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    • 6. 发明授权
    • Structure and method for thin film device
    • 薄膜器件的结构和方法
    • US08269221B2
    • 2012-09-18
    • US12011440
    • 2008-01-24
    • Ping MeiAlbert JeansCarl Taussig
    • Ping MeiAlbert JeansCarl Taussig
    • H01L29/786
    • H01L29/42384H01L29/6675H01L29/78645H01L29/7869Y10S438/942
    • Provided is a thin film device and an associated method of making a thin film device. For example, a thin film transistor with nano-gaps in the gate electrode. The method involves providing a substrate. Upon the substrate are then provided a plurality of parallel spaced electrically conductive strips. A plurality of thin film device layers are then deposited upon the conductive strips. A 3D structure is provided upon the plurality of thin film device layers, the structure having a plurality of different heights. The 3D structure and the plurality of thin film device layers are then etched to define a thin film device, such as for example a thin film transistor that is disposed above at least a portion of the conductive strips.
    • 本发明提供一种制造薄膜器件的薄膜器件和相关方法。 例如,在栅电极中具有纳米间隙的薄膜晶体管。 该方法包括提供基底。 然后在衬底上设置多个平行隔开的导电条。 然后将多个薄膜器件层沉积在导电条上。 3D结构设置在多个薄膜器件层上,该结构具有多个不同的高度。 然后蚀刻3D结构和多个薄膜器件层以限定薄膜器件,例如设置在至少一部分导电条上的薄膜晶体管。
    • 7. 发明授权
    • Structure and method for thin film device
    • 薄膜器件的结构和方法
    • US07341893B2
    • 2008-03-11
    • US11144204
    • 2005-06-02
    • Ping MeiAlbert JeansCarl Taussig
    • Ping MeiAlbert JeansCarl Taussig
    • H01L21/00
    • H01L29/42384H01L29/6675H01L29/78645H01L29/7869Y10S438/942
    • Provided is a thin film device and an associated method of making a thin film device. For example, a thin film transistor with nano-gaps in the gate electrode. The method involves providing a substrate. Upon the substrate are then provided a plurality of parallel spaced electrically conductive strips. A plurality of thin film device layers are then deposited upon the conductive strips. A 3D structure is provided upon the plurality of thin film device layers, the structure having a plurality of different heights. The 3D structure and the plurality of thin film device layers are then etched to define a thin film device, such as for example a thin film transistor that is disposed above at least a portion of the conductive strips.
    • 本发明提供一种制造薄膜器件的薄膜器件和相关方法。 例如,在栅电极中具有纳米间隙的薄膜晶体管。 该方法包括提供基底。 然后在衬底上设置多个平行隔开的导电条。 然后将多个薄膜器件层沉积在导电条上。 3D结构设置在多个薄膜器件层上,该结构具有多个不同的高度。 然后蚀刻3D结构和多个薄膜器件层以限定薄膜器件,例如设置在至少一部分导电条上的薄膜晶体管。