专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明申请

US20100326353A1 COATING AND DEVELOPING APPARATUS 审中-公开
公开(公告)号：US20100326353A1
公开(公告)日：2010-12-30
申请号：US12855524
申请日：2010-08-12
申请人： Masami AKIMOTO , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami AKIMOTO , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B05C9/12
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178 , H01L21/67207 , H01L21/67745
摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.

2. 发明申请

US20100277755A1 INFORMATION PROCESSING APPARATUS CONNECTED TO A PRINTING APPARATUS VIA A NETWORK AND COMPUTER-READABLE STORAGE MEDIUM HAVING STORED THEREON A PROGRAM FOR CAUSING A COMPUTER TO EXECUTE GENERATING PRINT DATA IN THE INFORMATION PROCESSING APPARATUS CONNECTED TO THE PRINTING APPARATUS VIA THE NETWORK 有权
标题翻译：通过网络连接到打印设备的信息处理设备和存储有打印机的计算机可读存储介质导致计算机执行通过网络连接到打印设备的信息处理设备中的生成打印数据的程序
公开(公告)号：US20100277755A1
公开(公告)日：2010-11-04
申请号：US12836395
申请日：2010-07-14
申请人： Yoshio Kimura , Yushi Matsukubo , Fumio Mikami , Yoshinobu Umeda , Tadashi Kawaguchi , Hiroshi Uchikawa , Yasuhiko Hirano , Hitoshi Imai , Hiroyasu Morita
发明人： Yoshio Kimura , Yushi Matsukubo , Fumio Mikami , Yoshinobu Umeda , Tadashi Kawaguchi , Hiroshi Uchikawa , Yasuhiko Hirano , Hitoshi Imai , Hiroyasu Morita
IPC分类号： G06K15/02 , H04L9/28
CPC分类号： H04N1/44 , H04L9/0822 , H04N1/00236 , H04N2201/0039 , H04N2201/0094
摘要： An information processing apparatus connected to a printing apparatus via a network encrypts print data if identification information is input, and does not encrypt print data if identification information is not input. If identification information is input and the print data has been encrypted, the information processing apparatus sends a print job including the encrypted print data to the printing apparatus via the network; otherwise, the information processing apparatus sends unencrypted print data to the printing apparatus via the network.
摘要翻译：经由网络连接到打印装置的信息处理装置如果输入了识别信息则对打印数据进行加密，如果未输入识别信息，则不对打印数据进行加密。如果输入了识别信息并且打印数据已被加密，则信息处理设备经由网络将包含加密的打印数据的打印作业发送到打印设备; 否则，信息处理装置经由网络向打印装置发送未加密的打印数据。

3. 发明授权

US07797855B2 Heating apparatus, and coating and developing apparatus 有权
标题翻译：加热装置和涂装显影装置
公开(公告)号：US07797855B2
公开(公告)日：2010-09-21
申请号：US11505810
申请日：2006-08-18
申请人： Tetsuo Fukuoka , Masami Akimoto , Takahiro Kitano , Yoshio Kimura , Shinichi Hayashi , Hikaru Ito
发明人： Tetsuo Fukuoka , Masami Akimoto , Takahiro Kitano , Yoshio Kimura , Shinichi Hayashi , Hikaru Ito
IPC分类号： F26B21/06
CPC分类号： C30B33/02 , C30B35/00 , H01L21/67098 , H01L21/67748
摘要： A heating apparatus 2 comprises a housing 20; a flat heating chamber 4 which is provided in the housing 2 and adapted to heat a wafer W used as a substrate, with one side of the heating chamber 4 opening for carrying in and carrying out the wafer; and a heating plates 44, 45 provided in the heating chamber 4 such that the wafer W can be heated from both above and below. A cooling plate 3 is provided in the housing 20 located in the vicinity of the opening of the heating chamber 4, for cooling the wafer W after being heated by the heating plates 44, 45. Additionally, a carrying means is provided in the housing 20 for carrying the wafer W between an upper position of the cooling plate 3 and the interior of the heating chamber 4 such that a heat treatment for the wafer W can be performed with the wafer W being held in the heating chamber 4.
摘要翻译：加热装置2包括壳体20; 平面加热室4，其设置在壳体2中并且适于加热用作基板的晶片W，加热室4的一侧开口用于承载和执行晶片; 以及设置在加热室4中的加热板44,45，使得晶片W能够从上下两者加热。冷却板3设置在位于加热室4的开口附近的壳体20中，用于在被加热板44,45加热之后冷却晶片W.此外，在壳体20中设置有承载装置用于在冷却板3的上部位置和加热室4的内部之间承载晶片W，使得可以在将晶片W保持在加热室4中的情况下进行晶片W的热处理。

4. 发明授权

US07793609B2 Coating and developing apparatus 有权
标题翻译：涂装显影装置
公开(公告)号：US07793609B2
公开(公告)日：2010-09-14
申请号：US11342616
申请日：2006-01-31
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B05C5/02
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178 , H01L21/67207 , H01L21/67745
摘要： Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.
摘要翻译：提供一种由多个单元块组成的涂层显影装置。第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。用于显影的单元块，每个包括多个处理单元，包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。用于应用或涂布的单元块包括多个处理单元，其包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置，布置在用于显影的单位块上方。用于应用的单元块被布置在第一和第二单元块堆叠中。根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。暴露的晶片仅通过单元块进行开发，而不经过用于应用的单元块中的任何一个。

5. 发明授权

US07782477B2 Information processing apparatus connected to a printing apparatus via a network and computer-readable storage medium having stored thereon a program for causing a computer to execute generating print data in the information processing apparatus connected to the printing apparatus via the network 有权
标题翻译：经由网络连接到打印设备的信息处理设备和其上存储有用于使计算机执行通过网络连接到打印设备的信息处理设备中生成打印数据的程序的计算机可读存储介质
公开(公告)号：US07782477B2
公开(公告)日：2010-08-24
申请号：US11041067
申请日：2005-01-21
申请人： Yoshio Kimura , Yushi Matsukubo , Fumio Mikami , Yoshinobu Umeda , Tadashi Kawaguchi , Hiroshi Uchikawa , Yasuhiko Hirano , Hitoshi Imai , Hiroyasu Morita
发明人： Yoshio Kimura , Yushi Matsukubo , Fumio Mikami , Yoshinobu Umeda , Tadashi Kawaguchi , Hiroshi Uchikawa , Yasuhiko Hirano , Hitoshi Imai , Hiroyasu Morita
IPC分类号： G06F15/00 , B41J1/00
CPC分类号： H04N1/44 , H04L9/0822 , H04N1/00236 , H04N2201/0039 , H04N2201/0094
摘要： An information processing apparatus connected to a printing apparatus via a network encrypts print data if identification information is input, and does not encrypt print data if identification information is not input. If identification information is input and the print data has been encrypted, the information processing apparatus sends a print job including the encrypted print data to the printing apparatus via the network; otherwise, the information processing apparatus sends unencrypted print data to the printing apparatus via the network.
摘要翻译：经由网络连接到打印装置的信息处理装置如果输入了识别信息则对打印数据进行加密，如果未输入识别信息，则不对打印数据进行加密。如果输入了识别信息并且打印数据已被加密，则信息处理设备经由网络将包含加密的打印数据的打印作业发送到打印设备; 否则，信息处理装置经由网络向打印装置发送未加密的打印数据。

6. 发明申请

US20100047702A1 RESIST PATTERN FORMING METHOD 有权
标题翻译：电阻图案形成方法
公开(公告)号：US20100047702A1
公开(公告)日：2010-02-25
申请号：US12610907
申请日：2009-11-02
申请人： Kunie OGATA , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
发明人： Kunie OGATA , Koki Nishimuko , Hiroshi Tomita , Yoshio Kimura , Ryouichi Uemura , Michio Tanaka
IPC分类号： G03F7/20 , G03B27/32
CPC分类号： H01L21/67253 , G03F7/162 , G03F7/3021 , H01L21/6715
摘要： A resist pattern forming method using a coating and developing apparatus and an aligner being connected thereto which are controlled to form a resist film on a surface of a substrate with a base film and a base pattern formed thereon, followed by inspecting at least one of a plurality of measurement items selected from: reflection ratio and film thickness of the base film and the resist film, line width after a development, an accuracy that the base pattern matches with a resist pattern, a defect on the surface after the development, etc. A parameter subject to amendment is selected based on corresponding data of each measurement item, such as the film thickness of the resist and the line width after the development, and amendment of the parameter is performed. This results in a reduced workload of an operator, and the appropriate amendment can be performed.
摘要翻译：使用涂覆和显影装置和对准器连接的抗蚀剂图案形成方法被控制以在其上形成有基膜和基底图案的基板的表面上形成抗蚀剂膜，然后检查至少一个选自以下的多个测量项目：基膜和抗蚀剂膜的反射率和膜厚度，显影后的线宽度，基底图案与抗蚀剂图案匹配的精度，显影后的表面上的缺陷等。基于每个测量项目的对应数据（例如抗蚀剂的膜厚度和显影后的线宽度）来选择修改参数，并且修改参数。这导致操作者的工作量减少，并且可以执行适当的修改。

7. 发明授权

US07281869B2 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US07281869B2
公开(公告)日：2007-10-16
申请号：US11335635
申请日：2006-01-20
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B5/00
CPC分类号： H01L21/67184 , H01L21/00 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system can cope with a case where antireflection films are formed and a case where any antireflection film is not formed. Film forming unit blocks, namely, a TCT layer, a COT layer and a BCT layer, and developing unit blocks, namely, DEV layers, are stacked up in layers in a processing block. The TCT layer, the COT layer and the BCT layer are used selectively in the case where antireflection films are formed and where no antireflection film is formed. The coating and developing system is controlled by a simple carrying program.
摘要翻译：涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。涂覆和显影系统可以应对形成防反射膜的情况以及没有形成任何抗反射膜的情况。成膜单位块，即TCT层，COT层和BCT层，以及显影单元块，即DEV层，在处理块中层叠。在形成防反射膜并且不形成抗反射膜的情况下，TCT层，COT层和BCT层被选择性地使用。涂层和显影系统由简单的携带程序控制。

8. 发明申请

US20060164613A1 Coating and developing system and coating and developing method 有权
公开(公告)号：US20060164613A1
公开(公告)日：2006-07-27
申请号：US11117566
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： G03B27/32
CPC分类号： H01L21/67184 , H01L21/6715 , H01L21/67178 , H01L21/6719
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.

9. 发明申请

US20060162646A1 Coating and developing system and coating and developing method 有权
标题翻译：涂层开发系统及涂层开发方法
公开(公告)号：US20060162646A1
公开(公告)日：2006-07-27
申请号：US11117552
申请日：2005-04-29
申请人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
发明人： Masami Akimoto , Shinichi Hayashi , Yasushi Hayashida , Nobuaki Matsuoka , Yoshio Kimura , Issei Ueda , Hikaru Ito
IPC分类号： B05D5/06 , B05C11/02 , B05C13/02
CPC分类号： H01L21/67184 , H01L21/67173 , H01L21/67178
摘要： A coating and developing system includes a resist film forming unit block and antireflection film forming unit blocks stacked up in layers to form a resist film and an antireflection film underlying the resist film and an antireflection film overlying the resist film in a small space. The coating and developing system is capable of coping with either of a case where antireflection films are formed and a case where any antireflection film is not formed and needs simple software. Film forming unit blocks, namely, a TCT layer B3, a COT layer B4 and a BCT layer B5, and developing unit blocks, namely, DEV layers B1 and B2, are stacked up in layers in a processing block S2. The TCT layer B3, the COT layer B4 and the BCT layer B5 are used selectively in the case where antireflection films are formed and the case where any antireflection film is not formed. The coating and developing system is controlled by a simple carrying program and simple software.
摘要翻译：涂覆显影系统包括：抗蚀剂膜形成单元块和层叠的抗反射膜形成单元块，以形成抗蚀剂膜和抗反射膜下面的抗反射膜以及在小空间中覆盖抗蚀剂膜的抗反射膜。涂层显影系统能够应对形成防反射膜的情况和没有形成任何抗反射膜的情况，并且需要简单的软件。成膜单元块，即TCT层B 3，COT层B 4和BCT层B 5以及显影单元块，即DEV层B 1和B 2，层叠在处理块S 2。在形成防反射膜的情况下，选择性地使用TCT层B 3，COT层B 4和BCT层B 5以及未形成任何抗反射膜的情况。涂层和显影系统由简单的携带程序和简单的软件控制。

10. 发明申请

US20060067532A1 Communication unit and communication method 审中-公开
标题翻译：通讯单元及通讯方式
公开(公告)号：US20060067532A1
公开(公告)日：2006-03-30
申请号：US11235071
申请日：2005-09-27
申请人： Yoshio Kimura , Noriya Sakamoto
发明人： Yoshio Kimura , Noriya Sakamoto
IPC分类号： H04L9/00
CPC分类号： H04L9/0891 , H04L9/0894 , H04L2209/60
摘要： A communication unit of the invention has a ciphering section which ciphers a content signal with a cipher key and outputs a ciphered content signal, a key ciphering section which ciphers the cipher key with the static device key and the dynamic device key preliminarily stored and outputs a ciphered cipher key, communication sections which makes communication in order to record the ciphered content signal in a predetermined unit on the network and record the ciphered cipher key in a predetermined region on the network, and a key updating section which, when the cipher key is abolished, updates the stored dynamic device key.
摘要翻译：本发明的通信单元具有加密部分，其使用加密密钥对内容信号进行加密，并输出加密的内容信号;密钥加密部分，其利用静态设备密钥加密密钥和预先存储的动态设备密钥，并输出加密密钥，进行通信的通信部分，以便在网络上的预定单元中记录加密内容信号，并将加密密码密钥记录在网络上的预定区域中;密钥更新部分，当密码密钥为废除，更新存储的动态设备密钥。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式