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1. 发明授权

US09366973B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09366973B2
公开(公告)日：2016-06-14
申请号：US13983203
申请日：2011-12-20
申请人： David Christopher Ockwell , Noud Jan Gilissen
发明人： David Christopher Ockwell , Noud Jan Gilissen
IPC分类号： G03F7/20 , H01H13/83 , H01H13/704 , H01H13/7065 , H01H3/12 , H01H13/86
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70733 , H01H3/125 , H01H13/704 , H01H13/7065 , H01H13/83 , H01H13/86 , H01H2219/036 , H01H2219/064 , H01H2221/03 , H01H2223/036 , H01H2227/028 , H01L21/6831 , H01L21/6833 , H01L21/6875 , Y10T29/49826
摘要： A substrate support is provided for a lithographic apparatus. The support comprises a substrate table constructed to hold a substrate and a chuck for the substrate table. In operation, the substrate table is supported by the chuck and clamped thereto. The substrate support comprises a first set of burls on a surface of the support block for abutting against the substrate table during the clamping and a second set of burls on a surface of the substrate table for abutting against the support block during the clamping.
摘要翻译：为光刻设备提供衬底支撑件。支撑件包括被构造成保持衬底和用于衬底台的卡盘的衬底台。在操作中，基板台被卡盘支撑并夹紧。衬底支撑件包括在支撑块的表面上的第一组毛刺，用于在夹紧过程中抵靠衬底台，并且在衬底台的表面上具有第二组毛刺，用于在夹紧期间抵靠支撑块。

2. 发明申请

US20130321788A1 Lithographic Apparatus and Device Manufacturing Method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US20130321788A1
公开(公告)日：2013-12-05
申请号：US13983203
申请日：2011-12-20
申请人： David Christopher Ockwell , Noud Jan Gilissen
发明人： David Christopher Ockwell , Noud Jan Gilissen
IPC分类号： G03F7/20
CPC分类号： G03F7/70708 , G03F7/707 , G03F7/70733 , H01H3/125 , H01H13/704 , H01H13/7065 , H01H13/83 , H01H13/86 , H01H2219/036 , H01H2219/064 , H01H2221/03 , H01H2223/036 , H01H2227/028 , H01L21/6831 , H01L21/6833 , H01L21/6875 , Y10T29/49826
摘要： A substrate support is provided for a lithographic apparatus. The support comprises a substrate table constructed to hold a substrate and a chuck for the substrate table. In operation, the substrate table is supported by the chuck and clamped thereto. The substrate support comprises a first set of burls on a surface of the support block for abutting against the substrate table during the clamping and a second set of burls on a surface of the substrate table for abutting against the support block during the clamping.
摘要翻译：为光刻设备提供衬底支撑件。支撑件包括被构造成保持衬底和用于衬底台的卡盘的衬底台。在操作中，基板台被卡盘支撑并夹紧。衬底支撑件包括在支撑块的表面上的第一组毛刺，用于在夹紧过程中抵靠衬底台，并且在衬底台的表面上具有第二组毛刺，用于在夹紧期间抵靠支撑块。

3. 发明授权

US07978306B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：光刻设备和器件制造方法
公开(公告)号：US07978306B2
公开(公告)日：2011-07-12
申请号：US12216441
申请日：2008-07-03
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译：光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

4. 发明授权

US07106416B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US07106416B2
公开(公告)日：2006-09-12
申请号：US10731428
申请日：2003-12-10
申请人： Wilhelmus Josephus Box , Noud Jan Gilissen , Joost Jeroen Ottens
发明人： Wilhelmus Josephus Box , Noud Jan Gilissen , Joost Jeroen Ottens
IPC分类号： G03B27/42 , G03B27/58
CPC分类号： G03F7/70875
摘要： A lithographic apparatus including an illumination system for providing a beam of radiation and a support structure for supporting a patterning device. The patterning device serving to impart the beam with a pattern in its cross-section. The apparatus also having a substrate table for holding a substrate and a projection system for projecting the patterned beam onto a target portion of the substrate. The lithographic apparatus further having a chuck for supporting an object and a frame which supports the chuck with respect to other parts of the lithographic apparatus. The chuck is thermally isolated from at least the frame.
摘要翻译：一种光刻设备，包括用于提供辐射束的照明系统和用于支撑图案形成装置的支撑结构。图案形成装置用于在其横截面中赋予光束图案。该装置还具有用于保持基板的基板台和用于将图案化的光束投影到基板的目标部分上的投影系统。光刻设备还具有用于支撑物体的卡盘和相对于光刻设备的其它部分支撑卡盘的框架。卡盘至少与框架隔离。

5. 发明授权

US09188882B2 Lithographic apparatus and device manufacturing method 有权
标题翻译：平版印刷设备和器件制造方法
公开(公告)号：US09188882B2
公开(公告)日：2015-11-17
申请号：US13160042
申请日：2011-06-14
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03B27/42 , G03B27/52 , G03F9/00 , G03F7/20
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译：光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

6. 发明申请

US20120058434A1 LITHOGRAPHIC APPARATUS, DEVICE MANUFACTURING METHOD, AND METHOD OF APPLYING A PATTERN TO A SUBSTRATE 有权
标题翻译：光刻设备，设备制造方法和将图案应用于基板的方法
公开(公告)号：US20120058434A1
公开(公告)日：2012-03-08
申请号：US13207123
申请日：2011-08-10
申请人： Laurent KHUAT DUY , Noud Jan Gilissen
发明人： Laurent KHUAT DUY , Noud Jan Gilissen
IPC分类号： G03F7/20 , G03B27/42
CPC分类号： G02B27/40 , G03F9/7049
摘要： A lithographic apparatus is arranged to transfer a pattern from a patterning device onto a substrate, in which a measuring subsystem comprises one or (preferably) more alignment & level sensors (AS, LS) directed at the substrate near a patterning location of a patterning subsystem. The alignment sensor(s) is operable to recognize and measure alignment marks (P1) on the substrate passing by the sensor during relative motion of the substrate and patterning subsystem under control of the positioning subsystem. A processor combines measurements of relative locations of a plurality of said marks to provide measurement results with an accuracy sufficient for the positioning subsystem to position at least a first substrate portion at said patterning location relative to said alignment marks. A preliminary step obtains position relative to a known pattern (M1) on the patterning device. Measurements are taken and updated in real time during exposure of successive substrate portions.
摘要翻译：光刻设备被布置成将图案从图案形成装置转移到基板上，其中测量子系统包括在图案化子系统的图案化位置附近指向基板的一个或（优选地）更多的对准和电平传感器（AS，LS）。对准传感器可操作以在基板和构图子系统在定位子系统的控制下的相对运动期间识别和测量在传感器上通过的基板上的对准标记（P1）。处理器结合了多个所述标记的相对位置的测量结果，以提供具有足够的精度的测量结果，该精度足以使定位子系统相对于所述对准标记在所述图案化位置处至少定位第一衬底部分。预备步骤相对于图案形成装置上的已知图案（M1）获得位置。在连续的衬底部分的曝光期间实时地进行测量和更新。

7. 发明申请

US20110241259A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 有权
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20110241259A1
公开(公告)日：2011-10-06
申请号：US13160042
申请日：2011-06-14
申请人： Joost Jeroen OTTENS , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen OTTENS , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
IPC分类号： B29C35/08 , B29C51/46 , B29C51/42
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.
摘要翻译：光刻设备可以包括至少部分由诸如气体轴承的轴承支撑的光学元件，例如浸没式流体储存器。为了使基板的边缘的光刻设备进行照明，提供围绕基板的周围结构。衬底的等级参数，例如衬底的厚度，通过诸如厚度传感器的传感器来测量。通过致动器，其上放置或将保持衬底的衬底台相对于周围结构定位，使得衬底的表面将处于与周围结构的表面基本相同的高度，因此使得光学元件能够从衬底的表面转移到周围结构的表面，反之亦然。

8. 发明申请

US20100165319A1 LITHOGRAPHIC APPARATUS AND DEVICE MANUFACTURING METHOD 审中-公开
标题翻译： LITHOGRAPHIC装置和装置制造方法
公开(公告)号：US20100165319A1
公开(公告)日：2010-07-01
申请号：US12642627
申请日：2009-12-18
申请人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
发明人： Hernes Jacobs , Noud Jan Gilissen , Hans Jansen , Nicolaas Ten Kate , Nicolaas Rudolf Kemper , Martinus Hendrikus Antonius Leenders , Erik Roelof Loopstra , Johannes Catharinus Hubertus Mulkens , Harmen Klaas Van Der Schoot , Marco Koert Stavenga , Bob Streefkerk , Peter Paul Steijaert , Marcus Martinus Petrus Adrianus Vermeulen , Jan Cornelis Van Der Hoeven
IPC分类号： G03B27/32
CPC分类号： G03F7/70341
摘要： An immersion lithographic projection apparatus is disclosed in which a liquid removal system surrounds a liquid supply system which provides liquid to a space between a projection system and a substrate. The liquid removal system is moveable relative to the liquid supply system and is controlled to have substantially zero velocity relative to the moving substrate table. The gap between the liquid supply system and the liquid removal system may be covered and the atmosphere between the liquid supply system and the liquid removal system above the substrate table may be maintained such that the vapor pressure of liquid is relatively high.
摘要翻译：公开了一种浸没式光刻投影装置，其中液体移除系统围绕向投影系统和基板之间的空间提供液体的液体供应系统。液体移除系统相对于液体供应系统是可移动的，并且被控制为相对于移动的基板台具有基本上零的速度。可以覆盖液体供应系统和液体移除系统之间的间隙，并且可以保持液体供应系统和衬底台之上的液体去除系统之间的气氛，使得液体的蒸汽压力相对较高。

9. 发明授权

US07064808B1 Substrate carrier and method for making a substrate carrier 有权
标题翻译：基板载体和制造基板载体的方法
公开(公告)号：US07064808B1
公开(公告)日：2006-06-20
申请号：US10829462
申请日：2004-04-22
申请人： Noud Jan Gilissen , Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
发明人： Noud Jan Gilissen , Joost Jeroen Ottens , Harmen Klaas Van Der Schoot , Petrus Matthijs Henricus Vosters
IPC分类号： G03B27/58 , G03B27/62
CPC分类号： G03F7/707 , G03F7/70716
摘要： A carrier for carrying a lithographic substrate or a lithographic patterning means. The carrier comprises a first member provided with an open hollow structure that is open to at least one side of the member. The carrier further comprises a second member connected to the first member, such that a closed hollow internal structure is formed between the carrier members.
摘要翻译：用于承载光刻基板或平版印刷图案形成装置的载体。载体包括设置有开口中空结构的第一构件，其向构件的至少一侧开口。载体还包括连接到第一构件的第二构件，使得在载体构件之间形成封闭的中空内部结构。

10. 发明授权

US07411657B2 Lithographic apparatus and device manufacturing method 有权
公开(公告)号：US07411657B2
公开(公告)日：2008-08-12
申请号：US10990323
申请日：2004-11-17
申请人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
发明人： Joost Jeroen Ottens , Noud Jan Gilissen , Martinus Hendrikus Antonius Leenders , Koen Jacobus Johannes Maria Zaal
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70725 , G03F7/70341 , G03F7/7075 , G03F9/7046
摘要： A lithographic apparatus may include an optical element, such as an immersion fluid reservoir, which supported at least in part by a bearing, such as a gas bearing. To enable illumination by the lithographic apparatus of an edge of the substrate, a surrounding structure is provided that surrounds the substrate. A level parameter of the substrate, such as a thickness of the substrate, is measured by a sensor, such as a thickness sensor. By means of an actuator, the substrate table on which the substrate is or will be held is positioned with respect to the surrounding structure, such that a surface of the substrate would be on a substantially same level as a surface of the surrounding structure, thus enabling the optical element to transition from the surface of the substrate to the surface of the surrounding structure and vice versa.

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