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    • 4. 发明授权
    • Coating and developing apparatus
    • 涂装显影装置
    • US07793609B2
    • 2010-09-14
    • US11342616
    • 2006-01-31
    • Masami AkimotoShinichi HayashiYasushi HayashidaNobuaki MatsuokaYoshio KimuraIssei UedaHikaru Ito
    • Masami AkimotoShinichi HayashiYasushi HayashidaNobuaki MatsuokaYoshio KimuraIssei UedaHikaru Ito
    • B05C5/02
    • H01L21/67184H01L21/67173H01L21/67178H01L21/67207H01L21/67745
    • Provided is a coating and developing apparatus composed of an assembly of plural unit blocks. A first unit-block stack and a second unit-block stack are arranged at different positions with respect to front-and-rear direction. Unit blocks for development, each of which comprises plural processing units including a developing unit that performs developing process after exposure and a transfer device that transfers a substrate among the processing units, are arranged at the lowermost level. Unit blocks for application, or coating, each of which comprises plural processing units including a coating unit that performs application process before exposure and a transfer device that transfers a substrate among the processing units, are arranged above the unit blocks for development. Unit blocks for application are arranged in both the first and second unit-block stacks. Unit blocks for application which a wafer goes through are determined depending on the layering positional relationship between an antireflective film and a resist film. An exposed wafer goes only through the unit block for development without going through any one of the unit blocks for application.
    • 提供一种由多个单元块组成的涂层显影装置。 第一单位块堆叠和第二单位块堆叠被布置在相对于前后方向的不同位置。 用于显影的单元块,每个包括多个处理单元,包括执行曝光之后的显影处理的显影单元和在处理单元之间传送基板的转印装置布置在最下层。 用于应用或涂布的单元块包括多个处理单元,其包括在曝光之前进行施加处理的涂布单元和在处理单元之间传送基板的转印装置,布置在用于显影的单位块上方。 用于应用的单元块被布置在第一和第二单元块堆叠中。 根据防反射膜和抗蚀剂膜之间的层叠位置关系确定晶片通过的应用单元块。 暴露的晶片仅通过单元块进行开发,而不经过用于应用的单元块中的任何一个。