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31. 发明授权

US07195846B2 Methods of manufacturing photomask blank and photomask 有权
标题翻译：制造光掩模坯料和光掩模的方法
公开(公告)号：US07195846B2
公开(公告)日：2007-03-27
申请号：US10724734
申请日：2003-12-02
申请人： Hideo Kaneko , Yukio Inazuki , Tetsushi Tsukamoto , Masayuki Mogi , Katsuya Okumura
发明人： Hideo Kaneko , Yukio Inazuki , Tetsushi Tsukamoto , Masayuki Mogi , Katsuya Okumura
IPC分类号： G03F1/00 , G03C5/00
CPC分类号： G03F1/82 , G03F1/26 , G03F1/32 , G03F1/68
摘要： A photomask blank having a film of at least one layer formed on a substrate is manufactured by forming a film on a substrate and irradiating the film with light from a flash lamp. A photomask is manufactured from the thus manufactured photomask blank by forming a patterned resist on the film on the blank by photolithography, etching away those portions of the film which are not covered with the resist, and removing the resist. The photomask blank and photomask have minimized warpage and improved chemical resistance.
摘要翻译：通过在基板上形成膜并用来自闪光灯的光照射薄膜来制造具有形成在基板上的至少一层的膜的光掩模坯料。通过光刻法在坯料上的膜上形成图案化的抗蚀剂，蚀刻掉未被抗蚀剂覆盖的膜的那些部分，并除去抗蚀剂，由这样制造的光掩模坯料制造光掩模。光掩模坯料和光掩模具有最小的翘曲和改善的耐化学性。

32. 发明授权

US07108589B2 Polishing apparatus and method 有权
标题翻译：抛光设备和方法
公开(公告)号：US07108589B2
公开(公告)日：2006-09-19
申请号：US11187944
申请日：2005-07-25
申请人： Norio Kimura , Mitsuhiko Shirakashi , Katsuya Okumura , You Ishii , Junji Kunisawa , Hiroyuki Yano
发明人： Norio Kimura , Mitsuhiko Shirakashi , Katsuya Okumura , You Ishii , Junji Kunisawa , Hiroyuki Yano
IPC分类号： B24B7/00
CPC分类号： B24B37/345 , B24B9/065 , B24B37/12 , H01L21/67046
摘要： A polishing apparatus and method has a function of polishing a surface of a film formed on a substrate to a flat mirror finish and a function of polishing unnecessary metal film such as copper film deposited on an outer peripheral portion of the substrate to remove such unnecessary metal film. The polishing apparatus comprises a surface polishing mechanism comprising a polishing table having a polishing surface and a top ring for holding the substrate and pressing the substrate against the polishing surface of the polishing table to thereby polish a surface of the substrate, and an outer periphery polishing mechanism for polishing an outer peripheral portion of the substrate.
摘要翻译：抛光装置和方法具有将形成在基板上的膜的表面抛光至平面镜面的功能，以及抛光沉积在基板的外周部分上的不需要的金属膜如铜膜的功能，以去除这种不必要的金属电影。抛光装置包括表面抛光机构，其包括具有抛光表面的抛光台和用于保持基板的顶环，并将基板压靠在抛光台的抛光表面上，从而抛光基板的表面，以及外周抛光用于抛光衬底的外周部分的机构。

33. 发明申请

US20050279170A1 Device for inspecting micro structure, method for inspecting micro structure and program for inspecting micro structure 失效
标题翻译：微观结构检测装置，微观结构检查方法和微观结构检查程序
公开(公告)号：US20050279170A1
公开(公告)日：2005-12-22
申请号：US11149176
申请日：2005-06-10
申请人： Katsuya Okumura , Toshiyuki Matsumoto , Naoki Ikeuchi , Masami Yakabe
发明人： Katsuya Okumura , Toshiyuki Matsumoto , Naoki Ikeuchi , Masami Yakabe
IPC分类号： B81C99/00 , G01C19/56 , G01C25/00 , G01N29/00 , G01N29/09 , G01N29/12 , G01N29/30 , G01N29/42 , G01N29/46 , G01P15/12 , G01P21/00 , H01L29/84
CPC分类号： G01C19/5719 , B81C99/005 , G01C25/005 , G01N29/12 , G01N29/30 , G01N29/42 , G01N29/46 , G01N2291/2695 , G01N2291/2697 , G01P15/123 , G01P21/00 , G01P2015/0842
摘要： Test sound wave is outputted from a speaker. A movable part of a three-axis acceleration sensor, which is a micro structure of a chip to be tested TP, moves due to the arrival of the test sound wave which is compression wave outputted from the speaker, that is, due to air vibrations. A change in the resistance value that changes in accordance with this movement is measured on the basis of an output voltage that is provided via a probe needles. A control part determines the property of the three-axis acceleration sensor on the basis of the measured property values, that is, measured data.
摘要翻译：测试声波从扬声器输出。作为被测试芯片TP的微结构的三轴加速度传感器的可动部分由于扬声器输出的压缩波的测试声波的到来而移动，即由于空气振动。基于通过探针提供的输出电压来测量根据该移动而变化的电阻值的变化。控制部件基于测量的属性值，即测量数据来确定三轴加速度传感器的特性。

34. 发明申请

US20050087853A1 Semiconductor device and method of manufacturing the same 有权
标题翻译：半导体装置及其制造方法
公开(公告)号：US20050087853A1
公开(公告)日：2005-04-28
申请号：US10855889
申请日：2004-05-28
申请人： Katsuya Okumura , Koji Maruyama , Kazuya Nagaseki , Akiteru Rai
发明人： Katsuya Okumura , Koji Maruyama , Kazuya Nagaseki , Akiteru Rai
IPC分类号： H01L23/52 , H01L21/3205 , H01L21/768 , H01L23/12 , H01L23/48 , H01L25/065 , H01L25/07 , H01L25/18 , H01L23/02 , H05K7/02
CPC分类号： H01L21/76898 , H01L23/481 , H01L2924/0002 , H01L2924/00 , H01L2924/00012
摘要： The present invention relates to a semiconductor device in which an electrode of a device formed on a substrate such as a semiconductor wafer and an electrode of a wiring structure such as an interposer are connected to each other through a connecting electrode extending through the substrate, and a method of manufacturing the same. A semiconductor device according to the present invention comprises a first substrate including a front surface and a back surface, a first device having a first electrode being formed on the front surface; and a wiring structure formed with a second electrode, the wiring structure having a principal surface. The first electrode of the first device and the second electrode of the wiring structure are connected to each other by a connecting electrode extending through the first substrate from the front surface to the back surface thereof. Substantially all the back surface of the first substrate is bonded to the principal surface of the wiring structure. A dielectric film formed between the first substrate and the wiring structure may be an adhesive layer.
摘要翻译：本发明涉及一种半导体器件，其中形成在诸如半导体晶片的基板上的器件的电极和诸如中介层之类的布线结构的电极通过延伸穿过衬底的连接电极相互连接，其制造方法。根据本发明的半导体器件包括：第一衬底，包括前表面和后表面;第一器件，具有形成在前表面上的第一电极; 以及形成有第二电极的布线结构，所述布线结构具有主表面。第一器件的第一电极和布线结构的第二电极通过从第一衬底的前表面延伸到后表面的连接电极彼此连接。基本上所有的第一基板的所有后表面被结合到布线结构的主表面。形成在第一基板和布线结构之间的电介质膜可以是粘合剂层。

35. 发明授权

US06788985B2 ELECTRONIC COMMERCE METHOD FOR SEMICONDUCTOR PRODUCTS, ELECTRONIC COMMERCE THEREOF, PRODUCTION SYSTEM, PRODUCTION METHOD, PRODUCTION EQUIPMENT DESIGN SYSTEM, PRODUCTION EQUIPMENT DESIGN METHOD, AND PRODUCTION EQUIPMENT MANUFACTURING METHOD 失效
标题翻译：电子商务方法半导体产品，电子商务，生产系统，生产方法，生产设备设计系统，生产设备设计方法和生产设备制造方法
公开(公告)号：US06788985B2
公开(公告)日：2004-09-07
申请号：US09867465
申请日：2001-05-31
申请人： Kunihiro Mitsutake , Katsuya Okumura
发明人： Kunihiro Mitsutake , Katsuya Okumura
IPC分类号： G06F1900
CPC分类号： G06Q30/06 , G06Q30/0601
摘要： An electronic commerce for semiconductor products comprises a network, a client terminal, a connection server, a virtual production line, and a real production line. The real production line actually manufactures semiconductor products. The virtual production line provides a computer with substantially the same functions as the real production line and computes an optimal lot progress. The connection server connects the virtual production line to the client terminal via the network. When a condition is entered from the client terminal, the connection server transfers this condition to the virtual production line. Simulation is performed realtime for determining whether a product flows in the virtual production line under the transferred condition. The connection server transfers a simulation result to the client terminal. Based on the simulation result, a electronic commerce is conducted.
摘要翻译：半导体产品的电子商务包括网络，客户终端，连接服务器，虚拟生产线和实际生产线。实际生产线实际上是生产半导体产品。虚拟生产线为计算机提供与实际生产线基本相同的功能，并计算最佳批量进度。连接服务器通过网络将虚拟生产线连接到客户终端。当从客户终端输入条件时，连接服务器将该条件传送到虚拟生产线。实时进行模拟，以确定产品是否在转移条件下在虚拟生产线中流动。连接服务器将模拟结果传送到客户终端。基于模拟结果，进行电子商务。

36. 发明授权

US06723572B2 Method for monitoring the shape of the processed surfaces of semiconductor devices and equipment for manufacturing the semiconductor devices 有权
标题翻译：用于监测半导体器件的处理表面的形状和用于制造半导体器件的设备的方法
公开(公告)号：US06723572B2
公开(公告)日：2004-04-20
申请号：US10139278
申请日：2002-05-07
申请人： Hiroyuki Yano , Katsuya Okumura
发明人： Hiroyuki Yano , Katsuya Okumura
IPC分类号： H01L2166
CPC分类号： H01L22/26 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： A to-be-polished surface of a semiconductor workpiece is polished to a target shape, using a CMP tool. The to-be-polished surface is a surface of a metal provided on an insulating film having trenches. A shape of a polished surface of the semiconductor workpiece is monitored to determine if a metal residue exists outside of the trenches on the polished surface while the semiconductor workpiece is set in the CMP tool, using a monitor. The monitor has a sensor that obtains a two-dimensional image of the to-be-polished surface. The CMP tool is controlled by feedback based on a result of monitoring to determine if the metal residue exists, using a controller.
摘要翻译：使用CMP工具将半导体工件的待抛光表面抛光至目标形状。被抛光表面是设置在具有沟槽的绝缘膜上的金属表面。监测半导体工件的抛光表面的形状，以确定当使用监视器将半导体工件设置在CMP工具中时，金属残留物是否存在于抛光表面上的沟槽外部。显示器具有获得被抛光表面的二维图像的传感器。 CMP工具由基于监测结果的反馈控制，以使用控制器确定是否存在金属残留物。

37. 发明授权

US06633045B1 Assembly part with wiring and for manufacturing system, method of manufacturing such assembly part, and semiconductor manufacturing system constituted using assembly part 失效
标题翻译：具有布线和制造系统的组装部件，这种组装部件的制造方法以及使用组装部件构成的半导体制造系统
公开(公告)号：US06633045B1
公开(公告)日：2003-10-14
申请号：US09667521
申请日：2000-09-22
申请人： Kazuyoshi Sugihara , Atsushi Ando , Katsuya Okumura
发明人： Kazuyoshi Sugihara , Atsushi Ando , Katsuya Okumura
IPC分类号： G21G500
CPC分类号： H05K3/0061 , H01J2237/3175 , H05K1/0284 , H05K1/0393 , H05K1/056 , H05K3/048 , H05K3/28 , H05K3/365 , H05K3/386 , H05K2201/0154 , H05K2203/066 , H05K2203/135
摘要： An assembly part for constituting a unit in a vacuum column is provided with wirings and wiring terminals. Each wiring is provided on a first insulating film, and is covered with a second insulating film made of an electro-deposited polyimide film. The assembly part is used to constitute a semiconductor manufacturing system such as an electron beam exposure system.
摘要翻译：用于构成真空塔中的单元的组装部分设置有布线和布线端子。每个布线设置在第一绝缘膜上，并被由电沉积聚酰亚胺膜制成的第二绝缘膜覆盖。组装部分用于构成诸如电子束曝光系统的半导体制造系统

38. 发明授权

US06570169B2 Apparatus for manufacturing a semiconductor device and a method for manufacturing a semiconductor device 有权
公开(公告)号：US06570169B2
公开(公告)日：2003-05-27
申请号：US10036453
申请日：2002-01-07
申请人： Kyoichi Suguro , Katsuya Okumura
发明人： Kyoichi Suguro , Katsuya Okumura
IPC分类号： H01J37317
CPC分类号： H01L21/26593 , H01J37/3171 , H01L21/26513 , H01L21/324
摘要： The purpose of the present invention is to avoid a decrease in the mechanical strength of a Si substrate because of the repetition of ion-implantation and annealing processes. As ions are implanted while the Si substrate surface temperature is kept at as low as −60° C. or less. Then the Si substrate is heated to recover the implantation defects caused by the ion-implantation. Such a combination of the low temperature ion-implantation and the annealing processes is repeated as required.

39. 发明授权

US06547638B2 Method and apparatus for dry-in, dry-out polishing and washing of a semiconductor device 失效
公开(公告)号：US06547638B2
公开(公告)日：2003-04-15
申请号：US09804232
申请日：2001-03-13
申请人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
发明人： Katsuya Okumura , Riichirou Aoki , Hiromi Yajima , Seiji Ishikawa , Manabu Tsujimura
IPC分类号： B24B5100
CPC分类号： H01L21/67161 , B08B1/04 , B24B27/0023 , B24B37/04 , B24B37/345 , B24B51/00 , B24B55/12 , F24F3/161 , H01L21/67028 , H01L21/67046 , H01L21/67057 , H01L21/67167 , H01L21/67219 , H01L21/67745 , H01L21/67778 , H03M13/39 , H04N5/4401 , H04N5/455
摘要： A polishing apparatus includes an arrangement of a plurality of units to deal with various operations and a robot having at least one arm. The plurality of units are disposed around the robot and include a loading unit for receiving thereon a, e.g. dry, workpiece to be polished, a polishing system including at least one polishing unit for polishing the workpiece, a washing system and a drying system at least including one washing unit for washing and drying the polished workpiece, and an unloading unit for receiving thereon a resultant clean and dry polished workpiece.

40. 发明授权

US06525328B1 Electron beam lithography system and pattern writing method 失效
标题翻译：电子束光刻系统和图案写入方法
公开(公告)号：US06525328B1
公开(公告)日：2003-02-25
申请号：US09624355
申请日：2000-07-24
申请人： Motosuke Miyoshi , Yuichiro Yamazaki , Katsuya Okumura
发明人： Motosuke Miyoshi , Yuichiro Yamazaki , Katsuya Okumura
IPC分类号： H01J3730
CPC分类号： B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： An electron beam lithography system 10 comprises an electron gun including a rectangular cathode 1 having an emission surface having an aspect ratio of other than 1, an illumination optical system 3 of an asymmetric lens system including multipole lenses Qa1 and Qa2, a CP aperture 5, and a projection optical system 8 of a symmetric lens system including multipole lenses Qb1 through Qb4. This electron beam lithography system 10 is used for emitting an electron beam at a low acceleration of 5 kV or less from the rectangular cathode 1, for controlling the illumination optical system so as to form an image of a desired character of the CP aperture 5 on an isotropic plane of incidence at different demagnifications in minor-axis and major-axis directions in accordance with the aspect ratio of the rectangular cathode 1, and for controlling the projection optical system 8 so that the electron beam leaving the CP aperture 5 as an aperture image is incident on a substrate 21 at the same demagnification in the minor-axis and major-axis directions and at different incident angles in the minor-axis and major-axis directions while passing through the trajectory without establishing any crossovers.
摘要翻译：电子束光刻系统10包括电子枪，其包括具有不同于1的纵横比的发射表面的矩形阴极1，包括多极透镜Qa1和Qa2的非对称透镜系统的照明光学系统3，CP孔5，以及包括多极透镜Qb1至Qb4的对称透镜系统的投影光学系统8。该电子束光刻系统10用于从矩形阴极1以5kV以下的低加速度发射电子束，用于控制照明光学系统，以便形成CP孔5的所需字符的图像根据矩形阴极1的纵横比在短轴和长轴方向上的不同缩小的各向同性平面，并且用于控制投影光学系统8，使得离开CP孔5的电子束作为孔图像在短轴和长轴方向上以相同的缩小入射在基板21上，并且在短轴和长轴方向上以不同的入射角同时穿过轨迹而不建立任何交叉。

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