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1. 发明授权

US06828573B1 Electron beam lithography system 失效
标题翻译：电子束光刻系统
公开(公告)号：US06828573B1
公开(公告)日：2004-12-07
申请号：US09315988
申请日：1999-05-21
申请人： Hajime Kawano , Minoru Wakita , Masato Kamada , Haruo Yoda
发明人： Hajime Kawano , Minoru Wakita , Masato Kamada , Haruo Yoda
IPC分类号： G21G500
CPC分类号： H01J37/3023 , H01J2237/31761 , H01J2237/31769
摘要： An object of this invention is to provide an electron beam lithography system capable of rapidly creating an accurate exposure map for proximity effect correction. The inventive system creates the map by dividing shot figures by mesh and adding up the divided area values for each mesh. The system comprises: (1) a function for judging and dividing boundaries of shots to be rendered based on mesh positions as well as shot positions and figures in the map, and (2) a function for calculating divided shot area values and adding the values simultaneously to adjacent addresses in cumulative fashion in a plurality of memories furnished downstream of the system.
摘要翻译：本发明的目的是提供一种电子束光刻系统，其能够快速创建用于邻近效应校正的精确曝光图。本发明的系统通过用网格划分射击图并且将每个网格的分割区域值相加来创建地图。该系统包括：（1）用于根据网格位置以及拍摄位置和图形来判断和分割要渲染的边界的功能，以及（2）用于计算分割的拍摄区域值并将值相加的功能在系统下游的多个存储器中以累积的方式同时到达相邻地址。

2. 发明授权

US06828569B2 Lithographic projection apparatus, device manufacturing method and device manufactured thereby 有权
标题翻译：平版印刷设备，装置制造方法和由此制造的装置
公开(公告)号：US06828569B2
公开(公告)日：2004-12-07
申请号：US09988391
申请日：2001-11-19
申请人： Willem Van Schaik , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
发明人： Willem Van Schaik , Bastiaan Matthias Mertens , Hans Meiling , Norbertus Benedictus Koster
IPC分类号： G21G500
CPC分类号： G03F7/70925 , G03F7/70883 , G03F7/70933
摘要： Cleaning of optical components for use in a lithographic projection apparatus can be carried out by irradiating a space within the apparatus containing the optical component with UV or EUV radiation having a wavelength of less than 250 nm, in the presence of an oxygen-containing species selected from water, nitrogen oxide and oxygen-containing hydrocarbons. Generally, the space will be purged with an ozone-less purge gas which contains a small amount of the oxygen-containing species in addition to the usual purge gas composition. The technique can also be used in an evacuated space by introducing a low pressure of the oxygen-containing species into the space.
摘要翻译：用于光刻投影装置的光学部件的清洁可以通过在选择的含氧物质的存在下，用波长小于250nm的UV或EUV辐射照射包含光学部件的装置内的空间来进行来自水，氮氧化物和含氧烃。通常，除了通常的吹扫气体组合物之外，空间将被含有少量含氧物质的无臭氧净化气体吹扫。该技术也可以通过将含氧物质的低压引入空间而用于抽空空间。

3. 发明授权

US06794663B2 Method and apparatus for specimen fabrication 有权
公开(公告)号：US06794663B2
公开(公告)日：2004-09-21
申请号：US10699853
申请日：2003-11-04
申请人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
发明人： Hiroyasu Shichi , Tohru Ishitani , Hidemi Koike , Kaoru Umemura , Eiichi Seya , Mitsuo Tokuda , Satoshi Tomimatsu , Hideo Kashima , Muneyuki Fukuda
IPC分类号： G21G500
CPC分类号： G01N23/20 , B23K15/0006 , B23K15/0013 , G01N1/286 , H01J2237/3114 , H01J2237/31745
摘要： A sample fabricating method of irradiating a sample with a focused ion beam at an incident angle less than 90 degrees with respect to the surface of the sample, eliminating the peripheral area of a micro sample as a target, turning a specimen stage around a line segment perpendicular to the sample surface as a turn axis, irradiating the sample with the focused ion beam while the incident angle on the sample surface is fixed, and separating the micro sample or preparing the micro sample to be separated. A sample fabricating apparatus for forming a sample section in a sample held on a specimen stage by scanning and deflecting an ion beam, wherein an angle between an optical axis of the ion beam and the surface of the specimen stage is fixed and formation of a sample section is controlled by turning the specimen stage.

4. 发明授权

US06633045B1 Assembly part with wiring and for manufacturing system, method of manufacturing such assembly part, and semiconductor manufacturing system constituted using assembly part 失效
标题翻译：具有布线和制造系统的组装部件，这种组装部件的制造方法以及使用组装部件构成的半导体制造系统
公开(公告)号：US06633045B1
公开(公告)日：2003-10-14
申请号：US09667521
申请日：2000-09-22
申请人： Kazuyoshi Sugihara , Atsushi Ando , Katsuya Okumura
发明人： Kazuyoshi Sugihara , Atsushi Ando , Katsuya Okumura
IPC分类号： G21G500
CPC分类号： H05K3/0061 , H01J2237/3175 , H05K1/0284 , H05K1/0393 , H05K1/056 , H05K3/048 , H05K3/28 , H05K3/365 , H05K3/386 , H05K2201/0154 , H05K2203/066 , H05K2203/135
摘要： An assembly part for constituting a unit in a vacuum column is provided with wirings and wiring terminals. Each wiring is provided on a first insulating film, and is covered with a second insulating film made of an electro-deposited polyimide film. The assembly part is used to constitute a semiconductor manufacturing system such as an electron beam exposure system.
摘要翻译：用于构成真空塔中的单元的组装部分设置有布线和布线端子。每个布线设置在第一绝缘膜上，并被由电沉积聚酰亚胺膜制成的第二绝缘膜覆盖。组装部分用于构成诸如电子束曝光系统的半导体制造系统

5. 发明授权

US06486482B1 Irradiation equipment 失效
标题翻译：照射设备
公开(公告)号：US06486482B1
公开(公告)日：2002-11-26
申请号：US09462233
申请日：2000-05-30
申请人： Bengt Anderberg , Mikael Lindholm
发明人： Bengt Anderberg , Mikael Lindholm
IPC分类号： G21G500
CPC分类号： G21K5/10 , A61L2/08 , A61L2/081 , A61L2202/122 , G21K5/04
摘要： An arrangement and a method for irradiation of products by charged particles. The arrangement comprises a particle acceleration device and a radiation chamber, in which the products are irradiated from at least two sides, by that the particle beam is deflected with a scanning magnet and redeflected with redeflection magnets. The particle beam impinges on the products substantially parallel to the main normals of the surfaces of the products, which normals are positioned substantially perpendicular to the direction that the radiation axis has immediately before the deflection. An absorption means comprising a particle stopper is arranged in the space between the pole pieces of the redeflection magnets. A transport device for double-sided irradiation transports the products, which during transport are fixed to the transport device, through the irradiation arrangement.
摘要翻译：带电粒子照射产品的布置和方法。该装置包括粒子加速装置和辐射室，其中产品从至少两侧照射，粒子束用扫描磁体偏转并用重定向磁体重新折射。粒子束基本上平行于产品表面的主要法线照射产品，该法线基本上垂直于辐射轴线在偏转之前具有的方向定位。在重定向磁体的极片之间的空间中布置有包括粒子塞的吸收装置。用于双面照射的运输装置通过照射装置将运输中的产品运送到运输装置。

6. 发明授权

US06806481B2 Rectangular frame system with one to two windowpane-like radiation filters and a tanning module 失效
标题翻译：矩形框架系统，具有一至两个窗玻璃状辐射过滤器和鞣制模块
公开(公告)号：US06806481B2
公开(公告)日：2004-10-19
申请号：US09988806
申请日：2001-11-20
申请人： Bernd Ullrich , Ullrich Berger , Ernst Smolka , Jörn Jahnke , Stefan Greif
发明人： Bernd Ullrich , Ullrich Berger , Ernst Smolka , Jörn Jahnke , Stefan Greif
IPC分类号： G21G500
CPC分类号： A61N5/0614 , G02B7/006
摘要： The invention relates to a rectangular frame system with one to two discoid radiation filters, as well as a tanning module with such a frame system. The rectangular frame system has an upper plate, a lower plate and two to three margin members, two margin members being opposite one another and joining the upper plate to the lower plate, the upper plate having a first opening whose perimeter describes a circle, an ellipse, a rectangle or a polygon, and the lower plate has a rectangular second opening, the second opening having a greater area than the first opening, and at least two double spring clips are arranged at the two opposite margin members, which border on side of the frame system at which no margin member is provided, such that between the lower plate and the double spring clips a first radiation filter is clamped.
摘要翻译：本发明涉及一种具有一至两个盘状辐射过滤器的矩形框架系统，以及具有这种框架系统的鞣制模块。矩形框架系统具有上板，下板和两至三个边缘部件，两个边缘部件彼此相对并且将上板连接到下板，上板具有其周边描述圆的第一开口，椭圆形，矩形或多边形，并且下板具有矩形的第二开口，第二开口具有比第一开口更大的面积，并且至少两个双弹簧夹布置在两侧边缘构件上在没有设置边缘构件的框架系统中，使得在下板和双弹簧夹之间夹紧第一辐射过滤器。

7. 发明授权

US06800865B2 Coated nanotube surface signal probe and method of attaching nanotube to probe holder 失效
标题翻译：涂层纳米管表面信号探针和将纳米管附着到探头支架的方法
公开(公告)号：US06800865B2
公开(公告)日：2004-10-05
申请号：US10326472
申请日：2002-12-20
申请人： Yoshikazu Nakayama , Akio Harada , Seiji Akita
发明人： Yoshikazu Nakayama , Akio Harada , Seiji Akita
IPC分类号： G21G500
CPC分类号： G01Q60/16 , G01Q60/38 , G01Q60/54 , G01Q70/12 , Y10S977/869 , Y10S977/873 , Y10S977/876
摘要： The coated nanotube surface signal probe constructed from a nanotube, a holder which holds the nanotube, a coating film fastening a base end portion of the nanotube to a surface of the holder by way of adhering the base end portion on the surface of holder in a range of a base end portion length with an electric contact state and covering a specified region including the base end portion with the coating film maintaining the electric contact state between the nanotube and the holder, a tip end portion of the nanotube being caused to protrude from the holder; and the tip end portion is used as a probe needle so as to scan surface signals. The coated nanotube surface signal probe can be used as a probe in AFM (Atomic Force Microscope), STM (Scanning Tunneling Microscope) other SPM (Scanning Probe Microscope).
摘要翻译：由纳米管构成的涂覆的纳米管表面信号探针，保持纳米管的保持器，通过将基座端部粘附在保持器的表面上的涂膜将纳米管的基端部固定在保持器的表面上具有电接触状态的基端部长度的范围，并且覆盖包括基端部的规定区域，所述涂膜保持纳米管和保持器之间的电接触状态，使纳米管的前端部从持有人并且使用尖端部作为探针，以扫描表面信号。涂覆的纳米管表面信号探针可用作AFM（原子力显微镜），STM（扫描隧道显微镜）其他SPM（扫描探针显微镜）中的探针。

8. 发明授权

US06740893B1 Optical instrument, and device manufacturing method 有权
标题翻译：光学仪器和器件制造方法
公开(公告)号：US06740893B1
公开(公告)日：2004-05-25
申请号：US09678255
申请日：2000-10-03
申请人： Masayuki Tanabe
发明人： Masayuki Tanabe
IPC分类号： G21G500
CPC分类号： G21K1/06 , G21K2201/067
摘要： An optical instrument includes an optical element and a detector for detecting an impurity concentration in an ambience containing a space surrounding the optical element. By controlling the impurity concentration on the basis of an output of the detector, deposition of impurities on the optical element and deterioration of the optical characteristic of the optical element thereby can be prevented effectively.
摘要翻译：光学仪器包括光学元件和用于检测包含光学元件周围的空间的环境中的杂质浓度的检测器。通过基于检测器的输出控制杂质浓度，可以有效地防止杂质沉积在光学元件上，从而有效地防止光学元件的光学特性的劣化。

9. 发明授权

US06617596B1 On-line measurement of absorbed electron beam dosage in irradiated product 有权
标题翻译：辐照产品中吸收电子束用量的在线测量
公开(公告)号：US06617596B1
公开(公告)日：2003-09-09
申请号：US09715481
申请日：2000-11-17
申请人： Sergey Alexandrovich Korenev
发明人： Sergey Alexandrovich Korenev
IPC分类号： G21G500
CPC分类号： G21K5/00
摘要： An accelerator (10) generates an electron beam (22) of selected energy that is swept (16) up and down. A conveyor (32) moves items (30) through the electron beam for irradiation treatment. An array (40a) of inductive electron beam strength detectors is disposed on a down stream side of the item to detect the energy of the electron beam exiting the item at the plurality of altitudes. The electron beam strength entering and leaving the item are communicated to a processor (54) which determines the absorbed dose of radiation absorbed by the item. The dose information is archived (56) or compared by a parameter adjustment processor (58) with target doses and deviations are used to control one or more of MeV or beam current of the electron beam, the sweep rate, and the conveying speed of the items. Each of the detectors includes a vacuum chamber in which two current transformers (60, 62) disposed on either side of a metal foil layer (64). From the difference in the current induced in the two transformers by a pulsed, collimated electron beam, the energy of the beam is determined.
摘要翻译：加速器（10）产生上下扫描（16）所选择的能量的电子束（22）。输送机（32）通过电子束移动物品（30）进行照射处理。感应电子束强度检测器的阵列（40a）设置在物品的下游侧，以检测在多个高度处离开物品的电子束的能量。进入和离开物品的电子束强度被传送到处理器（54），处理器确定物品吸收的辐射的吸收剂量。剂量信息通过参数调整处理器（58）存档（56）或与目标剂量进行比较，偏差用于控制电子束的MeV或束电流，扫描速率和输送速度中的一个或多个物品。每个检测器包括真空室，其中设置在金属箔层（64）的任一侧上的两个电流互感器（60,62）。通过脉冲准直电子束在两个变压器中感应的电流的差异，确定光束的能量。

10. 发明授权

US06541780B1 Particle beam current monitoring technique 失效
标题翻译：粒子束电流监测技术
公开(公告)号：US06541780B1
公开(公告)日：2003-04-01
申请号：US09123635
申请日：1998-07-28
申请人： Steven L. F. Richards , Nobuhiro Tokoro
发明人： Steven L. F. Richards , Nobuhiro Tokoro
IPC分类号： G21G500
CPC分类号： G01R19/0061 , H01J2237/31703
摘要： A method of monitoring particle beam current in an ion implanter in which the ion beam is analyzed to separate it into a separate sub-beam for each ion charge state. At least one sub-beam, having a charge state different from the desired charge state, is intercepted, and the current of the intercepted sub-beam is measured. This current is useful as an estimate of the current of the desired sub-beam which is used for the implantation.
摘要翻译：一种在离子注入机中监测粒子束电流的方法，其中分析离子束以将其分离成用于每个离子充电状态的单独的子光束。具有与期望的充电状态不同的充电状态的至少一个子光束被截断，并且被测量的子光束的电流被测量。该电流对于用于植入的期望子光束的电流的估计是有用的。

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