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61. 发明授权

US06361600B1 Film forming apparatus and film forming method 失效
公开(公告)号：US06361600B1
公开(公告)日：2002-03-26
申请号：US09366959
申请日：1999-08-04
申请人： Kiyohisa Tateyama , Tsutae Omori
发明人： Kiyohisa Tateyama , Tsutae Omori
IPC分类号： B05C1102
CPC分类号： H01L21/6715 , B05C11/08 , Y10T74/19074 , Y10T74/19102
摘要： A drive pulley is disposed to a driving motor. A plurality of follower pulleys are disposed to a rotating shaft of a spin chuck that vacuum sucks a substrate. A belt is passed from one follower pulley to the drive pulley. Belts are passed from the other follower pulleys to the drive shafts of a plurality of air motors. Since the air motors assist the driving of the driving motor, a large substrate can be rotated at a predetermined rotating acceleration. Thus, a film forming apparatus and a film forming method that allow the quantity of process solution supplied to be reduced and a film of process solution to be equally formed on a substrate can be provided.

62. 发明授权

US06227786B1 Substrate treating apparatus 失效
标题翻译：底物处理装置
公开(公告)号：US06227786B1
公开(公告)日：2001-05-08
申请号：US09064783
申请日：1998-04-23
申请人： Kiyohisa Tateyama
发明人： Kiyohisa Tateyama
IPC分类号： B65H100
CPC分类号： H01L21/67109 , Y10S414/135
摘要： A substrate treating apparatus for subjecting a substrate to a treatment including a heating or cooling treatment has a plate for heating or cooling the substrate. The plate has a plurality of holes formed therein and is arranged to be positioned under the substrate. A plurality of lifter pins for moving the substrate up and down are inserted in the holes, respectively, formed in the plate, and are incorporated with the plate to be movable up and down. A plurality of springs are arranged to bias the lifter pins downward, respectively. A push-up mechanism is used for pushing up the lifter pins while being in contact with bottom ends of the lifter pins. The push-up mechanism is arranged to be separable from the lifter pins. A driving mechanism is arranged to drive the push-up mechanism.
摘要翻译：用于对基材进行包括加热或冷却处理的处理的基板处理装置具有用于加热或冷却基板的板。该板具有形成在其中的多个孔，并且被布置成位于基板下方。多个用于上下移动基板的提升销分别插入形成在板中的孔中，并且与板结合以可上下移动。多个弹簧被布置成分别向下偏压升降器销。上推机构用于在升降器销的底端接触时推动升降销。上推机构设置成可与升降销分开。布置驱动机构来驱动上推机构。

63. 发明授权

US6110282A Coating apparatus for semiconductor process 失效
标题翻译：半导体工艺涂层装置
公开(公告)号：US6110282A
公开(公告)日：2000-08-29
申请号：US917510
申请日：1997-08-26
申请人： Kiyohisa Tateyama , Tetsu Kawasaki
发明人： Kiyohisa Tateyama , Tetsu Kawasaki
IPC分类号： B05C5/02 , B05C13/00 , B05C13/02 , B65G13/00 , G03F7/16 , G03F7/30 , H01L21/00 , H01L21/027 , B05C5/00
CPC分类号： H01L21/6715 , B05C13/00 , B05C5/0254 , G03F7/3042 , G03F7/3064 , G03F7/16
摘要： A coating apparatus for coating an LCD substrate with a developing liquid for a photo-resist has a conveyer mechanism for linearly conveying the substrate in a conveying direction. The conveyer mechanism has a plurality of lower conveyer rollers which are driving rollers, and a plurality of upper conveyer rollers which are driven rollers. A main support roller is arranged such that it replaces one of the lower conveyer rollers. A developing liquid supply nozzle is arranged above the main support roller for supplying a developing liquid onto the substrate when the substrate is passing over the main support roller. The supply nozzle has a supply port which is laterally long and narrow, so that the developing liquid is supplied onto the substrate from the supply nozzle as a band. This band extends over the entire width of a target region of the substrate, which is perpendicular to the conveying direction, and is supplied thereto all at once.
摘要翻译：用于用用于光刻胶的显影液涂覆LCD基板的涂布装置具有用于沿输送方向直线输送基板的输送机构。输送机构具有作为驱动辊的多个下输送辊，以及作为从动辊的多个上输送辊。主支撑辊布置成使得其替代下输送辊之一。显影液供给喷嘴设置在主支撑辊上方，用于当基板通过主支撑辊时将显影液供给到基板上。供给喷嘴具有横向长而窄的供给口，使得显影液从供给喷嘴作为带供给到基板上。该带在垂直于输送方向的基板的目标区域的整个宽度上延伸，并一次性地供给到该区域。

64. 发明授权

US5965200A Processing apparatus and processing method 失效
公开(公告)号：US5965200A
公开(公告)日：1999-10-12
申请号：US936723
申请日：1997-09-25
申请人： Kiyohisa Tateyama , Masafumi Nomura , Takayuki Tomoeda
发明人： Kiyohisa Tateyama , Masafumi Nomura , Takayuki Tomoeda
IPC分类号： G03F7/30 , B05C5/02 , B05C11/08 , B05C11/10 , H01L21/02 , H01L21/027 , B05D3/12
CPC分类号： B05C11/1039 , G03F7/3021 , B05C11/08 , B05C5/0208 , Y10S134/902
摘要： A develop processing apparatus is provided for processing an object with a developing solution, comprising a retaining member for rotatably retaining the object, a developing solution supply nozzle for supplying the developing solution to the object, a developing solution sucking nozzle for sucking the developing solution supplied to the object, a developing solution supply nozzle moving mechanism for moving the developing solution supply nozzle above the object, a developing solution sucking nozzle moving mechanism for moving the developing solution sucking nozzle above the object. After the developing solution is supplied to the object subsequent to moving the developing solution supply nozzle, the developing solution sucking nozzle is moved and the developing solution on the object is sucked.

65. 发明授权

US5941083A Cooling device and cooling method 失效
标题翻译：冷却装置及冷却方式
公开(公告)号：US5941083A
公开(公告)日：1999-08-24
申请号：US588309
申请日：1996-01-18
申请人： Tetsuya Sada , Osamu Hirose , Kiyohisa Tateyama
发明人： Tetsuya Sada , Osamu Hirose , Kiyohisa Tateyama
IPC分类号： H01L21/304 , G05D23/00 , G05D23/19 , H01L21/00 , F25B29/00
CPC分类号： H01L21/67109 , G05D23/1919
摘要： A cooling device for cooling an object to be processed to a target temperature comprises a plurality of contact members mounted on a placing table, for supporting the object such that the object opposes a top surface of the placing table with an interval, temperature sensors for outputting temperature information of the object supported by the contact members, a first cooling unit for cooling the placing table to a temperature lower than the target temperature to cool the object, a second cooling unit for heating the object cooled by the first cooling unit to a temperature almost equal to the target temperature, and a contrast circuit for performing a switching operation between cooling by the first cooling unit and heating by the second cooling unit on the basis of the temperature information from the temperature sensors.
摘要翻译：用于将待处理物体冷却到目标温度的冷却装置包括安装在放置台上的多个接触构件，用于支撑物体，使得物体间隔着与放置台的顶面相对，用于输出的温度传感器由接触构件支撑的物体的温度信息，用于将放置台冷却到低于目标温度的温度以冷却物体的第一冷却单元，用于将由第一冷却单元冷却的物体加热到第二冷却单元的温度几乎等于目标温度;以及对比度电路，用于根据来自温度传感器的温度信息，通过第一冷却单元的冷却和由第二冷却单元进行加热之间进行切换操作。

66. 发明授权

US5919520A Coating method and apparatus for semiconductor process 失效
标题翻译：用于半导体工艺的涂覆方法和装置
公开(公告)号：US5919520A
公开(公告)日：1999-07-06
申请号：US919503
申请日：1997-08-28
申请人： Kiyohisa Tateyama , Kimio Motoda , Noriyuki Anai
发明人： Kiyohisa Tateyama , Kimio Motoda , Noriyuki Anai
IPC分类号： B05C11/08 , B05D1/00 , B05D3/10 , G03F7/16 , H01L21/027 , B05D3/12
CPC分类号： B05C11/08 , B05D1/005 , B05D3/104 , G03F7/16 , G03F7/161
摘要： A coating apparatus has a spin chuck for attracting and holding a semiconductor wafer in a horizontal state by means of vacuum. A movable beam is arranged above the spin chuck. The movable beam includes first and second nozzles integrally formed. The first nozzle is used for supplying a photo-resist liquid while the second nozzle is used for supplying a solvent for the photo-resist liquid. When a coating process is performed, the movable beam above the wafer is horizontally moved in one direction. The solvent is first supplied onto the wafer from the second nozzle, and the coating or photo-resist liquid is then supplied from the first nozzle, following the solvent. Wettability of the wafer relative to the photo-resist is increased by the solvent, prior to supply of the photo-resist liquid.
摘要翻译：涂布装置具有用于通过真空吸引并保持水平状态的半导体晶片的旋转卡盘。可移动光束布置在旋转卡盘上方。可动梁包括一体形成的第一和第二喷嘴。第一喷嘴用于供应光致抗蚀剂液体，而第二喷嘴用于供应用于光致抗蚀剂液体的溶剂。当执行涂覆处理时，晶片上方的可移动光束在一个方向上水平移动。首先从第二喷嘴将溶剂供应到晶片上，然后在溶剂之后从第一喷嘴提供涂层或光致抗蚀剂液体。在提供光致抗蚀剂液体之前，晶片相对于光致抗蚀剂的润湿性由溶剂增加。

67. 发明授权

US5834737A Heat treating apparatus 失效
标题翻译：热处理设备
公开(公告)号：US5834737A
公开(公告)日：1998-11-10
申请号：US642898
申请日：1996-05-06
申请人： Osamu Hirose , Kiyohisa Tateyama
发明人： Osamu Hirose , Kiyohisa Tateyama
IPC分类号： G02F1/13 , B23Q3/18 , C03C17/00 , G02F1/1333 , G03F7/26 , H01L21/027 , C23C16/00
CPC分类号： C03C17/001 , Y10S414/135
摘要： The present invention is a heat treating apparatus, including a support plate having an object to be treated disposed thereon, heating member for heating the object through the support plate, and support pins extending through the support plate so as to support the object, wherein the support plate is provided with holes each sized large enough to permit a horizontal movement of the support pin, and the support pin is movable in a horizontal direction within the hole made in the support plate. The present invention also is a heat treating apparatus, including a support plate arranged within a treating chamber and having an object to be treated disposed thereon, heating member for heating the object through the support plate, a cover member arranged in the treating chamber to define a treating space between the support plate and the cover member, a shutter member partitioning the treating space and capable of opening/closing the partitioned treating space, and a gap setting member disposed between the cover member and the shutter member.
摘要翻译：本发明是一种热处理装置，其特征在于，包括具有被处置物的支撑板，通过所述支撑板加热所述物体的加热构件，以及延伸穿过所述支撑板以支撑所述物体的支撑销，其中，支撑板设置有各自的尺寸足够大以允许支撑销的水平移动的孔，并且支撑销可在支撑板中形成的孔内沿水平方向移动。本发明还是一种热处理装置，其包括布置在处理室内并具有待处理物体的支撑板，用于通过支撑板加热物体的加热构件，布置在处理室中的盖构件，以限定支撑板和盖构件之间的处理空间，分隔处理空间并能够打开/关闭分隔的处理空间的活门构件，以及设置在盖构件和活门构件之间的间隙设定构件。

68. 发明授权

US5695817A Method of forming a coating film 失效
标题翻译：形成涂膜的方法
公开(公告)号：US5695817A
公开(公告)日：1997-12-09
申请号：US512018
申请日：1995-08-07
申请人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
发明人： Kiyohisa Tateyama , Kimio Motoda , Kenji Sekiguchi , Tsutae Omori
IPC分类号： B05D1/00 , G03F7/16 , B05D3/12
CPC分类号： B05D1/005 , G03F7/162
摘要： A method of forming a coating film, in which the coating film is formed by supplying a coating liquid onto a surface of a substrate, while the substrate housed in a processing vessel is rotated together with the processing vessel, includes the steps of coating the surface of the substrate with a solvent, supplying the coating liquid to the substrate, rotating the substrate and the processing vessel at a first rotation speed to diffuse the coating liquid on the surface of the substrate, closing the processing vessel with a lid to seal the substrate in the processing vessel, and rotating the processing vessel with the lid and the substrate at a second rotation speed to uniform a film thickness of the coating film.
摘要翻译：一种形成涂膜的方法，其中通过将涂覆液体供给到基材的表面上形成涂膜，同时容纳在处理容器中的基材与处理容器一起旋转，包括以下步骤：将表面的溶剂，将涂布液供给到基板，以第一旋转速度旋转基板和处理容器，以将涂布液扩散到基板的表面上，用盖子封闭处理容器以密封基板在处理容器中，并且以第二转速旋转具有盖和基板的处理容器以使涂膜的膜厚均匀。

69. 发明授权

US5685039A Cleaning apparatus 失效
标题翻译：清洁装置
公开(公告)号：US5685039A
公开(公告)日：1997-11-11
申请号：US644811
申请日：1996-05-10
申请人： Tomoko Hamada , Mitiaki Matsushita , Kiyohisa Tateyama , Akira Yonemizu
发明人： Tomoko Hamada , Mitiaki Matsushita , Kiyohisa Tateyama , Akira Yonemizu
IPC分类号： A46B13/04
CPC分类号： H01L21/67046 , A46B13/04
摘要： A cleaning apparatus includes a spin chuck for holding and rotating a wafer, a brush for rubbing the surface of the wafer, and an arm for supporting the brush. A support is coupled to the arm through a linear guide. The arm and the support moves together in a horizontal direction and can relatively displace in a vertical direction. A compression spring is arranged between the arm and the support and deformed in accordance with a relative displacement of the arm and the support in the vertical direction. When the brush contacts the wafer held by the spin chuck, a biasing force of the brush against the wafer is generated in correspondence with deformation of the compression spring. The biasing force of the brush is set by adjusting the downward moving amount of the support in the vertical direction.
摘要翻译：清洁装置包括用于保持和旋转晶片的旋转卡盘，用于摩擦晶片表面的刷子和用于支撑刷子的臂。支撑件通过线性引导件与臂连接。臂和支撑件在水平方向上一起移动并且可以在垂直方向上相对移位。压缩弹簧布置在臂和支撑件之间，并且根据臂和支撑件在垂直方向上的相对位移而变形。当电刷接触由旋转卡盘保持的晶片时，与压缩弹簧的变形相对应地产生刷对着晶片的偏置力。通过调节支撑件在垂直方向上的向下移动量来设定刷子的偏置力。

70. 发明授权

US5250114A Coating apparatus with nozzle moving means 失效
标题翻译：带喷嘴移动装置的涂布装置
公开(公告)号：US5250114A
公开(公告)日：1993-10-05
申请号：US755781
申请日：1991-09-06
申请人： Nobuo Konishi , Hideyuki Takamori , Masami Akimoto , Kiyohisa Tateyama
发明人： Nobuo Konishi , Hideyuki Takamori , Masami Akimoto , Kiyohisa Tateyama
IPC分类号： G03F7/16 , B05C11/08 , H01L21/00 , H01L21/027 , H01L21/30 , H01L21/68 , B05B3/00
CPC分类号： H01L21/67173 , H01L21/6715 , H01L21/6719
摘要： A coating apparatus includes two spin chucks located in a single casing to support and rotate wafers. A waiting trench is located between the spin chucks to discharge that part of coating liquid which has been hardened at the tip of a nozzle. The wafers are loaded and unloaded to and from the spin chucks by a single carrying member located outside the casing. A coating liquid supply mechanism includes the single nozzle for dispensing coating liquid onto the wafers supported by the spin chucks. The nozzle is moved between the spin chucks by a moving arm. Processing cycles relative to the spin chucks are set for a same processing time and the processing cycle relative to one of the spin chucks is shifted from that relative to the other by a half cycle. The nozzle is rested on the waiting trench at the time when it does not dispense the coating liquid onto the wafers supported by the spin chucks.
摘要翻译：涂覆装置包括位于单个壳体中的两个旋转卡盘，以支撑和旋转晶片。等离子沟槽位于旋转卡盘之间，以排出在喷嘴尖端已经硬化的涂布液的那部分。通过位于壳体外部的单个承载构件将晶片装载和卸载到旋转卡盘。涂布液供给机构包括用于将涂布液分配到由旋转卡盘支撑的晶片上的单个喷嘴。喷嘴通过移动臂在旋转卡盘之间移动。相对于旋转卡盘的处理循环被设定为相同的处理时间，并且相对于其中一个旋转卡盘的处理循环相对于另一旋转卡盘的处理循环相对于另一旋转卡盘偏移半个周期。在不将涂布液分配到由旋转卡盘支撑的晶片上时，喷嘴搁置在等待的沟槽上。

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