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21. 发明授权

US07834353B2 Method of manufacturing display device 有权
标题翻译：显示装置的制造方法
公开(公告)号：US07834353B2
公开(公告)日：2010-11-16
申请号：US12021714
申请日：2008-01-29
申请人： Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
发明人： Mikio Hongo , Sachio Uto , Mineo Nomoto , Toshihiko Nakata , Mutsuko Hatano , Shinya Yamaguchi , Makoto Ohkura
IPC分类号： H01L31/0376 , H01L21/00
CPC分类号： H01L29/04 , B23K26/0622 , B23K26/064 , B23K26/0648 , B23K26/066 , B23K26/0665 , B23K26/0732 , H01L21/02422 , H01L21/02532 , H01L21/02678 , H01L21/02683 , H01L21/268 , H01L27/1285 , H01L27/1296 , H01L29/66757 , H01L29/78675
摘要： A TFT device having a pixel portion and a driving circuit portion formed on a glass substrate; wherein at least the active layer (active region) of a transistor constituting said driving circuit comprises polycrystalline silicon including crystals that do not have crystal grain boundaries which cross the direction of current flow.
摘要翻译：一种具有形成在玻璃基板上的像素部分和驱动电路部分的TFT器件; 其中构成所述驱动电路的晶体管的至少有源层（有源区）包括多晶硅，其包括不具有与电流流动方向交叉的晶界的晶体。

22. 发明申请

US20100271628A1 METHOD AND APPARATUS FOR DETECTING DEFECTS 有权
标题翻译：检测缺陷的方法和装置
公开(公告)号：US20100271628A1
公开(公告)日：2010-10-28
申请号：US12831102
申请日：2010-07-06
申请人： Hiroyuki NAKANO , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki NAKANO , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。用于检测缺陷的装置包括放置基板样本并可在X-Y-Z-中的每个中任意移动的台部; 方向，用于利用来自倾斜方向的光照射电路图案的照明系统，以及用于从上下方向在检测器上形成照射的检测区域的图像的图像形成光学系统。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器从样本接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

23. 发明申请

US20100064396A1 SCANNING PROBE MICROSCOPE AND SAMPLE OBSERVING METHOD USING THE SAME 有权
标题翻译：扫描探针显微镜和使用其的样品观察方法
公开(公告)号：US20100064396A1
公开(公告)日：2010-03-11
申请号：US12523369
申请日：2008-02-26
申请人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
发明人： Toshihiko Nakata , Masahiro Watanabe , Takashi Inoue , Kishio Hidaka , Motoyuki Hirooka
IPC分类号： G01Q60/18 , G01Q60/24
CPC分类号： G01Q60/18 , G01Q60/22
摘要： In a near-field scanning microscope using an aperture probe, the upper limit of the aperture formation is at most several ten nm in practice. In a near-field scanning microscope using a scatter probe, the resolution ability is limited to at most several ten nm because of the external illuminating light serving as background noise. Moreover, measurement reproducibility is seriously lowered by a damage or abrasion of a probe. Optical data and unevenness data of the surface of a sample can be measured at a nm-order resolution ability and a high reproducibility while damaging neither the probe nor the sample by fabricating a plasmon-enhanced near-field probe having a nm-order optical resolution ability by combining a nm-order cylindrical structure with nm-order microparticles and repeatedly moving the probe toward the sample and away therefrom at a low contact force at individual measurement points on the sample.
摘要翻译：在使用孔径探针的近场扫描显微镜中，实际上孔径形成的上限为至多几十nm。在使用散射探针的近场扫描显微镜中，由于外部照明光作为背景噪声，分辨能力被限制在至多几十nm。此外，通过探针的损伤或磨损，测量再现性被严重降低。可以以nm级分辨能力和高再现性测量样品表面的光学数据和不均匀性数据，同时通过制造具有nm级光学分辨率的等离子体增强近场探针而不损害探针和样品通过将nm级圆柱形结构与nm级微粒组合，并在样品上的各个测量点处以低接触力将探针重复地移动到样品并从中离开它们的能力。

24. 发明申请

US20090213366A1 METHOD AND APPARATUS FOR DETECTING DEFECTS 失效
标题翻译：检测缺陷的方法和装置
公开(公告)号：US20090213366A1
公开(公告)日：2009-08-27
申请号：US12435523
申请日：2009-05-05
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/958
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.
摘要翻译：提供一种用于检测缺陷的方法和装置，用于通过减少由于电路图案引起的噪声来检测对诸如氧化物膜的透明膜在内的待检查物体的高灵敏度的有害缺陷或异物。用于检测缺陷的装置包括：载置基板试样的载台部分，其可以在XYZ-θ方向中任意移动;照射系统，用于利用来自倾斜方向的光照射电路图案;以及图像形成光学系统，用于从上下方向在检测器上形成照射的检测区域的图像。利用这种布置，收集通过照明系统的照明在电路图案上产生的衍射光和散射光。此外，在傅立叶变换表面上提供空间滤波器，用于阻挡来自电路图形的线性部分的衍射光。由检测器从样本接收的散射和反射光被转换成电信号。将一个芯片的转换电信号与另一个芯片的转换电信号进行比较。如果这些信号彼此不相同，则检测到异物被确定为存在于样品上。

25. 发明申请

US20090033924A1 Defects Inspecting Apparatus And Defects Inspecting Method 有权
标题翻译：检测设备缺陷检测方法
公开(公告)号：US20090033924A1
公开(公告)日：2009-02-05
申请号：US12192578
申请日：2008-08-15
申请人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
发明人： Sachio Uto , Minori Noguchi , Hidetoshi Nishiyama , Yoshimasa Ohshima , Akira Hamamatsu , Takahiro Jingu , Toshihiko Nakata , Masahiro Watanabe
IPC分类号： G01N21/88
CPC分类号： G01N21/00 , G01N21/9501 , G06T7/0004 , G06T2207/30148
摘要： An inspecting apparatus and method including first and second illuminating units for illuminating a surface of a specimen to be inspected with different incident angles and first and second detecting optical units arranged at different elevation angle directions to the surface of the specimen for detecting images of the specimen illuminated by the first and second illuminating units.
摘要翻译：一种检查装置和方法，包括：第一和第二照明单元，用于以不同的入射角照射待检查样本的表面;以及第一和第二检测光学单元，其以不同的仰角方向布置在样本的表面上，用于检测样本的图像由第一和第二照明单元照亮。

26. 发明授权

US07446866B2 Apparatus and method for inspecting pattern 失效
标题翻译：用于检查图案的装置和方法
公开(公告)号：US07446866B2
公开(公告)日：2008-11-04
申请号：US11488620
申请日：2006-07-19
申请人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
发明人： Sachio Uto , Minoru Yoshida , Toshihiko Nakata , Shunzi Maeda , Atsushi Shimoda
IPC分类号： G01N21/00
CPC分类号： G01N21/21 , G01N21/33 , G01N21/55 , G01N21/9501 , G01N21/956 , G01N21/95607 , G01N2021/151 , G01N2021/95615 , G01N2201/06113 , G01N2201/1035
摘要： An apparatus for inspecting defects including a table which mounts a specimen to be inspected and which is movable in a plane, an ultraviolet light source for emitting ultraviolet light, an illuminating unit for illuminating the specimen mounted on the table with light emitted from the ultraviolet light source, a detecting unit for forming an image of the specimen illuminated by the illuminating unit and for detecting the image with an image sensor, and an image processing unit for processing the image detected by the image sensor and for outputting information about defects detected on the specimen. The illuminating unit and detecting unit are disposed in a clean environment which is supplied therein with clean gas and which is separated from outside by a wall.
摘要翻译：一种用于检查缺陷的装置，包括安装待检查样本并且可在平面中移动的台面，用于发射紫外线的紫外光源的照明单元，用于对从紫外线发射的光照射安装在桌子上的样本的照明单元源，用于形成由所述照明单元照射的所述样本的图像并且用图像传感器检测图像的检测单元，以及图像处理单元，用于处理由所述图像传感器检测到的图像，并且用于输出关于在所述图像传感器上检测到的缺陷的信息; 标本。照明单元和检测单元设置在清洁的环境中，其中提供有清洁的气体并且由壁与外部分离。

27. 发明申请

US20080047334A1 Scanning Microscope With Shape Correction Means 审中-公开
标题翻译：扫描显微镜与形状修正手段
公开(公告)号：US20080047334A1
公开(公告)日：2008-02-28
申请号：US11866661
申请日：2007-10-03
申请人： Shuichi Baba , Toshihiko Nakata , Masahiro Watanabe , Takeshi Arai
发明人： Shuichi Baba , Toshihiko Nakata , Masahiro Watanabe , Takeshi Arai
IPC分类号： G01B5/28
CPC分类号： G01Q10/06 , G01Q10/065 , G01Q20/02 , G01Q20/04 , G01Q30/025 , G01Q30/06
摘要： A scanning probe microscope for measuring a surface shape of a sample by scanning a probe by bringing said probe close to, or into contact with, a sample surface and measuring a physical interaction occurring between the probe and the sample, includes a measurement area specific which specifies a measurement area of the sample on the basis of the image of the sample surface, and a measurement shape corrector which corrects the measurement result of the sample surface on the basis of the condition of the probe.
摘要翻译：扫描探针显微镜，其用于通过使所述探针靠近或接触样品表面并测量所述探针和所述样品之间的物理相互作用来扫描探针来测量样品的表面形状，所述扫描探针显微镜包括测量区域特异性，基于样品表面的图像指定样品的测量面积;以及测量形状校正器，其基于探针的条件校正样品表面的测量结果。

28. 发明申请

US20070154938A1 Method of inspecting a DNA chip and apparatus thereof 有权
标题翻译：检查DNA芯片的方法及其装置
公开(公告)号：US20070154938A1
公开(公告)日：2007-07-05
申请号：US11709120
申请日：2007-02-22
申请人： Yoshitada Oshida , Toshihiko Nakata , Tomoaki Sakata , Kenji Yasuda , Satoshi Takahashi
发明人： Yoshitada Oshida , Toshihiko Nakata , Tomoaki Sakata , Kenji Yasuda , Satoshi Takahashi
IPC分类号： C12Q1/68 , G01J3/42
CPC分类号： G01N21/6428 , G01N21/6452 , G01N21/6456 , Y10S436/80 , Y10T436/143333
摘要： A DNA inspecting apparatus including driving means for relatively changing positions of the multi-spot lights and a position of the DNA chip so as to detect the fluorescent lights in such a manner that a desired area on the DNA chip is irradiated with the multi-spot lights, and a control system for determining and inspecting DNA information about the to-be-inspected DNA chip from fluorescent light intensities and fluorescent light positions of the desired area on the DNA chip, the fluorescent light intensities and the fluorescent light positions being detected by the driving means and the fluorescent light detecting means.
摘要翻译：一种DNA检查装置，包括用于相对改变多点灯位置的驱动装置和DNA芯片的位置，以便以这样的方式检测荧光，使得DNA芯片上的期望区域被多点照射灯和用于从DNA芯片上的期望区域的荧光强度和荧光灯位置确定和检查关于待检查DNA芯片的DNA信息的控制系统，荧光强度和荧光灯位置由驱动装置和荧光检测装置。

29. 发明申请

US20070052955A1 Method and equipment for detecting pattern defect 失效
标题翻译：检测图案缺陷的方法和设备
公开(公告)号：US20070052955A1
公开(公告)日：2007-03-08
申请号：US11593091
申请日：2006-11-06
申请人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
发明人： Hiroaki Shishido , Yasuhiro Yoshitake , Toshihiko Nakata , Shunji Maeda , Minoru Yoshida , Sachio Uto
IPC分类号： G01N21/88 , G01J4/00
CPC分类号： G01N21/9501 , G01J3/0218 , G01J3/0224 , G01J3/10 , G01N21/8851 , G01N21/956 , G01N21/95607 , G01N2021/479 , G01N2021/95676 , G01N2201/06113 , G02B5/09 , G02B21/365 , G02B26/12
摘要： An Inspection apparatus and method includes utilizing an emitter which emits a light beam, an illumination optical system, a detection optical system, and a processor. The illumination optical system includes a polarization controller, a coherence reducer, and an objective lens, for illuminating a specimen with a polarization condition controlled and coherency reduced light beam through the objective lens. The detection optical system includes an imaging lens and a sensor for detecting an image of the specimen illuminated by the light beam through the illumination optical system. The processor processes a signal outputted from the sensor and detects a defect on the specimen.
摘要翻译：检查装置和方法包括利用发射光束的发射器，照明光学系统，检测光学系统和处理器。照明光学系统包括偏振控制器，相干减少器和物镜，用于照射具有偏振状态的样本并通过物镜降低光束的相干性。检测光学系统包括成像透镜和用于检测由通过照明光学系统的光束照射的样本的图像的传感器。处理器处理从传感器输出的信号并检测样本上的缺陷。

30. 发明申请

US20060290923A1 Method and apparatus for detecting defects 失效
公开(公告)号：US20060290923A1
公开(公告)日：2006-12-28
申请号：US11472426
申请日：2006-06-22
申请人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
发明人： Hiroyuki Nakano , Toshihiko Nakata , Sachio Uto , Akira Hamamatsu , Shunji Maeda , Yuta Urano
IPC分类号： G01N21/88
CPC分类号： G01N21/956 , G01N21/47 , G01N21/94 , G01N21/9501 , G01N2021/8822
摘要： A method and apparatus for detecting defects are provided for detecting harmful defects or foreign matter with high sensitivity on an object to be inspected with a transparent film, such as an oxide film, by reducing noise due to a circuit pattern. The apparatus for detecting defects includes a stage part on which a substrate specimen is put and which is arbitrarily movable in each of the X-Y-Z-θ directions, an illumination system for irradiating the circuit pattern with light from an inclined direction, and an image-forming optical system for forming an image of an irradiated detection area on a detector from the upward and oblique directions. With this arrangement, diffracted light and scattered light caused on the circuit pattern through the illumination by the illumination system is collected. Furthermore, a spatial filter is provided on a Fourier transform surface for blocking the diffracted light from a linear part of the circuit pattern. The scattered and reflected light received by the detector from the specimen is converted into an electrical signal. The converted electrical signal of one chip is compared with that of the other adjacent chip. If these signals are not identical to each other, the foreign matter is determined to exist on the specimen in detection.

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