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31. 发明授权

US5780206A Fine pattern forming process using a resist composition sensitive to deep ultraviolet light 失效
标题翻译：使用对深紫外光敏感的抗蚀剂组合物的精细图案形成方法
公开(公告)号：US5780206A
公开(公告)日：1998-07-14
申请号：US898086
申请日：1997-07-23
申请人： Fumiyoshi Urano , Takanori Yasuda , Akiko Katsuyama , Kazuhiro Yamashita
发明人： Fumiyoshi Urano , Takanori Yasuda , Akiko Katsuyama , Kazuhiro Yamashita
IPC分类号： G03F7/004 , G03F7/039 , G03F7/09 , G03F7/30 , G03C1/52
CPC分类号： G03F7/091 , G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/127 , Y10S430/128
摘要： A resist composition for deep ultraviolet light comprising (a) one of the following resin components (i)-(iii): (i) a resin which becomes alkali-soluble by eliminating protective groups by the action of an acid, (ii) a combination of an alkali-soluble resin and a dissolution-inhibiting compound, and (iii) a combination of an alkali-soluble resin and a crosslinkable compound, (b) an acid generater, (c) a special anthracene derivative, and (d) a solvent, is suitable for forming a pattern using deep ultraviolet light, KrF excimer laser light, etc., on a highly reflective substrate having level differences due to absorption of undesirable reflected deep ultraviolet light.
摘要翻译：一种用于深紫外光的抗蚀剂组合物，其包含（a）以下树脂组分（i） - （iii）之一：（i）通过酸的作用除去保护基而变成碱溶性的树脂，（ii）碱溶性树脂和溶解抑制性化合物的组合，（iii）碱溶性树脂和交联性化合物的组合，（b）酸产生剂，（c）特殊的蒽衍生物，（d）溶剂适用于使用深紫外光，KrF准分子激光等在由于吸收不期望的反射的深紫外光而具有水平差的高反射性基板上形成图案。

32. 发明授权

US5590137A Semiconductor IC tester 失效
标题翻译：半导体IC测试仪
公开(公告)号：US5590137A
公开(公告)日：1996-12-31
申请号：US322270
申请日：1994-10-13
申请人： Kazuhiro Yamashita
发明人： Kazuhiro Yamashita
IPC分类号： G01R31/28 , G01R31/317 , G01R31/319 , G01R31/3193
CPC分类号： G01R31/31937 , G01R31/31713 , G01R31/31917 , G01R31/31919 , G01R31/31922 , G01R31/31926
摘要： A semiconductor IC tester is capable of undertaking a double-speed test for a IC device under test wherein the test pattern application and resulted signal comparison are performed both in the first half and the latter half of a test cycle of the IC tester without sacrificing the number of test pins. In the double-speed mode, the generating speed of test patterns is doubled as follows. In the first half of the test cycle, a flip-flop is set or reset at the timings of the outputs of first and second delay circuits, respectively. Moreover, in the latter half of test cycle, the flip-flop is set or reset at the timings of the output of third and fourth delay circuits, respectively, which are used usually as enabling and disabling a driver which generates a final form of test signal to the device under test. Threshold voltage values for first and second comparators are set to the same value, the compared result in the first half of test cycle is taken from the first comparator, and the compared result in the latter half is taken from the second comparator. The double-speed test may be applied to IC devices having input-only pins and output-only pins.
摘要翻译：半导体IC测试器能够对被测试的IC器件进行双速测试，其中在IC测试器的测试周期的前半个和后半期都进行测试图案应用和结果信号比较，而不牺牲测试针数。在双速模式下，测试图形的生成速度如下所示。在测试周期的前半部分中，分别在第一和第二延迟电路的输出的定时处设置或复位触发器。此外，在测试周期的后半期，触发器分别在第三和第四延迟电路的输出的定时被设置或复位，这通常被用作启用和禁用产生最终形式的测试的驱动器信号到被测设备。第一和第二比较器的阈值电压值被设置为相同的值，测试周期的前半部分的比较结果取自第一个比较器，后半部分的比较结果取自第二个比较器。双速测试可以应用于具有仅输入引脚和仅输出引脚的IC器件。

33. 发明授权

US5465066A Waveform formatter 失效
标题翻译：波形格式化
公开(公告)号：US5465066A
公开(公告)日：1995-11-07
申请号：US310162
申请日：1994-09-21
申请人： Kazuhiro Yamashita , Toshiyuki Negishi , Masatoshi Sato , Hiroshi Tsukahara
发明人： Kazuhiro Yamashita , Toshiyuki Negishi , Masatoshi Sato , Hiroshi Tsukahara
IPC分类号： G01R31/3183 , G01R31/28 , G01R31/319 , H03K3/04 , H03K11/00
CPC分类号： G01R31/31928 , G01R31/31922
摘要： A waveform formatter for use in testing a semiconductor device is capable of reducing a total size of circuit configuration. The waveform formatter includes a plurality of clock generators in which at low-speed operation, clocks are used to generate waveforms and control signals of drivers, while at high-speed operation, all clocks are used to generate waveforms for drivers. The waveform formatter further includes a parallel-serial converter for converting parallel signals to a serial signal, a data selector for selecting the parallel signals or the serial signal, and a waveform combining circuit for accepting output signals of the clock generators through a format control unit and for generating waveforms and control signals for the drivers using the clocks from the clock generators.
摘要翻译：用于测试半导体器件的波形格式器能够减小电路配置的总体尺寸。波形格式化器包括多个时钟发生器，其中在低速操作下，时钟用于产生驱动器的波形和控制信号，而在高速运行时，所有时钟都用于产生驱动器的波形。波形格式器还包括用于将并行信号转换为串行信号的并行 - 串行转换器，用于选择并行信号或串行信号的数据选择器，以及用于通过格式控制单元接收时钟发生器的输出信号的波形组合电路并使用时钟发生器的时钟产生用于驱动器的波形和控制信号。

34. 发明申请

US20100189184A1 Coding apparatus, coding method, and coding circuit 有权
标题翻译：编码装置，编码方法和编码电路
公开(公告)号：US20100189184A1
公开(公告)日：2010-07-29
申请号：US12662135
申请日：2010-03-31
申请人： Yousuke Yamaguchi , Takato Ohashi , Noriaki Tsukuda , Kazuhiro Yamashita
发明人： Yousuke Yamaguchi , Takato Ohashi , Noriaki Tsukuda , Kazuhiro Yamashita
IPC分类号： H04N7/26
CPC分类号： H04N19/86 , H04N19/107 , H04N19/136 , H04N19/14 , H04N19/152 , H04N19/174 , H04N19/176
摘要： A coding apparatus is for performing a deblocking filter process by dividing input moving image data into frames, and coding the moving image data by dividing the frames into macroblock lines and by shifting and changing, for each frame, a refresh area in which an amount of coding information allocated to a specific macroblock line is larger than that of another macroblock line. The coding apparatus includes a determining unit that determines that a refresh area in a current frame as well as a macroblock line in the current frame corresponding to a macroblock line that will become a refresh area in a frame being subsequently subjected to the coding process becomes a next refresh area. The coding apparatus includes a coding unit that codes the refresh area and the next refresh area by allocating a larger amount of coding information than an amount allocated to the other macroblock line.
摘要翻译：一种编码装置，用于通过将输入的运动图像数据划分成帧来执行去块滤波处理，并且通过将帧划分为宏块行并且通过对于每个帧进行移位和改变来对运动图像数据进行编码，其中，刷新区域的量分配给特定宏块行的编码信息大于另一宏块行的编码信息。编码装置包括确定单元，其确定当前帧中的刷新区域以及与随后进行编码处理的帧中将成为刷新区域的宏块行对应的当前帧中的宏块行变为下一个刷新区域。编码装置包括编码单元，其通过分配比分配给另一宏块行的量更大的编码信息量来对刷新区域和下一个刷新区域进行编码。

35. 发明申请

US20060023789A1 Decoding device and decoding program for video image data 有权
标题翻译：解码设备和视频图像数据解码程序
公开(公告)号：US20060023789A1
公开(公告)日：2006-02-02
申请号：US11020109
申请日：2004-12-27
申请人： Kazuhiro Yamashita , Kenji Orita
发明人： Kazuhiro Yamashita , Kenji Orita
IPC分类号： H04N11/02 , H04N7/12 , H04N11/04 , H04B1/66
CPC分类号： H04N19/423 , G06F12/0862 , G06F12/0875 , H04N19/433 , H04N19/44 , H04N19/51 , H04N19/61
摘要： A decoding device comprises a cache memory for temporally storing video image data, a unit for determining a position of a reference macroblock corresponding to a macroblock to be decoded based on a motion vector obtained by analyzing an encoded bitstream, and a unit for determining whether or not a reference macroblock includes a cacheline boundary when data of the reference macroblock is not stored in the memory and for specifying the position of the boundary as a front address for the data preload from a memory storing the data of the reference macroblock.
摘要翻译：解码装置包括用于暂时存储视频图像数据的高速缓冲存储器，用于基于通过分析编码比特流获得的运动矢量来确定与要解码的宏块对应的参考宏块的位置的单元，以及用于确定是否或当参考宏块的数据未被存储在存储器中并且用于从存储参考宏块的数据的存储器指定作为数据预加载的前端地址的边界的位置时，参考宏块不包括高速缓存行边界。

36. 发明授权

US06634420B2 Intercooler 失效
标题翻译：中冷器
公开(公告)号：US06634420B2
公开(公告)日：2003-10-21
申请号：US10118229
申请日：2002-04-09
申请人： Yoshitsugu Gokan , Fujio Umebayashi , Kazuhiko Tomoda , Kenji Okubo , Kouichi Takeshita , Kazuhiro Yamashita , Naoto Hayashi , Yoshihisa Eto
发明人： Yoshitsugu Gokan , Fujio Umebayashi , Kazuhiko Tomoda , Kenji Okubo , Kouichi Takeshita , Kazuhiro Yamashita , Naoto Hayashi , Yoshihisa Eto
IPC分类号： F28D710
CPC分类号： F02B29/0462 , F01P2060/02 , F28D7/1653 , F28D2021/0082 , F28F1/32 , F28F9/005 , F28F2245/02 , F28F2265/30 , Y02T10/146
摘要： In order to provide an intercooler assuming a simple structure that enables cooling of supercharging air and absorption of any expansion/contraction of the cooling water pipe and the casing attributable to the heat of the supercharging air, intake/outlet pipes of a heat exchanger housed inside a cooling space formed within a case are inserted at cylindrical pipe insertion portions formed at the case, and any gap present between the intake/outlet pipes and the insertion portions are sealed by seal members each constituted of an elastic material formed in a staged cylindrical shape having a first cylindrical portion placed in complete contact with one of the pipe insertion portions and a second cylindrical portion placed in complete contact with either one of the intake/outlet pipes, which are also utilized to fit the heat exchanger in the case with a gap.
摘要翻译：为了提供中间冷却器，假设简单的结构，能够冷却增压空气并且吸收由于增压空气的热量导致的冷却水管和壳体的任何膨胀/收缩，容纳在内部的热交换器的进/出管形成在壳体内的冷却空间被插入到形成在壳体上的圆柱形管插入部分处，并且在进/出管与插入部之间存在的任何间隙被密封件密封，每个密封件由形成为分段圆柱形的弹性材料具有与管插入部分之一完全接触的第一圆柱形部分和与任一个进/出口管完全接触的第二圆柱形部分，其也用于将热交换器装配在具有间隙的壳体中。

37. 发明授权

US06269923B1 Lockup device of torque converter 失效
标题翻译：变矩器闭锁装置
公开(公告)号：US06269923B1
公开(公告)日：2001-08-07
申请号：US09497208
申请日：2000-02-03
申请人： Kazuhiro Yamashita , Mitsugu Yamaguchi
发明人： Kazuhiro Yamashita , Mitsugu Yamaguchi
IPC分类号： F16H4502
CPC分类号： F16H45/02 , F16H2045/0294
摘要： A lockup device 6 is provided for a torque converter 1 that allows for the use of larger torsion springs 50. The lockup device 6 of the torque converter 1 includes a piston 8 and a damper mechanism 13. The piston 8 constitutes a clutch together with a front cover 3. The damper mechanism 13 includes a drive plate 9, a driven plate 10 and coil spring assemblies 12. The drive plate 9 is secured to one axial side surface of the piston 8. The coil spring assemblies 12 couple the drive plate 9 and the driven plate 10 in a rotational direction. Cutouts 41 are formed in the drive plate 9 at positions corresponding to positions of the coil spring assemblies 12. Each coil spring assembly 12 is received within the corresponding one of the cutout 41 and is axially supported by the one axial side surface of the piston 8.
摘要翻译：锁止装置6设置用于允许使用较大的扭转弹簧50的变矩器1。变矩器1的锁止装置6包括活塞8和阻尼机构13.活塞8与一个离合器一起构成阻尼机构13包括驱动板9，从动板10和螺旋弹簧组件12.驱动板9固定在活塞8的一个轴向侧表面上。螺旋弹簧组件12将驱动板9 和从动板10沿旋转方向。在驱动板9上形成有与螺旋弹簧组件12的位置相对应的位置处的切口41.每个螺旋弹簧组件12被容纳在相应的一个切口41内并由活塞8的一个轴向侧面轴向支承。

38. 发明授权

US5695910A Resist composition for deep ultraviolet light 失效
标题翻译：抗紫外线组合物
公开(公告)号：US5695910A
公开(公告)日：1997-12-09
申请号：US702805
申请日：1996-08-26
申请人： Fumiyoshi Urano , Takanori Yasuda , Akiko Katsuyama , Kazuhiro Yamashita
发明人： Fumiyoshi Urano , Takanori Yasuda , Akiko Katsuyama , Kazuhiro Yamashita
IPC分类号： G03F7/004 , G03F7/039 , G03F7/09 , G03C1/52
CPC分类号： G03F7/091 , G03F7/039 , G03F7/0045 , Y10S430/106 , Y10S430/127 , Y10S430/128
摘要： A resist composition for deep ultraviolet light comprising (a) one of the following resin components (i)-(iii): (i) a resin which becomes alkali-soluble by eliminating protective groups by the action of an acid, (ii) a combination of an alkali-soluble resin and a dissolution-inhibiting compound, and (iii) a combination of an alkali-soluble resin and a crosslinkable compound, (b) an acid generater, (c) a special anthracene derivative, and (d) a solvent, is suitable for forming a pattern using deep ultraviolet light, KrF excimer laser light, etc., on a highly reflective substrate having level differences due to absorption of undesirable reflected deep ultraviolet light.
摘要翻译：一种用于深紫外光的抗蚀剂组合物，其包含（a）以下树脂组分（i） - （iii）之一：（i）通过酸的作用除去保护基而变成碱溶性的树脂，（ii）碱溶性树脂和溶解抑制性化合物的组合，（iii）碱溶性树脂和交联性化合物的组合，（b）酸产生剂，（c）特殊的蒽衍生物，（d）溶剂适用于使用深紫外光，KrF准分子激光等在由于吸收不期望的反射的深紫外光而具有水平差的高反射性基板上形成图案。

39. 发明授权

US5518579A Method for forming a fine pattern 失效
标题翻译：形成精细图案的方法
公开(公告)号：US5518579A
公开(公告)日：1996-05-21
申请号：US373776
申请日：1995-01-17
申请人： Akiko Katsuyama , Masaru Sasago , Kazuhiro Yamashita
发明人： Akiko Katsuyama , Masaru Sasago , Kazuhiro Yamashita
IPC分类号： G03F7/085 , G03F7/11 , G03F7/16 , H01L21/00
CPC分类号： G03F7/16 , G03F7/085 , G03F7/11 , Y10S438/949
摘要： An acid solution is fed onto a TiN film formed on a semiconductor substrate. So, the TiN film is dipped into the acid solution, whereupon the surface of the semiconductor substrate is neutralized or is made less basic. Then, a chemically amplified resist, containing an acid generator which produces an acid when irradiated with radiant rays and a compound reactive to acids, is applied to the semiconductor substrate, to form a resist film. This is followed by a step for sending radiant rays upon the resist film to expose it. Then, the exposed resist pattern is developed to form a resist pattern without footing or scumming and under-cutting.
摘要翻译：将酸溶液进料到形成在半导体衬底上的TiN膜上。因此，将TiN膜浸入酸溶液中，于是半导体衬底的表面被中和或制成较少的碱性。然后，在半导体衬底上施加含有产生酸的发生剂的化学放大型抗蚀剂，该酸性发生剂在用辐射线照射时产生酸，反应生成酸的化合物，形成抗蚀剂膜。之后是将辐射线发射到抗蚀剂膜上以使其暴露的步骤。然后，曝光的抗蚀剂图案被显影以形成没有基底或浮渣和下切的抗蚀剂图案。

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