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1. 发明授权

US06707540B1 In-situ metalization monitoring using eddy current and optical measurements 有权
标题翻译：使用涡流和光学测量进行原位金属化监测
公开(公告)号：US06707540B1
公开(公告)日：2004-03-16
申请号：US09633800
申请日：2000-08-07
申请人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden , Guoheng Zhao , Mehrdad Nikoonahad
发明人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden , Guoheng Zhao , Mehrdad Nikoonahad
IPC分类号： G01N2100
CPC分类号： G01N27/72
摘要： Disclosed is a chemical mechanical polishing (CMP) system for polishing a sample with a polishing agent and monitoring the sample. The CMP system includes a polishing table, a sample carrier arranged to hold the sample over the polishing table, and an eddy probe. The polishing table and sample carrier are arranged to receive a polishing agent between the sample and the polishing table and to polish the sample by moving the polishing table and the sample carrier relative to each other. The eddy probe is arranged to be operable to obtain a measurement of the sample while the sample is being polished. The CMP system further includes an optical measurement device arranged to be operable to obtain a measurement of the sample while the sample is being polished. The CMP system also has a memory and a processor coupled with the memory. The processor and memory are adapted for operating the eddy probe and optical measurement device.
摘要翻译：公开了一种用抛光剂抛光样品并监测样品的化学机械抛光（CMP）系统。 CMP系统包括抛光台，布置成将样品保持在抛光台上的样品载体和涡流探针。抛光台和样品载体布置成在样品和抛光台之间接收抛光剂，并通过相对于彼此移动抛光台和样品载体来抛光样品。涡流探针布置成可操作以在样品被抛光时获得样品的测量。 CMP系统还包括光学测量装置，其布置成可操作以在样品被抛光时获得样品的测量。 CMP系统还具有与存储器耦合的存储器和处理器。处理器和存储器适于操作涡流探针和光学测量装置。

2. 发明授权

US06433541B1 In-situ metalization monitoring using eddy current measurements during the process for removing the film 有权
标题翻译：在去除薄膜的过程中使用涡流测量进行原位金属化监测
公开(公告)号：US06433541B1
公开(公告)日：2002-08-13
申请号：US09633198
申请日：2000-08-07
申请人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
发明人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
IPC分类号： G01B706
CPC分类号： G01N27/72
摘要： Disclosed is a method of obtaining information in-situ regarding a film of a sample using an eddy probe during a process for removing the film. The eddy probe has at least one sensing coil. An AC voltage is applied to the sensing coil(s) of the eddy probe. One or more first signals are measured in the sensing coil(s) of the eddy probe when the sensing coil(s) are positioned proximate the film of the sample. One or more second signals are measured in the sensing coil(s) of the eddy probe when the sensing coil(s) are positioned proximate to a reference material having a fixed composition and/or distance from the sensing coil. The first signals are calibrated based on the second signals so that undesired gain and/or phase changes within the first signals are corrected. A property value of the film is determined based on the calibrated first signals. An apparatus for performing the above described method is also disclosed.
摘要翻译：公开了一种在除去膜的过程中使用涡流探针在原位获取样品的膜的方法。涡流探头具有至少一个感测线圈。交流电压被施加到涡流探头的感测线圈上。当感测线圈靠近样品的膜定位时，在涡流探针的感测线圈中测量一个或多个第一信号。当感测线圈靠近具有与感测线圈的固定成分和/或距离的参考材料定位时，在涡流探针的感测线圈中测量一个或多个第二信号。第一信号基于第二信号进行校准，从而校正第一信号内的不期望的增益和/或相位变化。基于校准的第一信号确定胶片的属性值。还公开了一种用于执行上述方法的装置。

3. 发明授权

US07070476B2 In-situ metalization monitoring using eddy current measurements during the process for removing the film 有权
公开(公告)号：US07070476B2
公开(公告)日：2006-07-04
申请号：US11115835
申请日：2005-04-26
申请人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
发明人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
IPC分类号： B24B49/00
CPC分类号： G01N27/72
摘要： A method for measuring conductance of a sample using an eddy current probe with a sensing coil. The method includes N repetitions of measuring first and second voltage pairs including in-phase and quadrature components of an induced AC voltage in the sensing coil, calibrating the first signal based on the measured second signal at a different separation from the sample and reference material, determining a conductance function relating conductance with location along the selected curve, processing the calibrated first voltage pairs to generate a lift-off curve, determining an intersection voltage pair representing intersection of the lift-off curve with a selected curve, and determining the conductance of the sample from the intersection voltage pair and the conductance function.

4. 发明授权

US06885190B2 In-situ metalization monitoring using eddy current measurements during the process for removing the film 有权
标题翻译：在去除薄膜的过程中使用涡流测量进行原位金属化监测
公开(公告)号：US06885190B2
公开(公告)日：2005-04-26
申请号：US10623953
申请日：2003-07-21
申请人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
发明人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
IPC分类号： G01N27/72 , G01R33/12
CPC分类号： G01N27/72
摘要： A method for measuring conductance of a sample using an eddy current probe with a sensing coil. The method includes N repetitions of measuring first and second voltage pairs including in-phase and quadrature components of an induced AC voltage in the sensing coil, calibrating the first signal based on the measured second signal at a different separation from the sample and reference material, determining a conductance function relating conductance with location along the selected curve, processing the calibrated first voltage pairs to generate a lift-off curve, determining an intersection voltage pair representing intersection of the lift-off curve with a selected curve, and determining the conductance of the sample from the intersection voltage pair and the conductance function.
摘要翻译：使用具有感测线圈的涡流探头测量样品的电导率的方法。该方法包括测量包括感测线圈中的感应AC电压的同相和正交分量的第一和第二电压对的N次重复，基于在与样本和参考材料不同的分离处测量的第二信号来校准第一信号，确定与所选择的曲线相关的电导与位置的电导函数，处理校准的第一电压对以产生剥离曲线，确定表示取出曲线与选定曲线的交点的交叉电压对，以及确定来自交点电压对的样本和电导函数。

5. 发明授权

US06621264B1 In-situ metalization monitoring using eddy current measurements during the process for removing the film 有权
标题翻译：在去除薄膜的过程中使用涡流测量进行原位金属化监测
公开(公告)号：US06621264B1
公开(公告)日：2003-09-16
申请号：US10166585
申请日：2002-06-05
申请人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
发明人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
IPC分类号： G01B706
CPC分类号： G01N27/72
摘要： A method for measuring conductance of a sample using an eddy current probe with a sensing coil. The method includes N repetitions of measuring first and second voltage pairs including in-phase and quadrature components of an induced AC voltage in the sensing coil, calibrating the first signal based on the measured second signal at a different separation from the sample and reference material, determining a conductance function relating conductance with location along the selected curve, processing the calibrated first voltage pairs to generate a lift-off curve, determining an intersection voltage pair representing intersection of the lift-off curve with a selected curve, and determining the conductance of the sample from the intersection voltage pair and the conductance function.
摘要翻译：使用具有感测线圈的涡流探头测量样品的电导率的方法。该方法包括测量包括感测线圈中的感应AC电压的同相和正交分量的第一和第二电压对的N次重复，基于在与样本和参考材料不同的分离处测量的第二信号来校准第一信号，确定与所选择的曲线相关的电导与位置的电导函数，处理校准的第一电压对以产生剥离曲线，确定表示取出曲线与选定曲线的交点的交叉电压对，以及确定来自交点电压对的样本和电导函数。

6. 发明授权

US06628397B1 Apparatus and methods for performing self-clearing optical measurements 有权
标题翻译：用于执行自清除光学测量的装置和方法
公开(公告)号：US06628397B1
公开(公告)日：2003-09-30
申请号：US09396143
申请日：1999-09-15
申请人： Mehrdad Nikoonahad , Shing M. Lee , Kalman Kele , Guoheng Zhao , Kurt R. Lehman
发明人： Mehrdad Nikoonahad , Shing M. Lee , Kalman Kele , Guoheng Zhao , Kurt R. Lehman
IPC分类号： G01N2155
CPC分类号： G01N21/15 , B24B37/005 , B24B49/12 , B24D7/12 , G01B11/00 , G01B11/0683
摘要： Disclosed is a self-clearing objective for directing a beam towards a sample and clearing away debris from an optical viewing path adjacent to the sample. The self-clearing objective includes an optical element and a substantially transparent fluid flowing between the optical element and the sample such that at least a portion adjacent to the sample is substantially cleared of debris. The optical element and the fluid cooperatively direct the beam towards the sample. This self-clearing objective may be coupled with various measurement devices to measure various characteristics of samples having debris that prevents clear optical measurements. Additionally, the measurement device may be integrated with or coupled to various sample processing systems so that the relevant process may be clearly monitored.
摘要翻译：公开了一种用于将光束引向样品并从邻近样品的光学观察路径清除碎屑的自清除目标。自清除物镜包括在光学元件和样品之间流动的光学元件和基本上透明的流体，使得与样品相邻的至少一部分基本上被清除。光学元件和流体协调地将光束引向样品。这种自清除物镜可以与各种测量装置耦合，以测量具有防止清晰光学测量的碎片的样品的各种特性。此外，测量装置可以与各种样品处理系统集成或耦合到可以清楚地监测相关过程。

7. 发明授权

US06787773B1 Film thickness measurement using electron-beam induced x-ray microanalysis 失效
标题翻译：使用电子束诱导X射线微量分析的膜厚度测量
公开(公告)号：US06787773B1
公开(公告)日：2004-09-07
申请号：US09695726
申请日：2000-10-23
申请人： Shing M. Lee
发明人： Shing M. Lee
IPC分类号： G21K700
CPC分类号： G01B15/02 , G01N23/22 , H01J37/252 , H01J2237/24415 , H01J2237/2814
摘要： An X-ray micoanalysis test system comprising a beam generator which induces X-rays to emanate from a semiconductor device containing film stacks. The charged particle beam will penetrate at least two layers of a film stack on a semiconductor device so that these layers may be tested. The X-rays will be detected using multiple X-ray detectors that detect X-ray photons having a specific energy level. The X-rays will then be used to analyze the characteristics of the semiconductor device. Each of the multiple X-ray detectors may be wavelength dispersive system (WDS) detectors. The present invention also provides a method for measuring film stack characteristics on a semiconductor device. The method for measuring includes directing an electron beam towards the semiconductor device so that the electron beam penetrates at least a conductive film layer and a liner layer, detecting the X-rays which are caused to emanate from the device with multiple X-ray detectors that detect X-ray photons having a specific energy level. The present invention also provides a method and a computer-readable medium which determines a film stack's properties using the data collected with the test system of the present invention. The method and computer-readable medium includes selecting a set of values which estimate the film stack characteristics, using the estimated values to generate predicted data by solving equations which model the film stack, and selecting a new set of estimated film stack characteristic values when the difference between the predicted data and the raw data is larger than a certain margin of error.
摘要翻译：一种X射线微分析测试系统，包括一个光束发生器，其诱发从包含膜堆的半导体器件发出的X射线。带电粒子束将穿透半导体器件上的至少两层薄膜叠层，以便可以对这些层进行测试。将使用检测具有特定能级的X射线光子的多个X射线检测器检测X射线。然后将X射线用于分析半导体器件的特性。多个X射线检测器中的每一个可以是波长色散系统（WDS）检测器。本发明还提供了一种用于测量半导体器件上的膜叠层特性的方法。测量方法包括将电子束引向半导体器件，使得电子束至少穿透导电膜层和衬垫层，检测由多个X射线检测器从器件发出的X射线检测具有特定能级的X射线光子。本发明还提供一种方法和计算机可读介质，其使用利用本发明的测试系统收集的数据来确定薄膜叠层的性质。该方法和计算机可读介质包括选择一组估计胶片堆叠特性的值，使用估计值通过求解建模胶片堆叠的方程来生成预测数据，以及当预测数据与原始数据之间的差异大于一定的误差范围。

8. 发明授权

US5815270A In-line fiber-optic polarimeter using a fused 1x5 star coupler 失效
标题翻译：使用融合的1x5星形耦合器的在线光纤偏振计
公开(公告)号：US5815270A
公开(公告)日：1998-09-29
申请号：US902317
申请日：1997-07-29
申请人： Shing M. Lee
发明人： Shing M. Lee
IPC分类号： G01J4/00 , G01B11/00
CPC分类号： G01J4/00
摘要： An all fiber-optic in-line photopolarimeter is disclosed. This photopolarimeter replaces the conventional 1.times.2 coupler, bulk beamsplitter and accompanying optics with a single 1.times.5 star coupler. This system can measure state of polarization of light in a fiber in situ.
摘要翻译：公开了一种全光纤在线光电偏振计。该光偏振计用一个1x5星形耦合器取代了传统的1x2耦合器，大容量分光器和伴随的光学元件。该系统可以原位测量光纤中的光的偏振状态。

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