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    • 31. 发明申请
    • ANALYTICAL SAMPLE DRYING METHOD AND DRYING APPARATUS
    • 分析样品干燥方法和干燥装置
    • US20100031758A1
    • 2010-02-11
    • US12449869
    • 2008-02-29
    • Hiroyuki SakaiShintaro KomataniYoshihiro Yokota
    • Hiroyuki SakaiShintaro KomataniYoshihiro Yokota
    • G01N1/44G01N33/24
    • G01N1/40G01N1/4022G01N33/20G01N33/24
    • A soil for metal analysis having a high water content of 40% or more is dried up to 20% or less in water content within a short period of time.A filter paper 5 is laid over an inner bottom surface plate 2 of a nutsche 1. Powder of a super absorbent polymer 6 is uniformly spread (filled) on an upper surface thereof. Further, another filter paper 7 is laid thereon. A soil sample with a high water content is packed on an upper surface thereof, thereupon carrying out predrying to approximately 30% in water content. After that, the predried soil sample is added with ethanol, stirred and received in a receiving pan 38. The receiving pan 38 is arranged in a drying chamber 37. Water is supplied by a syringe 43 to a reaction vessel 42 having been filled with calcium oxide or barium oxide, thereby reacting calcium oxide or barium oxide with water. The receiving pan 38 is heated by a reaction heat generated at that moment, thereupon carrying out postdrying to make the water content 20% or less.
    • 将含水量高达40%以上的金属分析用土壤在短时间内干燥至含水量的20%以下。 将滤纸5放置在螺母1的内底板2上。超吸收性聚合物6的粉末在其上表面上均匀地铺展(填充)。 此外,在其上铺设另一个滤纸7。 具有高含水量的土壤样品被填充在其上表面上,然后预干燥约30%的含水量。 之后,将预干燥的土壤样品加入乙醇,搅拌并接收在接收盘38中。接收盘38布置在干燥室37中。水通过注射器43供应至填充有钙的反应容器42 氧化物或氧化钡,从而使氧化钙或氧化钡与水反应。 接收盘38被该时刻产生的反应热加热,进行后干燥,使含水率在20%以下。
    • 33. 发明授权
    • Diamond semiconductor device and method for manufacturing the same
    • 金刚石半导体器件及其制造方法
    • US07064352B2
    • 2006-06-20
    • US11003510
    • 2004-12-06
    • Yoshihiro YokotaNobuyuki KawakamiTakeshi TachibanaKazushi Hayashi
    • Yoshihiro YokotaNobuyuki KawakamiTakeshi TachibanaKazushi Hayashi
    • H01L31/312H01L21/00
    • H01L29/1602H01L29/78
    • A diamond semiconductor device includes a substrate made of single crystal diamond; a first diamond layer, placed on the substrate, containing an impurity; a second diamond layer containing the impurity, the second diamond layer being placed on the substrate and spaced from the first diamond layer; and a third diamond layer which has a impurity content less than that of the first and second diamond layers, which acts as a channel region, and through which charges are transferred from the first diamond layer to the second diamond layer. The first and second diamond layers have a first and a second end portion, respectively, facing each other with a space located therebetween. The first and second end portions have slopes epitaxially formed depending on the orientation of the substrate. The third diamond layer lies over the slopes and a section of the substrate that is located under the space.
    • 金刚石半导体器件包括由单晶金刚石制成的衬底; 第一金刚石层,放置在衬底上,含有杂质; 含有所述杂质的第二金刚石层,所述第二金刚石层被放置在所述基板上并与所述第一金刚石层间隔开; 以及第三金刚石层,其杂质含量小于作为沟道区的第一和第二金刚石层的杂质含量,并且电荷从第一金刚石层转移到第二金刚石层。 第一和第二金刚石层具有彼此面对的第一和第二端部,其间具有空间。 第一和第二端部具有取决于衬底的取向外延形成的斜面。 第三金刚石层位于斜坡上方,并且位于该空间下方的基底部分。
    • 40. 发明授权
    • Semiconductor accelerometer
    • 半导体加速度计
    • US5567880A
    • 1996-10-22
    • US60832
    • 1993-05-14
    • Yoshihiro YokotaShotaro NaitoToshihiko SuzukiAkira Koide
    • Yoshihiro YokotaShotaro NaitoToshihiko SuzukiAkira Koide
    • G01P15/12G01P15/125G01P15/18H01L27/20G01P15/08
    • H01L27/20G01P15/123G01P15/125G01P15/18G01P2015/0828G01P2015/084G01P2015/0842
    • A semiconductor accelerometer includes a mass portion formed at a center of a silicon plate, a frame portion formed around the circumference of the silicon plate so as to surround the mass portion and a diaphragm portion formed in the silicon plate between the mass portion and the frame portion so as to bridge the mass portion with the frame portion, one of major surfaces of the silicon plate serving as a common continuous major surface for the mass portion, frame portion and diaphragm portion. Piezoresistance elements are formed on the common continuous major surface at the diaphraqm portion and an additional Au film is formed on the common continuous major surface at the mass portion. The additional Au film constitutes in combination with the mass portion a weight which responds to an acceleration acting thereon. The mass of the additional Au film is selected in such a manner that the center of gravity of the weight is located within an area in the mass portion having a depth corresponding to the thickness of the diaphragm portion.
    • 半导体加速度计包括形成在硅板的中心的质量部分,围绕质量部分形成在硅板的周围的框架部分,以及形成在质量部分和框架之间的硅板中的膜部分 为了将质量部分与框架部分桥接,硅板的主表面之一用作质量部分,框架部分和隔膜部分的共同的连续主表面。 压电元件形成在引线部分的公共连续主表面上,并且在质量部分的公共连续主表面上形成附加的Au膜。 附加的Au膜与质量部分组合构成对作用在其上的加速度作出响应的重量。 选择附加Au膜的质量使得重量的重心位于质量部分中具有与膜部分的厚度相对应的深度的区域内。