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1. 发明申请

US20180172602A1 SYSTEM AND METHOD FOR INSPECTING CONTAINERS USING MULTIPLE RADIATION SOURCES 审中-公开
公开(公告)号：US20180172602A1
公开(公告)日：2018-06-21
申请号：US15579574
申请日：2016-06-03
申请人： Christian BECK , INDUSTRIAL DYNAMICS COMPANY, LTD.
发明人： Christian Beck
IPC分类号： G01N21/90 , G01N21/958
CPC分类号： G01N21/9036 , G01N21/90 , G01N21/9009 , G01N21/9018 , G01N21/9027 , G01N21/958 , G01N2021/8845 , G01N2201/06146 , G01N2201/0636
摘要： An inspection system having a light source, a mirror sensor, and an image sensor. The mirror assembly is aligned with the camera; the light is reflected from the container to the camera, and the camera creates multiple images of the container at a viewing angle. The multiple images are analyzed to detect defects.

2. 发明申请

US20180038804A1 INSPECTION DEVICE FOR CONTAINER CLOSURES 审中-公开
公开(公告)号：US20180038804A1
公开(公告)日：2018-02-08
申请号：US15316326
申请日：2015-05-07
申请人： KHS GmbH
发明人： Carsten Buchwald , Jürgen-Peter Herrmann , Marius Michael Herrmann , Wolfgang Schorn , Xiang Zhang
IPC分类号： G01N21/90 , G01N21/88
CPC分类号： G01N21/9054 , G01N21/8806 , G01N21/909 , G01N2021/8845
摘要： An inspection device for inspecting screw-closures on bottles includes a rotationally-symmetric lens disposed above a bottle's screw-closure and having a convex portion and a flat aspheric portion, a first lighting-unit for illuminating the screw-closure, and a camera located above the lens and connected to an image processor.

3. 发明授权

US09792515B2 Apparatus and method for recognizing stamped character and system for detecting stamped depth of character using the same 有权
公开(公告)号：US09792515B2
公开(公告)日：2017-10-17
申请号：US13959392
申请日：2013-08-05
申请人： Hyundai Motor Company
发明人： Jae Hun Song
IPC分类号： H04N7/18 , G06K9/20 , G01N21/88 , G01N21/89
CPC分类号： G06K9/2036 , G01N21/8806 , G01N21/8901 , G01N21/8903 , G01N2021/8845 , G01N2021/8918 , G06K2209/01
摘要： An apparatus and a method recognizes stamped characters, detects stamped depths of characters using the same, and/or accurately recognizes characters even when an image distortion occurs at stamped portion due to different stamped depths of characters.

4. 发明授权

US09658150B2 System and method for semiconductor wafer inspection and metrology 有权
公开(公告)号：US09658150B2
公开(公告)日：2017-05-23
申请号：US14990233
申请日：2016-01-07
申请人： KLA-TENCOR CORPORATION
发明人： Shifang Li , Youxian Wen
IPC分类号： G01N21/21 , G01B11/02 , G03F7/20 , G01B11/30 , G01N21/95 , G01B11/06 , G01N21/39 , G01N21/88
CPC分类号： G01N21/21 , G01B11/02 , G01B11/06 , G01B11/30 , G01B11/303 , G01N21/9501 , G01N2021/399 , G01N2021/8845 , G01N2021/8848 , G03F7/70608 , G03F7/70625
摘要： A system determines a value, such as a thickness, surface roughness, material concentration, and/or critical dimension, of a layer on a wafer based on normalized signals and reflected total intensities. A light source directs a beam at a surface of the wafer. A sensor receives the reflected beam and provides at least a pair of polarization channels. The signals from the polarization channels are received by a controller, which normalizes a difference between a pair of the signals to generate the normalized result. The value of the wafer is determined through analyzing the signal with a modeling of the system.

5. 发明申请

US20160320712A1 Inspection Method and Apparatus and Lithographic Apparatus 有权
标题翻译：检验方法与仪器及光刻设备
公开(公告)号：US20160320712A1
公开(公告)日：2016-11-03
申请号：US15105339
申请日：2014-11-14
申请人： ASML NETHERLANDS B.V.
发明人： Arie Jeffrey DEN BOEF
IPC分类号： G03F7/20
CPC分类号： G03F7/70625 , G01B2210/56 , G01N21/4788 , G01N21/956 , G01N2021/8845 , G03F7/70616
摘要： Disclosed are an inspection method and apparatus and an associated lithographic apparatus. The inspection method comprises illuminating a structure with inspection radiation of a selected wavelength, the structure being of a type comprising a plurality of layers (for example a 3D memory structure). The resultant diffraction signal is detected a physical property of a subset of said layers is determined from said diffraction signal. The subset of layers for which said physical property is determined is dependent upon the selected wavelength of the inspection radiation.
摘要翻译：公开了一种检查方法和装置以及相关的光刻设备。检查方法包括用所选波长的检查辐射照射结构，该结构是包括多个层（例如3D存储器结构）的类型。从所述衍射信号中确定所得到的衍射信号，所述层的子集的物理性质确定。确定所述物理性质的层子集取决于所选择的检查辐射波长。

6. 发明申请

US20160153914A1 INSPECTION SYSTEMS AND TECHNIQUES WITH ENHANCED DETECTION 有权
标题翻译：检测系统和具有增强检测的技术
公开(公告)号：US20160153914A1
公开(公告)日：2016-06-02
申请号：US14944124
申请日：2015-11-17
申请人： KLA-Tencor Corporation
发明人： Steven R. Lange
IPC分类号： G01N21/88 , G01N21/95
CPC分类号： G01N21/9505 , G01N21/8806 , G01N21/9501 , G01N21/956 , G01N2021/8845 , G01N2021/8848 , G03F7/70633 , G03F7/7065
摘要： Disclosed are methods and apparatus for inspecting semiconductor samples. On an inspection tool, a plurality of different wavelength ranges is selected for different layers of interest of one or more semiconductor samples based on whether such different layers of interest have an absorber type material present within or near such different layers of interest. On the inspection tool, at least one incident beam is directed at the different wavelength ranges towards the different layers of interest and, in response, output signals or images are obtained for each of the different layers of interest. The output signals or images from each of the different layers of interest are analyzed to detect defects in such different layers of interest.
摘要翻译：公开了用于检查半导体样品的方法和装置。在检查工具上，基于这些不同的感兴趣层具有存在于感兴趣的不同层内或附近的吸收体型材料，为一个或多个半导体样品的不同感兴趣的层选择多个不同的波长范围。在检查工具上，至少一个入射光束朝向感兴趣的不同层的不同波长范围，并且作为响应，针对感兴趣的不同层中的每一个获得输出信号或图像。分析来自每个不同感兴趣层的输出信号或图像，以检测这些不同感兴趣的层中的缺陷。

7. 发明授权

US09296641B2 Inspectable black glass containers 有权
标题翻译：可检查的黑色玻璃容器
公开(公告)号：US09296641B2
公开(公告)日：2016-03-29
申请号：US13666644
申请日：2012-11-01
申请人： Owens-Brockway Glass Container Inc.
发明人： Roger P. Smith , Carol A. Click , Rebecca Mullen , Stephen Daniel Barton
IPC分类号： C03C4/02 , C03B32/00 , G01J5/28 , C03C3/087 , G01N33/38 , G01N21/90
CPC分类号： G01N21/958 , C03B32/00 , C03C3/087 , C03C4/02 , G01J5/28 , G01N21/8806 , G01N21/909 , G01N33/386 , G01N2021/8845 , Y10T428/131
摘要： A soda-lime-silica glass container and related methods of manufacturing. A black-strikable glass composition having a base glass portion and a latent colorant portion is prepared. The base glass portion includes soda-lime-silica glass materials and one or more blue colorant materials, and the latent colorant portion includes cuprous oxide (Cu2O), stannous oxide (SnO), bismuth oxide (Bi2O3), and carbon (C). Glass containers may be formed from the black-strikable glass composition, and these glass containers may be heated to a temperature greater than 600 degrees Celsius to strike black therein. The glass containers formed from the black-strikable glass composition may be inspected—before or after striking—by infrared inspection equipment.
摘要翻译：钠钙硅玻璃容器及相关制造方法。制备具有基底玻璃部分和潜着色剂部分的黑色可蚀刻玻璃组合物。基础玻璃部分包括钠钙石英玻璃材料和一种或多种蓝色着色剂材料，潜着色剂部分包括氧化亚铜（Cu 2 O），氧化亚锡（SnO），氧化铋（Bi 2 O 3）和碳（C）。玻璃容器可以由黑色玻璃组合物形成，并且这些玻璃容器可以被加热到大于600摄氏度的温度以在其中发黑。由黑色可见玻璃组合物形成的玻璃容器可以在通过红外检测设备打击之前或之后进行检查。

8. 发明申请

US20150253129A1 INSPECTION APPARATUS 审中-公开
标题翻译：检查装置
公开(公告)号：US20150253129A1
公开(公告)日：2015-09-10
申请号：US14626971
申请日：2015-02-20
申请人： OMRON Corporation
发明人： Yasuhiro OHNISHI
IPC分类号： G01B11/25
CPC分类号： G01B11/254 , G01B11/24 , G01B11/2531 , G01N21/8806 , G01N2021/8816 , G01N2021/8845 , G01N2021/95646 , G01N2201/0627 , G01N2201/0634
摘要： In an inspection apparatus having a projection device for projecting pattern light and an obliquely arranged camera, a technology is provided with which favorable measurement performance for measuring solder shapes is realized. If an illumination device is provided with openings for projection devices, then the openings are formed at azimuth directions that are from the X-axis direction and the Y-axis direction. If both an opening for a projection device and an opening for an obliquely arranged camera are provided, then they are arranged at different azimuth directions. Alternatively, it is also possible to provide a supplementary illumination device to supplement deficiencies in the illumination light due to the openings. Alternatively, it is also possible to match the optical axes of the projection device and the obliquely arranged camera and to provide a shared opening.
摘要翻译：在具有用于投射图案光的投影装置和倾斜布置的照相机的检查装置中，提供了一种实现测量焊料形状的有利的测量性能的技术。如果照明装置设置有用于投影装置的开口，则开口形成在从X轴方向和Y轴方向的方位角。如果提供用于投影装置的开口和用于倾斜布置的相机的开口，则它们被布置在不同的方位方向。或者，还可以提供补充照明装置来补充由于开口引起的照明光的不足。或者，也可以匹配投影装置的光轴和倾斜布置的相机，并提供共享开口。

9. 发明授权

US09110037B2 Diode laser based broad band light sources for wafer inspection tools 有权
标题翻译：用于晶圆检测工具的基于二极管激光的宽带光源
公开(公告)号：US09110037B2
公开(公告)日：2015-08-18
申请号：US14521977
申请日：2014-10-23
申请人： KLA-Tencor Corporation
发明人： Anant Chimmalgi , Younus Vora , Rudolf Brunner
IPC分类号： G01N21/00 , G01N21/95 , G01N21/88 , G03F7/20 , G01N21/956
CPC分类号： G01N21/9501 , G01N21/8806 , G01N2021/8845 , G01N2021/95676 , G01N2201/0612 , G03F7/70483
摘要： Disclosed are methods and apparatus for performing inspection or metrology of a semiconductor device. The apparatus includes a plurality of laser diode arrays that are configurable to provide an incident beam having different wavelength ranges. At least some of the laser diode arrays form two dimensional stacks that have different wavelength ranges from each other. The apparatus also includes optics for directing the incident beam towards the sample, a detector for generating an output signal or image based on an output beam emanating from the sample in response to the incident beam, and optics for directing the output beam towards the detector. The apparatus further includes a controller for configuring the laser diode arrays to provide the incident beam at the different wavelength ranges and detecting defects or characterizing a feature of the sample based on the output signal or image.
摘要翻译：公开了用于执行半导体器件的检查或计量的方法和装置。该装置包括可配置为提供具有不同波长范围的入射光束的多个激光二极管阵列。至少一些激光二极管阵列形成彼此具有不同波长范围的二维叠层。该装置还包括用于将入射光束引向样品的光学器件，用于响应于入射光束而从样品发出的输出光束产生输出信号或图像的检测器，以及用于将输出光束引向检测器的光学器件。该装置还包括控制器，用于配置激光二极管阵列以在不同波长范围提供入射光束，并基于输出信号或图像检测缺陷或表征样本的特征。

10. 发明授权

US09075027B2 Apparatus and methods for detecting defects in vertical memory 有权
标题翻译：用于检测垂直存储器中的缺陷的装置和方法
公开(公告)号：US09075027B2
公开(公告)日：2015-07-07
申请号：US14078271
申请日：2013-11-12
申请人： KLA-Tencor Corporation
发明人： Steven R. Lange
IPC分类号： G01N21/00 , G01N21/95 , G01N21/88 , G01N21/21 , G01N21/956
CPC分类号： G01N21/9505 , G01N21/21 , G01N21/8806 , G01N21/9501 , G01N2021/8845 , G01N2021/95676 , G01N2201/061 , G01N2201/08
摘要： Disclosed are methods and apparatus for inspecting a vertical memory stack. On an inspection tool, incident light having a first wavelength range is used to detect defects on a surface of the vertical memory stack. On the inspection tool, incident light having a second wavelength range is used to detect defects on both the surface and throughout a depth of the vertical memory stack. The defects detected using the first and second wavelength range are compared to detect defects only throughout the depth of the vertical memory stack, excluding defects on the surface.
摘要翻译：公开了用于检查垂直存储器堆叠的方法和装置。在检查工具上，使用具有第一波长范围的入射光来检测垂直存储堆的表面上的缺陷。在检查工具上，具有第二波长范围的入射光用于检测垂直存储器堆叠的表面和深度上的缺陷。将使用第一和第二波长范围检测到的缺陷进行比较，以仅在垂直存储器堆叠的整个深度处检测缺陷，排除表面上的缺陷。

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