专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

41. 发明申请

US20090239561A1 Mobile Communication System 有权
标题翻译：移动通信系统
公开(公告)号：US20090239561A1
公开(公告)日：2009-09-24
申请号：US12260174
申请日：2008-10-29
申请人： Daisuke Nitta , Tetsuo Tomita , Tomonori Kumagai , Satoshi Watanabe , Kazunari Kobayashi
发明人： Daisuke Nitta , Tetsuo Tomita , Tomonori Kumagai , Satoshi Watanabe , Kazunari Kobayashi
IPC分类号： H04B7/00
CPC分类号： H04W88/12 , H04W8/06 , H04W88/08
摘要： A base station accommodation method and mobile communication system which allows the installation of many micro-miniature BTS devices are provided. The mobile communication system includes a plurality of base stations which accommodate a plurality of mobile terminals respectively; a plurality of first base station control devices, each of which accommodates a predetermined number of base stations out of the plurality of base stations; and a second base station control device which accommodates the plurality of first base station control devices, wherein each of the plurality of first base station control devices comprises, for supporting information identifying a mobile terminal, a mobile terminal data base to store identification information which identifies a base station to which the mobile terminal is subordinate, and a station data base to store an address of the base station.
摘要翻译：提供了允许安装许多微型BTS设备的基站调制方法和移动通信系统。移动通信系统包括分别容纳多个移动终端的多个基站; 多个第一基站控制装置，其各自容纳多个基站中的预定数量的基站; 以及第二基站控制装置，其容纳所述多个第一基站控制装置，其中，所述多个第一基站控制装置中的每一个包括用于支持识别移动终端的信息，移动终端数据库，以存储标识的标识信息移动终端所属的基站，以及用于存储基站的地址的站数据库。

42. 发明申请

US20090217908A1 IGNITION TIMING CONTROLLING APPARATUS AND IGNITION TIMING CONTROLLING METHOD FOR INTERNAL COMBUSTION ENGINE 有权
标题翻译：点火时间控制装置和点火时间控制方法内燃机
公开(公告)号：US20090217908A1
公开(公告)日：2009-09-03
申请号：US12395877
申请日：2009-03-02
申请人： Satoshi Watanabe , Hiroto Tanaka , Rihito Kaneko , Norihito Hanai , Kenji Senda , Satoshi Masuda
发明人： Satoshi Watanabe , Hiroto Tanaka , Rihito Kaneko , Norihito Hanai , Kenji Senda , Satoshi Masuda
IPC分类号： F02P5/152 , F01L1/34 , F02D43/00
CPC分类号： F02P5/1525 , F01L1/34 , F01L13/00 , F02P5/152 , G01L23/225 , Y02T10/46
摘要： An engine ECU executes a program including the steps of: calculating a knock magnitude N by dividing an integrated value lpkknk obtained by integrating the magnitude of vibration in the knock detection gate by BGL; controlling ignition timing according to a result of comparison between knock magnitude N and a determination value VJ; stopping updating of a standard deviation σ when it is determined that determination value VJ to be compared with knock magnitude N is to be changed; updating a median value VM by increasing an update amount of median value VM; and updating BGL according to median value VM and standard deviation σ.
摘要翻译：发动机ECU执行程序，包括以下步骤：通过将通过将爆震检测门中的振动的积分积分得到的积分值lpkknk除以BGL来计算爆震大小N; 根据敲击量N与判定值VJ的比较结果控制点火正时; 当确定要与敲击量N进行比较的确定值VJ被改变时，停止标准偏差σ的更新; 通过增加中值VM的更新量来更新中值VM; 并根据中值VM和标准偏差σ更新BGL。

43. 发明申请

US20090175010A1 Method of repair of electronic device and repair system 失效
标题翻译：电子设备和维修系统的修理方法
公开(公告)号：US20090175010A1
公开(公告)日：2009-07-09
申请号：US12285632
申请日：2008-10-09
申请人： Shigeo Iriguchi , Kiyoyuki Hatanaka , Satoshi Watanabe , Nobuo Taketomi , Keiichi Yamamoto , Masaru Sugie
发明人： Shigeo Iriguchi , Kiyoyuki Hatanaka , Satoshi Watanabe , Nobuo Taketomi , Keiichi Yamamoto , Masaru Sugie
IPC分类号： H05K1/18 , H05K3/30
CPC分类号： H05K3/3494 , H05K1/0212 , H05K3/225 , H05K2203/101 , H05K2203/176 , Y10T29/49137
摘要： A repair system which prevents heating of weakly heat resistant devices together and causing deterioration of the quality when preheating a first surface of the circuit board, wherein an electromagnetic induction material is buried in advance inside the circuit board near a specific electronic device envisioned as needed repair when becoming a defective electronic device in a production process and an electromagnetic coil emitting electromagnetic waves to an electromagnetic induction member in the vicinity of the repair device is provided and the heat generated by the electromagnetic induction member due to the electromagnetic waves enables the repair device to be heated and detached from the circuit board.
摘要翻译：一种在预热电路板的第一表面时防止弱耐热装置加热并导致质量劣化的修复系统，其中电磁感应材料预先埋在电路板内面靠近需要修理的特定电子装置附近当在生产过程中成为有缺陷的电子装置时，并且提供了向维修装置附近的电磁感应构件发射电磁波的电磁线圈，并且由于电磁波而由电磁感应构件产生的热能够使修理装置从电路板加热和分离。

44. 发明授权

US07534554B2 Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition 有权
标题翻译：具有这种化学放大抗蚀剂组合物的半导体集成电路器件的化学放大抗蚀剂组合物和制造方法
公开(公告)号：US07534554B2
公开(公告)日：2009-05-19
申请号：US12128039
申请日：2008-05-28
申请人： Seiji Nagahara , Satoshi Watanabe , Kazunori Maeda
发明人： Seiji Nagahara , Satoshi Watanabe , Kazunori Maeda
IPC分类号： G03F7/20 , G03F7/30
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the via hole (as well as in its vicinity) may remain even after the exposure and the development are carried out. The present invention relates to a chemically amplified resist composition comprising, at least, a photo acid generator, a quencher and a salt having a buffering function for an acid which is generated from the acid generator by irradiation, wherein the salt having the buffering function for the acid generated from the acid generator is a salt derived from a long chain alkylbenzenesulfonic acid or a long chain alkoxybenzenesulfonic acid and an organic amine that is a basic compound.
摘要翻译：在使用常规的化学放大型正性光致抗蚀剂组合物形成互连的镶嵌工艺的情况下，存在即使在曝光和显影进行之后，通孔（以及其附近）内的光致抗蚀剂也可能保留的问题。本发明涉及一种化学放大抗蚀剂组合物，其至少包含光酸产生剂，猝灭剂和具有由酸产生剂通过照射产生的酸的缓冲功能的盐，其中具有缓冲功能的盐由酸产生剂产生的酸是衍生自长链烷基苯磺酸或长链烷氧基苯磺酸的盐和作为碱性化合物的有机胺。

45. 发明授权

US07533125B2 Managing a data file with an access code 有权
标题翻译：使用访问代码管理数据文件
公开(公告)号：US07533125B2
公开(公告)日：2009-05-12
申请号：US10254516
申请日：2002-09-26
申请人： Hiroshi Satomi , Satoshi Igeta , Atsushi Inoue , Satoshi Watanabe , Kenichiro Matsuura
发明人： Hiroshi Satomi , Satoshi Igeta , Atsushi Inoue , Satoshi Watanabe , Kenichiro Matsuura
IPC分类号： G06F7/00 , G06F17/00
CPC分类号： H04L63/0807 , G06F21/62 , G06F2221/2117 , H04L67/06 , H04L69/329 , Y10S707/99945 , Y10S707/99948
摘要： A server apparatus which retains a data file transferred from a predetermined user through a network and provides an access service for the data file through the network is disclosed, in which unauthorized access to the data file can be prevented with a low processing load. When the third party is permitted to access the data file, the server apparatus according to this invention encrypts and generates an access code required for access on the basis of information managed in the server apparatus to specify the data file.
摘要翻译：公开了一种通过网络保留从预定用户传送的数据文件并通过网络提供数据文件的访问服务的服务器设备，其中可以以低处理负载来防止对数据文件的未经授权的访问。当允许第三方访问数据文件时，根据本发明的服务器装置根据在服务器装置中管理的信息来加密和生成访问所需的访问代码，以指定数据文件。

46. 发明授权

US07501223B2 Polymer, resist composition and patterning process using the same 有权
标题翻译：聚合物，抗蚀剂组合物和使用其的图案化工艺
公开(公告)号：US07501223B2
公开(公告)日：2009-03-10
申请号：US11902760
申请日：2007-09-25
申请人： Takanobu Takeda , Osamu Watanabe , Satoshi Watanabe , Ryuji Koitabashi , Keiichi Masunaga , Tamotsu Watanabe
发明人： Takanobu Takeda , Osamu Watanabe , Satoshi Watanabe , Ryuji Koitabashi , Keiichi Masunaga , Tamotsu Watanabe
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0397 , Y10S430/106
摘要： There is disclosed a polymer at least comprising repeating units represented by the following general formulae (1) and (2), and the polymer having a mass average molecular weight of 1,000 to 500,000. There can be provided a polymer, and a resist composition, in particular, a chemically amplified positive resist composition that exhibit higher resolution than conventional positive resist compositions, good in-plane dimension uniformity of developed resist patterns on substrates such as mask blanks and high etching resistance.
摘要翻译：公开了至少包含由以下通式（1）和（2）表示的重复单元，聚合物的质均分子量为1,000至500,000的聚合物。可以提供聚合物和抗蚀剂组合物，特别是具有比常规正性抗蚀剂组合物更高分辨率的化学放大正性抗蚀剂组合物，在诸如掩模毛坯和高蚀刻的基底上显影的抗蚀剂图案的良好的面内尺寸均匀性抵抗性。

47. 发明申请

US20080213788A1 GENE CODING FOR SCYTALONE DEHYDRATASE EXHIBITING RESISTANCE TO AGRICULTURAL FUNGICIDAL AGENT 失效
标题翻译： SCYTALONE脱氢酶基因编码对农业防腐剂的抗性
公开(公告)号：US20080213788A1
公开(公告)日：2008-09-04
申请号：US12099631
申请日：2008-04-08
申请人： Koichiro Kaku , Satoshi Watanabe , Kiyoshi Kawai , Tsutomu Shimizu , Kozo Nagayama
发明人： Koichiro Kaku , Satoshi Watanabe , Kiyoshi Kawai , Tsutomu Shimizu , Kozo Nagayama
IPC分类号： C12Q1/68
CPC分类号： C12N9/88 , C12Q1/32 , G01N2500/00
摘要： The present invention provides a gene that can be used extensively in studies relating to resistant rice blast fungi.The gene codes for either one of the following proteins (a) or (b): (a) a protein consisting of the amino acid sequence shown in SEQ ID NO:2; or (b) a protein consisting of an amino acid sequence shown in SEQ ID NO:2 by deletion substitution or addition of one or more amino acids, which exhibits scytalone dehydratase activity in the presence of a scytalone dehydratase inhibitor.
摘要翻译：本发明提供了可广泛用于有关抗稻瘟病真菌的研究中的基因。该基因编码以下蛋白质（a）或（b）中的任一种：（a）由SEQ ID NO：2所示的氨基酸序列组成的蛋白质; 或（b）通过缺失取代或添加一种或多种氨基酸组成的由SEQ ID NO：2所示的氨基酸序列组成的蛋白质，其在沙司酮脱水酶抑制剂的存在下显示出香叶醇脱水酶活性。

48. 发明授权

US07262436B2 III-nitride semiconductor light emitting device having a silver p-contact 有权
标题翻译：具有银p接触的III族氮化物半导体发光器件
公开(公告)号：US07262436B2
公开(公告)日：2007-08-28
申请号：US11104310
申请日：2005-04-11
申请人： You Kondoh , Satoshi Watanabe , Yawara Kaneko , Shigeru Nakagawa , Norihide Yamada
发明人： You Kondoh , Satoshi Watanabe , Yawara Kaneko , Shigeru Nakagawa , Norihide Yamada
IPC分类号： H01L29/22
CPC分类号： H01L33/42 , H01L33/40 , H01L2224/4847
摘要： A light emitting device includes an n-type semiconductor layer, an active layer for generating light, the active layer being in electrical contact with the n-type semiconductor layer. A p-type semiconductor layer is in electrical contact with the active layer, and a p-electrode is in electrical contact with the p-type semiconductor layer. The p-electrode includes a layer of silver. In a preferred embodiment of the present invention, the n-type semiconductor layer and the p-type semiconductor layer are constructed from group III nitride semiconducting materials. In one embodiment of the invention, the silver layer is sufficiently thin to be transparent. In other embodiments, the silver layer is thick enough to reflect most of the light incident thereon. A fixation layer may be provided. The fixation layer may be a dielectric or a conductor.
摘要翻译：发光器件包括n型半导体层，用于产生光的有源层，所述有源层与n型半导体层电接触。 p型半导体层与有源层电接触，p电极与p型半导体层电接触。 p电极包括一层银。在本发明的优选实施例中，n型半导体层和p型半导体层由III族氮化物半导体材料构成。在本发明的一个实施方案中，银层足够薄以使其透明。在其它实施例中，银层足够厚以反射入射到其上的大部分光。可以提供固定层。固定层可以是电介质或导体。

49. 发明申请

US20070111139A1 NEGATIVE RESIST COMPOSITION AND PATTERNING PROCESS 审中-公开
标题翻译：负极组合物和图案过程
公开(公告)号：US20070111139A1
公开(公告)日：2007-05-17
申请号：US11560137
申请日：2006-11-15
申请人： Takanobu TAKEDA , Osamu Watanabe , Satoshi Watanabe , Ryuji Koitabashi , Tamotsu Watanabe
发明人： Takanobu TAKEDA , Osamu Watanabe , Satoshi Watanabe , Ryuji Koitabashi , Tamotsu Watanabe
IPC分类号： G03C1/00
CPC分类号： G03F7/0382
摘要： A negative resist composition is provided comprising a polymer comprising recurring units having formula (1), an organic solvent, a crosslinker, and an optional photoacid generator. In formula (1), R1 and R2 are hydrogen or methyl, m is 0 or a positive integer of 1 to 5, p and q are positive numbers. The composition has a high contrast of alkali dissolution rate before and after exposure, high resolution and good etching resistance.
摘要翻译：提供了包含含有式（1）的重复单元，有机溶剂，交联剂和任选的光酸产生剂的聚合物的负性抗蚀剂组合物。在式（1）中，R 1和R 2均为氢或甲基，m为0或1至5的正整数，p和q为正数。该组合物在曝光前后具有高的对比度的碱溶解速率，高分辨率和良好的抗蚀刻性。

50. 发明授权

US07211367B2 Photo acid generator, chemical amplification resist material 有权
标题翻译：照片酸发生器，化学放大抗蚀材料
公开(公告)号：US07211367B2
公开(公告)日：2007-05-01
申请号：US11373925
申请日：2006-03-13
申请人： Tomohiro Kobayashi , Satoshi Watanabe , Tsunehiro Nishi , Youichi Ohsawa , Katsuhiro Kobayashi
发明人： Tomohiro Kobayashi , Satoshi Watanabe , Tsunehiro Nishi , Youichi Ohsawa , Katsuhiro Kobayashi
IPC分类号： G03F7/031
CPC分类号： G03F7/0045 , C07D327/06 , G03F7/0395 , G03F7/0397 , G03F7/0758
摘要： A high resolution resist material comprising an acid generator is provided so that high sensitivity and high resolution for high energy rays of 300 nm or less, small line-edge roughness, and excellence in heat stability and storage stability are obtained. Moreover, a pattern formation method using this resist material are provided. Specifically, a novel compound of the following general formula (1); and a positive resist material comprising this compound preferably as a photo acid generator, and a base resin; are provided. This positive resist material may contain a basic compound or a dissolution inhibitor. Further, the present invention provides a pattern formation method comprising the steps of applying this positive resist material on a substrate, then heat-treating the material, exposing the treated material to a high energy ray having a wavelength of 300 nm or less via a photo mask, optionally heat-treating the exposed material, and developing the material using a developer
摘要翻译：提供了包含酸产生器的高分辨率抗蚀剂材料，从而获得了300nm以下的高能量射线的高灵敏度和高分辨率，小的线边缘粗糙度，以及热稳定性和储存稳定性方面的优异性。此外，提供了使用该抗蚀剂材料的图案形成方法。具体地，下述通式（1）的新化合物; 以及优选含有该化合物作为光酸发生剂的正性抗蚀剂材料和基础树脂; 被提供。该正性抗蚀剂材料可含有碱性化合物或溶解抑制剂。此外，本发明提供了一种图案形成方法，包括以下步骤：将该正性抗蚀剂材料涂布在基板上，然后对该材料进行热处理，通过照片将经处理的材料暴露于波长为300nm以下的高能量射线掩模，任选地热处理暴露的材料，以及使用显影剂显影材料

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式