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31. 发明申请

US20030010353A1 Ultrasonic cleaning method for semiconductor manufacturing equipment 审中-公开
标题翻译：超声波清洗方法用于半导体制造设备
公开(公告)号：US20030010353A1
公开(公告)日：2003-01-16
申请号：US10096831
申请日：2002-03-14
发明人： Naoshige Kawasaki , Tomohiro Ishida
IPC分类号： B08B003/12
CPC分类号： H01L21/67057 , B08B3/048 , B08B3/12
摘要： An ultrasonic cleaning method for cleaning semiconductor manufacturing equipment with which a blast treated surface of a component of a sputtering equipment is cleaned, wherein de-aerated cleaning water in which the component is immersed has concentration of dissolved gasses of not more than 10 ppm, and ultrasonic power of the ultrasonic vibrator applying ultrasonic to the cleaning water is 50 W or more.
摘要翻译：一种用于清洗半导体制造设备的超声波清洗方法，其中清理溅射设备的部件的喷砂处理表面，其中浸没所述部件的脱气清洗水的溶解气体浓度不大于10ppm，以及超声波振动器向清洗水施加超声波的超声功率为50W以上。

32. 发明申请

US20020170583A1 Electric shaver cleaning apparatus 失效
标题翻译：电动剃须刀清洗装置
公开(公告)号：US20020170583A1
公开(公告)日：2002-11-21
申请号：US09858936
申请日：2001-05-16
发明人： Ying Man Wong
IPC分类号： B08B003/04
CPC分类号： A61L2/24 , A45D27/46 , A61L2/18 , A61L2/26 , B08B3/048 , B08B3/102
摘要： A cleaning apparatus for electric shaver components has a removable basket fits inside the compartment. Cleaning is carried out by pumping cleaning fluid and air into a bottom of the compartment via a sieve plate. Debris removed from the components is collected in one compartment of a reservoir The level of the water in the reservoir is maintained and controlled by the provision of an overflow pipe.
摘要翻译：用于电动剃须刀部件的清洁装置具有可拆卸的篮子装配在隔室内。通过将清洁液和空气通过筛板泵送到隔室的底部进行清洁。从组件中取出的碎屑被收集在储存器的一个隔室中通过设置溢流管来维持和控制储存器中的水位。

33. 发明授权

US06416587B1 Apparatus and method for cleaning wafer 失效
标题翻译：清洗晶片的装置及方法
公开(公告)号：US06416587B1
公开(公告)日：2002-07-09
申请号：US09536157
申请日：2000-03-28
申请人： Wen-Jang Lu , Yi-Ta Tsou , Hui-Xiu Tang
发明人： Wen-Jang Lu , Yi-Ta Tsou , Hui-Xiu Tang
IPC分类号： B08B302
CPC分类号： B08B3/102 , B08B3/048 , Y10S134/902 , Y10S438/906
摘要： A wafer cleaning apparatus includes a rinsing container in which wafers to be cleaned are positioned and four sets of nozzles arranged in the rinsing container to be symmetric with respect to each other. The nozzles generate water jets toward the wafers for performing a wafer cleaning process. In a first phase of the wafer cleaning process, the first nozzle set and the fourth nozzle set are turned on to generate water jets in diagonally opposite directions with respect to the wafers for a given period. In a second phase, the second nozzle set and the third nozzle set are turned on to generate water jets in diagonally opposite directions with respect to the wafers for a given period. In a third phase, the third nozzle set and the fourth nozzle set are turned on to cause an up-rising water flow from a bottom of the container to a top open side thereof for expelling contaminants dissolved or suspended in the water out of the container.
摘要翻译：晶片清洗装置包括：清洗容器，其中待清洗的晶片被定位，并且四组喷嘴布置在冲洗容器中以相对于彼此对称。喷嘴向晶片产生水射流以进行晶片清洁处理。在晶片清洗过程的第一阶段，第一喷嘴组和第四喷嘴组被打开，以在给定时间段内相对于晶片沿对角相反的方向产生水射流。在第二阶段中，打开第二喷嘴组和第三喷嘴组，以在给定时间段内相对于晶片产生对角相反方向的水射流。在第三阶段中，第三喷嘴组和第四喷嘴组被打开以引起从容器的底部向上开放的水的上升流动，以将从水中流出或悬浮的污染物排出容器。

34. 发明授权

US06245250B1 Process vessel 失效
标题翻译：加工容器
公开(公告)号：US06245250B1
公开(公告)日：2001-06-12
申请号：US09262991
申请日：1999-03-05
申请人： Tom Krawzak , Victor Mimken , Rod Fladwood , Wyland Atkins
发明人： Tom Krawzak , Victor Mimken , Rod Fladwood , Wyland Atkins
IPC分类号： C23G102
CPC分类号： H01L21/67253 , B08B3/048 , B08B3/12 , H01L21/67051 , H01L21/67057 , Y10S134/902
摘要： A process vessel which may be utilized in wet processing of semiconductor wafers includes a tank having one or more fluid displacers attachable to the tank. The one or more fluid displacer(s) have position in which they extend into the interior of the tank. The fluid displacers may be carried by a lid moveable into a closed position covering the opening in the tank. Movement of the lid into the closed position causes the fluid displacers to extend into the tank.
摘要翻译：可用于半导体晶片湿法处理的处理容器包括具有一个或多个可连接到罐的流体置换器的罐。一个或多个流体置换器具有它们延伸到罐的内部的位置。流体置换器可以由可移动到覆盖罐中的开口的关闭位置的盖子承载。盖子移动到关闭位置使得液体置换器延伸到罐中。

35. 发明授权

US11872602B2 Flow diverter and basket 有权
公开(公告)号：US11872602B2
公开(公告)日：2024-01-16
申请号：US17740253
申请日：2022-05-09
申请人： Unified Brands, Inc.
发明人： Michael P. Licata , Atul Singhal , Abhishek Agrawal , Richard Seiss , Roger Moore , Mark Churchill
IPC分类号： A47L15/42 , B08B3/04 , B08B3/06 , B08B3/10
CPC分类号： B08B3/048 , A47L15/4214 , B08B3/06 , B08B3/10
摘要： A system for and method of improving fluid flow is provided. The system includes a discharge manifold defining a primary flow path partially obstructed by one or more flow diverter. The flow diverter includes an obtrusion pair, each obtrusion of the obtrusion pair extending from a rear wall of the discharge manifold into an interior area of the discharge manifold, thereby creating a void along the primary flow path. The system further includes a first nozzle extending through the primary flow path and into the void such that a nozzle inlet of the first nozzle is positioned at least partially within the void. The system further includes a plurality of subsequent nozzles, each of the first and subsequent nozzles defining a respective secondary flow path for directing fluid away from the discharge manifold. The method includes utilizing obtrusion pairs to reduce or eliminate hydraulic skip.

36. 发明授权

US11848218B2 Semiconductor chamber component cleaning systems 有权
公开(公告)号：US11848218B2
公开(公告)日：2023-12-19
申请号：US17077711
申请日：2020-10-22
申请人： Applied Materials, Inc.
发明人： Katty Guyomard , Chidambara A. Ramalingam , Shawyon Jafari , Palash Joshi , Moin Ahmed Khan , Kirubanandan Naina Shanmugam , Subhaschandra Shreepad Salkod , Avishek Ghosh , David W. Groechel , Li Wu , Dorothea Buechel-Rimmel
IPC分类号： H01L21/67 , B08B3/04
CPC分类号： H01L21/67057 , B08B3/048
摘要： Exemplary semiconductor chamber component cleaning systems may include a receptacle. The receptacle may include a bottom lid that may be an annulus. The annulus may be characterized by an inner annular wall and an outer annular wall. A plurality of recessed annular ledges may be defined between the inner annular wall and the outer annular wall. Each recessed annular ledge of the plurality of recessed annular ledges may be formed at a different radial position along the bottom lid. The cleaning systems may include a top lid removably coupled with the bottom lid about an exterior region of the top lid. The cleaning systems may include a tank defining a volume to receive the receptacle.

37. 发明申请

US20180236499A1 RINSING MACHINE FOR DISPLAY PANEL AND RINSING METHOD THEREOF 审中-公开
公开(公告)号：US20180236499A1
公开(公告)日：2018-08-23
申请号：US15709803
申请日：2017-09-20
申请人： Boe Technology Group Co., Ltd. , Chengdu Boe Optoelectronics Technology Co., Ltd.
发明人： Junneng DENG , Tao DENG
IPC分类号： B08B3/04 , B08B3/14 , B08B3/08 , B08B3/10 , B01D61/14 , B01D71/68
CPC分类号： B08B3/048 , B01D61/147 , B01D71/68 , B08B3/045 , B08B3/08 , B08B3/104 , B08B3/14
摘要： A rinsing machine for cleaning a display panel, including a main tank body, a spillover slot at the periphery of upper edges of the main tank body, a stirrer in the main tank body, and a rinsing liquid storage slot for storing rinsing liquid used for supplementing the rinsing liquid in the main tank body is disclosed. The rinsing liquid storage slot is communicated with the main tank body via a rinsing liquid supplement valve. The main tank body is provided with a discharge port which is capable of being opened and closed at the bottom of the main tank body. A rinsing method by means of the rinsing machine is also disclosed.

38. 发明授权

US09907429B2 Beverage preparation machine with cleanable brewing head 有权
公开(公告)号：US09907429B2
公开(公告)日：2018-03-06
申请号：US14385195
申请日：2013-03-18
申请人： NESTEC S.A.
发明人： Christian Talon , Alfred Yoakim
IPC分类号： A47J31/40 , A47J31/60 , A47J31/46 , B08B3/08 , B08B3/04 , A47J31/36
CPC分类号： A47J31/407 , A47J31/3695 , A47J31/46 , A47J31/60 , B08B3/048
摘要： The present invention concerns a beverage preparation machine (1) for preparing a beverage from a food substance contained in a capsule (12) by injection of a fluid into said capsule (12), said machine comprising: —a capsule holder (8) for holding a capsule, said holder (8) having a cup-shaped body (27), a handle portion (28), and a dispensing opening (29) through the bottom portion (30) of said body (27); —a fluid conduction system comprising a fluid reservoir (2), a fluid pump, optionally a fluid heater, said reservoir, pump and heater being connected by fluid pipes; —a brewing head (3) having an aperture for receiving said capsule holder (8), and an injection support (17) connected to the fluid conduction system; —an injection plate (18) supported by said support (17), said injection plate (18) comprising an upper surface (23) with a fluid coupling (32) connected to the fluid conduction system through said support, said injection plate (18) further comprising a fluid conducting channel (24) connecting the fluid coupling (32) to a fluid injection element (19) located in the lower surface (22) of said injection plate (18), such that said injection element (19) is able to inject fluid into the capsule (12), characterized in that said injection plate (18) further comprises at least one cleaning channel (21) independent from the fluid conducting channel (24) connecting its upper (23) and lower (22) surfaces, said cleaning channel(s) (21) being suitable for circulating fluid at least from the lower surface (22) towards the upper surface (23) of said injection plate (18).

39. 发明申请

US20170224003A1 FOOD OR WARE WASHING, DEGLAZING AND DEFROSTING SYSTEM AND METHODS OF DEGLAZING AND DEFROSTING FOOD ITEMS 审中-公开
公开(公告)号：US20170224003A1
公开(公告)日：2017-08-10
申请号：US15334778
申请日：2016-10-26
申请人： ROGER MOORE , CALVIN M. SIMS
发明人： ROGER MOORE , CALVIN M. SIMS
IPC分类号： A23N12/02 , B08B3/10 , A47L15/00 , B08B3/04
CPC分类号： A23N12/02 , A23B4/07 , A23L3/365 , A47L15/0002 , B08B3/048 , B08B3/10 , B08B3/102 , B08B2203/007
摘要： A system and method for deglazing or defrosting items, for cleaning wares, and/or for thermalizing/rethermalizing food items. The system includes a tank for holding fluid and a wash pump for creating a rolling washing action within the wash tank. The method includes placing items into the fluid so that as the fluid rolls within the wash tank, the items become deglazed or defrosted. The system further includes a discharge manifold with a plurality of discharge jets, a flow balancer for equalizing flow to multiple sections of the tank, and a diffuser plate for equalizing flow within a section of the tank. The various components of the system can be removed for cleaning, inspection, and/or replacement. The discharge manifold is accessible for removal and is configured to be easily cleaned.

40. 发明授权

US09636719B2 Systems and methods for treating workpieces 有权
公开(公告)号：US09636719B2
公开(公告)日：2017-05-02
申请号：US14856835
申请日：2015-09-17
申请人： DÜRR ECOCLEAN GMBH
发明人： Michael Förster
IPC分类号： B08B3/00 , B08B7/04 , B25J21/00 , B08B3/04 , B08B3/10 , B08B13/00 , F26B19/00 , B08B1/00 , B08B3/02
CPC分类号： B08B7/04 , B08B1/002 , B08B3/024 , B08B3/04 , B08B3/047 , B08B3/048 , B08B3/10 , B08B13/00 , B25J21/00 , F26B19/00
摘要： Example systems and methods for treating workpieces are disclosed. In some examples, the system includes a treatment station positioned in a process chamber for treating the workpiece with fluid. The example system includes a handling device positioned in the process chamber. The example handling device includes a base positioned in the process chamber, a supporting arm coupled to the base and pivotable relative to the base about a first pivot axis, a pivoting arm coupled to the supporting arm and pivotable relative to the supporting arm about a second pivot axis, and a receptacle coupled to the pivoting arm and including a workpiece holder capable of picking up the workpiece from a workpiece feeder positioned outside of the process chamber. The example handling device is capable of moving the workpiece through an opening of the process chamber and into a treatment position at the treatment station.

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