专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

31. 发明申请

US20050122510A1 System and method for process variation monitor 有权
标题翻译：过程变化监控系统和方法
公开(公告)号：US20050122510A1
公开(公告)日：2005-06-09
申请号：US11038449
申请日：2005-01-18
申请人： Evgeni Levin , Gilad Almogy , Efrat Rozenman
发明人： Evgeni Levin , Gilad Almogy , Efrat Rozenman
IPC分类号： G01N21/956 , G01N21/95 , G06T7/00 , H01L21/66 , G06F19/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/8896 , G06T2207/30148 , Y10S430/146
摘要： A method to extend the process monitoring capabilities of a semiconductor wafer optical inspection system so as to be able to detect low-resolution effects of process variations over the surface of a wafer at much higher sensitivity than heretofore possible. The method consists, in essence, of grouping sensed pixels by geometric blocks over the inspected surface and comparing each block with a corresponding one from another die on the same wager, from another wager of from a stored model image. In one embodiment of the invention, pixel values are compared directly and differences are thresholded at a considerably lower level than during a defects detection process. In another embodiment, there is calculated a signature for each block, based on the sensed light intensity values, and corresponding signatures are compared.
摘要翻译：扩展半导体晶片光学检查系统的过程监控能力的方法，以便能够以比以前更高的灵敏度检测晶片表面上的工艺变化的低分辨率效应。本方法基本上包括通过检查表面上的几何块对感测像素进行分组，并且从相同下注的另一个模具中将每个块与来自另一个管芯的对应的块相比较，从另一个来自存储的模型图像的冲量。在本发明的一个实施例中，像素值被直接比较，并且差异以比在缺陷检测处理期间低得多的阈值阈值化。在另一个实施例中，基于感测的光强度值计算每个块的签名，并对相应的签名进行比较。

32. 发明授权

US06208751B1 Cluster tool 失效
标题翻译：群集工具
公开(公告)号：US06208751B1
公开(公告)日：2001-03-27
申请号：US09046607
申请日：1998-03-24
申请人： Gilad Almogy
发明人： Gilad Almogy
IPC分类号： G06K900
CPC分类号： H01L21/67173 , H01L21/67288 , H01L21/67778
摘要： A cluster tool for testing substrates and locating defects on the substrates utilizing a plurality of tools coupled via an automation platform. The cluster tool includes an interface receiving storage device(s) having, each, more than one substrate contained therein. An inspection tool capable of inspecting the substrates and delivering defect map indicative of suspected locations on each of the substrates. The automation platform is coupled to the interface to the inspection tool, and to a review tool, and is capable of transferring substrates between the tools.
摘要翻译：一种用于通过自动化平台耦合的多个工具来测试基板并在基板上定位缺陷的集群工具。集群工具包括接收存储设备的接口，每个存储设备中包含多于一个的衬底。一种检查工具，其能够检查基板并且在每个基板上传送指示可疑位置的缺陷图。自动化平台耦合到检查工具的界面，以及一个审查工具，并且能够在工具之间传送基板。

33. 发明授权

US5661590A Quantum well infrared photo detector and monolithic chopper 失效
标题翻译：量子阱红外光电探测器和单片斩波器
公开(公告)号：US5661590A
公开(公告)日：1997-08-26
申请号：US465274
申请日：1995-06-05
申请人： Gilad Almogy , Amnon Yariv , Yuanjian Xu
发明人： Gilad Almogy , Amnon Yariv , Yuanjian Xu
IPC分类号： H01L31/0352 , G02F1/03
CPC分类号： B82Y20/00 , H01L31/035236 , H01L31/035281 , Y02E10/50
摘要： A quantum well infrared photodetector and modulator are monolithically integrated to one another. The infrared scene impinges on an infrared receiving element such as a phase grating, which couples it to a modulator. The modulator includes asymmetric quantum wells which are shifted by an applied bias. By appropriately adjusting the bias, the modulator can pass a maximum amount of the input information or can pass less. The photodetector and modulator both use the same kinds of materials, preferably GaAs and Al.sub.x Ga.sub.1-x As, so they essentially become a single unit, obtaining better noise and operating characteristics from the combination.
摘要翻译：量子阱红外光电检测器和调制器彼此整体地集成。红外场景照射在诸如相位光栅的红外接收元件上，将其耦合到调制器。调制器包括通过施加的偏置偏移的非对称量子阱。通过适当调整偏置，调制器可以传递最大量的输入信息或者可以传递更少的输入信息。光电检测器和调制器都使用相同种类的材料，优选为GaAs和Al x Ga 1-x As，因此它们基本上变成单个单元，从组合获得更好的噪声和操作特性。

34. 发明授权

US08669462B2 Concentrating solar energy collector 失效
标题翻译：集中太阳能收集器
公开(公告)号：US08669462B2
公开(公告)日：2014-03-11
申请号：US13079193
申请日：2011-04-04
申请人： Gilad Almogy , Ratson Morad , Ofer Ricklis , Nathan P. Beckett , Amir Bar , Andrey Bochkariov , Amir A. Weiss , Radu Raduta , Brian E. Atchley
发明人： Gilad Almogy , Ratson Morad , Ofer Ricklis , Nathan P. Beckett , Amir Bar , Andrey Bochkariov , Amir A. Weiss , Radu Raduta , Brian E. Atchley
IPC分类号： H01L31/052 , H01L31/058
CPC分类号： H01L31/0525 , F24S23/74 , F24S30/425 , F24S40/52 , F24S2030/134 , H01L31/0521 , H01L31/0547 , H02S40/44 , Y02B10/20 , Y02B10/70 , Y02E10/45 , Y02E10/47 , Y02E10/52 , Y02E10/60
摘要： Systems, methods, and apparatus by which solar energy may be collected to provide electricity, heat, or a combination of heat and electricity are disclosed herein.
摘要翻译：本文公开了可以收集太阳能以提供电，热或热和电力的组合的系统，方法和装置。

35. 发明申请

US20110141462A1 WAFER INSPECTION SYSTEM 审中-公开
标题翻译：波浪检测系统
公开(公告)号：US20110141462A1
公开(公告)日：2011-06-16
申请号：US13034565
申请日：2011-02-24
申请人： Silviu Reinhorn , Daniel Some , Gilad Almogy
发明人： Silviu Reinhorn , Daniel Some , Gilad Almogy
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/1717
摘要： Apparatus for inspecting a surface, including a plurality of pump sources having respective pump optical output ends and providing respective pump beams through the pump optical output ends, and a plurality of probe sources having respective probe optical output ends and providing respective probe beams through the probe optical output ends. There is an alignment mounting which holds the respective pump optical output ends and probe optical output ends in equal respective effective spatial offsets, and optics which convey the respective pump beams and probe beams to the surface, so as to generate returning radiation from a plurality of respective locations thereon, and which convey the returning radiation from the respective locations. The apparatus includes a receiving unit which is adapted to receive the returning radiation and which is adapted to determine a characteristic of the respective locations in response thereto.
摘要翻译：用于检查表面的装置，包括具有相应的泵浦光学输出端的多个泵浦源，并且通过泵浦光学输出端提供相应的泵浦光束，以及具有相应的探测光学输出端的多个探测源，并且通过探针提供相应的探测光束光输出端。存在对准安装，其将相应的泵浦光学输出端和探测光学输出端保持在相等的有效空间偏移中;以及光学器件，其将相应的泵浦光束和探测光束传送到表面，以便产生来自多个各自的位置，并且从各个位置传送返回的辐射。该装置包括接收单元，该接收单元适于接收返回的辐射并适于响应于此确定相应位置的特性。

36. 发明授权

US07463351B2 Process and assembly for non-destructive surface inspection 失效
标题翻译：非破坏性表面检查的加工和组装
公开(公告)号：US07463351B2
公开(公告)日：2008-12-09
申请号：US11034422
申请日：2005-01-11
申请人： Gilad Almogy , Ron Naftali , Avishay Guetta , Doron Shoham
发明人： Gilad Almogy , Ron Naftali , Avishay Guetta , Doron Shoham
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N21/9501
摘要： An optical system for detecting defects on a wafer that includes a device for producing a beam and directing the beam onto the wafer surface, producing an illuminated spot on the wafer's surface. The system further includes a detector detecting light, and a mirrored assembly having together with the detector an axis of symmetry about a line perpendicular to the wafer surface. The assembly is configured to receive scattered light from the surface, where the scattered light including a first scattered light part being scattered from the pattern. The assembly is further configured to reflect and focus rotationally symmetrically about the axis of symmetry the scattered light to the detector. The system further includes a device operating with the detector for facilitating detection of a scattered light other than the specified scattered light due to pattern.
摘要翻译：一种用于检测晶片上的缺陷的光学系统，其包括用于产生光束并将光束引导到晶片表面上的装置，在晶片的表面上产生照明光斑。该系统还包括检测光的检测器和与检测器一起围绕垂直于晶片表面的线的对称轴的镜像组件。所述组件被配置为从所述表面接收散射光，其中所述散射光包括从所述图案散射的第一散射光部分。组件还被配置为将散射光的对称轴围绕旋转对称地反射并聚焦到检测器。该系统还包括利用检测器操作的装置，用于便于检测由于图案而导致的特定散射光之外的散射光。

37. 发明申请

US20060192904A1 System and method for defect localization on electrical test structures 有权
标题翻译：电气测试结构的缺陷定位系统和方法
公开(公告)号：US20060192904A1
公开(公告)日：2006-08-31
申请号：US10530157
申请日：2003-10-03
申请人： Gilad Almogy , Chris Talbot , Lior Levin
发明人： Gilad Almogy , Chris Talbot , Lior Levin
IPC分类号： G02F1/1335 , G06K9/00
CPC分类号： G01R31/2812 , G01N21/956
摘要： A method and system for defect localization includes: (i) receiving a test structure that includes at least one conductor that is at least partially covered by an electro-optically active material; (ii) providing an electrical signal to the conductor, such as charge at least a portion of the conductor; and (iii) imaging the test structure to locate a defect.
摘要翻译：用于缺陷定位的方法和系统包括：（i）接收包括至少部分被电光活性材料覆盖的导体的测试结构; （ii）向导体提供电信号，例如对导体的至少一部分充电; 和（iii）对测试结构进行成像以定位缺陷。

38. 发明申请

US20060012791A1 Wafer inspection system 审中-公开
标题翻译：晶圆检查系统
公开(公告)号：US20060012791A1
公开(公告)日：2006-01-19
申请号：US11158733
申请日：2005-06-21
申请人： Silviu Reinhorn , Daniel Some , Gilad Almogy
发明人： Silviu Reinhorn , Daniel Some , Gilad Almogy
IPC分类号： G01N21/88
CPC分类号： G01N21/9501 , G01N21/1717
摘要： Apparatus for inspecting a surface, including a plurality of pump sources having respective pump optical output ends and providing respective pump beams through the pump optical output ends, and a plurality of probe sources having respective probe optical output ends and providing respective probe beams through the probe optical output ends. There is an alignment mounting which holds the respective pump optical output ends and probe optical output ends in equal respective effective spatial offsets, and optics which convey the respective pump beams and probe beams to the surface, so as to generate returning radiation from a plurality of respective locations thereon, and which convey the returning radiation from the respective locations. The apparatus includes a receiving unit which is adapted to receive the returning radiation and which is adapted to determine a characteristic of the respective locations in response thereto.
摘要翻译：用于检查表面的装置，包括具有相应的泵浦光学输出端的多个泵浦源，并且通过泵浦光学输出端提供相应的泵浦光束，以及具有相应的探测光学输出端的多个探测源，并且通过探针提供相应的探测光束光输出端。存在对准安装，其将相应的泵浦光学输出端和探测光学输出端保持在相等的有效空间偏移中;以及光学器件，其将相应的泵浦光束和探测光束传送到表面，以便产生来自多个各自的位置，并且从各个位置传送返回的辐射。该装置包括接收单元，该接收单元适于接收返回的辐射并适于响应于此确定相应位置的特性。

39. 发明授权

US06946655B2 Spot grid array electron imaging system 有权
标题翻译：点阵阵列电子成像系统
公开(公告)号：US06946655B2
公开(公告)日：2005-09-20
申请号：US09986137
申请日：2001-11-07
申请人： Gilad Almogy , Oren Reches
发明人： Gilad Almogy , Oren Reches
IPC分类号： G01Q10/00 , G01Q30/02 , G01Q30/06 , H01J37/28
CPC分类号： H01J37/28 , H01J2237/024 , H01J2237/0635 , H01J2237/1503 , H01J2237/20228 , H01J2237/2817
摘要： A high data-rate electron beam spot-grid array imaging system is provided that overcomes the low resolution and severe linearity requirements of prior art systems. Embodiments include an imaging system comprising an electron beam generator for simultaneously irradiating an array of spots spaced apart from each other on a surface of an object to be imaged, and a detector for collecting backscattered and/or secondary electrons emitted as a result of the interaction of the spots with the surface of the object to form an image of the irradiated portions of the object surface. A mechanical system moves the substrate in a direction which is nearly parallel to an axis of the array of spots such that as the substrate is moved across the spot array in the scan direction (the y-direction) the spots trace a path which leaves no gaps in the mechanical cross-scan direction (the x-direction). A compensator, such as a servo or a movable mirror, compensates for mechanical inaccuracies in the moving stage, thereby increasing imaging accuracy. In other embodiments, multiple detectors placed at different angles to the substrate collect electrons to provide multiple perspective imaging of the substrate surface.
摘要翻译：提供了高数据速率电子束点阵阵列成像系统，其克服了现有技术系统的低分辨率和严格的线性要求。实施例包括一种成像系统，包括电子束发生器，用于同时照射待成像物体的表面上彼此间隔开的点阵列，以及用于收集由于相互作用而发射的反向散射和/或二次电子的检测器具有物体表面的斑点以形成物体表面的照射部分的图像。机械系统使基板沿着几乎平行于点阵列的轴线的方向移动，使得当基板在扫描方向（y方向）上移动穿过光点阵列时，斑点追踪不留下的路径机械横向扫描方向（x方向）的间隙。诸如伺服或可移动镜的补偿器补偿了移动台中的机械不准确度，从而提高了成像精度。在其他实施例中，以与衬底不同的角度放置的多个检测器收集电子以提供衬底表面的多个透视成像。

40. 发明申请

US20050179891A1 Process and assmebly for non-destructive surface inspection 失效
标题翻译：非破坏性表面检查的过程和方法
公开(公告)号：US20050179891A1
公开(公告)日：2005-08-18
申请号：US11034422
申请日：2005-01-11
申请人： Gilad Almogy , Ron Naftali , Avishay Guetta , Doron Shoham
发明人： Gilad Almogy , Ron Naftali , Avishay Guetta , Doron Shoham
IPC分类号： G01N21/95 , G01N21/00
CPC分类号： G01N21/956 , G01N21/9501
摘要： An optical system for detecting defects on a wafer that includes a device for producing a beam and directing the beam onto the wafer surface, producing an illuminated spot on the wafer's surface. The system further includes a detector detecting light, and a mirrored assembly having together with the detector an axis of symmetry about a line perpendicular to the wafer surface. The assembly is configured to receive scattered light from the surface, where the scattered light including a first scattered light part being scattered from the pattern. The assembly is further configured to reflect and focus rotationally symmetrically about the axis of symmetry the scattered light to the detector. The system further includes a device operating with the detector for facilitating detection of a scattered light other than the specified scattered light due to pattern.
摘要翻译：一种用于检测晶片上的缺陷的光学系统，其包括用于产生光束并将光束引导到晶片表面上的装置，在晶片的表面上产生照明光斑。该系统还包括检测光的检测器和与检测器一起围绕垂直于晶片表面的线的对称轴的镜像组件。所述组件被配置为从所述表面接收散射光，其中所述散射光包括从所述图案散射的第一散射光部分。组件还被配置为将散射光的对称轴围绕旋转对称地反射并聚焦到检测器。该系统还包括利用检测器操作的装置，用于便于检测由于图案而导致的特定散射光之外的散射光。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式