会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 51. 发明申请
    • THIN FILM DEVICE WITH MINIMIZED SPATIAL VARIATION OF LOCAL MEAN HEIGHT
    • 具有最小化的局部平均高度的空间变化的薄膜装置
    • US20090142560A1
    • 2009-06-04
    • US11948867
    • 2007-11-30
    • Warren JacksonCarl P. TaussigPing MeiAlbert JeansHan-Jun Kim
    • Warren JacksonCarl P. TaussigPing MeiAlbert JeansHan-Jun Kim
    • B32B7/02
    • B82Y10/00B32B7/02B82Y40/00G03F7/0002Y10T428/24942
    • This invention provides a thin film device with minimized spatial variation of local mean height. More specifically, the thin film device has a substrate and at least one first structure having a first spatially varying weighted local mean height determined by a layer weighting function. The first structure has a first maximum height, a first minimum height and a first variation for a given averaging area. A compensation structure is also provided upon the substrate, the compensation structure having a second spatially varying weighted local mean height determined by the layer weighting function. The compensation structure also has a second maximum height, a second minimum height and a second variation for the given averaging area. The first structure and compensation structure combine to provide a combined structure upon the substrate with minimized spatial variation of a combined weighted local mean.
    • 本发明提供一种具有最小的局部平均高度的空间变化的薄膜装置。 更具体地,薄膜器件具有衬底和至少一个具有由层加权函数确定的具有第一空间变化的加权局部平均高度的第一结构。 第一结构具有给定平均区域的第一最大高度,第一最小高度和第一变化。 还在衬底上提供补偿结构,补偿结构具有由层加权函数确定的第二空间变化的加权局部平均高度。 补偿结构还具有给定平均区域的第二最大高度,第二最小高度和第二变化。 第一结构和补偿结构结合在一起,在基底上提供组合结构,使组合加权局部平均值具有最小的空间变化。
    • 52. 发明授权
    • Thin film device active matrix by pattern reversal process
    • 薄膜器件有源矩阵通过图案反转处理
    • US07521313B2
    • 2009-04-21
    • US11037887
    • 2005-01-18
    • Ping Mei
    • Ping Mei
    • H01L21/8238
    • H01L27/1288H01L27/1214H01L27/1218H01L29/78603H01L29/7869
    • This invention provides a method of fabricating an active matrix of thin film devices through a pattern reversal self aligned imprint lithography (SAIL) process. The method includes providing a substrate and depositing at least one layer of material upon the substrate. A pattern is then established upon the layer of material, the pattern providing at least one exposed area and at least one covered area of the layer of material. The exposed areas are treated to provide etch resistance to the material and reverse the pattern. Subsequent etching removes the etch susceptible material, the etch resistant material remaining. A thin-film stack is then deposited upon the remaining etch resistant material. These deposited thin-films are then processed in accordance with the desired characteristics of the thin film devices.
    • 本发明提供一种通过图案反转自对准压印光刻(SAIL)工艺制造薄膜器件的有源矩阵的方法。 该方法包括提供衬底并在衬底上沉积至少一层材料。 然后在材料层上建立图案,该图案提供材料层的至少一个暴露区域和至少一个覆盖区域。 处理暴露的区域以对材料提供耐蚀刻性并逆转图案。 随后的蚀刻去除蚀刻敏感材料,留下耐蚀刻材料。 然后将薄膜堆叠沉积在剩余的耐蚀刻材料上。 然后根据薄膜器件的期望特性对这些沉积的薄膜进行处理。
    • 54. 发明授权
    • Large area storage display
    • 大面积存储显示
    • US07251783B2
    • 2007-07-31
    • US10286028
    • 2002-11-01
    • Warren JacksonPing Mei
    • Warren JacksonPing Mei
    • G03B15/00
    • G06F1/1601G02F1/136286G02F1/1368G06F3/1423
    • A large area display workstation provides a liquid crystal display, configured to produce an image. The electrical components of the liquid crystal display are disposed on a substrate through a large area fabrication technique. The workstation has a first, high-resolution video display, and the large area display is a second, lower-resolution file identification display. The computer displays a user-selected file in a high-resolution format on the high-resolution video display for manipulation, and displays a plurality of file indicators in a low-resolution format on the large area display.
    • 大面积显示工作站提供液晶显示器,用于产生图像。 液晶显示器的电气部件通过大面积制造技术设置在基板上。 工作站具有第一个高分辨率视频显示,大面积显示是第二个较低分辨率的文件识别显示。 计算机在高分辨率视频显示器上以高分辨率格式显示用户选择的文件进行操作,并在大面积显示器上以低分辨率格式显示多个文件指示符。
    • 57. 发明申请
    • Thin film transistor memory device
    • 薄膜晶体管存储器件
    • US20050157547A1
    • 2005-07-21
    • US10985762
    • 2004-11-09
    • Ping MeiJames Easton
    • Ping MeiJames Easton
    • G11C16/04G11C5/06G11C16/02G11C17/16H01L21/8247H01L27/115H01L29/788H01L29/792G11C16/06
    • G11C17/16
    • A memory device includes a memory array of thin film transistor (TFT) memory cells. The memory cells include a floating gate separated from a gate electrode portion of a gate line by an insulator. The gate electrode portion includes a diffusive conductor that diffuses through the insulator under the application of a write voltage. The diffusive conductor forms a conductive path through the insulator that couples the gate line to the floating gate, changing the gate capacitance and therefore the state of the memory cell. The states of the memory cells are detectable as the differing current values for the memory cells. The memory cells are three terminal devices, and read currents do not pass through the conductive paths in the memory cells during read operations. This renders the memory cells robust, because read currents will not interfere with the storage mechanism in the memory cells. The memory array can be fabricated using multiple steps using the same mask. The use of a single mask for multiple steps reduces the time and cost involved in fabricating the memory array.
    • 存储器件包括薄膜晶体管(TFT)存储单元的存储器阵列。 存储单元包括通过绝缘体与栅极线的栅极部分分离的浮动栅极。 栅电极部分包括在施加写入电压下扩散通过绝缘体的漫射导体。 扩散导体形成通过绝缘体的导电路径,其将栅极线耦合到浮动栅极,改变栅极电容并因此改变存储器单元的状态。 存储器单元的状态可被检测为存储器单元的不同电流值。 存储单元是三个终端设备,并且读取电流在读取操作期间不通过存储器单元中的导电路径。 这使得存储器单元牢固,因为读取电流将不会干扰存储器单元中的存储机制。 可以使用相同的掩模使用多个步骤来制造存储器阵列。 对于多个步骤使用单个掩模减少了制造存储器阵列所涉及的时间和成本。