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41. 发明授权

US06754302B2 X-ray exposure apparatus 失效
标题翻译： X射线曝光装置
公开(公告)号：US06754302B2
公开(公告)日：2004-06-22
申请号：US10108413
申请日：2002-03-29
申请人： Atsushi Kitaoka
发明人： Atsushi Kitaoka
IPC分类号： G21K500
CPC分类号： B82Y10/00 , G03F7/70033 , G03F7/70041 , G03F7/7035 , G03F7/70525 , G03F7/70558 , G03F7/70991
摘要： An X-ray exposure apparatus includes an X-ray source for generating pulsed X-rays, which are emitted radially, and first to nth exposure devices, disposed in a position facing the X-ray source and receiving the X-rays in an approximately perpendicular direction, and which use the received X-rays. The exposure devices project patterns of first to nth masks onto respective ones of first to nth substrates that are to be exposed.
摘要翻译： X射线曝光装置包括：X射线源，用于产生径向辐射的脉冲X射线;以及第一至第N曝光装置，设置在面对X射线源的位置并以大致的X射线接收X射线垂直方向，并使用接收的X射线。曝光装置将第一至第n个掩模的图案投影到待暴露的第一至第n基板上的相应的一个。

42. 发明授权

US06668037B2 X-ray projection exposure apparatus and a device manufacturing method 失效
公开(公告)号：US06668037B2
公开(公告)日：2003-12-23
申请号：US09948041
申请日：2001-09-07
申请人： Shinichi Hara , Masami Tsukamoto
发明人： Shinichi Hara , Masami Tsukamoto
IPC分类号： G21K500
CPC分类号： G03F7/70708 , G03F7/70875 , G21K5/10
摘要： An X-ray projection exposure apparatus includes a mask chuck, a wafer chuck, an X-ray illuminating system, and an X-ray projection system. The masks chuck holds a reflection X-ray mask having a mask pattern thereon. The wafer chuck holds a wafer onto which the mask pattern is transferred. The X-ray illuminating system illuminates the reflection X-ray mask, held by the mask chuck, with X-rays. The X-ray projection optical system projects the mask pattern of the reflection X-ray mask onto the wafer held by the wafer chuck with a predetermined magnification. The mask chuck includes a mechanism for generating static electricity for attracting and holding the reflection X-ray mask by an electrostatic force. The invention also includes a device manufacturing method using such an X-ray projection exposure apparatus to transfer a mask pattern onto the wafer using the X-ray projection exposure apparatus.

43. 发明授权

US06665371B1 Synchrotron radiation measurement apparatus, X-ray exposure apparatus, and device manufacturing method 失效
标题翻译：同步辐射测量装置，X射线曝光装置和装置制造方法
公开(公告)号：US06665371B1
公开(公告)日：2003-12-16
申请号：US09583979
申请日：2000-05-31
申请人： Hideyuki Chinju , Yutaka Watanabe , Akira Miyake , Nobuaki Ogushi
发明人： Hideyuki Chinju , Yutaka Watanabe , Akira Miyake , Nobuaki Ogushi
IPC分类号： G21K500
CPC分类号： H05H1/0025
摘要： A measurement apparatus has a first detector for measuring an intensity such that a sheet-shaped beam of synchrotron radiation is integrated over the entire range of the beam in the thickness direction thereof; a second detector for measuring the intensity of the beam at two points where positions along the direction are different; and a calculating device for calculating the magnitude of the beam in the direction on the basis of the detections by the first and second detectors.
摘要翻译：测量装置具有用于测量强度的第一检测器，使得在波束的厚度方向的整个范围上整合同步加速器辐射的片状波束; 第二检测器，用于在沿着所述方向的位置不同的两个点处测量所述光束的强度; 以及计算装置，用于基于第一和第二检测器的检测来计算沿该方向的光束的幅度。

44. 发明授权

US06658083B2 Weight compensation apparatus, stage apparatus using the same, and exposure apparatus 失效
标题翻译：重量补偿装置，使用该重量补偿装置的平台装置和曝光装置
公开(公告)号：US06658083B2
公开(公告)日：2003-12-02
申请号：US09878337
申请日：2001-06-12
申请人： Choshoku Sai
发明人： Choshoku Sai
IPC分类号： G21K500
CPC分类号： G03F7/70525 , F16C13/04 , F16C32/0618 , F16C32/0696 , G03F7/70766 , G21K5/10
摘要： A weight compensation apparatus for compensating for a weight of a stage that is movable along a vertical reference plane including a pulley having a pulley shaft, a belt which is wound around and supported by the pulley, and has the stage at one end and a counter mass corresponding to the stage at the other end, and a hydrostatic bearing which has an arcuated bearing portion, and supports the pulley shaft by causing a fluid to flow into a bearing gap between the bearing portion and the pulley shaft.
摘要翻译：一种用于补偿能够沿着垂直基准平面移动的平台的重量的重量补偿装置，所述平台包括具有滑轮轴的皮带轮，缠绕在所述皮带轮上并由所述皮带轮支撑并且在一端具有所述台架的皮带轮对应于另一端的台架的液压轴承和具有弧形轴承部分的静压轴承，并且通过使流体流入轴承部分和带轮轴之间的轴承间隙中来支撑滑轮轴。

45. 发明授权

US06647088B1 Production of a dense mist of micrometric droplets in particular for extreme UV lithography 失效
标题翻译：特别是用于极紫外光刻的微气滴微生物浓雾的生产
公开(公告)号：US06647088B1
公开(公告)日：2003-11-11
申请号：US10089098
申请日：2002-04-12
申请人： Martin Schmidt , Olivier Sublemontier
发明人： Martin Schmidt , Olivier Sublemontier
IPC分类号： G21K500
CPC分类号： H05G2/003 , G03F7/70033 , H05G2/008 , Y10S977/887 , Y10S977/951
摘要： Process and device for the generation of a fog of micrometric and submicrometric droplets, which may find application to the generation of light in the extreme ultraviolet range, particularly for lithography. According to the process and device, a pressurized liquid is injected into a very small diameter nozzle opening up into a vacuum. Light is generated by focusing laser radiation onto the fog.
摘要翻译：用于产生微米和亚微米液滴的雾的方法和装置，其可以应用于在极紫外范围内产生光，特别是用于光刻。根据该方法和装置，将加压液体注入开口至真空中的非常小直径的喷嘴。通过将激光束聚焦到雾上而产生光。

46. 发明授权

US06627874B1 Pressure measurement using ion beam current in a mass spectrometer 失效
标题翻译：在质谱仪中使用离子束电流进行压力测量
公开(公告)号：US06627874B1
公开(公告)日：2003-09-30
申请号：US09520638
申请日：2000-03-07
申请人： George Yefchak
发明人： George Yefchak
IPC分类号： G21K500
CPC分类号： H01J41/12 , H01J49/00
摘要： Method and apparatus for rapid monitoring of pressure in a chamber equipped with a mass spectrometer by using the primary beam current in conjunction with a conventional pressure gauge. The conventional gauge allows frequent calibration of the relationship of the beam current to the chamber pressure, preventing excessive drift in the system. An advantage of the system is that it takes advantage of instruments already present in a typical spectrometry apparatus.
摘要翻译：通过使用一次束流与常规压力计一起快速监测装有质谱仪的室中的压力的方法和装置。常规仪表允许频繁地校准束电流与腔室压力的关系，从而防止系统中的过度漂移。该系统的优点是它利用了已经存在于典型的光谱测定装置中的仪器。

47. 发明授权

US06614876B1 System for X-ray irradiation 有权
标题翻译： X射线照射系统
公开(公告)号：US06614876B1
公开(公告)日：2003-09-02
申请号：US10244209
申请日：2002-09-16
申请人： Randol E. Kirk
发明人： Randol E. Kirk
IPC分类号： G21K500
CPC分类号： G21K5/04
摘要： A blood irradiator for providing a uniform dose of X-ray beam irradiation for blood products contained within bags positioned in a cannister. A first X-ray tube is positioned to irradiate said bags from one surface of the bags, and a second X-ray tube is positioned to irradiate said bags from the opposite surface of said bags concurrently with said first tube. A low Z high density material collar mounted around said cannister to reflect X-rays. The X-rays from the two tubes and the reflected X-rays combine to provide a uniform dose of X-rays to said bags.
摘要翻译：一种血液照射器，用于对包含在位于食物罐内的袋子内的血液制品提供均匀剂量的X射线束照射。第一X射线管被定位成从袋的一个表面照射所述袋，并且第二X射线管被定位成与所述第一管同时地从所述袋的相对表面照射所述袋。安装在所述罐上的低Z高密度材料套筒以反射X射线。来自两个管的X射线和反射的X射线结合在一起，以向所述袋提供均匀剂量的X射线。

48. 发明授权

US06594334B1 Exposure method and exposure apparatus 失效
标题翻译：曝光方法和曝光装置
公开(公告)号：US06594334B1
公开(公告)日：2003-07-15
申请号：US09697638
申请日：2000-10-27
申请人： Kazuya Ota
发明人： Kazuya Ota
IPC分类号： G21K500
CPC分类号： G03F7/70066 , G03F7/70233 , G03F7/7025 , G03F7/70575 , G03F7/707 , G03F7/70708 , G03F7/70916 , G03F7/70983
摘要： Laser light emitted from a high output laser light source is condensed by a condenser lens to form a condensed point. Xenon (Xe) gas or the like as a target is injected from a nozzle to the condensed point to generate Extreme Ultra Violate (EUV) light, and then the generated EUV light is condensed by a condenser mirror. A transmission filter having a predetermined transmittance with respect to the EUV light is disposed between the condenser mirror and a reflecting mirror, and scattering particles mixed in the EUV light are adsorbed by the transmission filter. The EUV light passing through the transmission filter is deviated by the reflecting mirror, a illuminance distribution of the EUV light is uniformalized by fly eye mirrors, thereafter the EUV light is condensed by another condenser mirror, and then exposure is effected using the condensed EUV light as an exposure beam.
摘要翻译：从高输出激光源发出的激光由聚光透镜凝结，形成凝聚点。作为目标的氙（Xe）气体等从喷嘴喷射到凝聚点以产生极端超越（EUV）光，然后所产生的EUV光由聚光镜凝结。在聚光镜和反射镜之间设置有相对于EUV光具有预定透射率的透射滤光片，并且在EUV光中混合的散射粒子被透射滤光片吸附。通过透射滤光器的EUV光由反射镜偏离，EUV光的照度分布由飞眼镜均匀化，之后EUV光被另一个聚光镜冷凝，然后使用冷凝的EUV光进行曝光作为曝光光束。

49. 发明授权

US06522716B1 Multilayer-film reflective mirrors, extreme UV microlithography apparatus comprising same, and microelectronic-device manufacturing methods utilizing same 失效
标题翻译：多层膜反射镜，包括该多层膜反射镜的极紫外微光刻设备以及利用其的微电子器件制造方法
公开(公告)号：US06522716B1
公开(公告)日：2003-02-18
申请号：US09684873
申请日：2000-10-06
申请人： Katsuhiko Murakami , Yutaka Ichihara
发明人： Katsuhiko Murakami , Yutaka Ichihara
IPC分类号： G21K500
CPC分类号： B82Y10/00 , G03F7/70233 , G03F7/70958 , G21K1/06 , G21K1/062
摘要： Microlithography apparatus and methods are disclosed for achieving high-resolution pattern transfer of a pattern onto a substrate, such as a semiconductor wafer, using extreme ultraviolet (EUV, also termed soft X-ray) radiation. The apparatus include an imaging-optical system (projection-optical system) capable of receiving pattern-encoding EUV light from a mask and forming an image of the pattern on the substrate. The desired wavelength of the EUV light is 20 nm to 50 nm, and the imaging-optical system includes multiple reflective mirrors having aspherical surficial profiles and multilayer-film reflective surfaces. The apparatus are configured especially to achieve a pattern-element resolution, of the projected image, of 70 nm or finer.
摘要翻译：公开了用于使用极紫外（EUV，也称为软X射线）辐射将图案高分辨率图案转印到诸如半导体晶片的基板上的微光刻设备和方法。该装置包括能够从掩模接收图案编码的EUV光并在基板上形成图案的图像的成像光学系统（投影光学系统）。 EUV光的期望波长为20nm至50nm，并且成像光学系统包括具有非球面表面轮廓和多层膜反射表面的多个反射镜。该装置被特别地配置为实现70nm或更细的投影图像的图案元素分辨率。

50. 发明授权

US06477225B1 X-ray mask and method for providing same 有权
标题翻译： X射线掩模及其提供方法
公开(公告)号：US06477225B1
公开(公告)日：2002-11-05
申请号：US09636002
申请日：2000-08-09
申请人： Alfredo M. Morales , Dawn M. Skala
发明人： Alfredo M. Morales , Dawn M. Skala
IPC分类号： G21K500
CPC分类号： B29C33/3842 , G03F7/0017
摘要： The present invention describes a method for fabricating an x-ray mask tool which can achieve pattern features having lateral dimension of less than 1 micron. The process uses a thin photoresist and a standard lithographic mask to transfer an trace image pattern in the surface of a silicon wafer by exposing and developing the resist. The exposed portion of the silicon substrate is then anisotropically etched to provide an etched image of the trace image pattern consisting of a series of channels in the silicon having a high depth-to-width aspect ratio. These channels are then filled by depositing a metal such as gold to provide an inverse image of the trace image and thereby providing a robust x-ray mask tool.
摘要翻译：本发明描述了一种可以实现具有小于1微米的横向尺寸的图案特征的X射线掩模工具的制造方法。该方法使用薄的光致抗蚀剂和标准光刻掩模，通过曝光和显影抗蚀剂来转移硅晶片的表面中的迹线图案。然后对硅衬底的暴露部分进行各向异性蚀刻，以提供由具有高深度至宽度纵横比的硅中的一系列通道组成的迹像图案的蚀刻图像。然后通过沉积诸如金的金属来填充这些通道以提供迹线图像的逆图像，从而提供鲁棒的x射线掩模工具。

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