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51. 发明申请

US20050173380A1 Directed energy net shape method and apparatus 审中-公开
公开(公告)号：US20050173380A1
公开(公告)日：2005-08-11
申请号：US11054770
申请日：2005-02-09
申请人： Frank Carbone
发明人： Frank Carbone
IPC分类号： B23K15/00 , B23K26/08 , B23K26/14 , B23K26/34
CPC分类号： B22F3/1055 , B22F2003/1056 , B23K15/002 , B23K15/0046 , B23K15/0086 , B23K26/032 , B23K26/0853 , B23K26/1224 , B23K26/144 , B23K26/147 , B23K26/32 , B23K26/34 , B23K26/342 , B23K35/0244 , B23K2103/50 , B23P6/00 , B23P23/04 , Y02P10/295
摘要： An electron gun mounted on top of a vacuum chamber, the gun emitting an electron beam vertically downward towards a substrate placed upon a three axis movable stage, creating a molten pool on the substrate, which is translated along an automatically generated, pre-programmed path in a plane normal to the beam by an automated numerical controller. A wire feeder and spool surround the beam in an annular ring, providing continuous material feed and constant orientation of the wire to the beam and pool, producing a high rate of material deposition and near net shape geometry. Integrated machining and inspection heads sequentially machine each layer to net shape then non-destructively inspect each layer. A heat and microstructure management system employs chilled oil or liquid metal coolant circulating through a vat surrounding the movable stage, supported by an actuator that gradually submerges the substrate as the deposited layers grow, the circulating coolant removing heat and machine chips. An integrated system architecture including six subsystems ensures density (no voids), accuracy, reliability, repeatability and verifiability: an energy management system manages energy input, including beam density, diameter and position; a geometry acquisition and path planning system acquires the cross-sectional two dimensional geometry from a three dimensional computer generated mathematical model and computes numerical control paths for deposit, machining and inspection processes; a material deposition system controls the placement and rate of material deposited; an integrated machining system subtracts excess material from each layer; an inspection and repair system detects, removes, refills and remachines defective areas; a heat management system eliminates excess heat by controlling the temperature and flow of a liquid metal coolant, and improves the microstructure of the deposited material via transducer generated sonic frequencies; a supervisory control synchronizes and coordinates the interaction between the various subsystems.

52. 发明申请

US20050025445A1 Method of making at least one hole in a transparent body and devices made by this method 失效
标题翻译：在透明体中制造至少一个孔的方法和通过该方法制造的装置
公开(公告)号：US20050025445A1
公开(公告)日：2005-02-03
申请号：US10632364
申请日：2003-07-31
申请人： Joseph Schoroeder , Alexander Streltsov
发明人： Joseph Schoroeder , Alexander Streltsov
IPC分类号： B23K26/06 , B23K26/12 , B23K26/18 , B23K26/38 , B23K26/40 , C03B21/06 , C03B23/02 , C03B37/012 , C03C23/00 , G02B6/36 , G02B6/00
CPC分类号： B23K26/009 , B23K26/064 , B23K26/0648 , B23K26/0665 , B23K26/1224 , B23K26/18 , B23K26/384 , B23K26/40 , B23K2103/172 , C03B21/06 , C03B23/02 , C03C23/0025 , G02B6/3636 , G02B6/3644 , G02B6/3652 , G02B6/3672 , G02B6/3688
摘要： A method of making an at least one hole in an optically transparent body comprises the following steps: (i) providing an ultrashort pulse laser for producing a laser output with a wavelength λ, the laser output having a subpicosecond laser pulse duration; (ii) providing a laser output focusing lens for focusing the laser output, the focusing lens having a numerical aperture NA; (iii) providing an optically transparent body, the optically transparent body having a transparency at λ of at least 90%/cm; (iv) providing a liquid filled container situated proximate to the optically transparent body, such that the optically transparent body is in direct contact with the liquid; and (v) directing the laser output through the focusing lens to produce a focused laser output with a subpicosecond laser pulse duration proximate the optically transparent body, wherein the focused laser output traces at least one hole track pattern through the transparent glass body while the optically transparent body and said focused laser output move relative to one another in X-Y-Z directions. The at least one hole track pattern is in contact with the liquid and the focused laser output, in conjunction with the liquid, creates at least one hole in the optically transparent body.
摘要翻译：在光学透明体中制造至少一个孔的方法包括以下步骤：（i）提供用于产生具有波长λ的激光输出的超短脉冲激光器，所述激光输出具有亚皮秒激光脉冲持续时间; （ii）提供用于聚焦激光输出的激光输出聚焦透镜，聚焦透镜具有数值孔径NA; （iii）提供光学透明体，所述光学透明体具有λ至少为90％/ cm 2的透明度; （iv）提供位于光学透明体附近的液体填充容器，使得光学透明体与液体直接接触; 和（v）通过聚焦透镜引导激光输出以产生具有邻近光学透明体的亚皮秒激光脉冲持续时间的聚焦激光输出，其中聚焦激光输出通过透明玻璃体追踪至少一个孔迹图案，而光学透明体并且所述聚焦激光输出在XYZ方向上相对于彼此移动。所述至少一个孔迹图案与液体接触并且聚焦的激光输出与液体一起在光学透明体中产生至少一个孔。

53. 发明申请

US20040129684A1 Method of laser processing and head for ejecting droplet 失效
标题翻译：激光加工方法和喷头喷头
公开(公告)号：US20040129684A1
公开(公告)日：2004-07-08
申请号：US10706619
申请日：2003-11-12
申请人： SEIKO EPSON CORPORATION
发明人： Daisuke Sawaki , Masato Shimada , Kazushige Umetsu
IPC分类号： B23K026/00
CPC分类号： B23K26/032 , B23K26/046 , B23K26/0624 , B23K26/082 , B23K26/1224 , B23K26/123 , B23K26/14 , B23K26/142 , B23K26/364 , B23K26/389 , B23K26/40 , B23K2103/14 , B23K2103/16 , B23K2103/172 , B23K2103/52 , B41J2/1607 , B41J2/1623 , B41J2/1626 , B41J2/1634 , B41J2002/14241
摘要： A method of laser processing for processing a laminated member where a metal thin film is protruded from an end portion of a silicon substrate at the bottom of the silicon substrate, wherein; a laser beam of which wavelength has the light absorption coefficient of the metal thin film being higher than the light absorption coefficient of the silicon substrate, is irradiated onto an boundary between an end of the silicon substrate and the metal thin film so as to cut the metal thin film.
摘要翻译：一种激光加工方法，用于处理在硅衬底的底部从硅衬底的端部突出金属薄膜的层叠构件，其中：将具有比硅衬底的光吸收系数高的金属薄膜的波长的波长的激光照射到硅衬底的端部与金属薄膜之间的边界上，以切割金属薄膜。

54. 发明申请

US20040112882A1 Laser processing apparatus 有权
标题翻译：激光加工设备
公开(公告)号：US20040112882A1
公开(公告)日：2004-06-17
申请号：US10654611
申请日：2003-09-04
发明人： Hidekazu Miyairi , Yasuyuki Arai
IPC分类号： B23K026/12
CPC分类号： B23K26/1476 , B23K26/082 , B23K26/0821 , B23K26/0853 , B23K26/1224 , B23K26/123 , B23K26/142 , B23K26/40 , B23K2103/172 , B23K2103/50
摘要： The present invention provides a laser processing apparatus having a laser oscillator for outputting a pulsed laser beam; deflection unit for deflecting the pulsed laser beam to irradiate a object to be processed with the deflected pulsed laser beam; a mounting base on which the object is placed and which is movable in an axial direction or two-axial directions perpendicular to each other; and local shielding unit for controlling an atmosphere around the surface of the object to be processed which is irradiated with the laser beam. When a thin semiconductor film with a thickness of 1 nullm or less is formed over the surface, minute convex portions are formed, which causes a problem that characteristics of TFTs vary among elements. Minute particles generated and adhered to a main surface of a substrate through a laser processing, which is difficult to remove in general surface cleaning, become preventable by the invention.
摘要翻译：本发明提供一种具有用于输出脉冲激光束的激光振荡器的激光加工装置; 偏转单元，用于使脉冲激光束偏转以用偏转的脉冲激光束照射待处理的物体; 安装基座，物体被放置在该基座上并且可以在彼此垂直的轴向或双轴方向上移动; 以及局部屏蔽单元，用于控制被激光束照射的待处理物体表面周围的气氛。当在表面上形成厚度为1μm或更小的薄的半导体膜时，形成微小的凸起部分，这导致TFT的特性在元件之间变化的问题。本发明可以防止在通常的表面清洁中难以除去的通过激光加工产生并附着到基板主表面上的微粒子。

55. 发明申请

US20030080089A1 Method of patterning a substrate 失效
标题翻译：图案化基板的方法
公开(公告)号：US20030080089A1
公开(公告)日：2003-05-01
申请号：US10078382
申请日：2002-02-21
发明人： Wen Dong Song , Minghui Hong , Yong Feng Lu
IPC分类号： C23F001/00 , B44C001/22 , C03C015/00 , C03C025/68 , C02F001/44 , B01D061/00
CPC分类号： C03C17/23 , B23K26/1224 , B23K26/146 , B23K2101/40 , C03C2217/211 , C03C2217/215 , C03C2217/231 , C03C2218/33 , H01L21/30604 , H01L21/31111
摘要： The present invention provides a method of patterning a substrate (30) according to a predetermined path, said method including forming a liquid film (134) on the substrate surface and directing laser energy from a laser (10) through the film (134) to etch the substrate surface, wherein etched material is carried away from the substrate surface via evaporation of the film during said etching. The liquid film (134) may be formed on the substrate surface by jetting a liquid vapour onto the substrate surface
摘要翻译：本发明提供了一种根据预定路径图案化衬底（30）的方法，所述方法包括在衬底表面上形成液膜（134）并将来自激光器（10）的激光能量引导通过膜（134）至蚀刻衬底表面，其中通过在所述蚀刻期间膜的蒸发将蚀刻的材料从衬底表面带走。可以通过将液体蒸气喷射到基板表面上而在基板表面上形成液体膜（134）

56. 发明授权

US6071765A Method of forming polycrystalline silicon layer on substrate and surface treatment apparatus thereof 失效
标题翻译：在基板上形成多晶硅层的方法及其表面处理装置
公开(公告)号：US6071765A
公开(公告)日：2000-06-06
申请号：US915269
申请日：1997-08-20
申请人： Takashi Noguchi , Tohru Ogawa , Yuji Ikeda
发明人： Takashi Noguchi , Tohru Ogawa , Yuji Ikeda
IPC分类号： B23K26/04 , B23K26/06 , B23K26/067 , B23K26/42 , C23C16/24 , C23C16/56 , H01L21/20 , H01L21/223 , H01L21/268 , H01L21/318 , H01L21/324 , H01L21/336 , H01L29/786 , H01L21/00
CPC分类号： B23K26/0608 , B23K26/032 , B23K26/04 , B23K26/06 , B23K26/0604 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/066 , B23K26/0665 , B23K26/067 , B23K26/1224 , B23K26/123 , B23K26/702 , B23K26/705 , C23C16/24 , C23C16/56 , H01L21/2026 , H01L21/223 , H01L21/268 , H01L21/3185 , H01L21/324 , H01L29/66757 , H01L29/66765 , H01L29/78675 , H01L29/78678 , Y10S117/904 , Y10S148/09 , Y10S148/093
摘要： A method of forming a polycrystalline silicon thin film improved in crystallinity and a channel of a transistor superior in electrical characteristics by the use of such a polycrystalline silicon thin film. An amorphous silicon layer of a thickness preferably of 30 nm to 50 nm is formed on a substrate. Next, substrate heating is performed to set the amorphous silicon layer to preferably 350.degree. C. to 500.degree. C., more preferably 350.degree. C. to 450.degree. C. Then, at least the amorphous silicon layer is irradiated with laser light of an excimer laser energy density of 100 mJ/cm.sup.2 to 500 mJ/cm.sup.2, preferably 280 mJ/cm.sup.2 to 330 mJ/cm.sup.2, and a pulse width of 80 ns to 200 ns, preferably 140 ns to 200 ns, so as to directly anneal the amorphous silicon layer and form a polycrystalline silicon thin film. The total energy of the laser used for the irradiation of excimer laser light is at least 5 J, preferably at least 10 J.
摘要翻译：通过使用这种多晶硅薄膜，形成提高结晶度的多晶硅薄膜的方法和电特性优异的晶体管的沟道。在基板上形成厚度优选为30nm〜50nm的非晶硅层。接下来，进行基板加热以将非晶硅层设定为350℃至500℃，更优选350℃至450℃。然后，至少对非晶硅层照射激光准分子激光能量密度为100mJ / cm 2至500mJ / cm 2，优选为280mJ / cm 3至330mJ / cm 2，脉冲宽度为80ns至200ns，优选为140ns至200ns，以便直接退火非晶硅层，形成多晶硅薄膜。用于照射准分子激光的激光的总能量为至少5J，优选为至少10J。

57. 发明授权

US6005660A Detection and analysis of a fine foreign matter on a sample 失效
标题翻译：检测和分析样品上的细小杂质
公开(公告)号：US6005660A
公开(公告)日：1999-12-21
申请号：US86311
申请日：1998-05-27
申请人： Haruo Yoshida , Nobuo Miyamoto
发明人： Haruo Yoshida , Nobuo Miyamoto
IPC分类号： G01N23/225 , B23K26/03 , G01N21/88 , G01N21/94 , G01N21/956 , H01L21/66 , B23K26/00 , G01N21/00
CPC分类号： B08B7/0042 , B23K26/032 , B23K26/1224 , B23K26/123 , H01L21/67288
摘要： A foreign matter processing apparatus is disclosed for detecting a foreign matter sticking to the surface of a sample such as a circuit board. In the sample processing apparatus of the present invention, a fine foreign matter sticking to a surface of a sample is detected, and the composition of the detected foreign matter is analyzed. Then, it is determined based on a result of the analysis and various data registered in advance whether or not it is required to remove the foreign matter, and the foreign matter, whose removal has been determined to be required, is removed from the surface of the sample. Accordingly, detection, analysis and removal of a foreign matter on the surface of a sample can be performed by a single apparatus.
摘要翻译：公开了一种异物处理装置，用于检测粘附在诸如电路板的样品表面的异物。在本发明的样品处理装置中，检测粘附到样品表面的微细异物，并分析检测到的异物的组成。然后，基于分析结果和预先登记的各种数据来确定是否需要除去异物，并且将其去除已被确定为需要的异物从表面上移除例子。因此，可以通过单个装置来进行样品表面的异物的检测，分析和除去。

58. 发明授权

US5869803A Method of forming polycrystalline silicon layer on substrate and surface treatment apparatus thereof 失效
标题翻译：在基板上形成多晶硅层的方法及其表面处理装置
公开(公告)号：US5869803A
公开(公告)日：1999-02-09
申请号：US463962
申请日：1995-06-05
申请人： Takashi Noguchi , Tohru Ogawa , Yuji Ikeda
发明人： Takashi Noguchi , Tohru Ogawa , Yuji Ikeda
IPC分类号： B23K26/04 , B23K26/06 , B23K26/067 , B23K26/42 , C23C16/24 , C23C16/56 , H01L21/20 , H01L21/223 , H01L21/268 , H01L21/318 , H01L21/324 , H01L21/336 , H01L29/786 , B23K26/12
CPC分类号： B23K26/0608 , B23K26/032 , B23K26/04 , B23K26/06 , B23K26/0604 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/066 , B23K26/0665 , B23K26/067 , B23K26/1224 , B23K26/123 , B23K26/702 , B23K26/705 , C23C16/24 , C23C16/56 , H01L21/2026 , H01L21/223 , H01L21/268 , H01L21/3185 , H01L21/324 , H01L29/66757 , H01L29/66765 , H01L29/78675 , H01L29/78678 , Y10S117/904 , Y10S148/09 , Y10S148/093
摘要： A method of forming a polycrystalline silicon thin film includes irradiating an amorphous silicon layer with laser light of an excimer laser energy density of 100 mJ/cm.sup.2 to 500 mJ/cm.sup.2, preferably 280 mJ/cm.sup.2 to 330 mJ/cm.sup.2, and a pulse width of 80 ns to 200 ns, preferably 140 ns to 200 ns, so as to directly anneal the amorphous silicon layer and form a polycrystalline silicon thin film. The total energy of the laser used for the irradiation of excimer laser light is at least 5 J, preferably at least 10 J. The laser device includes an homogenizer movably mounted at the end of the optical path of the laser beam.
摘要翻译：形成多晶硅薄膜的方法包括用准分子激光能量密度为100mJ / cm 2至500mJ / cm 2，优选280mJ / cm 2至330mJ / cm 2的激光照射非晶硅层，脉冲宽度 80ns至200ns，优选140ns至200ns，以便直接退火非晶硅层并形成多晶硅薄膜。用于照射准分子激光的激光的总能量为至少5J，优选为至少10J。激光装置包括可移动地安装在激光束的光路端部的均质器。

59. 发明授权

US5490849A Uniform-radiation caustic surface for photoablation 失效
标题翻译：均匀辐射烧碱表面
公开(公告)号：US5490849A
公开(公告)日：1996-02-13
申请号：US824775
申请日：1992-01-23
申请人： Robert F. Smith
发明人： Robert F. Smith
IPC分类号： A61F9/01 , B23K26/03 , B23K26/073 , A61M5/06
CPC分类号： A61F9/00804 , B23K26/032 , B23K26/0643 , B23K26/0648 , B23K26/0652 , B23K26/0665 , B23K26/0734 , B23K26/1224 , B23K26/142 , G02B19/0028 , G02B19/0047 , G02B19/0095 , G02B27/0983 , G02B5/001 , A61F2009/00872 , A61F2009/00882 , A61F2009/00895
摘要： A simultaneously generated caustic surface comprised of high energy photons is created for the purpose of ablating organic materials to within optical accuracies. The apparatus and method are principally for modifying, in vivo, the anterior cornea of the eye to effect refractive correction thereof. A catadioptric system in tandem with a continuously adjustable system of lenses provides a range of spherical or aspherical caustic curvatures throughout which range relatively uniform radiation intensity is maintained over the entire caustic. Ablation monitoring uses both visual and interferometric means; control is performed using interferometry in conjunction with a computer controlled excimer laser.
摘要翻译：产生由高能光子组成的同时产生的苛性表面，用于将有机材料烧蚀到光学精度内。该装置和方法主要用于在体内修饰眼睛的前角膜以进行其屈光矫正。与可变系统连续可调的反射折射系统提供一系列球形或非球面腐蚀性曲率，整个苛性碱范围内保持相对均匀的辐射强度。消融监测使用视觉和干涉手段; 结合计算机控制的准分子激光器使用干涉测量进行控制。

60. 发明授权

US5444213A Remote maintenance method and system for a fusion reactor 失效
标题翻译：聚变反应堆的远程维护方法和系统
公开(公告)号：US5444213A
公开(公告)日：1995-08-22
申请号：US51883
申请日：1993-04-26
申请人： Keizoh Honda , Yoshinobu Makino , Seiichiro Kimura , Tsutomu Honda , Nobuo Tachikawa
发明人： Keizoh Honda , Yoshinobu Makino , Seiichiro Kimura , Tsutomu Honda , Nobuo Tachikawa
IPC分类号： B23K26/00 , B23K26/06 , B23K26/073 , G21B1/11 , G21B1/25 , H01S3/02
CPC分类号： B23K26/0613 , B23K26/06 , B23K26/0604 , B23K26/064 , B23K26/0643 , B23K26/0648 , B23K26/0665 , B23K26/1224 , B23K26/123 , B23K26/125 , G21B1/25
摘要： Optical paths of laser beams generated from at least two laser beam generators, which are used for performing connection and cutting work at prescribed locations of structural members, are each switched by corresponding optical path switchers, and the laser beams polarized by the corresponding optical path switchers are reflected in the same direction by a laser beam combiner to combine the plurality of laser beams into a parallel laser beam bundle, in order to perform cutting or welding at the corresponding prescribed location. This configuration removes the need to provide high-power laser beam generators for situations such as vacuum walls of fusion devices where the laser generation efficiency is low, while also making it possible to use more powerful high-power lasers therein if necessary.
摘要翻译：由用于在结构构件的规定位置执行连接和切割工作的至少两个激光束发生器产生的激光束的光路每个由相应的光路切换器切换，并且由相应的光路切换器偏振的激光束通过激光束组合器以相同的方向反射，以将多个激光束组合成平行激光束，以便在相应的规定位置进行切割或焊接。该配置消除了在诸如激光发生效率低的融合装置的真空壁的情况下提供高功率激光束发生器的需要，同时还可以在必要时使用更强大的高功率激光器。

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