阶切口第一极结构。 台阶缺口结构包括比形成在其上的第二切口部分更宽的底部切口部分。 上部或更窄的切口部分具有基本上等于并与其上形成的第二极结构(P 2)自对准的宽度。 本发明还可以包括形成在第一极中的从ABS凹入并从第一极的第一切口部横向延伸的第一和第二翼部。 翼形部分的形成由在其上形成的离子磨耐磨凸起(氧化铝凸块)辅助,其在用于形成第一和第二凹口的离子铣削操作期间用作掩模。
    • 2. 发明授权
    • Magnetic write head having a first magnetic pole with a self aligned stepped notch
    • 磁写头,具有具有自对准阶梯式切口的第一磁极
    • US07551397B2
    • 2009-06-23
    • US11218701
    • 2005-09-02
    • Bin V. CaoHung-Chin GuthrieWen-Chien HsiaoJyh-Shuey Lo
    • Bin V. CaoHung-Chin GuthrieWen-Chien HsiaoJyh-Shuey Lo
    • G11B5/187
    • G11B5/3116G11B5/3163
    • A magnetic write head and method of manufacture thereof that has a first pole structure having a step notched first pole structure. The step notched structure includes a bottom notched portion that is wider than the second notched portion formed thereover. The upper, or narrower, notched portion has a width that is substantially equal to and self aligned with a second pole structure (P2) formed thereover. The invention may also include first and second wing portions formed in the first pole that are recessed from the ABS and that extend laterally from the first notched portions of the first pole. The formation of the winged portions is assisted by an ion mill resistant bump (alumina bump) formed thereover, which acts as a mask during the ion milling operations that are used to form the first and second notches.
    • 一种磁写头及其制造方法,其具有第一极结构,具有阶切口第一极结构。 台阶缺口结构包括比形成在其上的第二切口部分更宽的底部切口部分。 上部或更窄的切口部分具有与形成在其上的第二极结构(P2)基本相等并自对准的宽度。 本发明还可以包括形成在第一极中的从ABS凹入并从第一极的第一切口部横向延伸的第一和第二翼部。 翼形部分的形成由在其上形成的离子磨耐磨凸起(氧化铝凸块)辅助,其在用于形成第一和第二凹口的离子铣削操作期间用作掩模。
    • 3. 发明授权
    • Magnetic write head having a stair notched, steep shouldered pole and a write gap bump
    • 磁性写头具有阶梯式切口,陡峭的肩部极点和写入间隙凸起
    • US07675709B2
    • 2010-03-09
    • US11525789
    • 2006-09-21
    • Hung-Chin GuthrieWen-Chien David HsiaoJyh-Shuey LoAron Pentek
    • Hung-Chin GuthrieWen-Chien David HsiaoJyh-Shuey LoAron Pentek
    • G11B5/31G11B5/187
    • G11B5/3116G11B5/1278G11B5/3163
    • A magnetic write head structure that maximizes write field strength while minimizing stray fields. The write pole structure maximizes write field strength by minimizing saturation of the magnetic pole tips, and minimizes stray field writing by preventing magnetic fields from extending laterally from the sides of the magnetic pole. The write head structure includes a write pole having a pole tip configured with a stair notched shape and a steep shouldered base beneath the stair notched portion. This configuration maximizes the amount of flux that can be delivered to the pole tip while also avoiding stray fields. The magnetic pole can also be configured with wing shaped extensions that extend laterally from the pole tip region but which are recessed from the ABS by a desired amount. The magnetic write head structure can be manufactured by forming a magnetic pole with a raised portion, depositing a write gap material over the magnetic pole and then forming a magnetic pedestal over the magnetic pole and write gap, the pedestal having a width significantly smaller than the width of the raised portion of the magnetic pole, a first ion mill can then be performed to notch and trim the magnetic pole. Then a non-magnetic layer such as alumina can be deposited and a second ion mill performed to form a stair notched configuration. An alumina bump can be formed prior to ion milling to provide a mask for forming the laterally extending, recessed wings in the pole tip of the magnetic pole.
    • 磁写头结构,使写入场强度最大化,同时最小化杂散场。 写磁极结构通过最小化磁极尖端的饱和度来最大化写入场强度,并且通过防止磁场从磁极的侧面横向延伸来最小化杂散磁场写入。 写头结构包括具有构造为具有阶梯形切口形状的极尖的写入极和在阶梯切口部下方的陡峭的肩部基座。 该配置最大化可以传送到极尖的通量,同时也避免杂散场。 磁极还可以配置有翼形延伸部,其从极尖区域横向延伸,但是从ABS凹入所需量。 可以通过形成具有凸起部分的磁极来制造磁性写入头结构,在磁极上沉积写入间隙材料,然后在磁极和写入间隙上形成磁性基座,该基座具有明显小于 磁极的凸起部分的宽度,然后可以执行第一离子磨机来切割和修整磁极。 然后可以沉积诸如氧化铝的非磁性层,并且执行第二离子磨,以形成阶梯形缺口构型。 可以在离子研磨之前形成氧化铝凸块,以提供用于在磁极的极尖中形成横向延伸的凹入的翼的掩模。
    • 5. 发明申请
    • Magnetic write head having a stair notched, steep shouldered pole and a write gap bump
    • 磁性写头具有阶梯式切口,陡峭的肩部极点和写入间隙凸起
    • US20080074782A1
    • 2008-03-27
    • US11525789
    • 2006-09-21
    • Hung-Chin GuthrieWen-Chien David HsiaoJyh-Shuey LoAron Pentek
    • Hung-Chin GuthrieWen-Chien David HsiaoJyh-Shuey LoAron Pentek
    • G11B5/127
    • G11B5/3116G11B5/1278G11B5/3163
    • A magnetic write head structure that maximizes write field strength while minimizing stray fields. The write pole structure maximizes write field strength by minimizing saturation of the magnetic pole tips, and minimizes stray field writing by preventing magnetic fields from extending laterally from the sides of the magnetic pole. The write head structure includes a write pole having a pole tip configured with a stair notched shape and a steep shouldered base beneath the stair notched portion. This configuration maximizes the amount of flux that can be delivered to the pole tip while also avoiding stray fields. The magnetic pole can also be configured with wing shaped extensions that extend laterally from the pole tip region but which are recessed from the ABS by a desired amount. The magnetic write head structure can be manufactured by forming a magnetic pole with a raised portion, depositing a write gap material over the magnetic pole and then forming a magnetic pedestal over the magnetic pole and write gap, the pedestal having a width significantly smaller than the width of the raised portion of the magnetic pole, a first ion mill can then be performed to notch and trim the magnetic pole. Then a non-magnetic layer such as alumina can be deposited and a second ion mill performed to form a stair notched configuration. An alumina bump can be formed prior to ion milling to provide a mask for forming the laterally extending, recessed wings in the pole tip of the magnetic pole.
    • 磁写头结构,使写入场强度最大化,同时最小化杂散场。 写磁极结构通过最小化磁极尖端的饱和度来最大化写入场强度,并且通过防止磁场从磁极的侧面横向延伸来最小化杂散磁场写入。 写头结构包括具有构造为具有阶梯形切口形状的极尖的写入极和在阶梯切口部下方的陡峭的肩部基座。 该配置最大化可以传送到极尖的通量,同时也避免杂散场。 磁极还可以配置有翼形延伸部,其从极尖区域横向延伸,但是从ABS凹入所需量。 可以通过形成具有凸起部分的磁极来制造磁性写入头结构,在磁极上沉积写入间隙材料,然后在磁极和写入间隙上形成磁性基座,该基座具有明显小于 磁极的凸起部分的宽度,然后可以执行第一离子磨机来切割和修整磁极。 然后可以沉积诸如氧化铝的非磁性层,并且执行第二离子磨,以形成阶梯形缺口构型。 可以在离子研磨之前形成氧化铝凸块,以提供用于在磁极的极尖中形成横向延伸的凹入的翼的掩模。
    • 6. 发明授权
    • Process of fabricating write pole in magnetic recording head using rhodium CMP stop layer
    • 使用铑CMP停止层在磁记录头中制造写柱的过程
    • US07029376B1
    • 2006-04-18
    • US11225907
    • 2005-09-14
    • Hung-Chin GuthrieMing JiangJyh-Shuey LoHong Zhang
    • Hung-Chin GuthrieMing JiangJyh-Shuey LoHong Zhang
    • G11B5/127
    • G11B5/3116Y10T29/49046Y10T29/49048
    • In the formation of the top magnetic write pole in a thin film magnetic recording head, a CMP stop layer comprising rhodium is deposited over the Al2O3 layer that overlies the top magnetic pole. A mixture of silicon dioxide, ammonium persulfate and benzotriazole is employed as a slurry in the CMP process that removes the portion of the Al2O3 layer covering the top magnetic pole. This eliminates the need for an extra thick layer of Al2O3 to be first deposited over the top pole and then removed to expose the top pole. The magnetic layer that forms the top pole can be plated to the target thickness of the top pole. As a result, the thickness of the photoresist layer that is used to define the size and shape of the top pole can be decreased to a desirable thickness, facilitating the use of DUV radiation to expose the photoresist layer.
    • 在薄膜磁记录头中形成顶磁写磁极时,包含铑的CMP停止层沉积在覆盖顶部的Al 2 O 3层上 磁极。 在CMP工艺中使用二氧化硅,过硫酸铵和苯并三唑的混合物作为浆料,其除去覆盖顶部磁极的部分Al 2 O 3 N 3层。 这样就不需要首先沉积在顶极上的另外一层较厚的Al 2 O 3 3 3层,然后去除以暴露顶极。 可以将形成顶极的磁性层电镀到顶极的目标厚度。 结果,用于限定顶极的尺寸和形状的光致抗蚀剂层的厚度可以减小到期望的厚度,便于使用DUV辐射来曝光光致抗蚀剂层。
    • 10. 发明授权
    • Run-to-run control of backside pressure for CMP radial uniformity optimization based on center-to-edge model
    • 基于中心到边缘模型的用于CMP径向均匀性优化的背侧压力的运行控制控制
    • US07722436B2
    • 2010-05-25
    • US11832455
    • 2007-08-01
    • Hung-Chin GuthrieMing JiangYeak-Chong Wong
    • Hung-Chin GuthrieMing JiangYeak-Chong Wong
    • B24B49/00
    • B24B49/03B24B37/042
    • During planarization of wafers, the thickness of a layer of a wafer is measured at a number of locations, after the wafer has been planarized by chemical mechanical polishing. The thickness measurements are used to automatically determine, from a center to edge profile model to which the measurements are fit, a parameter that controls chemical mechanical polishing, called “backside pressure.” Backside pressure is determined in some embodiments by a logic test based on the center-to-edge profile model, coefficient of determination R-square of the model, and current value of backside pressure. Note that a “backside pressure” set point is adjusted only if the fit of the measurements to the model is good, e.g. as indicated by R-square being greater than a predetermined limit. Next, the backside pressure that has been determined from the model is used in planarizing a subsequent wafer.
    • 在晶片的平坦化期间,在通过化学机械抛光对晶片进行平面化之后,在多个位置测量晶片层的厚度。 厚度测量用于自动确定从测量结合到的中心到边缘轮廓模型,控制称为“后侧压力”的化学机械抛光的参数。背面压力在一些实施例中通过基于 中心到边缘轮廓模型,模型的确定系数R平方和背侧压力的当前值。 注意,仅当对模型的测量的拟合良好时才调整“背侧压力”设定点。 如R平方所示大于预定极限。 接下来,将从模型确定的背面压力用于平面化后续晶片。