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21. 发明申请

US20110281511A1 GRINDING DISK HAVING PLANT SEED CAPSULES AS A FILLER AND METHOD FOR THE PRODUCTION THEREOF 审中-公开
标题翻译：具有植物种子囊的研磨盘作为填充物及其生产方法
公开(公告)号：US20110281511A1
公开(公告)日：2011-11-17
申请号：US13146670
申请日：2010-01-28
申请人： Josef Keuler , Christian Stang
发明人： Josef Keuler , Christian Stang
IPC分类号： B24B27/00 , B24D3/20 , B24D3/34
CPC分类号： B24D3/342 , B24D3/20 , B24D3/32 , B24D3/348
摘要： The invention relates to a synthetic-resin-bonded grinding disk comprising a mixture of abrasive grain, binding agent, and pore formers, wherein the pore formers are plant seeds and are contained in the finished grinding disk. The grinding disk is composed of 60 to 90 wt % of abrasive grain and 10 to 40 wt % of a binding agent, wherein the plant seeds constitute up to 80 wt % of the binding agent. The plant seeds can contain oil and can be rape seeds, poppy seeds, clover seed, lupin seeds, mustard seeds, serradella vetch seeds, or similar plant seeds. The grinding disk can be produced by mixing abrasive grain, binding agent, and plant seeds, pouring the starting mixture into a mold provided therefor, pressing the mixture, pre-drying the mixture, and curing the grinding disk. The plant seeds are not burned in the production of the grinding disk. The grinding disk is cured at temperatures of up to 250° C., preferably of up to 200° C., more preferably of up to 180° C., and more preferably of up to 150° C.
摘要翻译：本发明涉及一种包括磨粒，粘合剂和成孔剂混合物的合成树脂粘合研磨盘，其中成孔剂是植物种子并且包含在成品研磨盘中。研磨盘由60-90重量％的磨料颗粒和10-40重量％的粘合剂组成，其中植物种子构成最多80重量％的粘合剂。植物种子可以含有油，可以是油菜种子，罂粟种子，三叶草种子，羽扇豆种子，芥菜种子，苜蓿种子或类似植物种子。研磨盘可以通过混合磨粒，粘合剂和植物种子来制备，将起始混合物倒入到其中提供的模具中，压制混合物，预干燥混合物并固化研磨盘。植物种子在研磨盘的生产中不被烧。研磨盘在高达250℃，优选高达200℃，更优选高达180℃，更优选高达150℃的温度下固化。

22. 发明申请

US20110218263A1 POLISHING PAD 有权
标题翻译：抛光垫
公开(公告)号：US20110218263A1
公开(公告)日：2011-09-08
申请号：US13107347
申请日：2011-05-13
申请人： Atsushi KAZUNO , Kazuyuki Ogawa , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
发明人： Atsushi KAZUNO , Kazuyuki Ogawa , Masahiko Nakamori , Takatoshi Yamada , Tetsuo Shimomura
IPC分类号： C08J9/228
CPC分类号： B24B37/24 , B24D3/28 , B24D3/32 , C08G18/12 , C08G18/4238 , C08G18/4854 , C08G18/724 , C08G18/758 , C08G18/7621 , C08G2101/0025 , C08G2101/0066 , C08J9/30 , C08J2375/08 , C08G18/3814 , C08G18/48 , C08G18/3865
摘要： A polishing pad generates very few scratches on a surface of a polishing object, and is excellent in planarization property. The polishing pad has a high polishing rate and is excellent in planarization property. The polishing pad grooves become very little clogged with abrasive grains or polishing swarf during polishing and, even when continuously used for a long period of time, the polishing rate is scarcely reduced.
摘要翻译：抛光垫在抛光对象的表面上产生很少的划痕，并且平坦化性能优异。抛光垫具有高的抛光速率，并且平坦化性能优异。抛光垫槽在抛光过程中变得很少被磨粒或抛光屑堵塞，并且即使长时间连续使用，抛光速率几乎不降低。

23. 发明申请

US20110105000A1 Chemical Mechanical Planarization Pad With Surface Characteristics 审中-公开
标题翻译：具有表面特性的化学机械平面化垫
公开(公告)号：US20110105000A1
公开(公告)日：2011-05-05
申请号：US12891612
申请日：2010-09-27
申请人： Yongqi Hu , Kadthala Ramaya Narendrnath , Ashish Bhatnagar
发明人： Yongqi Hu , Kadthala Ramaya Narendrnath , Ashish Bhatnagar
IPC分类号： B24B41/00 , B24D3/32 , B24D3/34
CPC分类号： B24B37/24 , B24D3/32 , B24D3/344 , B24D3/346
摘要： A polishing pad includes a polymer matrix and polyhedral oligomeric silsequioxane (“POSS”) molecules or soluble particles and a surfactant dispersed within the polymer matrix. A polishing pad can be formed by casting a liquid polymer on a conveyer belt having a casting surface with a set of projections and curing the liquid polymer on the conveyer belt such that a polymer matrix has a surface with a second set of projections complimentary to the first set of projections.
摘要翻译：抛光垫包括分散在聚合物基体内的聚合物基质和多面体低聚硅氧烷（“POSS”）分子或可溶性颗粒和表面活性剂。可以通过在具有铸造表面的输送带上浇铸具有一组突起的液体聚合物并将液体聚合物固化在输送带上的方法来形成抛光垫，使得聚合物基质具有与第二组突起互补的表面第一套预测。

24. 发明授权

US07927186B2 Method for producing glass substrate for magnetic disk 失效
标题翻译：制造磁盘用玻璃基板的方法
公开(公告)号：US07927186B2
公开(公告)日：2011-04-19
申请号：US12503960
申请日：2009-07-16
申请人： Mizuho Ishida , Kara Yoshida
发明人： Mizuho Ishida , Kara Yoshida
IPC分类号： B24B49/00
CPC分类号： G11B5/8404 , B24B37/042 , B24B37/24 , B24D3/32 , C03C19/00
摘要： In the production of a glass substrate for magnetic disk, the present invention provides a method for producing a glass substrate for magnetic disk including a step of polishing a main surface of a circular glass substrate using a polishing pad made of a foamed resin while feeding a polishing liquid containing an abrasive, in which a polishing pad made of a foamed resin having an international rubber hardness of 45 IRHD or less, the hardness being measured at a dry state before contact with a slurry by the M method defined in JIS K6253, is used as a starting polishing pad and polishing is started after a polishing surface of the starting polishing pad is subjected to a dressing treatment to adjust the pad so that an open pore area ratio is 8% or more and an average circle equivalent diameter of open pores is 10 μm or more, in order to suppress an increase in roll-off in the polishing step of the main surface of the circular glass plate.
摘要翻译：在制造磁盘用玻璃基板时，本发明提供一种磁盘用玻璃基板的制造方法，其特征在于，包括使用由发泡树脂构成的研磨垫对圆形玻璃基板的主面进行研磨的工序，含有研磨剂的研磨液，其中由国际橡胶硬度为45IRHD以下的发泡树脂制成的抛光垫，通过JIS K6253中规定的M法与浆料接触之前在干燥状态下测量的硬度为用作起始抛光垫，并且在对起始抛光垫的抛光表面进行修整处理以调整垫以使开孔面积比为8％以上，开孔的平均圆当量直径开始研磨为10μm以上，为了抑制圆形玻璃板的主面的研磨工序中的滚降的增加。

25. 发明授权

US07883398B2 Abrasive tool 有权
标题翻译：研磨工具
公开(公告)号：US07883398B2
公开(公告)日：2011-02-08
申请号：US11203456
申请日：2005-08-11
申请人： Sergej-Tomislav Buljan , Srinivasan Ramanath , Donald Brodeur , Robert F. Corcoran
发明人： Sergej-Tomislav Buljan , Srinivasan Ramanath , Donald Brodeur , Robert F. Corcoran
IPC分类号： B24B23/00
CPC分类号： B24D3/06 , B24D3/32 , B24D5/10
摘要： An abrasive tool, suitable for cutting, slotting, grinding and polishing hard materials, such as ceramics, metals, and composites thereof, and methods for making same. The tool includes a plurality of pores positioned in an abrasive region adjacent an outer circumference of the disk. The pores have any predetermined shape, size and position relative to one another.
摘要翻译：一种适用于切割，开槽，研磨和抛光硬质材料如陶瓷，金属及其复合材料的研磨工具及其制造方法。该工具包括位于与盘的外圆周相邻的研磨区域中的多个孔。孔隙相对于彼此具有任何预定的形状，尺寸和位置。

26. 发明申请

US20100003896A1 POLISHING PAD 有权
标题翻译：抛光垫
公开(公告)号：US20100003896A1
公开(公告)日：2010-01-07
申请号：US12439154
申请日：2007-08-17
申请人： Yoshiyuki Nakai , Tsuyoshi Kimura , Atsushi Kazuno , Kazuyuki Ogawa , Tetsuo Shimomura
发明人： Yoshiyuki Nakai , Tsuyoshi Kimura , Atsushi Kazuno , Kazuyuki Ogawa , Tetsuo Shimomura
IPC分类号： B24B1/00 , C08G18/28 , C09K3/14 , B24D11/00
CPC分类号： B24B37/24 , B24B29/00 , B24D3/26 , B24D3/32 , C08G18/10 , C08G18/14 , C08G18/4854 , C08G18/6674 , C08G18/724 , C08G18/7831 , C08G18/3814 , C08G18/792
摘要： A polishing pad capable of maintaining a high level of dimensional stability during absorption of moisture or water includes a polishing layer including a polyurethane foam having fine cells, wherein the polyurethane foam includes a cured product of a reaction of an isocyanate-terminated prepolymer (A), a polymerized diisocyanate, and a chain extender, and the isocyanate-terminated prepolymer (A) includes an isocyanate monomer, a high molecular weight polyol (a), and a low molecular weight polyol. A method for manufacturing such a polishing pad includes mixing a first component containing an isocyanate-terminated prepolymer with a second component containing a chain extender and curing the mixture to form a polyurethane foam. The pad so made is used in the manufacture of semiconductor devices.
摘要翻译：能够在吸收水分或水的同时维持高水平的尺寸稳定性的抛光垫包括：抛光层，其包括具有细孔的聚氨酯泡沫，其中聚氨酯泡沫包括异氰酸酯封端的预聚物（A）的反应的固化产物，聚合二异氰酸酯和扩链剂，异氰酸酯封端的预聚物（A）包括异氰酸酯单体，高分子量多元醇（a）和低分子量多元醇。制造这种抛光垫的方法包括将含有异氰酸酯封端的预聚物的第一组分与含有扩链剂的第二组分混合并固化该混合物以形成聚氨酯泡沫。如此制成的焊盘用于制造半导体器件。

27. 发明申请

US20090280734A1 Coated Abrasive Disk Comprising A Loop Fabric Layer and Preparation Thereof 审中-公开
标题翻译：包覆环形织物层及其制备方法
公开(公告)号：US20090280734A1
公开(公告)日：2009-11-12
申请号：US12304515
申请日：2007-05-29
申请人： Jeung Woon Kim
发明人： Jeung Woon Kim
IPC分类号： B24D3/28 , B24D5/02
CPC分类号： B24D11/02 , B24D3/002 , B24D3/32
摘要： A coated abrasive disk including (1) a loop fabric layer having a plurality of projected filament loops on one side thereof, (2) a carbon fiber textile layer or a glass fiber paper layer in a pre-dried state after impregnation-treatment with an adhesive resin, and (3) a coated abrasive material, which are sequentially stacked and tightly combined together, has an improved elasticity and high cutting performance characteristics.
摘要翻译：一种涂覆的研磨盘，包括：（1）环状织物层，其一侧具有多个突出的丝状环，（2）在浸渍处理之后，预干燥状态下的碳纤维织物层或玻璃纤维纸层，粘合剂树脂和（3）依次层叠并紧密结合在一起的涂覆磨料具有改进的弹性和高切割性能特性。

28. 发明申请

US20090264050A1 HIGH POROSITY ABRASIVE ARTICLES AND METHODS OF MANUFACTURING SAME 有权
标题翻译：高度磨蚀性物品及其制造方法
公开(公告)号：US20090264050A1
公开(公告)日：2009-10-22
申请号：US12372549
申请日：2009-02-17
申请人： Rachana Upadhyay , Richard W. J. Hall
发明人： Rachana Upadhyay , Richard W. J. Hall
IPC分类号： B24B1/00 , C09G1/02
CPC分类号： B24D3/32 , B24B37/245 , B24D3/26 , B24D11/00 , B24D18/00 , B24D18/0027
摘要： An abrasive article includes a polymer matrix and abrasive grains dispersed in the polymer matrix, wherein the abrasive article has a void volume of at least 50%. The polymer matrix is polymerized from a monomer including at least one double bond.
摘要翻译：磨料制品包括分散在聚合物基质中的聚合物基体和磨料颗粒，其中磨料制品具有至少50％的空隙体积。聚合物基体由包含至少一个双键的单体聚合。

29. 发明申请

US20080268223A1 Composite sheet for mounting a workpiece and the method for making the same 审中-公开
标题翻译：用于安装工件的复合片及其制造方法
公开(公告)号：US20080268223A1
公开(公告)日：2008-10-30
申请号：US11790963
申请日：2007-04-30
申请人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Zong-Yao Ku
发明人： Chung-Chih Feng , I-Peng Yao , Lyang-Gung Wang , Zong-Yao Ku
IPC分类号： B32B3/26 , B24B7/04
CPC分类号： B24D3/32 , B24B37/30 , B24D11/003 , B24D13/147 , B32B5/18 , B32B5/32 , B32B7/02 , B32B7/12 , B32B27/40 , Y10T428/249953
摘要： The present invention relates to a composite sheet for mounting a workpiece and a method for making the same. The composite sheet includes a buffer layer and an adsorption layer. The buffer layer has a plurality of continuous pores. The adsorption layer is located on the buffer layer for adsorbing a workpiece, and the compression ratio of the buffer layer is higher than that of the adsorption layer. Thereby, due to low hardness, good adsorption effect, and high compression ratio, the composite sheet of the present invention has good buffer effect.
摘要翻译：本发明涉及一种用于安装工件的复合片及其制造方法。复合片材包括缓冲层和吸附层。缓冲层具有多个连续孔。吸附层位于用于吸附工件的缓冲层上，缓冲层的压缩比高于吸附层的压缩比。因此，由于硬度低，吸附效果好，压缩比高，本发明的复合片材具有良好的缓冲效果。

30. 发明授权

US07326378B2 Process for producing polyurethane grinding tool 失效
标题翻译：生产聚氨酯研磨工具的工艺
公开(公告)号：US07326378B2
公开(公告)日：2008-02-05
申请号：US10947327
申请日：2004-09-23
申请人： Kai Yasuoka , Hitoshi Kurosaki , Kenichi Kazama
发明人： Kai Yasuoka , Hitoshi Kurosaki , Kenichi Kazama
IPC分类号： B29C44/02
CPC分类号： B24D18/0009 , B24D3/32 , B24D13/147 , B29C67/246
摘要： A process for producing a polyurethane grinding tool is provided, the process including a step of mixing one or more types of polyol component selected from the group consisting of polyether polyols and polyester polyols with inorganic abrasive grains, a step of mixing an organic polyisocyanate component with inorganic abrasive grains, a step of uniformly mixing the polyol component mixed with the abrasive grains and the polyisocyanate component mixed with the abrasive grains by means of a rotary-static mixer, and a step of molding the mixture thus obtained by reacting the mixture in a mold.
摘要翻译：提供了一种生产聚氨酯研磨工具的方法，该方法包括将选自聚醚多元醇和聚酯多元醇的一种或多种多元醇成分与无机磨料颗粒混合的步骤，将有机多异氰酸酯组分与无机磨料颗粒，通过旋转静态混合器将与磨粒混合的多元醇组分和与磨粒混合的多异氰酸酯组分均匀混合的步骤，以及通过使混合物反应而制得的混合物的步骤模子。

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