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1. 发明授权

US06710876B1 Metrology system using optical phase 失效
标题翻译：计量系统采用光学相位
公开(公告)号：US06710876B1
公开(公告)日：2004-03-23
申请号：US09639495
申请日：2000-08-14
申请人： Mehrdad Nikoonahad , Guoheng Zhao , Ian Smith , Mehdi Vaez-Iravani
发明人： Mehrdad Nikoonahad , Guoheng Zhao , Ian Smith , Mehdi Vaez-Iravani
IPC分类号： G01B1100
CPC分类号： G03F7/70633
摘要： Misalignment error between two periodic structures such as two overlay targets placed side-by-side is measured. The two structures are illuminated by coherent radiation and the positive and negative diffraction beams of the input beam by the two structures are detected to discover the optical phase difference between the positive and negative diffraction beams. The misalignment between the two structures may then be ascertained from the phase difference.
摘要翻译：测量两个周期性结构（如并排放置的两个叠加目标）之间的对准误差。这两个结构被相干辐射照射，并且检测由两个结构的输入光束的正和负衍射光束以发现正和负衍射光束之间的光学相位差。然后可以从相位差确定两个结构之间的未对准。

2. 发明申请

US20050094153A1 Metrology system using optical phase 审中-公开
标题翻译：计量系统采用光学相位
公开(公告)号：US20050094153A1
公开(公告)日：2005-05-05
申请号：US11016025
申请日：2004-12-17
申请人： Mehrdad Nikoonahad , Guoheng Zhao , Ian Smith , Mehdi Vaez-Iravani
发明人： Mehrdad Nikoonahad , Guoheng Zhao , Ian Smith , Mehdi Vaez-Iravani
IPC分类号： G03F7/20 , G01B9/02
CPC分类号： G03F7/70633
摘要： Misalignment error between two periodic structures such as two overlay targets placed side-by-side is measured. The two structures are illuminated by coherent radiation and the positive and negative diffraction beams of the input beam by the two structures are detected to discover the optical phase difference between the positive and negative diffraction beams. The misalignment between the two structures may then be ascertained from the phase difference.
摘要翻译：测量两个周期性结构（如并排放置的两个叠加目标）之间的对准误差。这两个结构被相干辐射照射，并且检测由两个结构的输入光束的正和负衍射光束以发现正和负衍射光束之间的光学相位差。然后可以从相位差确定两个结构之间的未对准。

3. 发明授权

US06922236B2 Systems and methods for simultaneous or sequential multi-perspective specimen defect inspection 有权
标题翻译：用于同时或顺序多视角样本缺陷检查的系统和方法
公开(公告)号：US06922236B2
公开(公告)日：2005-07-26
申请号：US10192813
申请日：2002-07-10
申请人： Mehdi Vaez-Iravani , Stan Stokowski , Steven Biellak , Jamie Sullivan , Keith Wells , Mehrdad Nikoonahad
发明人： Mehdi Vaez-Iravani , Stan Stokowski , Steven Biellak , Jamie Sullivan , Keith Wells , Mehrdad Nikoonahad
IPC分类号： G01N21/84 , G01N21/47 , G01N21/94 , G01N21/95 , G01N21/956 , H01L21/027 , H01L21/66 , G01N21/88
CPC分类号： G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8825
摘要： Systems and methods for inspecting a surface of a specimen such as a semiconductor wafer are provided. A system may include an illumination system configured to direct a first beam of light to a surface of the specimen at an oblique angle of incidence and to direct a second beam of light to a surface of the specimen at a substantially normal angle. The system may also include a collection system configured to collect at least a portion of the first and second beams of light returned from the surface of the specimen. In addition, the system may include a detection system. The detection system may be configured to process the collected portions of the first and second beams of light. In this manner, a presence of defects on the specimen may be detected from the collected portions of the first and second beams of light.
摘要翻译：提供了用于检查诸如半导体晶片的样本的表面的系统和方法。系统可以包括照明系统，其被配置为以倾斜的入射角度将第一光束引导到样品的表面，并以基本上一般的角度将第二光束引导到样品的表面。系统还可以包括收集系统，其被配置为收集从样本表面返回的第一和第二光束的至少一部分。另外，该系统可以包括检测系统。检测系统可以被配置为处理第一和第二光束的收集部分。以这种方式，可以从第一和第二光束的收集部分检测出样本上的缺陷。

4. 发明申请

US20090195779A1 SYSTEM FOR SCATTEROMETRIC MEASUREMENTS AND APPLICATIONS 有权
标题翻译： SCATTERMETRIC测量和应用系统
公开(公告)号：US20090195779A1
公开(公告)日：2009-08-06
申请号：US12410379
申请日：2009-03-24
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
IPC分类号： G01J4/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

5. 发明申请

US20080084567A1 System for Scatterometric Measurements and Applications 有权
标题翻译：散射测量和应用系统
公开(公告)号：US20080084567A1
公开(公告)日：2008-04-10
申请号：US11945949
申请日：2007-11-27
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
IPC分类号： G01B9/02 , G01B11/24 , G01J4/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

6. 发明授权

US07009704B1 Overlay error detection 失效
公开(公告)号：US07009704B1
公开(公告)日：2006-03-07
申请号：US09697025
申请日：2000-10-26
申请人： Mehrdad Nikoonahad , Guoheng Zhao , Andrei V. Shchegrov , Ben Tsai
发明人： Mehrdad Nikoonahad , Guoheng Zhao , Andrei V. Shchegrov , Ben Tsai
IPC分类号： G01B11/00 , G01K9/00
CPC分类号： G03F7/70633 , G01B11/272
摘要： An overlay target with gratings thereon is illuminated and radiation scattered by the target is imaged onto detectors. A phase difference is then detected between the outputs of the detectors to find the mis-alignment error. In another aspect, an overlay target with gratings or box-in-box structures is illuminated and radiation scattered by the target is imaged onto detectors located away from the specular reflection direction of the illumination in a dark field detection scheme. Medium numerical aperture optics may be employed for collecting the radiation from the overlay target in a bright or dark field configuration so that the system has a larger depth of focus and so that the two structures of the target at different elevations can be measured accurately at the same time. Analytical functions are constructed for the grating type targets. By finding the phase difference between the two gratings at different elevations, misalignment errors can be detected. Analytical functions are constructed as a model for box-in-box type targets where data points away from the edges of the box or bars can be used in the curve fitting. Symmetrical functions are employed to further reduce noise.

7. 发明授权

US06628397B1 Apparatus and methods for performing self-clearing optical measurements 有权
标题翻译：用于执行自清除光学测量的装置和方法
公开(公告)号：US06628397B1
公开(公告)日：2003-09-30
申请号：US09396143
申请日：1999-09-15
申请人： Mehrdad Nikoonahad , Shing M. Lee , Kalman Kele , Guoheng Zhao , Kurt R. Lehman
发明人： Mehrdad Nikoonahad , Shing M. Lee , Kalman Kele , Guoheng Zhao , Kurt R. Lehman
IPC分类号： G01N2155
CPC分类号： G01N21/15 , B24B37/005 , B24B49/12 , B24D7/12 , G01B11/00 , G01B11/0683
摘要： Disclosed is a self-clearing objective for directing a beam towards a sample and clearing away debris from an optical viewing path adjacent to the sample. The self-clearing objective includes an optical element and a substantially transparent fluid flowing between the optical element and the sample such that at least a portion adjacent to the sample is substantially cleared of debris. The optical element and the fluid cooperatively direct the beam towards the sample. This self-clearing objective may be coupled with various measurement devices to measure various characteristics of samples having debris that prevents clear optical measurements. Additionally, the measurement device may be integrated with or coupled to various sample processing systems so that the relevant process may be clearly monitored.
摘要翻译：公开了一种用于将光束引向样品并从邻近样品的光学观察路径清除碎屑的自清除目标。自清除物镜包括在光学元件和样品之间流动的光学元件和基本上透明的流体，使得与样品相邻的至少一部分基本上被清除。光学元件和流体协调地将光束引向样品。这种自清除物镜可以与各种测量装置耦合，以测量具有防止清晰光学测量的碎片的样品的各种特性。此外，测量装置可以与各种样品处理系统集成或耦合到可以清楚地监测相关过程。

8. 发明授权

US07821654B2 System for scatterometric measurements and applications 有权
标题翻译：散射测量和应用系统
公开(公告)号：US07821654B2
公开(公告)日：2010-10-26
申请号：US12410379
申请日：2009-03-24
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
IPC分类号： G01B11/34 , G01J4/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

9. 发明授权

US07301649B2 System for scatterometric measurements and applications 有权
标题翻译：散射测量和应用系统
公开(公告)号：US07301649B2
公开(公告)日：2007-11-27
申请号：US11192056
申请日：2005-07-27
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel C. Wack , Mehrdad Nikoonahad
IPC分类号： G01B11/34 , G01J4/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

10. 发明申请

US20050274901A1 System for scatterometric measurements and applications 有权
标题翻译：散射测量和应用系统
公开(公告)号：US20050274901A1
公开(公告)日：2005-12-15
申请号：US11192056
申请日：2005-07-27
申请人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
发明人： Anatoly Fabrikant , Guoheng Zhao , Daniel Wack , Mehrdad Nikoonahad
IPC分类号： G01B11/00 , G01B11/30 , G01N21/21 , G01N21/27 , G01N21/47 , G01N21/95 , G02B5/18 , G03F1/08 , H01L21/027 , H01L21/66 , G06F19/00
CPC分类号： G01N21/45 , G01N21/21 , G01N21/4788 , G01N21/9501 , G01N2021/213 , G01N2021/217 , G01N2021/8416 , G02B5/18
摘要： Instead of constructing a full multi-dimensional look-up-table as a model to find the critical dimension or other parameters in scatterometry, regression or other optimized estimation methods are employed starting from a “best guess” value of the parameter. Eigenvalues of models that are precalculated may be stored and reused later for other structures having certain common characteristics to save time. The scatterometric data that is used to find the value of the one or more parameter can be limited to those at wavelengths that are less sensitive to the underlying film characteristics. A model for a three-dimensional grating may be constructed by slicing a representative structure into a stack of slabs and creating an array of rectangular blocks to approximate each slab. One dimensional boundary problems may be solved for each block which are then matched to find a two-dimensional solution for the slab. A three-dimensional solution can then be constructed from the two-dimensional solutions for the slabs to yield the diffraction efficiencies of the three-dimensional grating. This model can then be used for finding the one or more parameters of the diffracting structure in scatterometry. Line roughness of a surface can be measured by directing a polarized incident beam in an incident plane normal to the line grating and measuring the cross-polarization coefficient. The value of the one or more parameters may then be supplied to a stepper or etcher to adjust a lithographic or etching process.
摘要翻译：不需要构建一个完整的多维查找表作为模型来查找散点图中的关键维度或其他参数，而是从参数的“最佳猜测”值开始采用回归或其他优化的估计方法。预先计算的模型的特征值可以稍后存储并重用于具有某些共同特征的其他结构以节省时间。用于查找一个或多个参数的值的散点数据可以限于那些对底层薄膜特性较不敏感的波长数据。三维光栅的模型可以通过将代表性结构切片成一叠平板并且产生矩形块阵列来近似每个平板来构造。可以为每个块解决一维边界问题，然后将其匹配以找到板的二维解。然后可以从板的二维解决方案中构建三维解，以产生三维光栅的衍射效率。然后，该模型可用于在散射测量中找到衍射结构的一个或多个参数。可以通过将垂直于线光栅的入射平面中的偏振入射光束引导并测量交叉极化系数来测量表面的线粗糙度。然后可以将一个或多个参数的值提供给步进器或蚀刻器以调整光刻或蚀刻工艺。

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