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61. 发明授权

US06710876B1 Metrology system using optical phase 失效
标题翻译：计量系统采用光学相位
公开(公告)号：US06710876B1
公开(公告)日：2004-03-23
申请号：US09639495
申请日：2000-08-14
申请人： Mehrdad Nikoonahad , Guoheng Zhao , Ian Smith , Mehdi Vaez-Iravani
发明人： Mehrdad Nikoonahad , Guoheng Zhao , Ian Smith , Mehdi Vaez-Iravani
IPC分类号： G01B1100
CPC分类号： G03F7/70633
摘要： Misalignment error between two periodic structures such as two overlay targets placed side-by-side is measured. The two structures are illuminated by coherent radiation and the positive and negative diffraction beams of the input beam by the two structures are detected to discover the optical phase difference between the positive and negative diffraction beams. The misalignment between the two structures may then be ascertained from the phase difference.
摘要翻译：测量两个周期性结构（如并排放置的两个叠加目标）之间的对准误差。这两个结构被相干辐射照射，并且检测由两个结构的输入光束的正和负衍射光束以发现正和负衍射光束之间的光学相位差。然后可以从相位差确定两个结构之间的未对准。

62. 发明授权

US06707540B1 In-situ metalization monitoring using eddy current and optical measurements 有权
标题翻译：使用涡流和光学测量进行原位金属化监测
公开(公告)号：US06707540B1
公开(公告)日：2004-03-16
申请号：US09633800
申请日：2000-08-07
申请人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden , Guoheng Zhao , Mehrdad Nikoonahad
发明人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden , Guoheng Zhao , Mehrdad Nikoonahad
IPC分类号： G01N2100
CPC分类号： G01N27/72
摘要： Disclosed is a chemical mechanical polishing (CMP) system for polishing a sample with a polishing agent and monitoring the sample. The CMP system includes a polishing table, a sample carrier arranged to hold the sample over the polishing table, and an eddy probe. The polishing table and sample carrier are arranged to receive a polishing agent between the sample and the polishing table and to polish the sample by moving the polishing table and the sample carrier relative to each other. The eddy probe is arranged to be operable to obtain a measurement of the sample while the sample is being polished. The CMP system further includes an optical measurement device arranged to be operable to obtain a measurement of the sample while the sample is being polished. The CMP system also has a memory and a processor coupled with the memory. The processor and memory are adapted for operating the eddy probe and optical measurement device.
摘要翻译：公开了一种用抛光剂抛光样品并监测样品的化学机械抛光（CMP）系统。 CMP系统包括抛光台，布置成将样品保持在抛光台上的样品载体和涡流探针。抛光台和样品载体布置成在样品和抛光台之间接收抛光剂，并通过相对于彼此移动抛光台和样品载体来抛光样品。涡流探针布置成可操作以在样品被抛光时获得样品的测量。 CMP系统还包括光学测量装置，其布置成可操作以在样品被抛光时获得样品的测量。 CMP系统还具有与存储器耦合的存储器和处理器。处理器和存储器适于操作涡流探针和光学测量装置。

63. 发明授权

US06671051B1 Apparatus and methods for detecting killer particles during chemical mechanical polishing 失效
标题翻译：化学机械抛光期间检测杀伤颗粒的装置和方法
公开(公告)号：US06671051B1
公开(公告)日：2003-12-30
申请号：US09556238
申请日：2000-04-24
申请人： Mehrdad Nikoonahad , Anantha R. Sethuraman , Guoheng Zhao
发明人： Mehrdad Nikoonahad , Anantha R. Sethuraman , Guoheng Zhao
IPC分类号： G01N2155
CPC分类号： B24B49/12 , B24B37/005 , B24D7/12 , G01B11/00 , G01B11/0683 , G01N21/15 , G01N21/94
摘要： Disclosed is a system for detecting anomalies associated with a sample. The system includes an objective arranged proximate to a sample while the sample is undergoing chemical mechanical polishing and a beam source arranged to generate an incident beam and direct the incident beam through the objective and toward the sample while the sample is undergoing chemical mechanical polishing. The system also includes a sensor arranged to detect a scattered beam reflected from at least one anomaly associated with the sample while the sample is undergoing chemical mechanical polishing, the scattered beam being in response to the incident beam. The scattered beam indicates a characteristic of the anomaly, such as particle size.
摘要翻译：公开了一种用于检测与样本相关联的异常的系统。该系统包括在样品经历化学机械抛光时靠近样品布置的物镜，以及布置成在样品进行化学机械抛光时产生入射光束并将入射光束引导通过物镜并朝向样品的光束源。该系统还包括传感器，该传感器布置成在样品进行化学机械抛光时检测从与样品相关联的至少一个异常反射的散射光束，散射光束响应入射光束。散射光束表示异常的特征，如粒径。

64. 发明授权

US06639662B2 Sample inspection system 有权
公开(公告)号：US06639662B2
公开(公告)日：2003-10-28
申请号：US09746141
申请日：2000-12-21
申请人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
发明人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
IPC分类号： G01N2100
CPC分类号： G01J3/44 , G01J3/0216 , G01J3/0229 , G01N21/21 , G01N21/47 , G01N21/474 , G01N21/8806 , G01N21/94 , G01N21/9501 , G01N2021/8825 , G01N2021/8845 , G01N2021/8848 , G01N2201/065
摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

65. 发明授权

US06608676B1 System for detecting anomalies and/or features of a surface 失效
标题翻译：用于检测表面的异常和/或特征的系统
公开(公告)号：US06608676B1
公开(公告)日：2003-08-19
申请号：US08904892
申请日：1997-08-01
申请人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Stanley Stokowski , Mehdi Vaez-Iravani
IPC分类号： G01N2100
CPC分类号： G01N21/9501
摘要： A cylindrical mirror or lens is used to focus an input collimated beam of light onto a line on the surface to be inspected, where the line is substantially in the plane of incidence of the focused beam. An image of the beam is projected onto an array of charge-coupled devices parallel to the line for detecting anomalies and/or features of the surface, where the array is outside the plane of incidence of the focused beam.
摘要翻译：使用圆柱形镜或透镜将输入的准直光束聚焦到要检查的表面上的线上，其中线基本上在聚焦束的入射平面中。光束的图像被投影到平行于线的电荷耦合器件的阵列上，用于检测表面的异常和/或特征，其中阵列位于聚焦光束的入射平面之外。

66. 发明授权

US06201601B1 Sample inspection system 失效
公开(公告)号：US06201601B1
公开(公告)日：2001-03-13
申请号：US08933771
申请日：1997-09-19
申请人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
发明人： Mehdi Vaez-Iravani , Stanley Stokowski , Guoheng Zhao
IPC分类号： G01N2100
CPC分类号： G01J3/44 , G01J3/0216 , G01J3/0229 , G01N21/21 , G01N21/47 , G01N21/474 , G01N21/8806 , G01N21/94 , G01N21/9501 , G01N2021/8825 , G01N2021/8845 , G01N2021/8848 , G01N2201/065
摘要： A curved mirrored surface is used to collect radiation scattered by a sample surface and originating from a normal illumination beam and an oblique illumination beam. The collected radiation is focused to a detector. Scattered radiation originating from the normal and oblique illumination beams may be distinguished by employing radiation at two different wavelengths, by intentionally introducing an offset between the spots illuminated by the two beams or by switching the normal and oblique illumination beams on and off alternately. Beam position error caused by change in sample height may be corrected by detecting specular reflection of an oblique illumination beam and changing the direction of illumination in response thereto. Butterfly-shaped spatial filters may be used in conjunction with curved mirror radiation collectors to restrict detection to certain azimuthal angles.

67. 发明授权

US09001327B2 Composite polarizer with adjustable polarization angles 有权
标题翻译：具有可调偏振角的复合偏光镜
公开(公告)号：US09001327B2
公开(公告)日：2015-04-07
申请号：US13883988
申请日：2012-02-14
申请人： Guoheng Zhao
发明人： Guoheng Zhao
IPC分类号： G01J4/00 , G02B27/28 , G02B5/30 , G01N21/21 , G01N21/88 , G01N21/95
CPC分类号： G02B27/286 , G01N21/21 , G01N21/8806 , G01N21/9501 , G01N2021/8848 , G02B5/3066 , G02B27/283
摘要： An adjustable, composite polarizer can include first and second plate polarizers and an adjusting apparatus. The adjusting apparatus can adjust a pitch angle and a roll angle for the first and second plate polarizers while maintaining a predetermined, minimal distance between those plates. In this configuration, the adjustable, composite polarizer can provide mirror symmetric polarization with respect to an incident plane while providing the flexibility of any polarization.
摘要翻译：可调节的复合偏振器可以包括第一和第二板偏振器和调节装置。调节装置可以在保持这些板之间预定的最小距离的同时，调整第一和第二板偏振器的俯仰角和滚动角。在这种配置中，可调整的复合偏振器可以提供相对于入射平面的镜对称极化，同时提供任何偏振的柔性。

68. 发明授权

US08891079B2 Wafer inspection 有权
标题翻译：晶圆检查
公开(公告)号：US08891079B2
公开(公告)日：2014-11-18
申请号：US13822281
申请日：2011-12-07
申请人： Guoheng Zhao , Jenn-Kuen Leong , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Jenn-Kuen Leong , Mehdi Vaez-Iravani
IPC分类号： G01N21/00 , G01J4/00 , G01N21/88 , G01N21/95 , H01L21/66
CPC分类号： G01N21/9501 , G01N21/21 , G01N21/47 , G01N21/8806 , G01N2201/06113 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Systems and methods for inspecting a wafer are provided. One system includes an illumination subsystem configured to illuminate the wafer; a collection subsystem configured to collect light scattered from the wafer and to preserve the polarization of the scattered light; an optical element configured to separate the scattered light collected in different segments of the collection numerical aperture of the collection subsystem, where the optical element is positioned at a Fourier plane or a conjugate of the Fourier plane of the collection subsystem; a polarizing element configured to separate the scattered light in one of the different segments into different portions of the scattered light based on polarization; and a detector configured to detect one of the different portions of the scattered light and to generate output responsive to the detected light, which is used to detect defects on the wafer.
摘要翻译：提供了用于检查晶片的系统和方法。一个系统包括配置成照亮晶片的照明子系统; 收集子系统，被配置为收集从晶片散射的光并保持散射光的偏振; 光学元件，被配置为将收集在收集子系统的收集数值孔径的不同段中的散射光分离，其中所述光学元件位于所述收集子系统的傅立叶平面或所述傅立叶平面的共轭处; 偏振元件，被配置为基于极化将所述不同段中的一个中的散射光分离成所述散射光的不同部分; 以及检测器，被配置为检测散射光的不同部分中的一个，并且响应于检测到的光而产生输出，所述检测光用于检测晶片上的缺陷。

69. 发明授权

US08283631B2 In-situ differential spectroscopy 失效
标题翻译：原位差分光谱
公开(公告)号：US08283631B2
公开(公告)日：2012-10-09
申请号：US12351215
申请日：2009-01-09
申请人： Mehdi Vaez-Iravani , Mehran Nasser-Ghodsi , Guoheng Zhao
发明人： Mehdi Vaez-Iravani , Mehran Nasser-Ghodsi , Guoheng Zhao
IPC分类号： G01N23/00 , G21K7/00 , H01J40/00
CPC分类号： H01J37/244 , G01N2223/079 , G01N2223/086 , G01N2223/33 , H01J37/256 , H01J2237/24495 , H01J2237/2511 , H01J2237/2807
摘要： A spectrometer having an electron beam generator for generating an electron beam that is directed at a sample. An electron beam positioner directs the electron beam onto a position of the sample, and thereby produces a secondary emitted stream from the sample, where the secondary emitted stream includes at least one of electrons and x-rays. An secondary emitted stream positioner positions the secondary emitted stream onto a detector array, which receives the secondary emitted stream and detects both the amounts and the received positions of the secondary emitted stream. A modulator modulates the electron beam that is directed onto the sample, and thereby sweeps the electron beam between a first position and a second position on the sample. An extractor is in signal communication with both the modulator and the detector array, and extracts a differential signal that represents a difference between the signals that are received from the first position and the signals that are received from the second position.
摘要翻译：具有用于产生针对样品的电子束的电子束发生器的光谱仪。电子束定位器将电子束引导到样品的位置，从而产生来自样品的二次发射流，其中二次发射流包括电子和X射线中的至少一个。二次发射流定位器将二次发射流定位在检测器阵列上，检测器阵列接收二次发射流并检测二次发射流的量和接收位置。调制器调制被引导到样品上的电子束，从而在样品上的第一位置和第二位置之间扫描电子束。提取器与调制器和检测器阵列进行信号通信，并且提取表示从第一位置接收的信号与从第二位置接收的信号之间的差的差分信号。

70. 发明授权

US08194301B2 Multi-spot scanning system and method 有权
标题翻译：多点扫描系统及方法
公开(公告)号：US08194301B2
公开(公告)日：2012-06-05
申请号：US12042252
申请日：2008-03-04
申请人： Guoheng Zhao , Rex Runyon , Mehdi Vaez-Iravani
发明人： Guoheng Zhao , Rex Runyon , Mehdi Vaez-Iravani
IPC分类号： G02B26/08
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2201/10 , G01N2201/104 , G02B26/123 , Y10S359/90
摘要： A multi-spot scanning technique using a spot array having a predetermined gap between spots can advantageously provide scalability to a large number of spots as well as the elimination of cross-talk between channels. The multi-spot scanning technique can select a number of spots for the spot array (1D or 2D), determine a separation between the spots to minimize crosstalk, and perform a scan on a wafer using the spot array and a full field of view (FOV). Performing the scan includes performing a plurality of scan line cycles, wherein each scan line cycle can fill in gaps left by previous scan line cycles. This “delay and fill” scan allows large spacing between spots, thereby eliminating cross-talk at the detector plane. In one embodiment, the scan is begun and ended outside a desired scan area on the wafer to ensure full scan coverage.
摘要翻译：使用具有点之间的预定间隙的点阵列的多点扫描技术可以有利地提供大量斑点的可扩展性以及消除通道之间的串扰。多点扫描技术可以为斑点阵列（1D或2D）选择多个斑点，确定斑点之间的距离以最小化串扰，并使用斑点阵列和全视场对晶片进行扫描（ FOV）。执行扫描包括执行多个扫描线周期，其中每个扫描线周期可以填充先前扫描线周期留下的间隙。这种“延迟和填充”扫描允许斑点之间的大间距，从而消除检测器平面处的串扰。在一个实施例中，扫描开始并在晶片上期望的扫描区域外部结束以确保全扫描覆盖。

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