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41. 发明授权

US06740416B1 Aerogel substrate and method for preparing the same 有权
标题翻译：气凝胶底物及其制备方法
公开(公告)号：US06740416B1
公开(公告)日：2004-05-25
申请号：US09830572
申请日：2001-05-08
申请人： Hiroshi Yokogawa , Masaru Yokoyama , Kenji Tsubaki , Kenji Kawano , Kenji Sonoda
发明人： Hiroshi Yokogawa , Masaru Yokoyama , Kenji Tsubaki , Kenji Kawano , Kenji Sonoda
IPC分类号： B32B1304
CPC分类号： C23C16/045 , B05D1/202 , C03C17/34 , C03C17/3411 , C03C17/3417 , C03C17/36 , C03C17/42 , C03C2217/75 , C03C2217/76 , C03C2218/32 , C23C14/046 , C23C14/06 , G02B6/02042 , G02B6/122 , H01L33/005 , H01L33/0066 , H01L33/0079 , H01L51/5262 , H05K1/0306 , Y10S428/913 , Y10T428/24917
摘要： An aerogel substrate useful for an electrically conductive substrate, a heat insulating substrate, an optical waveguide substrate, a substrate for a light emitting device or a light emitting device is provided. The aerogel substrate is characterized by comprising a functional layer and an aerogel layer, and an intermediate layer formed between the functional layer and the aerogel layer to allow the functional layer to be formed uniformly thereon. The intermediate layer is formed on at least one surface of the aerogel layer by a gas phase method, by the Langmuir-Blodgett method or by adsorption of an inorganic layered compound; or formed by a hydrophilicizing treatment of at least one surface of the aerogel layer followed by coating and drying an aqueous coating fluid, by an annealing treatment of at least one surface of the aerogel layer, or by a hydrophilicizing treatment of at least one surface of the aerogel layer.
摘要翻译：提供了可用于导电基板，隔热基板，光波导基板，发光器件用基板或发光元件的气凝胶基板。气凝胶基板的特征在于，具有功能层和气凝胶层，以及形成在功能层和气凝胶层之间的中间层，以使功能层均匀地形成。中间层通过气相法，Langmuir-Blodgett法或通过无机层状化合物的吸附形成在气凝胶层的至少一个表面上; 或通过对气凝胶层的至少一个表面进行亲水化处理，然后通过涂覆和干燥水性涂布液，通过对气凝胶层的至少一个表面的退火处理，或通过亲水化处理至少一个表面气凝胶层。

42. 发明授权

US06445410B2 Image input apparatus having interchangeable image pickup device and pan head 失效
标题翻译：图像输入装置具有可互换的图像拾取装置和盘头
公开(公告)号：US06445410B2
公开(公告)日：2002-09-03
申请号：US08547201
申请日：1995-10-24
申请人： Kenji Kawano
发明人： Kenji Kawano
IPC分类号： H04N5232
CPC分类号： H04N5/23209 , H04N7/142
摘要： An image input apparatus has a pan head for mounting an image pickup device thereon and for changing the image pickup direction of the image pickup device. The image pickup device has an engaging device, and control terminals capable of transmitting specification information about an operation of the pan head from the image pickup device to the pan head. The pan head has a holding device to be engaged with the engaging device so as to interchangeably hold the image pickup device, identifying terminals capable of receiving the specification information when the image pickup device is held by the holding device, and a selection circuit for selecting an operation of the pan head corresponding to the held image pickup device based on the received specification information.
摘要翻译：图像输入装置具有用于在其上安装图像拾取装置并用于改变图像拾取装置的图像拾取方向的摇摄头。图像拾取装置具有接合装置，以及控制端子，其能够将关于盘头的操作的规格信息从图像拾取装置发送到盘头。摇头具有与接合装置接合的保持装置，以便可互换地保持图像拾取装置，当保持装置保持图像拾取装置时能够接收指定信息的识别终端;以及选择电路基于所接收的指定信息，对应于所保持的图像拾取装置的平移头的操作。

43. 发明授权

US06423977B1 Pattern size evaluation apparatus 失效
标题翻译：图案尺寸评估装置
公开(公告)号：US06423977B1
公开(公告)日：2002-07-23
申请号：US09030510
申请日：1998-02-25
申请人： Kei Hayasaki , Shinichi Ito , Kenji Kawano , Soichi Inoue , Katsuya Okumura
发明人： Kei Hayasaki , Shinichi Ito , Kenji Kawano , Soichi Inoue , Katsuya Okumura
IPC分类号： G01N2186
CPC分类号： G01N21/956
摘要： A pattern size evaluation apparatus comprising an illumination optical system for projecting parallel light rays of a predetermined wavelength on a monitoring area formed on an object, the monitoring area being formed at a position different from a device pattern formed on the object, a light intensity detection optical system for detecting diffracted light from the monitoring area, and a device pattern size evaluation section for evaluating a size of the device pattern based on an intensity of diffracted light from the monitoring area.
摘要翻译：一种图案尺寸评估装置，包括用于在形成在物体上的监视区域上投射预定波长的平行光线的照明光学系统，所述监视区域形成在与形成在物体上的装置图案不同的位置，光强度检测用于检测来自监视区域的衍射光的光学系统，以及用于基于来自监视区域的衍射光的强度来评估装置图案的尺寸的装置图案尺寸评估部。

44. 发明授权

US06377083B1 Semiconductor integrated device and methods of detecting and correcting a voltage drop in an integrated circuit 失效
标题翻译：半导体集成器件及集成电路中的电压降检测和校正方法
公开(公告)号：US06377083B1
公开(公告)日：2002-04-23
申请号：US09686062
申请日：2000-10-11
申请人： Tsutomu Takabayashi , Kenji Kawano , Shizuo Morizane
发明人： Tsutomu Takabayashi , Kenji Kawano , Shizuo Morizane
IPC分类号： H03D100
CPC分类号： G06F1/28 , H03K5/159 , H03K5/19
摘要： A semiconductor integrated device has a detection cell arranged in a power-supply line in the semiconductor integrated device and detecting a power-supply voltage. Further, a detection circuit detects a voltage drop of the power-supply voltage detected by the detection cell. Connection wiring connects the detection cell and the detection circuit and outputs the power-supply voltage detected by the detection cell to the detection circuit.
摘要翻译：半导体集成器件具有布置在半导体集成器件的电源线中并检测电源电压的检测单元。此外，检测电路检测由检测单元检测到的电源电压的电压降。连接线连接检测单元和检测电路，并将检测单元检测出的电源电压输出到检测电路。

45. 发明授权

US06243208B1 Optical element, optical system using optical element, and optical device with optical element 失效
标题翻译：光学元件，使用光学元件的光学系统和具有光学元件的光学装置
公开(公告)号：US06243208B1
公开(公告)日：2001-06-05
申请号：US08915044
申请日：1997-08-20
申请人： Tsukasa Uehara , Makoto Sekita , Kenji Kawano , Seiji Iida
发明人： Tsukasa Uehara , Makoto Sekita , Kenji Kawano , Seiji Iida
IPC分类号： G02B2714
CPC分类号： G02B17/086 , G02B17/0848 , G02B17/0896
摘要： In an optical element (B1) prepared by integrally forming, on surfaces of a transparent member, a refracting surface (R2) for receiving a light beam, a plurality of reflecting surfaces (R3, R4, R5) with curvatures, and a refracting surface (R6) for outputting the light beam reflected by the plurality of reflecting surfaces, a reference portion (7) for defining the position of the optical element in a predetermined direction with respect to a Y′-Z′ plane including an incident reference axis (5) and an exit reference axis (5) of at least one reflecting surface of the optical element (B1) is formed on the optical element.
摘要翻译：在通过在透明构件的表面上一体地形成用于接收光束的折射表面（R2），具有曲率的多个反射表面（R3，R4，R5）和折射表面（B1）而制备的光学元件（R6），用于输出由多个反射表面反射的光束;基准部分（7），用于相对于包括入射参考轴线的Y'-Z'平面在预定方向上限定光学元件的位置（ 5），并且光学元件（B1）的至少一个反射表面的出射参考轴线（5）形成在光学元件上。

46. 发明授权

US06228666B1 Method of testing integrated circuit including a DRAM 失效
标题翻译：包括DRAM的集成电路测试方法
公开(公告)号：US06228666B1
公开(公告)日：2001-05-08
申请号：US09391000
申请日：1999-09-07
申请人： Kenji Kawano
发明人： Kenji Kawano
IPC分类号： H01L2166
CPC分类号： G11C29/835 , G11C29/44 , H01L23/544 , H01L24/05 , H01L24/06 , H01L2223/5444 , H01L2223/54473 , H01L2224/05554 , H01L2924/12042 , H01L2924/13091 , H01L2924/14 , H01L2924/00
摘要： A method of testing a semiconductor integrated circuit device including a defective chip recognition circuit unit so that in testing a DRAM unit, if the DRAM unit cannot be made to conform to a specification, even using a redundancy circuit, defective data can be written in the defective chip recognition circuit unit. The method includes deciding whether a DRAM unit conforms and deciding whether a DRAM unit judged imperfect can be conformed using a redundancy circuit; deciding whether the semiconductor integrated circuit device is defective when the DRAM unit has been judged defective and writing the defective decision data into a defective chip recognition circuit unit; reading the defective decision data in the defective chip recognition circuit unit and deciding whether to test the logic unit; testing the logic unit when the test of the logic unit is to be performed; and deciding whether the logic unit conforms.
摘要翻译：一种测试包括有缺陷的芯片识别电路单元的半导体集成电路装置的方法，使得在测试DRAM单元时，如果不能使DRAM单元符合规范，即使使用冗余电路，也可以将错误数据写入有缺陷的芯片识别电路单元。该方法包括：确定DRAM单元是否符合并决定是否可以使用冗余电路来确定判断不完整的DRAM单元; 当DRAM单元已被判定为有缺陷并将缺陷判定数据写入缺陷芯片识别电路单元时，判断半导体集成电路器件是否有缺陷; 读取有缺陷的芯片识别电路单元中的有缺陷的判定数据，并决定是否测试逻辑单元; 当要执行逻辑单元的测试时测试逻辑单元; 并决定逻辑单元是否符合要求。

47. 发明授权

US6160654A Ultra high-speed semiconductor optical modulator with traveling-wave electrode 有权
标题翻译：具有行波电极的超高速半导体光调制器
公开(公告)号：US6160654A
公开(公告)日：2000-12-12
申请号：US360759
申请日：1999-07-26
申请人： Kenji Kawano
发明人： Kenji Kawano
IPC分类号： G02F1/015 , G02F1/017
CPC分类号： B82Y20/00 , G02F1/01708 , G02F2001/0159 , G02F2201/127
摘要： A wideband semiconductor electro-absorption optical modulator including a semiconductor core shorter in absorption-peak wavelength than a wavelength of optical signal, and an electrode for applying an electric signal to absorb the optical signal by shifting the absorption-peak wavelength to a long wavelength region when a voltage is applied, wherein an electric signal input port and an electric signal output port are disposed so that the electrode is constructed in the form of a traveling-wave electrode, and a total thickness of non-doped layers including the semiconductor core is reduced to decrease a driving voltage. Degradation of optical modulation bandwidth and reflection characteristics of the electric signal caused by mismatching of characteristic impedance to an outer circuit are reduced by decreasing an interaction length of the electric signal and the optical signal. Further, mismatching of characteristic impedance is corrected by adjusting a doping concentration of a p-type or n-type doped layer located above or beneath the semiconductor core.
摘要翻译：一种宽带半导体电吸收光调制器，其包括具有比光信号的波长更短的吸收峰值波长的半导体芯片，以及用于通过将吸收峰值波长移位到长波长区域来施加电信号以吸收光信号的电极当施加电压时，其中设置电信号输入端口和电信号输出端口，使得电极构造为行波电极的形式，并且包括半导体芯的非掺杂层的总厚度为降低驱动电压。通过减小电信号和光信号的相互作用长度，降低由特性阻抗与外部电路失配引起的电信号的光调制带宽和反射特性的降低。此外，通过调整位于半导体芯上方或下方的p型或n型掺杂层的掺杂浓度来校正特性阻抗的失配。

48. 发明授权

US6159642A Exposure mask and method of manufacturing thereof, and pattern data generating method for an exposure mask 失效
标题翻译：曝光掩模及其制造方法以及曝光掩模的图案数据生成方法
公开(公告)号：US6159642A
公开(公告)日：2000-12-12
申请号：US813049
申请日：1997-03-07
申请人： Kenji Kawano , Shinichi Ito , Satoshi Tanaka , Soichi Inoue , Hideki Kanai , Ikuo Yoneda
发明人： Kenji Kawano , Shinichi Ito , Satoshi Tanaka , Soichi Inoue , Hideki Kanai , Ikuo Yoneda
IPC分类号： G03F1/30 , G03F1/68 , H01L21/027 , G03F9/00
CPC分类号： G03F1/26 , G03F1/30
摘要： An exposure mask includes a transparent substrate having a light shielding pattern and an aperture pattern thereon for transmitting an exposure light and arranged in that any two adjacent apertures of the same pattern size in the aperture pattern are different from each other in the etched depth, wherein a difference between the aperture pattern size and its adjacent light shielding pattern size, and the trench depth in the aperture pattern are determined by a sum of the aperture pattern size and its adjacent light shielding pattern size.
摘要翻译：曝光掩模包括具有遮光图案和其上的孔径图案的透明基板，用于透射曝光光，并且布置为在蚀刻深度中孔径图案中相同图案尺寸的任何两个相邻孔径彼此不同，其中孔径图案尺寸与其相邻的遮光图案尺寸之间的差异以及孔径图案中的沟槽深度由孔径图案尺寸和其相邻的遮光图案尺寸之和决定。

49. 发明授权

US5907393A Exposure mask and method and apparatus for manufacturing the same 失效
标题翻译：曝光掩模及其制造方法和装置
公开(公告)号：US5907393A
公开(公告)日：1999-05-25
申请号：US729592
申请日：1996-10-11
申请人： Kenji Kawano , Shinichi Ito , Iwao Higashikawa , Masamitsu Itoh , Takashi Kamo , Hiroaki Hazama , Takayuki Iwamatsu
发明人： Kenji Kawano , Shinichi Ito , Iwao Higashikawa , Masamitsu Itoh , Takashi Kamo , Hiroaki Hazama , Takayuki Iwamatsu
IPC分类号： G03F1/32 , G03F1/68 , G01N21/00
CPC分类号： G03F1/32 , G03F1/68
摘要： This invention provides an exposure mask including a translucent film formed on a light-transmitting substrate and having a mask pattern, and a stabilized region formed in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film to prevent variations in physical properties of the translucent film. In addition, this invention provides a method of manufacturing an exposure mask, including the steps of forming a translucent film on a light-transmitting substrate, forming a photosensitive resin film on the translucent film, forming a photosensitive resin pattern by exposing the photosensitive resin film to a radiation or a charged particle beam, removing an exposed portion of the translucent film by using the photosensitive resin pattern as a mask, removing the photosensitive resin pattern, and forming a stabilized region in the boundary between the light-transmitting substrate and the translucent film or on at least the surface of the translucent film before the step of forming the photosensitive resin film or after the step of forming the photosensitive resin pattern. Also, this invention provides an apparatus for manufacturing an exposure mask, including a light source for radiating light containing at least an exposure wavelength onto a translucent film formed on a light-transmitting substrate, a photodetecting unit for detecting light emitted from the light source and transmitted through or reflected by the translucent film, and a measuring unit for measuring the characteristic of the translucent film from the light detected by the photodetecting unit.
摘要翻译：本发明提供一种曝光掩模，其包括形成在透光基板上并具有掩模图案的半透明膜，以及形成在透光基板和半透膜之间的边界中的至少半透明的表面的稳定区域膜以防止半透明膜的物理性质的变化。此外，本发明提供一种制造曝光掩模的方法，包括以下步骤：在透光性基板上形成半透膜，在半透膜上形成感光性树脂膜，通过使感光性树脂膜曝光，形成感光性树脂图案通过使用感光性树脂图案作为掩模去除透光性膜的露出部分，除去感光性树脂图案，在透光性基板与透光性的界面之间形成稳定区域或在形成感光性树脂膜的步骤之前或在形成感光性树脂图案的步骤之后，至少在半透明膜的表面上。另外，本发明提供了一种用于制造曝光掩模的装置，包括用于将至少包含曝光波长的光发射到形成在透光基板上的半透明膜上的光源，用于检测从光源发射的光的光电检测单元和通过透光膜透射或反射，以及测量单元，用于根据由光检测单元检测到的光来测量半透膜的特性。

50. 发明授权

US5877806A Image sensing apparatus for obtaining high resolution computer video signals by performing pixel displacement using optical path deflection 失效
标题翻译：用于通过使用光路偏转执行像素位移来获得高分辨率计算机视频信号的图像感测装置
公开(公告)号：US5877806A
公开(公告)日：1999-03-02
申请号：US550028
申请日：1995-10-30
申请人： Kenji Kawano
发明人： Kenji Kawano
IPC分类号： G02B26/08 , H04N5/225 , H04N5/349
CPC分类号： G02B26/0875 , H04N3/1587 , H04N5/2254 , H04N5/2259
摘要： An image sensing apparatus which can increase the image information amount by performing a pixel displacement by rotating a deflector for changing the optical path of image light incident on an image sensing element about two orthogonal axes (axes A and B) using two cams. The two cams are arranged on one side with respect to the axis B, and are driven by a single motor. Cam surfaces for canceling an interference are formed in advance on the two cams.
摘要翻译：一种图像感测装置，其可以通过使用两个凸轮旋转用于改变入射在图像感测元件上的图像光的光路的两个正交轴（轴线A和B）来执行像素位移来增加图像信息量。两个凸轮相对于轴线B布置在一侧，并由单个电机驱动。用于抵消干涉的凸轮表面预先形成在两个凸轮上。

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