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1. 发明授权

US08101335B2 Resist composition and patterning process 有权
标题翻译：抗蚀剂组成和图案化工艺
公开(公告)号：US08101335B2
公开(公告)日：2012-01-24
申请号：US12463751
申请日：2009-05-11
申请人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
发明人： Yuji Harada , Jun Hatakeyama , Kazunori Maeda , Koji Hasegawa , Satoshi Shinachi
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0395 , G03F7/0046 , G03F7/0397 , G03F7/11 , G03F7/2041 , Y10S430/106 , Y10S430/111
摘要： A copolymer of an alkali-soluble (α-trifluoromethyl)-acrylate and a norbornene derivative is useful as an additive to a resist composition. When processed by immersion lithography, the resist composition exhibits excellent water repellency and water slip and forms a pattern with few development defects.
摘要翻译：碱溶性（α-三氟甲基）丙烯酸酯和降冰片烯衍生物的共聚物可用作抗蚀剂组合物的添加剂。当通过浸渍光刻处理时，抗蚀剂组合物表现出优异的防水性和水滑动性并且形成几乎没有显影缺陷的图案。

2. 发明申请

US20100136482A1 RESIST COMPOSITION AND PATTERNING PROCESS 有权
标题翻译：耐腐蚀组合物和方法
公开(公告)号：US20100136482A1
公开(公告)日：2010-06-03
申请号：US12628794
申请日：2009-12-01
申请人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa , Kazunori Maeda , Tomohiro Kobayashi
发明人： Yuji Harada , Jun Hatakeyama , Koji Hasegawa , Kazunori Maeda , Tomohiro Kobayashi
IPC分类号： G03F7/20 , G03F7/004
CPC分类号： G03F7/0046 , G03F7/0045 , G03F7/0392 , G03F7/0395 , G03F7/0397 , G03F7/2041
摘要： A resist composition is provided comprising (A) an additive polymer of acyl-protected hexafluoroalcohol structure, (B) a base polymer having a structure derived from lactone ring, hydroxyl group and/or maleic anhydride, the base polymer becoming soluble in alkaline developer under the action of acid, (C) a photoacid generator, and (D) an organic solvent. The additive polymer is transparent to radiation of wavelength up to 200 nm, and its properties can be tailored by a choice of the polymer structure.
摘要翻译：提供了抗蚀剂组合物，其包含（A）酰基保护的六氟醇结构的添加剂聚合物，（B）具有衍生自内酯环，羟基和/或马来酸酐的结构的基础聚合物，所述基础聚合物在碱性显影剂中变得可溶酸的作用，（C）光致酸发生剂，和（D）有机溶剂。添加剂聚合物对波长高达200nm的辐射是透明的，并且其性质可以通过选择聚合物结构来定制。

3. 发明授权

US07701265B2 Power-on reset circuit using flip-flop and semiconductor device having such power-on reset circuit 失效
标题翻译：使用具有这种上电复位电路的触发器和半导体器件的上电复位电路
公开(公告)号：US07701265B2
公开(公告)日：2010-04-20
申请号：US11783293
申请日：2007-04-06
申请人： Kazunori Maeda
发明人： Kazunori Maeda
IPC分类号： H03L7/00
CPC分类号： H03K17/22
摘要： A power-on reset circuit has a dummy flip-flop in addition to a setting flip-flop. Even if resetting is not performed by a power-on reset signal at power-on, output from the dummy flip-flop is used to perform resetting and initialization.
摘要翻译：除了设置触发器之外，上电复位电路还具有虚拟触发器。即使在上电复位信号时不进行复位，也可以使用虚拟触发器的输出进行复位和初始化。

4. 发明申请

US20090208873A1 POLYMER, RESIST COMPOSITION, AND PATTERNING PROCESS 有权
标题翻译：聚合物，耐腐蚀组合物和方法
公开(公告)号：US20090208873A1
公开(公告)日：2009-08-20
申请号：US12371455
申请日：2009-02-13
申请人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
发明人： Yuji HARADA , Jun Hatakeyama , Kazunori Maeda , Tomohiro Kobayashi
IPC分类号： G03F7/20 , C08F118/02 , G03F7/039
CPC分类号： G03F7/0046 , C08F220/18 , C08F220/24 , C08F220/28 , G03F7/0392 , G03F7/0397
摘要： A polymer obtained through copolymerization of a monomer having a hexafluoroalcohol pendant whose hydroxyl moiety has been protected and a monomer having an acid labile group is useful as an additive to a photoresist composition for immersion lithography. When processed by immersion lithography, the resist composition exhibits good water repellency and water slip and produces few development defects.
摘要翻译：通过使具有羟基部分被保护的六氟醇侧基的单体和具有酸不稳定基团的单体的共聚合得到的聚合物可用作浸渍光刻用光致抗蚀剂组合物的添加剂。当通过浸渍光刻处理时，抗蚀剂组合物表现出良好的拒水性和水滑动，并且产生很少的显影缺陷。

5. 发明授权

US07498126B2 Photoacid generators, chemically amplified resist compositions, and patterning process 有权
标题翻译：光酸发生剂，化学放大抗蚀剂组合物和图案化工艺
公开(公告)号：US07498126B2
公开(公告)日：2009-03-03
申请号：US11806970
申请日：2007-06-05
申请人： Youichi Ohsawa , Kazunori Maeda , Satoshi Watanabe
发明人： Youichi Ohsawa , Kazunori Maeda , Satoshi Watanabe
IPC分类号： G03C1/73 , G03F7/031 , G03F7/039 , G03F7/20 , G03F7/30
CPC分类号： G03F7/0045 , C07D333/36 , G03F7/0382 , G03F7/0392 , G03F7/0397 , Y10S430/106 , Y10S430/12 , Y10S430/122 , Y10S430/123
摘要： A photoacid generator has formula (1). A chemically amplified resist composition comprising the photoacid generator has advantages including a high resolution, focus latitude, long-term PED dimensional stability, and a satisfactory pattern profile shape. When the photoacid generator is combined with a resin having acid labile groups other than those of the acetal type, resolution and top loss are improved. The composition is suited for deep UV lithography.
摘要翻译：光致酸发生器具有式（1）。包含光致酸发生器的化学放大抗蚀剂组合物具有包括高分辨率，聚焦纬度，长期PED尺寸稳定性和令人满意的图案轮廓形状的优点。当光酸产生剂与具有不同于缩醛类型的酸不稳定基团的树脂组合时，分辨率和顶部损失得到改善。该组合物适用于深紫外光刻。

6. 发明授权

US07396633B2 Chemically amplified resist composition and manufacturing method of semiconductor integrated circuit device with such chemically amplified resist composition 有权
标题翻译：具有这种化学放大抗蚀剂组合物的半导体集成电路器件的化学放大抗蚀剂组合物和制造方法
公开(公告)号：US07396633B2
公开(公告)日：2008-07-08
申请号：US10873475
申请日：2004-06-23
申请人： Seiji Nagahara , Satoshi Watanabe , Kazunori Maeda
发明人： Seiji Nagahara , Satoshi Watanabe , Kazunori Maeda
IPC分类号： G03C1/73 , G03F7/039 , G03F7/038
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/115 , Y10S430/12 , Y10S430/122
摘要： With the damascene process in which an interconnection is formed using a conventional chemically amplified positive photoresist composition, there arises a problem that the photoresist within the via hole (as well as in its vicinity) may remain even after the exposure and the development are carried out. The present invention relates to a chemically amplified resist composition comprising, at least, a photo acid generator, a quencher and a salt having a buffering function for an acid which is generated from the acid generator by irradiation, wherein the salt having the buffering function for the acid generated from the acid generator is a salt derived from a long chain alkylbenzenesulfonic acid or a long chain alkoxybenzenesulfonic acid and an organic amine that is a basic compound.
摘要翻译：在使用常规的化学放大型正性光致抗蚀剂组合物形成互连的镶嵌工艺的情况下，存在即使在曝光和显影进行之后，通孔（以及其附近）内的光致抗蚀剂也可能保留的问题。本发明涉及一种化学放大抗蚀剂组合物，其至少包含光酸产生剂，猝灭剂和具有由酸产生剂通过照射产生的酸的缓冲功能的盐，其中具有缓冲功能的盐由酸产生剂产生的酸是衍生自长链烷基苯磺酸或长链烷氧基苯磺酸的盐和作为碱性化合物的有机胺。

7. 发明授权

US07335458B2 Chemically amplified positive resist composition and patterning process 有权
标题翻译：化学扩增正性抗蚀剂组成和图案化工艺
公开(公告)号：US07335458B2
公开(公告)日：2008-02-26
申请号：US11354204
申请日：2006-02-15
申请人： Youichi Ohsawa , Kazunori Maeda , Satoshi Watanabe
发明人： Youichi Ohsawa , Kazunori Maeda , Satoshi Watanabe
IPC分类号： G03F7/004 , G03F7/30
CPC分类号： G03F7/0392 , G03F7/0045 , G03F7/0397 , Y10S430/106 , Y10S430/111
摘要： A chemically amplified positive resist composition is provided comprising (A) a resin containing acid labile groups other than acetal type which changes its solubility in an alkaline developer as a result of the acid labile groups being eliminated under the action of acid and (B) specific sulfonium salts as a photoacid generator.The composition is improved in resolution and focus latitude, minimized in line width variation and profile degradation even on prolonged PED, improved in pattern profile after development, minimized in pattern feature size variation within the wafer plane by uneven development and thus best suited in the deep-UV lithography.
摘要翻译：提供一种化学放大正性抗蚀剂组合物，其包含（A）除了缩醛型以外的酸不稳定基团的树脂，其在酸性作用下由于酸不稳定基团被消除而改变其在碱性显影剂中的溶解度，（B）具体锍盐作为光致酸发生剂。组合物在分辨率和对焦纬度方面得到改善，即使在长时间的PED下也减少了线宽变化和轮廓退化，改善了显影后的图案轮廓，通过不平坦的发展使晶片平面内的图案特征尺寸变化最小化，因此最适合于深度 -UV光刻。

8. 发明申请

US20070166517A1 Product information display body and product authentication method 审中-公开
标题翻译：产品信息显示体和产品认证方法
公开(公告)号：US20070166517A1
公开(公告)日：2007-07-19
申请号：US10525827
申请日：2003-08-27
申请人： Shinya Fukui , Morimasa Sato , Masahiro Tsubone , Kazunori Maeda
发明人： Shinya Fukui , Morimasa Sato , Masahiro Tsubone , Kazunori Maeda
IPC分类号： B41M5/00
CPC分类号： G06K7/12 , G01N33/442 , G06K19/14 , G06K2019/06225 , G09F3/0294 , Y10T428/24802
摘要： There is provided an economical product information display body A capable of increasing credibility of the product information and sufficiently assuring product reliability and safety at a low cost. The display body A is attached to a product and has a visible information display C relating to the product and invisible information identification means D. The invisible information identification means D is composed of an information presenting substance consisting of one or more elements emitting fluorescence when radiated by an electromagnetic wave of a particular wavelength range or a compound consisting of two or more elements or a substance including these elements or a compound. One or more information of the product information display by the visible information display is correlated to the information presenting substance.
摘要翻译：提供了一种经济的产品信息显示体A，其能够增加产品信息的可信度并以低成本充分确保产品的可靠性和安全性。显示体A附着在产品上，具有与产品和不可见信息识别单元D有关的可视信息显示C.无形信息识别单元D包括由辐射时发出荧光的一个或多个元件组成的信息呈现物质通过特定波长范围的电磁波或由两种或多种元素组成的化合物或包括这些元素的物质或化合物。通过可见信息显示显示的产品信息的一个或多个信息与信息呈现物质相关。

9. 发明申请

US20060053844A1 Drum type washing machine 失效
标题翻译：鼓式洗衣机
公开(公告)号：US20060053844A1
公开(公告)日：2006-03-16
申请号：US11107879
申请日：2005-04-18
申请人： Staoshi Maeda , Hiroshi Kajihara , Kazunori Maeda , Tadashi Inuzuka
发明人： Staoshi Maeda , Hiroshi Kajihara , Kazunori Maeda , Tadashi Inuzuka
IPC分类号： D06F35/00
CPC分类号： D06F39/12 , D06F23/06 , D06F37/26
摘要： A drum type washing machine includes a housing, a rotary drum, a water tub accommodating the rotary drum therein, a door for opening and closing a housing opening for allowing laundry to be loaded into or unloaded from the rotary drum therethrough, a water tub opening communicating with the housing opening, a rotary drum opening communicating with the housing opening and the water tub opening; and an elastic connection member for connecting the housing opening and water tub opening, and having a portion that makes a pressurized contact with the door when the door is closed. A center of the housing opening is displaced upward with respect to a center of the rotary drum opening, and an angle of inclination of the housing opening with respect to a vertical plane is set to be greater than that of the rotary drum opening with respect to the vertical plane.
摘要翻译：滚筒式洗衣机包括壳体，旋转滚筒，容纳旋转滚筒的水桶，用于打开和关闭用于允许衣物装载到旋转滚筒或从其中卸载的外壳开口的门，水桶开口与所述壳体开口连通，与所述壳体开口和所述水桶开口连通的旋转鼓开口; 以及用于连接壳体开口和水桶开口的弹性连接构件，并且具有当门关闭时与门加压接触的部分。壳体开口的中心相对于旋转鼓开口的中心向上移位，并且壳体开口相对于垂直平面的倾斜角度被设定为大于旋转鼓开口相对于垂直平面的倾斜角垂直平面。

10. 发明申请

US20050173424A1 Microwave oven 失效
标题翻译：微波炉
公开(公告)号：US20050173424A1
公开(公告)日：2005-08-11
申请号：US11038150
申请日：2005-01-21
申请人： Kazunori Maeda
发明人： Kazunori Maeda
IPC分类号： F24C7/02 , A23L5/10 , F24C15/00 , H01H13/02 , H01H13/712 , H05B6/68 , H05B6/50
CPC分类号： H05B6/6435
摘要： A microwave oven includes a heating chamber for heating and cooking foods, a heating unit for supplying heat energy to the heating chamber; a controller for controlling an operation of the heating unit, and an input unit for inputting cooking information into the controller. The input unit includes as one unit a display unit for displaying the cooking information to be inputted and an electrode unit having one or more switches directly formed on the display unit.
摘要翻译：微波炉包括用于加热和烹饪食物的加热室，用于向加热室供应热能的加热单元; 用于控制加热单元的操作的控制器，以及用于将烹饪信息输入到控制器中的输入单元。输入单元包括用于显示要输入的烹饪信息的显示单元和具有直接形成在显示单元上的一个或多个开关的电极单元。

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