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31. 发明申请

US20100047702A1 RESIST PATTERN FORMING METHOD 有权
标题翻译：电阻图案形成方法
公开(公告)号：US20100047702A1
公开(公告)日：2010-02-25
申请号：US12610907
申请日：2009-11-02
申请人： Kunie OGATA , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
发明人： Kunie OGATA , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
IPC分类号： G03F7/20 , G03B27/32
CPC分类号： H01L21/67253 , G03F7/162 , G03F7/3021 , H01L21/6715
摘要： A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.
摘要翻译：使用涂覆和显影装置和对准器连接的抗蚀剂图案形成方法被控制以在其上形成有基膜和基底图案的基板的表面上形成抗蚀剂膜，然后检查至少一个选自以下的多个测量项目：基膜和抗蚀剂膜的反射率和膜厚度，显影后的线宽度，基底图案与抗蚀剂图案匹配的精度，显影后的表面上的缺陷等。基于每个测量项目的对应数据（例如抗蚀剂的膜厚度和显影后的线宽度）来选择修改参数，并且修改参数。这导致操作者的工作量减少，并且可以执行适当的修改。

32. 发明申请

US20060067532A1 Communication unit and communication method 审中-公开
标题翻译：通讯单元及通讯方式
公开(公告)号：US20060067532A1
公开(公告)日：2006-03-30
申请号：US11235071
申请日：2005-09-27
申请人： Yoshio Kimura , Noriya Sakamoto
发明人： Yoshio Kimura , Noriya Sakamoto
IPC分类号： H04L9/00
CPC分类号： H04L9/0891 , H04L9/0894 , H04L2209/60
摘要： A communication unit of the invention has a ciphering section which ciphers a content signal with a cipher key and outputs a ciphered content signal, a key ciphering section which ciphers the cipher key with the static device key and the dynamic device key preliminarily stored and outputs a ciphered cipher key, communication sections which makes communication in order to record the ciphered content signal in a predetermined unit on the network and record the ciphered cipher key in a predetermined region on the network, and a key updating section which, when the cipher key is abolished, updates the stored dynamic device key.
摘要翻译：本发明的通信单元具有加密部分，其使用加密密钥对内容信号进行加密，并输出加密的内容信号;密钥加密部分，其利用静态设备密钥加密密钥和预先存储的动态设备密钥，并输出加密密钥，进行通信的通信部分，以便在网络上的预定单元中记录加密内容信号，并将加密密码密钥记录在网络上的预定区域中;密钥更新部分，当密码密钥为废除，更新存储的动态设备密钥。

33. 发明授权

US06984477B2 Resist pattern forming apparatus and method thereof 失效
标题翻译：抗蚀剂图案形成装置及其方法
公开(公告)号：US06984477B2
公开(公告)日：2006-01-10
申请号：US09963527
申请日：2001-09-27
申请人： Kunie Ogata , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
发明人： Kunie Ogata , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
IPC分类号： G03F9/00 , G03F7/20 , G03F7/30 , G03F7/40 , B05D3/12
CPC分类号： H01L21/67253 , G03F7/162 , G03F7/3021 , H01L21/6715
摘要： A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and an appropriate amendment can be performed.
摘要翻译：使用涂覆和显影装置和对准器连接的抗蚀剂图案形成方法被控制以在其上形成有基膜和基底图案的基板的表面上形成抗蚀剂膜，然后检查至少一个选自以下的多个测量项目：基膜和抗蚀剂膜的反射率和膜厚度，显影后的线宽度，基底图案与抗蚀剂图案匹配的精度，显影后的表面上的缺陷等。基于每个测量项目的对应数据（例如抗蚀剂的膜厚度和显影后的线宽度）来选择修改参数，并且修改参数。这导致操作者的工作量减少，并且可以执行适当的修改。

34. 发明授权

US06713239B2 Developing method and developing apparatus 失效
标题翻译：开发方法和开发设备
公开(公告)号：US06713239B2
公开(公告)日：2004-03-30
申请号：US10108382
申请日：2002-03-29
申请人： Takayuki Toshima , Tsutae Omori , Yoshio Kimura
发明人： Takayuki Toshima , Tsutae Omori , Yoshio Kimura
IPC分类号： G03F730
CPC分类号： G03D5/04 , G03F7/3021 , G03F7/38 , Y10S134/902
摘要： A solution having a photosensitive radical is applied onto a resist film, a developing solution is applied thereonto, and the entire surface of the solution having the photosensitive radical is exposed all at once. Developing of the resist film progresses all at once after a coating film of the solution having the photosensitive radical dissolves in the developing solution, and hence time difference in the start time of developing does not occur in the surface of a substrate, thereby enabling uniform developing and an improvement in line width uniformity (CD value uniformity) in the surface of the substrate.
摘要翻译：将具有光敏基团的溶液施加到抗蚀剂膜上，将显影液施加到其上，并且具有光敏基团的溶液的整个表面全部被曝光。在具有感光性自由基的溶液的涂膜溶解在显影液中之后，抗蚀剂膜的显影全部进行，因此在基板表面上不会发生显影开始时间的时间差，从而能够均匀显影以及衬底表面的线宽均匀性（CD值均匀性）的改善。

35. 发明授权

US06593045B2 Substrate processing apparatus and method 有权
标题翻译：基板加工装置及方法
公开(公告)号：US06593045B2
公开(公告)日：2003-07-15
申请号：US09902159
申请日：2001-07-11
申请人： Norikatsu Sato , Kunie Ogata , Yoshio Kimura , Hiroshi Tomita , Seiji Nakashima , Hidehiko Kamiya
发明人： Norikatsu Sato , Kunie Ogata , Yoshio Kimura , Hiroshi Tomita , Seiji Nakashima , Hidehiko Kamiya
IPC分类号： G03F900
CPC分类号： H01L21/67161 , G01N21/9501 , H01L21/67178 , H01L21/67184 , H01L21/67778 , H01L21/67781 , Y10S414/136 , Y10S414/137 , Y10S414/141
摘要： A cassette station, a processing station having a coating unit and a developing unit, and an inspecting station having a film thickness inspecting apparatus and a defect inspecting apparatus are disposed in the direction approximately perpendicular to the direction of the disposition of cassettes of the cassette station in such a manner that the inspecting station is disposed midway between the cassette station and the processing station. In the structure, the inspecting station and the processing station are connected and wafers are automatically transferred among the stations, operations from the substrate process to the inspection can be simplified and the time period necessary therefore can be shortened.
摘要翻译：具有涂布单元和显影单元的盒式磁带站，具有膜厚度检查装置和缺陷检查装置的检查站沿大致垂直于盒式磁带机的盒的方向的方向设置以这样的方式，使得检查站位于盒站和处理站之间的中间。在结构中，检测站和处理站连接，晶片自动转移到站之间，可以简化从基板处理到检查的操作，从而可以缩短所需的时间。

36. 发明授权

US5908657A Coating apparatus and method of controlling the same 失效
标题翻译：涂布装置及其控制方法
公开(公告)号：US5908657A
公开(公告)日：1999-06-01
申请号：US946917
申请日：1997-10-09
申请人： Yoshio Kimura , Satoshi Morita , Yuuji Matsuyama
发明人： Yoshio Kimura , Satoshi Morita , Yuuji Matsuyama
IPC分类号： B05B15/04 , B05C11/08 , B05D1/00 , H01L21/00 , B05D3/12 , B05C5/00
CPC分类号： H01L21/6715 , B05B15/0406 , B05D1/005 , B05C11/08
摘要： In the present invention, a waste solution and a exhaust gas are guided together from a drain cup DC into a storing means through common discharge means. Naturally, the gas-liquid separation is performed within the storing means in place of performing the gas-liquid separation within the drain cup DC. Therefore, the waste solution is not solidified within the drain cup so as to plug the common discharge means. Also, a predetermined waste solution is kept stored in the storing means included in the coating apparatus of the present invention, making it possible to permit the surface of the stored waste solution to absorb the mist, and the waste solution is prevented from being solidified within the storing means. Further, since a minimum amount of the exhaust gas is kept discharged even during non-operation of the coating apparatus by using an exhaust gas damper whose degree of opening can be controlled, the waste solution stored in the storing means is prevented from being solidified. Also, the waste solution evaporated within the storing means can be released to the outside.
摘要翻译：在本发明中，废液和废气通过共同排放装置从排水杯DC一起被引导到存储装置中。自然地，在储存装置内进行气液分离，代替在排水杯DC内进行气液分离。因此，废液不会在排水杯内凝固，堵塞普通排放装置。此外，将预定的废液保存在本发明的涂布装置所包含的储存装置中，使得可以使储存的废液的表面吸收雾气，并且防止废液在其内固化存储装置。此外，由于即使在使用能够控制开度的排气阻尼器的涂布装置的非操作期间，排气的最小量也被排出，所以防止存储在存储装置中的废液固化。此外，在存储装置内蒸发的废液可以释放到外部。

37. 发明授权

US5711809A Coating apparatus and method of controlling the same 失效
公开(公告)号：US5711809A
公开(公告)日：1998-01-27
申请号：US634739
申请日：1996-04-18
申请人： Yoshio Kimura , Satoshi Morita , Yuuji Matsuyama
发明人： Yoshio Kimura , Satoshi Morita , Yuuji Matsuyama
IPC分类号： B05B15/04 , B05C11/08 , B05D1/00 , H01L21/00 , B05C5/00
CPC分类号： H01L21/6715 , B05B15/0406 , B05D1/005 , B05C11/08
摘要： In the present invention, a waste solution and a exhaust gas are guided together from a drain cup DC into a storing means through common discharge means. Naturally, the gas-liquid separation is performed within the storing means in place of performing the gas-liquid separation within the drain cup DC. Therefore, the waste solution is not solidified within the drain cup so as to plug the common discharge means. Also, a predetermined waste solution is kept stored in the storing means included in the coating apparatus of the present invention, making it possible to permit the surface of the stored waste solution to absorb the mist, and the waste solution is prevented from being solidified within the storing means. Further, since a minimum amount of the exhaust gas is kept discharged even during non-operation of the coating apparatus by using an exhaust gas damper whose degree of opening can be controlled, the waste solution stored in the storing means is prevented from being solidified. Also, the waste solution evaporated within the storing means can be released to the outside.

38. 发明授权

US5578127A System for applying process liquid 失效
标题翻译：用于加工液体的系统
公开(公告)号：US5578127A
公开(公告)日：1996-11-26
申请号：US574732
申请日：1995-12-19
申请人： Yoshio Kimura
发明人： Yoshio Kimura
IPC分类号： B65G49/07 , G03F7/16 , H01L21/00 , H01L21/31 , H01L21/677 , H01L21/68 , B05B13/02 , B05C5/00 , B05C13/00
CPC分类号： G03F7/16 , H01L21/6715 , Y10S134/902
摘要： A system for coating a photoresist on a semiconductor wafer includes a loading/unloading unit and a process unit. A convey path is arranged in the process unit, and an adhesion process section, a pre-bake section, a cooling section, a resist coating section, and a cover film coating section are arranged along the convey path. The adhesion process section, the pre-bake section, and the cover film coating section are arranged in individual process chambers, while the cooling section and the resist coating section are arranged in a common main process chamber. A convey robot is disposed to be movable along the convey path, and a substrate is conveyed among the process chambers by the convey robot. A convey member is arranged in and dedicated to the main process chamber, and the substrate is conveyed from the cooling section to the-resist coating section by the convey member.
摘要翻译：用于在半导体晶片上涂覆光致抗蚀剂的系统包括装载/卸载单元和处理单元。输送路径布置在处理单元中，沿着传送路径布置粘合处理部分，预烘烤部分，冷却部分，抗蚀剂涂覆部分和覆盖膜涂覆部分。粘附处理部分，预烘烤部分和覆盖膜涂覆部分被布置在各个处理室中，而冷却部分和抗蚀剂涂覆部分被布置在共同的主处理室中。输送机器人设置成可沿输送路径移动，并且基板通过输送机器人在处理室之间输送。传送部件布置在主处理室中并专用于主处理室，并且基板通过传送部件从冷却部分传送到抗蚀涂层部分。

39. 发明授权

US5122041A Scroll type fluid displacement apparatus having an axially movable seal plate 失效
标题翻译：具有轴向移动密封板的滚动型流体变位装置
公开(公告)号：US5122041A
公开(公告)日：1992-06-16
申请号：US540479
申请日：1990-06-19
申请人： Taketoshi Yokota , Yoshio Kimura , Kenichi Ida
发明人： Taketoshi Yokota , Yoshio Kimura , Kenichi Ida
IPC分类号： F04C18/02 , F04C27/00
CPC分类号： F04C27/005 , F04C18/0253 , F04C18/0261 , F04C2240/801
摘要： A scroll type fluid displacement apparatus, in particular, a compressor unit is disclosed. The apparatus includes a pair of scroll members interfitting at an angular and radial offset for forming fluid pockets, each scroll member including an end plate and a spiral element. A seal plate is provided on the surface of the end plate of at least one scroll member and is movable between the surface of the end plate of the scroll member and the axial end surface of the spiral element of the other scroll member. A fluid introducing mechanism is provided on the central portion of the spiral elements for introducing a high-pressure fluid between the seal plate and the end plate to move the seal plate in the axial direction for sealing the fluid pockets more completely.

40. 发明授权

US4895842A Phenylalanine derivative and proteinase inhibitor 失效
公开(公告)号：US4895842A
公开(公告)日：1990-01-23
申请号：US912480
申请日：1986-09-29
申请人： Shosuke Okamoto , Yoshio Okada , Akiko Okunomiya , Taketoshi Naito , Yoshio Kimura , Morihiko Yamada , Norio Ohno , Yasuhiro Katsuura , Yumi Seki
发明人： Shosuke Okamoto , Yoshio Okada , Akiko Okunomiya , Taketoshi Naito , Yoshio Kimura , Morihiko Yamada , Norio Ohno , Yasuhiro Katsuura , Yumi Seki
IPC分类号： A61K38/00 , C07D211/16 , C07D211/32 , C07D211/62 , C07D213/30 , C07D213/40 , C07D213/64 , C07D213/643 , C07D213/75 , C07D239/42 , C07D295/185 , C07D307/14 , C07D401/12 , C07K5/065
CPC分类号： C07D213/30 , C07D211/16 , C07D211/32 , C07D211/62 , C07D213/40 , C07D213/643 , C07D213/75 , C07D239/42 , C07D295/185 , C07D307/14 , C07D401/12 , C07K5/06078 , A61K38/00
摘要： A phenylalanine derivative having the formula (I): ##STR1## where R.sup.1 and R.sup.2 are independently hydrogen provided that both R.sup.1 and R.sup.2 are not hydrogen at the same time;C.sub.1 -C.sub.8 alkyl which may be substituted with hydroxy, hydroxycarbonyl, C.sub.1 -C.sub.4 alkoxycarbonyl, C.sub.1 -C.sub.4 alkylmercapto, C.sub.1 -C.sub.4 alkoxy, carbamoyl, sulfamoyl, pyridyl, or phenyl which may further be substituted with nitro, C.sub.1 -C.sub.4 alkoxy, or halogen;C.sub.6 -C.sub.8 cycloalkyl which may be substituted with hydroxy, C.sub.1 -C.sub.4 alkoxy, hydroxylcarbonyl, C.sub.1 -C.sub.4 alkoxycarbonyl, or C.sub.1 -C.sub.4 alkyl;phenyl which may be substituted with halogen, nitro, trifluoromethyl, C.sub.1 -C.sub.4 alkoxy C.sub.1 C.sub.4 alkylmercapto, C.sub.1 -C.sub.4 alkylcarbonyl, phenylcarbonyl, hydroxycarbonyl, C.sub.1 -C.sub.4 alkoxycarbonyl, carbamoyl, sulfamoyl, amidino, pyridylcarbonyl, or C.sub.1 -C.sub.6 alkyl which may further be substituted with C.sub.1 -C.sub.4 alkylcarbonyl, hydroxycarbonyl, or C.sub.1 -C.sub.4 alkoxycarbonyl;pyridyl which may be substituted with halogen or C.sub.1 -C.sub.4 alkoxy;pyrimidyl;N-benzylazacyclohexyl; andR.sup.1 and R.sup.2 may form with the nitrogen atom attached thereto a ring structure as morpholino; thiomorpholino; piperazino which may be substituted with phenylcarbonyl, benzyl, or C.sub.1 -C.sub.4 alkyl;pyrrolidyl which may be substituted with hydroxycarbonyl or C.sub.1 -C.sub.4 alkoxycarbonyl; andpiperidino substituted with C.sub.1 -C.sub.4 alkyl, phenyl C.sub.1 -C.sub.4 alkyl, phenycarbonyl, or C.sub.1 -C.sub.4 alkoxycarbonyl;X is hydrogen; nitro; amino; or --OZ wherein Z is hydrogen; C.sub.1 -C.sub.4 alkyl; C.sub.2 -C.sub.4 alkenyl; benzyl which may be substituted with halogen, C.sub.1 -C.sub.4 alkyl, nitro, trifluoromethyl, hydroxycarbonyl, C.sub.1 -C.sub.4 alkoxycarbonyl, or cyano; phenylcarbonylmethyl; pyridylmethyl; phenyl which may be substituted with nitro or halogen; pyridyl or pyrimidyl which may be substituted with nitro; phenylsulfonyl which may be substituted with C.sub.1 -C.sub.4 alkyl; or benzyloxycarbonyl which may be substituted with halogen;n is 4 to 10; andthe mark * indicates that the configuration of the carbon may be either one of D-configuration, L-configuration and DL-configuration or a pharmaceutical acceptable salt thereof.This phenylalanine derivative is effective as a proteinase inhibitor.

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