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41. 发明授权

US09111715B2 Charged particle energy filter 有权
标题翻译：带电粒子能量过滤器
公开(公告)号：US09111715B2
公开(公告)日：2015-08-18
申请号：US13601818
申请日：2012-08-31
申请人： N. William Parker , Wesley Hughes
发明人： N. William Parker , Wesley Hughes
IPC分类号： H01J37/05 , H01J37/305
CPC分类号： H01J37/05 , H01J37/3056 , H01J2237/043 , H01J2237/057 , H01J2237/1534
摘要： A multi-element electrostatic chicane energy filter, with the addition of electrostatic quadrupole and hexapole excitations to the dipole elements. A charged particle energy filter according to the present invention with a combination of dipole, quadrupole, and hexapole elements capable of producing a line focus at an aperture reduces space-charge effects and aperture damage. A preferred embodiment allows the filter to act as a conjugate blanking system. The energy filter is capable of narrowing the energy spread to result in a smaller beam.
摘要翻译：多元素静电智能能量滤波器，向偶极子元件添加静电四极和六极激发。根据本发明的具有能够在孔处产生线焦点的偶极子，四极和六极元件的组合的带电粒子能量过滤器减少了空间电荷效应和孔径损伤。优选的实施方案允许过滤器充当共轭体消隐系统。能量过滤器能够使能量扩展变窄，导致较小的光束。

42. 发明授权

US08710453B2 Charged particle source with multiple selectable particle emitters 有权
标题翻译：具有多个可选粒子发射器的带电粒子源
公开(公告)号：US08710453B2
公开(公告)日：2014-04-29
申请号：US13341487
申请日：2011-12-30
申请人： N. William Parker
发明人： N. William Parker
IPC分类号： H01J31/48
CPC分类号： H01J37/26 , H01J37/06 , H01J37/08 , H01J37/1471 , H01J37/28 , H01J2237/0635 , H01J2237/0802 , H01J2237/083 , H01J2237/1501 , H01J2237/1502 , H01J2237/31749
摘要： A charged particle source for a focused particle beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), scanning electron microscope (SEM), or focused ion beam (FIB) system is disclosed. The source employs a multiplicity of independently-addressable emitters within a small region which can be centered on the axis of the charged particle system. All of the emitters may be individually controlled to enable emission from one or more tips simultaneously. A mode with only one emitter activated corresponds to high brightness, while modes with multiple emitters simultaneously activated provides high angular intensities with lower brightness. Source lifetimes can be extended through sequential use of single emitters. A combined mechanical and electrical alignment procedure for all emitters is described.
摘要翻译：公开了透射电子显微镜（TEM），扫描透射电子显微镜（STEM），扫描电子显微镜（SEM）或聚焦离子束（FIB）系统等聚焦粒子束系统的带电粒子源。该源在可以在带电粒子系统的轴线上居中的小区域内采用多个可独立寻址的发射器。所有的发射器可以被单独控制以使得能够同时从一个或多个尖端发射。只有一个发射器激活的模式对应于高亮度，而同时激活多个发射器的模式提供了较高亮度的较高角度强度。可以通过连续使用单个发射器来扩展源寿命。描述了用于所有发射器的组合的机械和电气校准程序。

43. 发明申请

US20120168638A1 Charged Particle Source with Multiple Selectable Particle Emitters 有权
标题翻译：带多个可选粒子发射器的带电粒子源
公开(公告)号：US20120168638A1
公开(公告)日：2012-07-05
申请号：US13341487
申请日：2011-12-30
申请人： N. William Parker
发明人： N. William Parker
IPC分类号： H01J3/14
CPC分类号： H01J37/26 , H01J37/06 , H01J37/08 , H01J37/1471 , H01J37/28 , H01J2237/0635 , H01J2237/0802 , H01J2237/083 , H01J2237/1501 , H01J2237/1502 , H01J2237/31749
摘要： A charged particle source for a focused particle beam system such as a transmission electron microscope (TEM), scanning transmission electron microscope (STEM), scanning electron microscope (SEM), or focused ion beam (FIB) system is disclosed. The source employs a multiplicity of independently-addressable emitters within a small region which can be centered on the axis of the charged particle system. All of the emitters may be individually controlled to enable emission from one or more tips simultaneously. A mode with only one emitter activated corresponds to high brightness, while modes with multiple emitters simultaneously activated provides high angular intensities with lower brightness. Source lifetimes can be extended through sequential use of single emitters. A combined mechanical and electrical alignment procedure for all emitters is described.
摘要翻译：公开了透射电子显微镜（TEM），扫描透射电子显微镜（STEM），扫描电子显微镜（SEM）或聚焦离子束（FIB）系统等聚焦粒子束系统的带电粒子源。该源在可以在带电粒子系统的轴线上居中的小区域内采用多个可独立寻址的发射器。所有的发射器可以被单独控制以使得能够同时从一个或多个尖端发射。只有一个发射器激活的模式对应于高亮度，而同时激活多个发射器的模式提供了较高亮度的较高角度强度。可以通过连续使用单个发射器来扩展源寿命。描述了用于所有发射器的组合的机械和电气校准程序。

44. 发明授权

US07928404B2 Variable-ratio double-deflection beam blanker 有权
标题翻译：可变比双偏转光束消隐器
公开(公告)号：US07928404B2
公开(公告)日：2011-04-19
申请号：US12120174
申请日：2008-05-13
申请人： N. William Parker
发明人： N. William Parker
IPC分类号： H01J37/28
CPC分类号： H01J37/045 , B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J2237/045 , H01J2237/0492 , H01J2237/151 , H01J2237/244
摘要： The invention provides methods for conjugate blanking of a charged particle beam within a charged particle column using a beam blanker. The beam blanker comprises a first deflector, a second deflector and a blanking aperture, the first deflector being positioned between a gun lens and a main lens, the second deflector being positioned between the first deflector and the main lens, the blanking aperture being positioned between the second deflector and the main lens, and the first deflector, the second deflector and the blanking aperture being aligned on the optical axis of the column. A method according to the invention comprises the steps of: configuring electron optical elements of said charged particle column to form a beam in the column either with or without a crossover; configuring the main lens to focus the beam formed by the gun lens onto a substrate plane; deflecting the beam with a first deflector in a first direction; and deflecting the beam with a second deflector in a second direction onto the blanking aperture, wherein the first direction is parallel or anti-parallel to the second direction; and wherein the image at the substrate plane does not move during blanking.
摘要翻译：本发明提供了使用光束消除器对带电粒子束内的带电粒子束进行共轭消隐的方法。光束消除器包括第一偏转器，第二偏转器和消隐孔，第一偏转器位于枪式透镜和主透镜之间，第二偏转器位于第一偏转器和主透镜之间，消隐孔位于第二偏转器和主透镜，以及第一偏转器，第二偏转器和冲裁孔在柱的光轴上对准。根据本发明的方法包括以下步骤：配置所述带电粒子的电子光学元件以在所述色谱柱中形成具有或不具有交叉的光束; 配置主透镜以将由枪形透镜形成的光束聚焦到衬底平面上; 在第一方向上用第一偏转器偏转光束; 以及将具有第二导向器的所述梁在第二方向上偏转到所述消隐孔上，其中所述第一方向平行或反平行于所述第二方向; 并且其中衬底平面处的图像在消隐期间不移动。

45. 发明授权

US07456402B2 Detector optics for multiple electron beam test system 有权
标题翻译：用于多电子束测试系统的检测器光学器件
公开(公告)号：US07456402B2
公开(公告)日：2008-11-25
申请号：US11355256
申请日：2006-02-14
申请人： N. William Parker , S. Daniel Miller
发明人： N. William Parker , S. Daniel Miller
IPC分类号： G01N23/00
CPC分类号： H01J37/244 , H01J9/42 , H01J37/256 , H01J37/28 , H01J2237/24495 , H01J2237/24592 , H01J2237/2485 , H01J2237/2817
摘要： A detector optics system for collecting secondary electrons (SEs) and/or backscattered electrons (BSEs) in a multiple charged particle beam test system is disclosed. Aspects of the detector optics system include: the ability to image and/or electrically test a number of locations simultaneously across the full width of a large substrate with high throughput and uniform collection efficiency while avoiding crosstalk between signals generated by neighboring beams. In one embodiment, a linear array of N electron beams causes SEs to be emitted from the substrate, which are then collected by one or more linear arrays of ≧2N detectors. Each linear array is connected to a signal combiner circuit which dynamically determines which detectors are collecting SEs generated by each electron beam as it scans across the substrate surface and then combines the signals from these detectors to form N simultaneous output signals (one per charged particle beam) for each detector array.
摘要翻译：公开了一种用于在多重带电粒子束测试系统中收集二次电子（SE）和/或反向散射电子（BSE）的检测器光学系统。检测器光学系统的方面包括：在具有高吞吐量和均匀采集效率的同时在大型衬底的整个宽度上同时跨多个位置进行成像和/或电测试的能力，同时避免由相邻光束产生的信号之间的串扰。在一个实施例中，N个电子束的线性阵列导致从衬底发射SE，然后由一个或多个≥2N个检测器的线性阵列收集。每个线性阵列连接到信号组合器电路，其在动态地确定哪些检测器正在收集由每个电子束产生的SE，因为它扫描基板表面，然后组合来自这些检测器的信号以形成N个同时输出信号（每个带电粒子束一个）。

46. 发明授权

US06872958B2 Platform positioning system 失效
标题翻译：平台定位系统
公开(公告)号：US06872958B2
公开(公告)日：2005-03-29
申请号：US10059048
申请日：2002-01-28
申请人： Gerry B. Andeen , Martin E. Lee , N. William Parker , S. Daniel Miller
发明人： Gerry B. Andeen , Martin E. Lee , N. William Parker , S. Daniel Miller
IPC分类号： F16D3/56 , G01Q10/00 , G01Q20/00 , G01Q30/16 , G03F7/20 , H01J37/20 , H01L21/00 , H01L21/027 , H01L21/68 , F16B1/00
CPC分类号： G03F7/70716 , G03F7/70841 , G03F7/709 , H01J37/20 , H01L21/67259 , H01L21/682 , Y10T403/45
摘要： A system for precisely positioning and moving a platform relative to a support structure is disclosed herein. The platform is particularly suitable for carrying wafers. Charged particle optics can be attached to the support structure. The platform positioning system comprises a stage, comprising a base, a platform and stage actuators, the stage actuators being coupled to the platform and the platform being coupled to the base; a frame attached to the base; a support structure mechanically coupled to the frame; stage sensors attached to the support structure, for sensing the position of the platform relative to the support structure; and a current control system coupled to the stage sensors and the stage actuators. The current control system may include a predictor for generating an ouptut signal anticipating the actual position of the platform relative to the support structure in real time.
摘要翻译：本文公开了一种用于相对于支撑结构精确地定位和移动平台的系统。该平台特别适用于承载晶圆。带电粒子光学元件可以附着在支撑结构上。该平台定位系统包括一个台，包括基座，平台和平台致动器，平台致动器联接到平台并且平台联接到基座; 一个连接到基座的框架; 机架地连接到所述框架的支撑结构; 附接到支撑结构的级传感器，用于感测平台相对于支撑结构的位置; 以及耦合到载物台传感器和载物台致动器的电流控制系统。当前控制系统可以包括用于生成预测平台相对于支撑结构的实际位置的实时发射信号的预测器。

47. 发明授权

US06617587B2 Electron optics for multi-beam electron beam lithography tool 失效
标题翻译：多光束电子束光刻工具的电子光学
公开(公告)号：US06617587B2
公开(公告)日：2003-09-09
申请号：US10243585
申请日：2002-09-12
申请人： N. William Parker , Alan D. Brodie , George Xinsheng Guo , Edward M. Yin , Michael C. Matter
发明人： N. William Parker , Alan D. Brodie , George Xinsheng Guo , Edward M. Yin , Michael C. Matter
IPC分类号： H01J37147
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174 , H01J37/3177
摘要： A charge particle optical column capable of being used in a high throughput, mutli-column, multi-beam electron beam lithography system is disclosed herein. The column has the following properties: purely electrostatic components; small column footprint (20 mm square); multiple, individually focused charge particle beams; telecentric scanning of all beams simultaneously on a wafer for increased depth of field; and conjugate blanking of the charged particle beams for reduced beam blur. An electron gun is disclosed that uses microfabricated field emission sources and a microfabricated aperture-deflector assembly. The aperture-deflector assembly acts as a perfect lens in focusing, steering and blanking a multipicity of electron beams through the back focal plane of an immersion lens located at the bottom of the column. Beam blanking can be performed using a gating signal to decrease beam blur during writing on the wafer.
摘要翻译：本文公开了一种能够在高通量，多列，多光束电子束光刻系统中使用的电荷粒子光学列。该柱具有以下特性：纯静电成分; 小柱占地面积（20平方米）; 多个单独聚焦的电荷粒子束; 同时在晶圆上同时扫描所有光束以增加景深; 并且用于减少光束模糊的带电粒子束的共轭消隐。公开了一种电子枪，其使用微制造的场致发射源和微制造的孔径偏转器组件。孔径偏转器组件用作聚焦，转向和消隐通过位于塔底部的浸没透镜的后焦平面的多个电子束的完美透镜。可以使用门控信号进行光束消隐，以减少在晶片上写入期间的光束模糊。

48. 发明申请

US20120305127A1 Method and Structure for Prevention of Incorrect Fueling Operations for Diesel-Powered Vehicles 有权
标题翻译：柴油机车辆不正确加油操作的方法与结构
公开(公告)号：US20120305127A1
公开(公告)日：2012-12-06
申请号：US13153180
申请日：2011-06-03
申请人： Curtis Roys , N. William Parker
发明人： Curtis Roys , N. William Parker
IPC分类号： B65B3/04 , B23P19/00
CPC分类号： B67D7/344 , B60K15/0406 , B60K2015/0461 , B60K2015/0483
摘要： A method and structure are described for preventing the accidental introduction of gasoline into the fuel system of a diesel-powered vehicle. In a first preferred embodiment, a gasoline fuel nozzle is configured with a magnet, such as magnetic strips, and the entrance to a fill tube of a diesel-powered is configured with a magnetic field sensor ring. When an incorrect fueling operation, such as the introduction of gasoline into the fuel tank of the diesel-powered vehicle, is attempted the sensor ring alerts the operator visually and/or audibly before fueling starts, thereby preventing incorrect fueling. In alternative embodiments, sensing of an attempted incorrect fueling operation may require only the sensor ring.
摘要翻译：描述了一种用于防止汽油意外引入柴油动力车辆的燃料系统中的方法和结构。在第一优选实施例中，汽油燃料喷嘴配置有诸如磁条的磁体，并且柴油动力的填充管的入口配置有磁场传感器环。当尝试不正确的加油操作，例如将汽油引入柴油动力车辆的燃料箱时，传感器环在加油开始之前可视地和/或可听见地警告操作者，从而防止不正确的加油。在替代实施例中，尝试不正确的加油操作的感测可能仅需要传感器环。

49. 发明申请

US20120261565A1 WIDE APERATURE WIEN EXB MASS FILTER 有权
公开(公告)号：US20120261565A1
公开(公告)日：2012-10-18
申请号：US13089875
申请日：2011-04-19
申请人： David Tuggle , N. William Parker
发明人： David Tuggle , N. William Parker
IPC分类号： H01J49/22 , H01J49/20
CPC分类号： H01J37/05 , H01J2237/31749
摘要： An ExB Wien mass filter provides an independently-adjustable electric field combined with the dipole electric field required for mass separation. The independently adjustable electric field can be used provide a larger optical aperture, to correct astigmatism and to deflect the beam in direction parallel and/or perpendicular to the magnetic field.
摘要翻译： ExB维恩质量过滤器提供独立可调的电场与质量分离所需的偶极电场相结合。可独立调节的电场可以提供更大的光学孔径，以校正散光并使光束在与磁场平行和/或垂直的方向上偏转。

50. 发明授权

US08242457B2 Charged particle optics with azimuthally-varying third-order aberrations for generation of shaped beams 有权
标题翻译：具有方位变化的三阶像差的带电粒子光学器件用于产生成形梁
公开(公告)号：US08242457B2
公开(公告)日：2012-08-14
申请号：US12050035
申请日：2008-03-17
申请人： N. William Parker
发明人： N. William Parker
IPC分类号： G21K1/08
CPC分类号： H01J37/153 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3023 , H01J37/3174 , H01J2237/1534 , H01J2237/303 , H01J2237/30494
摘要： A charged particle shaped beam column includes: a charged particle source; a gun lens configured to provide a charged particle beam approximately parallel to the optic axis of the column; an objective lens configured to form the charged particle shaped beam on the surface of a substrate, wherein the disk of least confusion of the objective lens does not coincide with the surface of the substrate; an optical element with 8N poles disposed radially symmetrically about the optic axis of the column, the optical element being positioned between the condenser lens and the objective lens, wherein N is an integer greater than or equal to 1; and a power supply configured to apply excitations to the 8N poles of the optical element to provide an octupole electromagnetic field. The octupole electromagnetic field is configured to induce azimuthally-varying third-order deflections to the beam trajectories passing through the 8N-pole optical element. By controlling the excitation of the 8N poles a shaped beam, such as a square beam, can be formed at the surface of the substrate. The 8N-pole element can be magnetic or electrostatic.
摘要翻译：带电粒子束柱包括：带电粒子源; 枪式透镜，其构造成提供近似平行于所述柱的光轴的带电粒子束; 配置为在基板的表面上形成带电粒子束的物镜，其中所述物镜的最小混淆盘与所述基板的表面不一致; 具有8N磁极的光学元件，其围绕所述列的光轴径向对称设置，所述光学元件位于所述聚光透镜和所述物镜之间，其中N是大于或等于1的整数; 以及电源，被配置为对所述光学元件的8N极施加激励以提供八极电磁场。八极电磁场被配置为引起通过8N极光学元件的光束轨迹的方位角变化的三阶偏转。通过控制8N极的激发，可以在衬底的表面上形成诸如方束的成形光束。 8N极元件可以是磁性的或静电的。

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