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41. 发明授权

US08822858B2 Keyboard design 有权
标题翻译：键盘设计
公开(公告)号：US08822858B2
公开(公告)日：2014-09-02
申请号：US13221753
申请日：2011-08-30
申请人： James J. Niu , Harold J. Welch , Chad A. Bronstein , Patrick Kessler , Chris Ligtenberg
发明人： James J. Niu , Harold J. Welch , Chad A. Bronstein , Patrick Kessler , Chris Ligtenberg
IPC分类号： H01H9/00 , H01H13/83 , G03F7/20 , H01H3/12 , H01H13/86
CPC分类号： G03F7/70708 , G03F7/70733 , H01H3/125 , H01H13/704 , H01H13/7065 , H01H13/83 , H01H13/86 , H01H2219/036 , H01H2219/064 , H01H2221/03 , H01H2223/036 , H01H2227/028 , Y10T29/49826
摘要： Embodiments of a backlit keyboard assembly are described. A keycap assembly is mounted into a case web having intersecting ribs. A flange, which can be angled, is on the bottom perimeter of the keycap and a correspondingly shaped flange is on each rib of the case web. An overlap of the keycap flange and the case web flanges prevents direct sighting of the backlight light source and also provides a more evenly distributed halo around the keycap, thereby improving both aesthetics and functionality by providing better light control and contrast.
摘要翻译：描述背光键盘组件的实施例。键帽组件安装到具有相交肋的壳体腹板中。可以成角度的凸缘位于键帽的底部周边上，并且相应形状的凸缘位于壳体腹板的每个肋上。键帽凸缘和外壳腹板凸缘的重叠防止背光源的直接瞄准，并且还提供围绕键帽的更均匀分布的光晕，从而通过提供更好的光控制和对比度来改善美观和功能。

42. 发明申请

US20140232999A1 APPARATUS AND METHODS FOR KEEPING IMMERSION FLUID ADJACENT TO AN OPTICAL ASSEMBLY DURING WAFER EXCHANGE IN AN IMMERSION LITHOGRAPHY MACHINE 审中-公开
标题翻译：用于在浸没式切割机中的波形交换期间保持与光学组件相关的流体流体的装置和方法
公开(公告)号：US20140232999A1
公开(公告)日：2014-08-21
申请号：US14262058
申请日：2014-04-25
申请人： NIKON CORPORATION
发明人： Alex Ka Tim POON , Leonard Wai Fung KHO , Gaurav KESWANI , Derek COON , Daishi TANAKA
IPC分类号： G03F7/20
CPC分类号： G03F7/70341 , G03F7/70733
摘要： A lithographic projection apparatus includes a stage assembly having a substrate table on which a substrate is supported and exposed with an exposure beam from a final optical element of a projection optical assembly through an immersion liquid. A confinement member encircles a portion of a path of the exposure beam and has an aperture through which the exposure beam is projected. A movable member is movable in a space between the confinement member and the substrate, the substrate table, or both, such that a first portion of the space is located between a first surface of the movable member and the confinement member, and a second portion of the space is located between a second surface of the movable member and the substrate, the substrate table, or both.
摘要翻译：光刻投影装置包括具有基板台的载台组件，基板被支撑并且通过浸没液体从投影光学组件的最终光学元件的曝光光束暴露在基板台上。限制构件环绕曝光光束的路径的一部分并且具有曝光光束投射的孔。可动构件可在限制构件与衬底，衬底台或两者之间的空间中移动，使得空间的第一部分位于可动构件的第一表面和限制构件之间，第二部分的空间位于可移动部件的第二表面和基板，基板台之间或两者之间。

43. 发明申请

US20140218707A1 EXPOSURE METHOD AND EXPOSURE APPARATUS, AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译：曝光方法和曝光装置以及装置制造方法
公开(公告)号：US20140218707A1
公开(公告)日：2014-08-07
申请号：US14245050
申请日：2014-04-04
申请人： Nikon Corporation
发明人： Yuichi SHIBAZAKI
IPC分类号： G03F7/20
CPC分类号： G03F7/70708 , G03F7/7035 , G03F7/70358 , G03F7/70733 , G03F7/70783 , H01L21/0273
摘要： An exposure apparatus which transfers a pattern formed on a mask onto a photosensitive substrate placed in proximity to the mask, the apparatus including an illumination optical device which illuminates the mask with an energy beam, a mask holding device which holds a periphery area of a pattern area of the mask from above, and makes a force at least within a plane parallel to a predetermined plane act on the mask and a substrate holding device which moves along the predetermined plane holding the substrate.
摘要翻译：将形成在掩模上的图案转印到位于掩模附近的感光基片上的曝光装置，该装置包括用能量束照射掩模的照明光学装置，保持图案的周边区域的掩模保持装置并且至少在平行于预定平面的平面内作用在掩模上的力和沿着保持基板的预定平面移动的基板保持装置。

44. 发明授权

US08797508B2 Exposure apparatus, exposure method, and device manufacturing method 有权
标题翻译：曝光装置，曝光方法和装置制造方法
公开(公告)号：US08797508B2
公开(公告)日：2014-08-05
申请号：US12265831
申请日：2008-11-06
申请人： Yuichi Shibazaki
发明人： Yuichi Shibazaki
IPC分类号： G03B27/58 , G03F7/20
CPC分类号： G03F7/70775 , G03F7/70341 , G03F7/70733
摘要： During the transition from a state where one of wafer stages is located in an area below a projection optical system where a liquid immersion area is formed to a state where the other of the wafer stages is located in the area, both the wafer stages are made to be in proximity or in contact in a Y-axis direction in a state of being shifted in an X-axis direction, by making an overhang section and a stepped section that are arranged respectively on the wafer stages be engaged, and both the wafer stages are simultaneously driven in the Y-axis direction while maintaining this state. Accordingly, the liquid immersion area is delivered between the two wafer stages via the overhang section and leakage of a liquid that forms the liquid immersion area is restrained.
摘要翻译：在从其中一个晶片台位于其中形成液浸区域的投影光学系统下方的区域到另一个晶片台位于该区域中的状态的转变期间，两个晶片台都被制成通过使分别布置在晶片台上的悬伸部和台阶部接合而在X轴方向上移动的状态下在Y轴方向上接近或接触，并且两个晶片同时在保持该状态的同时沿Y轴方向驱动级。因此，液浸区域经由突出部分在两个晶片台之间传送，并且限制了形成液浸区域的液体的泄漏。

45. 发明授权

US08755033B2 Lithographic apparatus and device manufacturing method involving a barrier to collect liquid 有权
公开(公告)号：US08755033B2
公开(公告)日：2014-06-17
申请号：US13240711
申请日：2011-09-22
申请人： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
发明人： Aleksey Yurievich Kolesnychenko , Johannes Jacobus Matheus Baselmans , Sjoerd Nicolaas Lambertus Donders , Christiaan Alexander Hoogendam , Hans Jansen , Jeroen Johannes Sophia Maria Mertens , Johannes Catharinus Hubertus Mulkens , Felix Godfried Peter Peeters , Bob Streefkerk , Franciscus Johannes Herman Maria Teunissen , Helmar Van Santen
IPC分类号： G03B27/58 , G03B27/52
CPC分类号： G03F7/70341 , G03F7/70733 , G03F7/70866 , G03F7/70908
摘要： A substrate table of an immersion lithographic apparatus is disclosed which comprises a barrier configured to collect liquid. The barrier surrounds the substrate and is spaced apart from the substrate. In this way any liquid which is spilt from the liquid supply system can be collected to reduce the risk of contamination of delicate components of the lithographic projection apparatus.

46. 发明授权

US08717537B2 Exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08717537B2
公开(公告)日：2014-05-06
申请号：US13853643
申请日：2013-03-29
申请人： Nikon Corporation
发明人： Akimitsu Ebihara
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： Exposure apparatus and methods expose a substrate with an energy beam via a projection optical system and has first and second tables on each of which a substrate is mountable. A mark detection system is arranged in a second area different from a first area in which the projection optical system is arranged. A substrate mounted on one of the first and second tables is moved in the first area while the one table is held by a first movable member. A substrate mounted on another of the first and second tables is moved in the second area while the another table is held by a second movable member. The tables held by the first and second movable members are driven so that the another table is moved from the second to the first movable member to be held in place of the one table.
摘要翻译：曝光装置和方法通过投影光学系统暴露具有能量束的衬底，并且具有可安装衬底的第一和第二表。标记检测系统布置在与投影光学系统布置的第一区域不同的第二区域中。安装在第一台和第二台之一上的基板在第一区域中移动，而一个台被第一可移动构件保持。安装在另一个第一台和第二台上的基板在第二区域中移动，而另一台由第二可移动构件保持。由第一和第二可移动部件保持的工作台被驱动，使得另一个工作台从第二个可移动部件移动到第一个可移动部件，以保持在一个工作台上。

47. 发明授权

US08711328B2 Stage drive method and stage unit, exposure apparatus, and device manufacturing method 有权
公开(公告)号：US08711328B2
公开(公告)日：2014-04-29
申请号：US12923784
申请日：2010-10-07
申请人： Yuichi Shibazaki
发明人： Yuichi Shibazaki
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/70666 , G03F7/70733 , Y10T29/49155
摘要： When a transition from a first state where one stage is positioned at a first area directly below projection optical system to which liquid is supplied to a state where the other stage-is positioned at the first area, both stages are simultaneously driven while a state where both stages are close together in the X-axis direction is maintained. Therefore, it becomes possible to make a transition from the first state to the second state in a state where liquid is supplied in the space between the projection optical system and the specific stage directly under the projection optical system. Accordingly, the time from the completion of exposure operation on one stage side until the exposure operation begins on the other stage side can be reduced, which allows processing with high throughput. Further, because the liquid can constantly exist on the image plane side of the projection optical system, generation of water marks on optical members of the projection optical system on the image plane side is prevented.

48. 发明申请

US20140106264A1 PHOTOLITHOGRAPHY MASK, PHOTOLITHOGRAPHY MASK ARRANGEMENT, AND METHOD FOR EXPOSING A WAFER 审中-公开
标题翻译：光刻胶片，曝光掩模布局和曝光方法
公开(公告)号：US20140106264A1
公开(公告)日：2014-04-17
申请号：US13834267
申请日：2013-03-15
申请人： INFINEON TECHNOLOGIES AG
发明人： Josef Campidell , Rainer Leuschner , Gottfried Seebacher
IPC分类号： G03F7/20 , G03F1/50
CPC分类号： G03F7/20 , G03F1/50 , G03F7/70733
摘要： A photolithography mask according to an embodiment may include: a mask substrate, the mask substrate having a three-dimensional pattern located and dimensioned to at least partially receive an inverse three-dimensional pattern of a wafer to be exposed using the photolithography mask.
摘要翻译：根据一个实施例的光刻掩模可以包括：掩模基板，所述掩模基板具有三维图案，所述三维图案的位置和尺寸被设计成至少部分地使用所述光刻掩模接收待曝光的晶片的反三维图案。

49. 发明授权

US08692976B2 Exposure apparatus, and device manufacturing method 有权
标题翻译：曝光装置和装置制造方法
公开(公告)号：US08692976B2
公开(公告)日：2014-04-08
申请号：US13853319
申请日：2013-03-29
申请人： Nikon Corporation
发明人： Akimitsu Ebihara
IPC分类号： G03B27/42 , G03B27/52 , G03F7/20
CPC分类号： G03F7/70333 , B82Y10/00 , G03F7/70225 , G03F7/70325 , G03F7/70341 , G03F7/70716 , G03F7/70725 , G03F7/70733 , G03F7/70758 , G03F7/70816 , Y10T29/49826
摘要： An exposure apparatus and method exposes a substrate via a projection optical system and liquid. A liquid immersion member having a lower surface and a recovery port at its lower surface side supplies liquid to form a liquid immersion region below the projection optical system and recovers the liquid via the recovery port. First and second tables, on which a substrate is mountable, are positionable opposite to the lower surface of the liquid immersion member. A drive system moves the first and second tables below the projection optical system relative to the liquid immersion member to replace one of the tables positioned opposite to the lower surface of the liquid immersion member with the other of the tables, whereby the liquid immersion region is transferred from the one to the other of the tables while the liquid immersion region is maintained below and in contact with the projection optical system.
摘要翻译：曝光装置和方法通过投影光学系统和液体曝光基板。具有下表面的液浸部件和在其下表面侧的回收口供给液体以在投影光学系统下方形成液浸区域，并经由回收口回收液体。可安装基板的第一和第二台可与液浸部件的下表面相对定位。驱动系统相对于液浸部件移动投影光学系统下面的第一和第二表，以替换与浸液部件的下表面相对的一个表与另一个表，由此液浸区域在液浸区域保持在下方并与投影光学系统接触的同时从一个表传送到另一个表。

50. 发明申请

US20130321788A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20130321788A1
公开(公告)日：2013-12-05
申请号：US13983203
申请日：2011-12-20
申请人： David Christopher Ockwell , Noud Jan Gilissen
发明人： David Christopher Ockwell , Noud Jan Gilissen
IPC分类号： G03F7/20
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70733 , H01H3/125 , H01H13/704 , H01H13/7065 , H01H13/83 , H01H13/86 , H01H2219/036 , H01H2219/064 , H01H2221/03 , H01H2223/036 , H01H2227/028 , H01L21/6831 , H01L21/6833 , H01L21/6875 , Y10T29/49826
摘要： A substrate support is provided for a lithographic apparatus. The support comprises a substrate table constructed to hold a substrate and a chuck for the substrate table. In operation, the substrate table is supported by the chuck and clamped thereto. The substrate support comprises a first set of burls on a surface of the support block for abutting against the substrate table during the clamping and a second set of burls on a surface of the substrate table for abutting against the support block during the clamping.
摘要翻译：为光刻设备提供衬底支撑件。支撑件包括被构造成保持衬底和用于衬底台的卡盘的衬底台。在操作中，基板台被卡盘支撑并夹紧。衬底支撑件包括在支撑块的表面上的第一组毛刺，用于在夹紧过程中抵靠衬底台，并且在衬底台的表面上具有第二组毛刺，用于在夹紧期间抵靠支撑块。

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