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41. 发明授权

US07061961B2 Very narrow band, two chamber, high rep-rate gas discharge laser system 有权
公开(公告)号：US07061961B2
公开(公告)日：2006-06-13
申请号：US11199691
申请日：2005-08-09
申请人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scot T. Smith , William G. Hulburd , Jeffrey Oicles
发明人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scot T. Smith , William G. Hulburd , Jeffrey Oicles
IPC分类号： H01S3/22
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An oscillator-amplifier gas discharge laser system and method is disclosed which may comprise a first laser unit which may comprise a first discharge region which may contain an excimer or molecular fluorine lasing gas medium; a first pair of electrodes defining the first discharge region containing the lasing gas medium, a line narrowing unit for narrowing a spectral bandwidth of output laser light pulse beam pulses produced in said first discharge region; a second laser unit which may comprise a second discharge chamber which may contain an excimer or molecular fluorine lasing gas medium; a second pair of electrodes defining the second discharge region containing the lasing gas medium; a pulse power system providing electrical pulses to the first pair of electrodes and to the second pair of electrodes producing gas discharges in the lasing gas medium between the respective first and second pair of electrodes, and laser parameter control mechanism modifying a selected parameter of a selected laser output light pulse beam pulse produced by said gas discharge laser system by controlling the timing of the occurrence of the gas discharge between the first pair of electrodes and the occurrence of the gas discharge between the second pair of electrodes.

42. 发明授权

US06757316B2 Four KHz gas discharge laser 有权
标题翻译：四KHz气体放电激光器
公开(公告)号：US06757316B2
公开(公告)日：2004-06-29
申请号：US09854097
申请日：2001-05-11
申请人： Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
发明人： Peter C. Newman , Thomas P. Duffey , William N. Partlo , Richard L. Sandstrom , Paul C. Melcher , David M. Johns , Robert B. Saethre , Vladimir B. Fleurov , Richard M. Ness , Curtis L. Rettig , Robert A. Shannon , Richard C. Ujazdowski , Shahryar Rokni , Xiaojiang J. Pan , Vladimir Kulgeyko , Scott T. Smith , Stuart L. Anderson , John M. Algots , Ronald L. Spangler , Igor V. Fomenkov
IPC分类号： H01S322
CPC分类号： H01S3/225 , G01J1/4257 , G01J3/027 , G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/097 , H01S3/09702 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2308
摘要： The present invention provides an excimer laser capable of producing a high quality pulsed laser beam at pulse rates of about 4,000 Hz at pulse energies of about 5 mJ or greater. A preferred embodiment is an ArF excimer laser specifically designed as a light source for integrated circuit lithography. An improved wavemeter with special software monitors output beam parameters and controls a very fast PZT driven tuning mirror and the pulse power charging voltage to maintain wavelength and pulse energy within desired limits. In a preferred embodiment two fan motors drive a single tangential fan which provides sufficient gas flow to clear discharge debris from the discharge region during the approximately 0.25 milliseconds between pulses.
摘要翻译：本发明提供了一种准分子激光器，其能够以约5mJ或更大的脉冲能量产生脉冲速率约为4000Hz的高质量脉冲激光束。优选的实施方案是专门设计为用于集成电路光刻的光源的ArF准分子激光器。具有特殊软件的改进型波长测量仪监测输出光束参数，并控制非常快的PZT驱动调光镜和脉冲功率充电电压，以将波长和脉冲能量保持在所需的极限内。在优选实施例中，两个风扇马达驱动单个切向风扇，其提供足够的气流以在脉冲之间的大约0.25毫秒期间从放电区域清除放电碎片。

43. 发明授权

US06625191B2 Very narrow band, two chamber, high rep rate gas discharge laser system 有权
公开(公告)号：US06625191B2
公开(公告)日：2003-09-23
申请号：US10012002
申请日：2001-11-30
申请人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
发明人： David S. Knowles , Daniel J. W. Brown , Herve A. Besaucele , David W. Myers , Alexander I. Ershov , William N. Partlo , Richard L. Sandstrom , Palash P. Das , Stuart L. Anderson , Igor V. Fomenkov , Richard C. Ujazdowski , Eckehard D. Onkels , Richard M. Ness , Scott T. Smith , William G. Hulburd , Jeffrey Oicles
IPC分类号： H01S322
CPC分类号： G01J1/4257 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70483 , G03F7/70575 , G03F7/70933 , H01S3/005 , H01S3/0057 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0387 , H01S3/0404 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/137 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： An injection seeded modular gas discharge laser system capable of producing high quality pulsed laser beams at pulse rates of about 4,000 Hz or greater and at pulse energies of about 5 mJ or greater. Two separate discharge chambers are provided, one of which is a part of a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. The chambers can be controlled separately permitting separate optimization of wavelength parameters in the master oscillator and optimization of pulse energy parameters in the amplifying chamber. A preferred embodiment in an ArF excimer laser system configured as a MOPA and specifically designed for use as a light source for integrated circuit lithography. In the preferred MOPA embodiment, each chamber comprises a single tangential fan providing sufficient gas flow to permit operation at pulse rates of 4000 Hz or greater by clearing debris from the discharge region in less time than the approximately 0.25 milliseconds between pulses. The master oscillator is equipped with a line narrowing package having a very fast tuning mirror capable of controlling centerline wavelength on a pulse-to-pulse basis at repetition rates of 4000 Hz or greater to a precision of less than 0.2 pm.

44. 发明授权

US06621846B1 Electric discharge laser with active wavelength chirp correction 有权
标题翻译：具有有源波长啁啾校正的放电激光器
公开(公告)号：US06621846B1
公开(公告)日：2003-09-16
申请号：US09501160
申请日：2000-02-09
申请人： Richard L. Sandstrom , Palash P. Das , George J. Everage , Frederick G. Erie , William N. Partlo , Igor V. Fomenkov
发明人： Richard L. Sandstrom , Palash P. Das , George J. Everage , Frederick G. Erie , William N. Partlo , Igor V. Fomenkov
IPC分类号： H01S322
CPC分类号： H01S3/104 , G03F7/70025 , G03F7/70333 , G03F7/70575 , G03F7/708 , H01S3/036 , H01S3/038 , H01S3/0381 , H01S3/0382 , H01S3/105 , H01S3/1055 , H01S3/13 , H01S3/134 , H01S3/225
摘要： Electric discharge laser with active chirp correction. This application discloses techniques for moderating and dispensing these pressure waves. In some lasers small predictable patterns remain which can be substantially corrected with active wavelength control using relatively slow wavelength control instruments of the prior art. In a preferred embodiment a simple learning algorithm is described to allow advance tuning mirror adjustment in anticipation of the learned chirp pattern. Embodiments include stepper motors having very fine adjustments so that size of tuning steps are substantially reduced for more precise tuning. However, complete elimination of wavelength chirp is normally not feasible with structural changes in the laser chamber and advance tuning; therefore, Applicants have developed equipment and techniques for very fast active chirp correction. Improved techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver. In another preferred embodiment chirp correction is made on a pulse-to-pulse basis where the wavelength of one pulse is measured and the wavelength of the next pulse is corrected based on the measurement. This correction technique is able to function at repetition rates as rapid as 2000 Hz and greater.
摘要翻译：具有主动啁啾校正的放电激光器。本申请公开了用于调节和分配这些压力波的技术。在一些激光器中，可以使用现有技术的相对较慢的波长控制装置的主动波长控制基本上校正了小的可预测的图案。在优选实施例中，描述了一种简单的学习算法，以便在预期学习的啁啾模式中允许预调谐镜调节。实施例包括具有非常精细调节的步进电动机，使得调节步骤的尺寸被显着减小以便更精确的调谐。然而，完全消除波长啁啾通常不可行，在激光室的结构变化和提前调谐; 因此，申请人已经开发了用于非常快的主动啁啾校正的设备和技术。改进的技术包括相对较慢的步进电机和非常快的压电驱动器的组合。在另一个优选实施例中，在脉冲对脉冲基础上进行啁啾校正，其中测量一个脉冲的波长，并且基于测量校正下一个脉冲的波长。该校正技术能够以2000Hz及更高的重复速率工作。

45. 发明授权

US06480275B2 High resolution etalon-grating monochromator 有权
标题翻译：高分辨率标准光栅单色仪
公开(公告)号：US06480275B2
公开(公告)日：2002-11-12
申请号：US09772293
申请日：2001-01-29
申请人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith
发明人： Richard L. Sandstrom , Alexander I. Ershov , William N. Partlo , Igor V. Fomenkov , Scott T. Smith
IPC分类号： G01J318
CPC分类号： G01J3/12 , G01J1/4257 , G01J3/22 , G01J3/26 , G01J9/02
摘要： A high resolution etalon-grating monochromator. A preferred embodiment presents an extremely narrow slit function in the ultraviolet range and is very useful for measuring bandwidth of narrow band excimer lasers used for integrated circuit lithography. Light from the laser is focused into a diffuser and the diffused light exiting the diffuser illuminates an etalon. A portion of its light exiting the etalon is collected and directed into a slit positioned at a fringe pattern of the etalon. Light passing through the slit is collimated and the collimated light illuminates a grating positioned in an approximately Littrow configuration which disburses the light according to wavelength. A portion of the dispursed light representing the wavelength corresponding to the selected etalon fringe is passed through a second slit and monitored by a light detector. When the etalon and the grating are tuned to the same precise wavelength a slit function is defined which is extremely narrow such as about 0.034 pm (FWHM) and about 0.091 pm (95 percent integral). The bandwidth of a laser beam can be measured very accurately by a directing portion of the laser beam into the monochromator and scanning the laser wavelength over a range which includes the monochromator slit wavelength.
摘要翻译：高分辨率标准光栅单色仪。优选的实施例在紫外范围内呈现非常狭窄的狭缝功能，并且对于测量用于集成电路光刻的窄带准分子激光器的带宽是非常有用的。来自激光的光被聚焦成漫射器，并且离开扩散器的漫射光照射标准具。将其从标准具出射的光的一部分收集并引导到位于标准具的边缘图案处的狭缝中。通过狭缝的光线被准直，并且准直光照射位于大约Littrow配置中的光栅，其根据波长散发光。表示对应于所选择的标准具条纹的波长的调度光的一部分通过第二狭缝并由光检测器监视。当标准具和光栅调谐到相同的精确波长时，定义狭缝功能，其极窄，例如约0.034μm（FWHM）和约0.091μm（95％积分）。激光束的带宽可以通过激光束的引导部分进入单色仪并且在包括单色器狭缝波长的范围内扫描激光波长而被非常精确地测量。

46. 发明授权

US5991324A Reliable. modular, production quality narrow-band KRF excimer laser 失效
标题翻译：可靠。模块化，生产质量好的窄带KRF准分子激光器
公开(公告)号：US5991324A
公开(公告)日：1999-11-23
申请号：US41474
申请日：1998-03-11
申请人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
发明人： David S. Knowles , James H. Azzola , Herve A. Besaucele , Palash P. Das , Alexander I. Ershov , Igor V. Fomenkov , Tibor Juhasz , Robert G. Ozarski , William N. Partlo , Daniel A. Rothweil , Richard L. Sandstrom , Richard C. Ujazdowski , Tom A. Watson , Richard M. Ness
IPC分类号： H01S3/038 , G03F7/20 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/139 , H01S3/225 , H01S3/22
CPC分类号： G01J9/0246 , G03F7/70025 , G03F7/70041 , G03F7/70358 , G03F7/70558 , G03F7/70575 , H01S3/02 , H01S3/03 , H01S3/036 , H01S3/0971 , H01S3/1055 , H01S3/225 , H01S3/1392
摘要： A reliable, modular, production quality narrow-band KrF excimer laser capable of producing 10 mJ laser pulses at 1000 Hz with a bandwidth of about 0.6 pm or less. The present invention is especially suited to long-term round-the-clock operation in the lithographic production of integrated circuits. Improvements over prior art lasers include a single upstream preionizer tube and acoustic baffles. A preferred embodiment includes reduced fluorine concentration, an anode support bar shaped to reduce aerodynamic reaction forces on blower bearings, a modified pulse power system providing faster pulse rise time, an output coupler with substantially increased reflectivity, a line narrowing module with CaF prism beam expanders, a more accurate wavemeter, a laser computer controller programmed with new and improved pulse energy control algorithm.
摘要翻译：一种可靠，模块化，生产质量好的窄带KrF准分子激光器，能够以1000Hz的频率产生10mJ的激光脉冲，带宽约为0.6μm或更小。本发明特别适用于集成电路的平版印刷生产中的长期全天候操作。现有技术的激光器的改进包括单个上游预分解器管和声学挡板。优选的实施例包括减少的氟浓度，阳极支撑杆形状以减小鼓风机轴承上的空气动力反作用力，改进的脉冲电源系统提供更快的脉冲上升时间，输出耦合器具有显着增加的反射率，具有CaF棱镜扩束器的线窄化模块，更准确的波长计，激光计算机控制器编程，具有新的改进的脉冲能量控制算法。

47. 发明授权

US07346093B2 DUV light source optical element improvements 有权
标题翻译： DUV光源光学元件改进
公开(公告)号：US07346093B2
公开(公告)日：2008-03-18
申请号：US10808157
申请日：2004-03-23
申请人： Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
发明人： Richard L. Sandstrom , John Martin Algots , Joshua C. Brown , Raymond F. Cybulski , John Dunlop , James K. Howey , Richard G. Morton , Xiaojiang Pan , William N. Partlo , Firas F. Putris , Tom A. Watson , Thomas A. Yager
IPC分类号： H01S3/08 , H01S3/22
CPC分类号： H01S3/02 , G01J1/429 , G01J9/02 , G03F7/70025 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/0071 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0401 , H01S3/041 , H01S3/08009 , H01S3/08036 , H01S3/0812 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/1024 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/223 , H01S3/225 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2333 , H01S3/2366
摘要： A high power narrow band, high repetition rate laser light source optical improvement apparatus and methods are disclosed with a fast angularly positionable mirror having a mirror mounting frame, a reflective optic with a coefficient different from that of the mounting frame, at least one flexure mount fromed in the mounting frame that is flexible having flexure arm attached the flexture to the mounting frame. The apparatus may include a flexure force mechanism having an elongated rod. The force mechanism may pre-stress the flexure. The mirror maybe a grating which includes a substrate with metallic layer formed on the substrate, and a protective coating made of silica formed on the reflective metallic layer. The grating maybe actively tuned using an electro- or magneto-sensitive element. Oxides of the metal in the reflective layer may be removed by a hydrogen purge system exposed to deep ultraviolet radiation.
摘要翻译：公开了一种高功率窄带，高重复率激光光源光学改进装置和方法，其具有快速可角度定位的反射镜，其具有镜安装框架，具有与安装框架系数不同的系数的反射光学元件，至少一个弯曲安装座从柔性的安装框架开始，挠曲臂将挠性件附接到安装框架。该装置可以包括具有细长杆的挠曲力机构。力机构可以预应力挠曲。镜子可以是包括在基板上形成有金属层的基板的光栅，以及形成在反射金属层上的由二氧化硅形成的保护涂层。光栅可以使用电磁感应元件或磁敏元件进行主动调谐。可以通过暴露于深紫外线辐射的氢气清除系统来去除反射层中金属的氧化物。

48. 发明授权

US06650666B2 Laser wavelength control unit with piezoelectric driver 有权
公开(公告)号：US06650666B2
公开(公告)日：2003-11-18
申请号：US10027210
申请日：2001-12-21
申请人： Ronald L. Spangler , Robert N. Jacques , John A. Rule , Frederick A. Palenschat , Igor V. Fomenkov , John M. Algots , Jacob P. Lipcon , Richard L. Sandstrom
发明人： Ronald L. Spangler , Robert N. Jacques , John A. Rule , Frederick A. Palenschat , Igor V. Fomenkov , John M. Algots , Jacob P. Lipcon , Richard L. Sandstrom
IPC分类号： H01S310
CPC分类号： G03F7/70575 , G03F7/70025 , G03F7/70041 , G03F7/70333 , G03F7/70933 , H01S3/02 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/0404 , H01S3/041 , H01S3/08036 , H01S3/097 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1055 , H01S3/1305 , H01S3/1312 , H01S3/134 , H01S3/137 , H01S3/22 , H01S3/2207 , H01S3/225
摘要： An electric discharge laser with fast wavelength correction. Fast wavelength correction equipment includes at least one piezoelectric drive and a fast wavelength measurement system and fast feedback response times. In a preferred embodiment, equipment is provided to control wavelength on a slow time frame of several milliseconds, on a intermediate time from of about one to five milliseconds and on a very fast time frame of a few microseconds. Preferred techniques include a combination of a relatively slow stepper motor and a very fast piezoelectric driver for tuning the laser wavelength using a tuning mirror. A preferred control technique is described (utilizing a very fast wavelength monitor) to provide the slow and intermediate wavelength control with the combination of a stepper motor and a piezoelectric driver. Very fast wavelength control is provided with a piezoelectric load cell in combination with the piezoelectric driver. Preferred embodiments provide (1) fast feedback control based on wavelength measurements, (2) fast vibration control, (3) active damping using the load cell and an active damping module, (4) transient inversion using feed forward algorithms based on historical burst data. A preferred embodiment adapts the feed forward algorithms to current conditions. Another preferred embodiment measures tuning mirror position to permit wavelength pretuning and active wavelength tuning.

49. 发明授权

US07039086B2 Control system for a two chamber gas discharge laser 有权
公开(公告)号：US07039086B2
公开(公告)日：2006-05-02
申请号：US10631349
申请日：2003-07-30
申请人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
发明人： John P. Fallon , John A. Rule , Robert N. Jacques , Jacob Lipcon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher
IPC分类号： H01S3/22
CPC分类号： H01S3/225 , G03F7/70025 , G03F7/70041 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/0381 , H01S3/09702 , H01S3/1055 , H01S3/2258 , H01S3/2333
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber.Novel control features specially adapted for a two-chamber gas discharge laser system include: (1) pulse energy controls, with nanosecond timing precision (2) precision pulse to pulse wavelength controls with high speed and extreme speed wavelength tuning (3) fast response gas temperature control and (4) F2 injection controls with novel learning algorithm.

50. 发明授权

US06690704B2 Control system for a two chamber gas discharge laser 有权
标题翻译：双室气体放电激光器控制系统
公开(公告)号：US06690704B2
公开(公告)日：2004-02-10
申请号：US10210761
申请日：2002-07-31
申请人： John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
发明人： John P. Fallon , Richard L. Sandstrom , William N. Partlo , Alexander I. Ershov , Toshihiko Ishihara , John Meisner , Richard M. Ness , Paul C. Melcher , John A. Rule , Robert N. Jacques
IPC分类号： H01S322
CPC分类号： H01S3/2333 , G03F7/70025 , G03F7/70041 , G03F7/70575 , G03F7/70933 , H01S3/0057 , H01S3/03 , H01S3/036 , H01S3/038 , H01S3/0385 , H01S3/041 , H01S3/08004 , H01S3/08009 , H01S3/08036 , H01S3/0943 , H01S3/097 , H01S3/09702 , H01S3/09705 , H01S3/0971 , H01S3/0975 , H01S3/104 , H01S3/105 , H01S3/1305 , H01S3/134 , H01S3/139 , H01S3/22 , H01S3/2207 , H01S3/2251 , H01S3/2256 , H01S3/2258 , H01S3/2366
摘要： The present invention provides a control system for a modular high repetition rate two discharge chamber ultraviolet gas discharge laser. In preferred embodiments, the laser is a production line machine with a master oscillator producing a very narrow band seed beam which is amplified in the second discharge chamber. Feedback timing control techniques are provided for controlling the relative timing of the discharges in the two chambers with an accuracy in the range of about 2 to 5 billionths of a second even in burst mode operation. This MOPA system is capable of output pulse energies approximately double the comparable single chamber laser system with greatly improved beam quality.
摘要翻译：本发明提供了一种用于模块化高重复率两放电室紫外线气体放电激光器的控制系统。在优选实施例中，激光器是具有主振荡器的生产线机器，该主振荡器产生在第二放电室中放大的非常窄的带状晶体束。提供了反馈定时控制技术，即使在脉冲串模式操作中，也可以精确地控制两个室中的放电的相对定时，其精确度在大约2至50亿分之一秒的范围内。该MOPA系统能够以大大提高的光束质量将输出脉冲能量大约增加到相当的单室激光器系统的两倍。

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