专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20080224063A1 CHARGED PARTICLE OPTICS WITH AZIMUTHALLY-VARYING THIRD-ORDER ABERRATIONS FOR GENERATION OF SHAPED BEAMS 有权
标题翻译：带有三角形变化的三角形的带有粒子的光学器件用于形成形状的贝叶斯
公开(公告)号：US20080224063A1
公开(公告)日：2008-09-18
申请号：US12050035
申请日：2008-03-17
申请人： N. William Parker
发明人： N. William Parker
IPC分类号： H01J3/14
CPC分类号： H01J37/153 , B82Y10/00 , B82Y40/00 , H01J37/3007 , H01J37/3023 , H01J37/3174 , H01J2237/1534 , H01J2237/303 , H01J2237/30494
摘要： A charged particle shaped beam column includes: a charged particle source; a gun lens configured to provide a charged particle beam approximately parallel to the optic axis of the column; an objective lens configured to form the charged particle shaped beam on the surface of a substrate, wherein the disk of least confusion of the objective lens does not coincide with the surface of the substrate; an optical element with 8N poles disposed radially symmetrically about the optic axis of the column, the optical element being positioned between the condenser lens and the objective lens, wherein N is an integer greater than or equal to 1; and a power supply configured to apply excitations to the 8N poles of the optical element to provide an octupole electromagnetic field. The octupole electromagnetic field is configured to induce azimuthally-varying third-order deflections to the beam trajectories passing through the 8N-pole optical element. By controlling the excitation of the 8N poles a shaped beam, such as a square beam, can be formed at the surface of the substrate. The 8N-pole element can be magnetic or electrostatic.
摘要翻译：带电粒子束柱包括：带电粒子源; 枪式透镜，其构造成提供近似平行于所述柱的光轴的带电粒子束; 配置为在基板的表面上形成带电粒子束的物镜，其中所述物镜的最小混淆盘与所述基板的表面不一致; 具有8N磁极的光学元件，其围绕所述列的光轴径向对称设置，所述光学元件位于所述聚光透镜和所述物镜之间，其中N是大于或等于1的整数; 以及电源，被配置为对所述光学元件的8N极施加激励以提供八极电磁场。八极电磁场被配置为引起通过8N极光学元件的光束轨迹的方位角变化的三阶偏转。通过控制8N极的激发，可以在衬底的表面上形成诸如方束的成形光束。 8N极元件可以是磁性的或静电的。

2. 发明授权

US5812412A Charged beam pattern data generating method and a charged beam pattern data generating apparatus 失效
标题翻译：带电波束图案数据生成方法和带电波束图案数据生成装置
公开(公告)号：US5812412A
公开(公告)日：1998-09-22
申请号：US535729
申请日：1995-09-28
申请人： Koichi Moriizumi , Kinya Kamiyama , Makoto Kanno , Hironobu Taoka , Hiroomi Nakao , Kazuhiro Yamazaki
发明人： Koichi Moriizumi , Kinya Kamiyama , Makoto Kanno , Hironobu Taoka , Hiroomi Nakao , Kazuhiro Yamazaki
IPC分类号： H01L21/027 , G06F17/50 , H01J37/302
CPC分类号： H01J37/3026 , H01J2237/30494
摘要： A charged beam pattern data generating method for generating high quality pattern data from the circuit layout design data of a semiconductor device for use by a charged beam drawing apparatus in the production of resist patterns or other semiconductor device manufacturing processes.
摘要翻译：一种带电波束图案数据生成方法，用于从制造抗蚀剂图案或其它半导体器件制造工艺中的带电波束牵引装置的半导体器件的电路布局设计数据生成高质量图案数据。

3. 发明授权

US09620332B1 Charged particle beam substrate inspection using both vector and raster scanning 有权
公开(公告)号：US09620332B1
公开(公告)日：2017-04-11
申请号：US14703306
申请日：2015-05-04
申请人： Multibeam Corporation
发明人： David K. Lam , Kevin M. Monahan , Enden David Liu , Cong Tran , Theodore A. Prescop
IPC分类号： H01J37/00 , H01J37/29 , H01J37/20 , H01J37/22
CPC分类号： H01J37/292 , H01J37/20 , H01J37/222 , H01J37/265 , H01J37/28 , H01J37/3045 , H01J37/3177 , H01J2237/30494 , H01J2237/31761
摘要： The present application discloses methods, systems and devices for using charged particle beam tools to inspect and perform lithography on a substrate using a combination of vectoring to move a beam to features to be imaged, and raster scanning to obtain an image of the feature(s). The inventors have discovered that it is highly advantageous to use an extra step, a fast raster scan to image the substrate at a lower resolution, to determine which features receive priority for inspection; this extra step can reduce total inspection time, enhance inspection results, and improve beam alignment and manufacturing yield. Using multiple beam-producing columns, with multiple control computers local to the columns, provides various synergies. Preferably, miniature, non-magnetic, electrostatically-driven columns are used.

4. 发明授权

US08816303B2 Method of processing of an object 有权
标题翻译：处理对象的方法
公开(公告)号：US08816303B2
公开(公告)日：2014-08-26
申请号：US13164122
申请日：2011-06-20
申请人： Josef Biberger , Ralph Pulwey , Jaroslaw Paluszynski , Dietmar Doenitz , Hans Mathèe , Michael Steigerwald
发明人： Josef Biberger , Ralph Pulwey , Jaroslaw Paluszynski , Dietmar Doenitz , Hans Mathèe , Michael Steigerwald
IPC分类号： H01J37/30 , H01J37/305 , H01J37/317 , H01J37/304
CPC分类号： H01J37/3056 , G01B15/04 , H01J37/30 , H01J37/3005 , H01J37/3007 , H01J37/304 , H01J37/3174 , H01J2237/2611 , H01J2237/30455 , H01J2237/30494 , H01J2237/31722 , H01J2237/31749
摘要： A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons; determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations.
摘要翻译：一种处理物体的方法包括：扫描物体表面上的粒子束，并检测由于扫描而从物体出射的电子; 基于检测到的电子，确定物体表面与物体表面上的多个位置中的每一个的预定表面之间的高度差; 基于所确定的高度差来确定所述物体表面上的所述多个位置中的每一个的处理强度; 并且基于所确定的处理强度将粒子束引导到多个位置，以便从多个位置处去除材料或在物体上沉积材料。

5. 发明申请

US20120145895A1 Method of Processing of an Object 有权
标题翻译：对象的处理方法
公开(公告)号：US20120145895A1
公开(公告)日：2012-06-14
申请号：US13164122
申请日：2011-06-20
申请人： Josef BIBERGER , Ralph Pulwey , Jaroslaw Paluszynski , Dietmar Doenitz , Hans Mathèe , Michael Steigerwald
发明人： Josef BIBERGER , Ralph Pulwey , Jaroslaw Paluszynski , Dietmar Doenitz , Hans Mathèe , Michael Steigerwald
IPC分类号： H01J37/28 , H01J37/30
CPC分类号： H01J37/3056 , G01B15/04 , H01J37/30 , H01J37/3005 , H01J37/3007 , H01J37/304 , H01J37/3174 , H01J2237/2611 , H01J2237/30455 , H01J2237/30494 , H01J2237/31722 , H01J2237/31749
摘要： A method of processing of an object comprises scanning a particle beam across a surface of the object and detecting electrons emerging from the object due to the scanning; determining a height difference between the surface of the object and a predetermined surface for each of plural of locations on the surface of the object based on the detected electrons; determining a processing intensity for each of the plural locations on the surface of the object based on the determined height differences; and directing a particle beam to the plural locations based on the determined processing intensities, in order to remove material from or deposit material on the object at the plural locations.
摘要翻译：一种处理物体的方法包括：扫描物体表面上的粒子束，并检测由于扫描而从物体出射的电子; 基于检测到的电子，确定物体表面与物体表面上的多个位置中的每一个的预定表面之间的高度差; 基于所确定的高度差来确定所述物体表面上的所述多个位置中的每一个的处理强度; 并且基于所确定的处理强度将粒子束引导到多个位置，以便从多个位置处去除材料或在物体上沉积材料。

6. 发明授权

US09466463B1 Charged particle beam substrate inspection using both vector and raster scanning 有权
标题翻译：使用矢量和光栅扫描的带电粒子束基板检查
公开(公告)号：US09466463B1
公开(公告)日：2016-10-11
申请号：US14085768
申请日：2013-11-20
申请人： Mutibeam Corporation
发明人： David K. Lam , Kevin M. Monahan , Enden David Liu , Cong Tran , Theodore A. Prescop
IPC分类号： H01J49/00 , H01J37/28 , H01J37/317
CPC分类号： H01J37/292 , H01J37/20 , H01J37/222 , H01J37/265 , H01J37/28 , H01J37/3045 , H01J37/3177 , H01J2237/30494 , H01J2237/31761
摘要： The present application discloses methods, systems and devices for using charged particle beam tools to inspect and perform lithography on a substrate using a combination of vectoring to move a beam to features to be imaged, and raster scanning to obtain an image of the feature(s). The inventors have discovered that it is highly advantageous to use an extra step, a fast raster scan to image the substrate at a lower resolution, to determine which features receive priority for inspection; this extra step can reduce total inspection time, enhance inspection results, and improve beam alignment and manufacturing yield. Using multiple beam-producing columns, with multiple control computers local to the columns, provides various synergies. Preferably, miniature, non-magnetic, electrostatically-driven columns are used.
摘要翻译：本申请公开了使用带电粒子束工具来使用矢量化的组合来检测和执行光刻的方法，系统和装置，以将光束移动到要成像的特征，以及光栅扫描以获得特征的图像）。本发明人已经发现，使用额外的步骤是非常有利的，快速光栅扫描以较低的分辨率对衬底进行成像，以确定哪些特征接受检查的优先级; 这个额外的步骤可以减少总检查时间，增强检测结果，并提高光束对准和制造产量。使用多个光束产生色谱柱，多个控制计算机在本地列，提供了各种协同作用。优选地，使用微型，非磁性，静电驱动的列。

7. 发明申请

US20100189917A1 CROSS SECTION PROCESSING METHOD AND METHOD OF MANUFACTURING CROSS SECTION OBSERVATION SAMPLE 有权
标题翻译：交叉截面处理方法和制造横截面观察样本的方法
公开(公告)号：US20100189917A1
公开(公告)日：2010-07-29
申请号：US12693580
申请日：2010-01-26
申请人： Hidekazu Suzuki , Toshiaki Fujii , Mike Hassel-Shearer
发明人： Hidekazu Suzuki , Toshiaki Fujii , Mike Hassel-Shearer
IPC分类号： C23C14/22
CPC分类号： C23C16/047 , G01N1/286 , H01J37/3023 , H01J37/3056 , H01J2237/30494 , H01J2237/31732 , H01J2237/31745
摘要： A cross section processing method to be performed on a sample by irradiating the sample having a layer or a structure of an organic substance on a surface at a cross section processing position thereof with a focused ion beam using a focused ion beam apparatus includes: a protective film forming step for forming a protective film on the surface of the layer or the structure of the organic substance by irradiating the surface of the sample including the cross section processing position with the focused ion beam under the existence of source gas as the protective film; and a cross section processing step for performing cross section processing by irradiating the cross section processing position formed with the protective film with the focused ion beam at a voltage higher than an accelerating voltage in the protective film forming step.
摘要翻译：使用聚焦离子束装置，用聚焦离子束在其截面处理位置的表面上照射具有有机物的层或结构的样品，对样品进行的截面处理方法包括：通过在存在源气体的情况下用聚焦离子束照射包括截面处理位置的样品的表面作为保护膜，在层的表面上形成保护膜或有机物的结构的成膜步骤; 以及横截面处理步骤，用于通过在保护膜形成步骤中以高于加速电压的电压照射具有聚焦离子束的由保护膜形成的横截面处理位置进行横截面处理。

8. 发明申请

US20070075275A1 Beam exposure writing strategy system and method 失效
标题翻译：光束曝光写作策略系统及方法
公开(公告)号：US20070075275A1
公开(公告)日：2007-04-05
申请号：US11243304
申请日：2005-10-03
申请人： Benyamin Buller , Richard Lozes
发明人： Benyamin Buller , Richard Lozes
IPC分类号： H01J37/302
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J37/3026 , H01J2237/30488 , H01J2237/30494
摘要： A beam exposure writing strategy method and system are disclosed for exposing a desired pattern on a substrate, by raster scanning a beam such as a particle beam, across a major field on the substrate. The beam is also vector scanned across a minor field of the substrate superimposed along the major field raster scan. The beam is selectively blanked and unblanked as the beam is being scanned. The unblanked flashes of the beam are modulated in coordination with the raster and vector scanning to expose the desired pattern on the substrate. The disclosed system and method generating an adjustable length microvector having a maximum range of at least about N time a nominal length λ, where N is equal to four and λ is substantially equal to a dimension of a nominal flash area, the nominal flash location dimension being substantially greater than a major field cell dimension.
摘要翻译：公开了一种束曝光写入策略方法和系统，用于通过在衬底上的主场上光栅扫描诸如粒子束的光束来在衬底上暴露期望的图案。光束也沿着主场光栅扫描叠加的衬底的次视场矢量扫描。当光束被扫描时，光束被选择性地消隐并且被清除。与光栅和矢量扫描协调地调制光束的未闪烁闪光以暴露衬底上的期望图案。所公开的系统和方法产生可调长度的微向量，其具有至少约N倍的标称长度λ的最大范围，其中N等于4，并且λ基本上等于标称闪光区域的尺寸，标称闪光位置尺寸远远大于主要的电池尺寸。

9. 发明授权

US11688583B2 Operating a particle beam apparatus with an object holder 有权
公开(公告)号：US11688583B2
公开(公告)日：2023-06-27
申请号：US17458771
申请日：2021-08-27
申请人： Carl Zeiss Microscopy GmbH
发明人： Alexander Orchowski
IPC分类号： H01J37/28 , H01J37/20 , H01J37/304
CPC分类号： H01J37/28 , H01J37/20 , H01J37/3045 , H01J2237/20221 , H01J2237/2802 , H01J2237/30494
摘要： The system described herein relates to a method for operating a beam apparatus, such as a particle beam apparatus or laser beam apparatus, a computer program product and a beam apparatus for carrying out the method, and to an object holder for an object that, for example, is able to be arranged in a particle beam apparatus. The method includes generating a marking on an object holder using a laser beam of a laser beam device and/or using a particle beam of the particle beam apparatus, where the particle beam includes charged particles, arranging an object on the object holder, moving the object holder, positioning the particle beam and/or the laser beam in relative fashion in relation to the object using the marking, and processing, imaging and/or analyzing the object using the particle beam and/or the laser beam.

10. 发明申请

US20150228453A1 METHOD FOR ACQUIRING SETTLING TIME 有权
标题翻译：获取结算时间的方法
公开(公告)号：US20150228453A1
公开(公告)日：2015-08-13
申请号：US14607630
申请日：2015-01-28
申请人： NuFlare Technology, Inc.
发明人： Rieko NISHIMURA
IPC分类号： H01J37/304 , H01J37/06 , H01J37/30 , H01J37/317 , H01J37/20
CPC分类号： H01J37/3174 , H01J2237/15 , H01J2237/30433 , H01J2237/30494 , H01J2237/31776
摘要： A method for acquiring a settling time includes forming, using a deflector, a reference pattern so that a deflection movement amount of the beam may be smaller than an evaluation deflection movement amount; forming, while variably setting the settling time of the DAC amplifier, an evaluation pattern such that both ends of the width dimension of the evaluation pattern being the same design width dimension as that of the reference pattern, for each of times set variably, such that a deflection movement amount of a second beam shot of two beam shots successively shot is equivalent to the evaluation deflection movement amount; calculating a difference between the width dimension of the evaluation pattern concerned and that of the reference pattern, for each of the times set variably; and acquiring a settling time of the DAC amplifier necessary for the deflection movement amount, using the difference.
摘要翻译：获取建立时间的方法包括使用偏转器形成参考图案，使得光束的偏转移动量可以小于评估偏转移动量; 在可变地设置DAC放大器的建立时间的同时，形成评价图案，使得评估图案的宽度尺寸的两端与参考图案的宽度尺寸相同，每个时间可变地设定，使得相继拍摄的两束射击的第二射束的偏转移动量等于评价偏转移动量; 在可变地设定的每个时间段中计算相关评估模式的宽度尺寸与参考图案的宽度尺寸之间的差; 并且使用该差异来获取所述偏转移动量所需的DAC放大器的建立时间。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式