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31. 发明授权

US06190841B1 Pattern forming process and a photosensitive composition 失效
标题翻译：图案形成工艺和光敏组合物
公开(公告)号：US06190841B1
公开(公告)日：2001-02-20
申请号：US09217580
申请日：1998-12-21
申请人： Naoko Kihara , Satoshi Saito , Toru Ushirogouchi
发明人： Naoko Kihara , Satoshi Saito , Toru Ushirogouchi
IPC分类号： G03C556
CPC分类号： G03F7/38 , G03F7/0045 , G03F7/039
摘要： The present invention provides a pattern forming process. The process comprises the following steps. (1) A photosensitive material is prepared by coating a photosensitive composition onto the surface of a substrate. The photosensitive composition comprises the following components: (a) an acid generator which generates an acid when irradiated with actinic radiation, and (b) a compound containing carboxyl groups, which can decompose upon decarboxylation. (2) The photosensitive material is subjected to pattern-wise exposure to actinic radiation, thereby allowing the acid generator (a) to generate an acid in the exposed area. (3) The acid generated in the exposed area is neutralized with a basic compound (c). (4) The carboxyl groups in the carboxyl-group-containing compound (b) in the unexposed area are decarboxylated by applying conditions under which the basic compound (c) can catalyze decarboxylation. (5) The photosensitive material, and composition used in the above process are developed. The basic compound (c) can be introduced in advance into the photosensitive material prepared in step (1). By using such a pattern forming process or a photosensitive composition, a pattern can successfully be formed with high reproducibility without being affected by the environment.
摘要翻译：本发明提供一种图案形成方法。该方法包括以下步骤：（1）通过将光敏组合物涂布在基材的表面上来制备感光材料。光敏组合物包含以下组分：（a）当用光化辐射照射时产生酸的酸产生剂，和（b）含羧基的化合物，其可在脱羧时分解;（2）感光材料经受图案（3）暴露区域产生的酸用碱性化合物（c）中和;（4）羧基基团（A）在酸性发生剂（a）通过施用碱性化合物（c）可以催化脱羧作用的条件，在未曝光区域的含羧基化合物（b）中脱羧。（5）显影在上述方法中使用的感光材料和组合物。基本化合物（c）可以预先引入到步骤（1）中制备的感光材料中。通过使用这种图案形成方法或光敏组合物，可以以不会受环境影响的方式，以高再现性成功地形成图案。

32. 发明授权

US5340684A Photosensitive composition and resin-encapsulated semiconductor device 失效
标题翻译：光敏组合物和树脂封装的半导体器件
公开(公告)号：US5340684A
公开(公告)日：1994-08-23
申请号：US158490
申请日：1993-11-29
申请人： Rumiko Hayase , Masayuki Oba , Naoko Kihara , Yukihiro Mikogami
发明人： Rumiko Hayase , Masayuki Oba , Naoko Kihara , Yukihiro Mikogami
IPC分类号： G03F7/075 , H01L21/312 , H01L23/29 , G03F7/023 , G03F7/115
CPC分类号： H01L21/312 , G03F7/0754 , G03F7/0757 , G03F7/0758 , H01L23/293 , H01L2924/0002 , Y10S430/106
摘要： A photosensitive composition contains a polyimide constituted by a repeating unit having a hydroxyl group and a repeating unit having a siloxane bond, or a repeating unit having a hydroxyl group, a repeating unit having a siloxane bond, and a repeating unit other than these two repeating units, and a photosensitive agent consisting of an ester compound or an amide-ester compound of naphthoquinonediazidesulfonic acid or benzoquinonediazidesulfonic acid. The photosensitive composition is used as a passivation film of a semiconductor device or a photoresist.
摘要翻译：光敏组合物含有由具有羟基的重复单元和具有硅氧烷键的重复单元或具有羟基的重复单元，具有硅氧烷键的重复单元和除了这两个重复的重复单元之外的重复单元构成的聚酰亚胺单元，以及由萘化二叠氮磺酸或苯醌二叠氮磺酸的酯化合物或酰胺 - 酯化合物组成的感光剂。光敏组合物用作半导体器件或光致抗蚀剂的钝化膜。

33. 发明授权

US5332648A Potosensitive composition and method of forming a pattern using the same 失效
标题翻译：波纹组合物和使用其形成图案的方法
公开(公告)号：US5332648A
公开(公告)日：1994-07-26
申请号：US813694
申请日：1991-12-27
申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
发明人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
IPC分类号： G03F7/004 , G03F7/039 , H01L21/027 , H01L21/30 , G03C1/73
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/116 , Y10S430/118
摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms --COO.sup.- or --SO.sub.3.sup.- ; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150.degree. C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. ##STR1## where R.sub.1 and R.sub.2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C.dbd.O or --SO.sub.2 --; Y represents a divalent organic group; R.sub.1 and R.sub.2 can be bonded together, forming a ring; and at least one of R.sub.1, R.sub.2, and Y has a substituent which is decomposed by an acid.
摘要翻译：一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。如果需要，组合物还包含碱溶性聚合物。酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时，该组合物可形成精细的抗蚀剂图案。（1）其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起，形成环; R 1，R 2和Y中的至少一个具有被酸分解的取代基。

34. 发明授权

US5216077A Rubber-modified phenolic resin composition and method of manufacturing the same 失效
标题翻译：橡胶改性酚醛树脂组合物及其制造方法
公开(公告)号：US5216077A
公开(公告)日：1993-06-01
申请号：US874226
申请日：1992-04-27
申请人： Akira Yoshizumi , Shinetsu Fujieda , Ken Uchida , Naoko Kihara , Kazuhiro Sawai , Tsutomu Nagata , Shinji Murakami , Shigeyuki Kouchiyama
发明人： Akira Yoshizumi , Shinetsu Fujieda , Ken Uchida , Naoko Kihara , Kazuhiro Sawai , Tsutomu Nagata , Shinji Murakami , Shigeyuki Kouchiyama
IPC分类号： C08L61/06 , C08L63/00 , H01B3/40
CPC分类号： H01B3/40 , C08L61/06 , C08L63/00
摘要： A rubber-modified phenolic resin composition contains a novolak-type phenolic resin in which at least one modifying agent selected from the group consisting of an ABS resin and an MBS resin is homogeneously dispersed. The composition has good impact resistance and thermal shock resistance. The composition is prepared by adding at least one modifying agent described above to a novolak-type phenolic resin which is heated and melted at its softening point or more, so that the modifying agent is homogeneous dispersed in the resin. The resin composition is suitably used as a curing agent for an epoxy resin encapsulant for sealing electronic devices.
摘要翻译：橡胶改性酚醛树脂组合物含有酚醛清漆型酚醛树脂，其中至少一种选自ABS树脂和MBS树脂的改性剂均匀分散。该组合物具有良好的抗冲击性和耐热冲击性。通过将上述至少一种改性剂加入到其软化点或更高温度下被加热和熔化的酚醛清漆型酚醛树脂来制备组合物，使得改性剂均匀分散在树脂中。树脂组合物适合用作环氧树脂密封剂用于密封电子器件的固化剂。

35. 发明申请

US20080041818A1 Method for pattern formation 有权
标题翻译：图案形成方法
公开(公告)号：US20080041818A1
公开(公告)日：2008-02-21
申请号：US11727158
申请日：2007-03-23
申请人： Naoko Kihara , Hiroyuki Hieda
发明人： Naoko Kihara , Hiroyuki Hieda
IPC分类号： C23F1/02
CPC分类号： H01L21/3086 , B82Y10/00 , Y10S438/942
摘要： There is provided a method for pattern formation, including a step of coating a composition comprising a block copolymer, a silicon compound, and a solvent for dissolving these components onto an object to form a layer of the composition on the object, a step of subjecting the layer of the composition to self-organization of the block copolymer to cause phase separation into a first phase, in which the silicon compound is localized, having higher etching resistance by heat treatment or/and oxygen plasma treatment, and a second phase comprising a polymer phase and having lower etching resistance by heat treatment or/and oxygen plasma treatment, and thereby forming a pattern layer with a fine pattern, and a step of etching the object using as a mask the thus formed pattern layer.
摘要翻译：提供了一种形成图案的方法，其包括将包含嵌段共聚物，硅化合物和溶剂的组合物涂布到物体上以形成该物质层的步骤，所述组合物层自组织所述嵌段共聚物以引起相分离成其中所述硅化合物定位的第一相，通过热处理或/和氧等离子体处理具有较高的耐蚀刻性，以及第二相，其包含聚合物相，并且通过热处理或/和氧等离子体处理具有较低的耐腐蚀性，从而形成具有精细图案的图案层，以及使用由此形成的图案层作为掩模蚀刻该物体的步骤。

36. 发明申请

US20070172584A1 Method of manufacturing patterned magnetic recording medium 审中-公开
标题翻译：图案化磁记录介质的制造方法
公开(公告)号：US20070172584A1
公开(公告)日：2007-07-26
申请号：US11657720
申请日：2007-01-25
申请人： Naoko Kihara , Satoshi Shirotori , Yoshiyuki Kamata , Masatoshi Sakurai
发明人： Naoko Kihara , Satoshi Shirotori , Yoshiyuki Kamata , Masatoshi Sakurai
IPC分类号： B05D5/12
CPC分类号： G11B5/855
摘要： A method of manufacturing a patterned magnetic recording medium includes coating a magnetic film with a resist which is decomposed by exposure to electromagnetic radiation or an electron beam to have a low molecular weight, forming a pattern on the resist by an imprinting method, transferring the pattern to the magnetic film by using the resist having the pattern formed thereon as a mask, and removing the resist by exposing the resist to the electromagnetic radiation or the electron beam.
摘要翻译：图案化磁记录介质的制造方法包括：通过用电磁辐射或电子束分解的抗蚀剂涂覆磁性膜以具有低分子量，通过压印方法在抗蚀剂上形成图案，转印图案通过使用其上形成有图案的抗蚀剂作为掩模，并且通过将抗蚀剂暴露于电磁辐射或电子束来除去抗蚀剂到磁性膜。

37. 发明申请

US20050284320A1 Imprint apparatus and method for imprinting 有权
标题翻译：压印设备和印刷方法
公开(公告)号：US20050284320A1
公开(公告)日：2005-12-29
申请号：US10952743
申请日：2004-09-30
申请人： Masatoshi Sakuarai , Akira Kikitsu , Naoko Kihara
发明人： Masatoshi Sakuarai , Akira Kikitsu , Naoko Kihara
IPC分类号： G11B5/855 , B41G7/00 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G11B5/855 , Y10S977/877 , Y10S977/888
摘要： An imprint apparatus configured such that it can press a laminate structure in which a magnetic film and a resist film are sequentially laminated on a substrate. The imprint apparatus includes a first press plate configured to mount the laminate structure, a second press plate adapted for sandwiching the laminate structure, a stamper placed on a surface of the second press plate, and has projections and recesses configured to be transferred onto the resist film, and a light source configured to dispose on the same plane as the laminate structure, and is oriented so that the light source can shine the resist film.
摘要翻译：一种压印装置，其构造成能够将其中磁性膜和抗蚀剂膜依次层压在基板上的层叠结构。压印装置包括构造成安装层叠结构的第一压板，适于夹持层叠结构的第二压板，设置在第二压板的表面上的压模，并且具有被配置为转印到抗蚀剂上的突起和凹陷膜，以及配置为与层叠结构在同一平面上的光源，并且被定向成使得光源能够照射抗蚀剂膜。

38. 发明授权

US06340552B1 Photosensitive composition containing a dissolution inhibitor and an acid releasing compound 失效
标题翻译：含有溶解抑制剂和释放酸的化合物的光敏组合物
公开(公告)号：US06340552B1
公开(公告)日：2002-01-22
申请号：US08247356
申请日：1994-05-23
申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
发明人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
IPC分类号： G03C1492
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/116 , Y10S430/118
摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO— or —SO3—; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents
摘要翻译：一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。如果需要，组合物还包含碱溶性聚合物。酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时，该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种组; X表示

39. 发明授权

US06306553B1 Photosensitive composition and method of forming a pattern using the same 失效
标题翻译：光敏组合物和使用其形成图案的方法
公开(公告)号：US06306553B1
公开(公告)日：2001-10-23
申请号：US08473963
申请日：1995-06-07
申请人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
发明人： Naoko Kihara , Fumihiko Yuasa , Tohru Ushirogouchi , Tsukasa Tada , Osamu Sasaki , Takuya Naito , Satoshi Saito
IPC分类号： G03C176
CPC分类号： G03F7/0045 , Y10S430/115 , Y10S430/116 , Y10S430/118
摘要： A photosensitive composition comprising: an acid-decomposable compound having at least one substituent which is decomposed by an acid, forming a product which reacts with alkali solution and forms —COO− or —SO3−; and a compound which generates an acid when exposed to a chemical radiation. If necessary, the composition further comprises an alkali-soluble polymer. The acid-decomposable compound is one which is represented by the following formula (1), and the alkali-soluble polymer has a softening point of 150° C. or more and an average molecular weight of 3000 to 8000. When used as photoresist, the composition can form a fine resist pattern. where R1 and R2 are either the same or different, each of which represents at least one selected from the group consisting of hydrogen, halogen atom, cyano group, nitro group, silyl group, and monovalent organic group; X represents >C═O or —SO2—; Y represents a divalent organic group; R1 and R2 can be bonded together, forming a ring; and at least one of R1, R2, and Y has a substituent which is decomposed by an acid.
摘要翻译：一种光敏组合物，其包含：具有至少一个被酸分解的取代基的酸可分解化合物，形成与碱溶液反应形成-COO-或-SO 3 - 的产物; 以及当暴露于化学辐射时产生酸的化合物。如果需要，组合物还包含碱溶性聚合物。酸分解性化合物是由下式（1）表示的化合物，碱溶性聚合物的软化点为150℃以上，平均分子量为3000〜8000。当用作光致抗蚀剂时，该组合物可以形成精细的抗蚀剂图案，其中R1和R2相同或不同，它们各自表示选自氢，卤素原子，氰基，硝基，甲硅烷基和一价有机基团中的至少一种组; X表示> C = O或-SO 2 - ; Y表示二价有机基团; R1和R2可以结合在一起，形成环; R 1，R 2和Y中的至少一个具有被酸分解的取代基。

40. 发明授权

US06177229B1 Photosensitive composition 有权
标题翻译：感光组合物
公开(公告)号：US06177229B1
公开(公告)日：2001-01-23
申请号：US09237659
申请日：1999-01-27
申请人： Satoshi Saito , Naoko Kihara , Toru Ushirogouchi
发明人： Satoshi Saito , Naoko Kihara , Toru Ushirogouchi
IPC分类号： G03C173
CPC分类号： G03F7/0045 , G03F7/039 , Y10S430/106 , Y10S430/115
摘要： Disclosed is a positive photosensitive composition, comprising an alkali soluble resin having at least some or all of the alkali soluble groups protected by a substituent which can be decomposed by an acid, a compound which generates an acid upon irradiation with an actinic radiation, and a compound which generates water under action of an acid catalyst.
摘要翻译：公开了一种正型光敏组合物，其包含碱溶性树脂，其具有至少部分或全部由可被酸分解的取代基保护的碱溶性基团，在用光化辐射照射时产生酸的化合物，以及在酸催化剂作用下产生水的化合物。

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