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    • 39. 发明授权
    • Silicon-germanium bipolar transistor with optimized germanium profile
    • 具有优化锗型材的硅锗双极晶体管
    • US06750483B2
    • 2004-06-15
    • US10200541
    • 2002-07-22
    • Wolfgang KleinRudolf LachnerWolfgang Molzer
    • Wolfgang KleinRudolf LachnerWolfgang Molzer
    • H01L29737
    • H01L29/165H01L29/7378
    • A silicon-germanium bipolar transistor includes a silicon substrate in which a first n-doped emitter region, a second p-doped base region adjoining the latter and a third n-doped collector region adjoining the latter, are formed. A first space charge zone is formed between the emitter region and the base region and a second space charge zone is formed between the base region and the collector region. The base region and an edge zone of the adjoining emitter region are alloyed with germanium. The germanium concentration in the emitter region rises toward the base region. The germanium concentration in a junction region containing the first space charge zone rises less sharply than in the emitter region or decreases and, in the base region, it initially again rises more sharply than in the junction region.
    • 硅 - 锗双极晶体管包括硅衬底,其中形成有第一n掺杂发射极区域,与之相邻的第二p掺杂基极区域和与之相邻的第三n掺杂集电极区域。 在发射极区域和基极区域之间形成第一空间电荷区域,并且在基极区域和集电极区域之间形成第二空间电荷区域。 邻接发射极区域的基极区域和边缘区域与锗合金化。 发射极区域中的锗浓度朝向基极区域上升。 包含第一空间电荷区的结区中的锗浓度比发射极区域急剧上升或降低,并且在基极区域中其初始地再次比在结区域中急剧上升。