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21. 发明申请

US20080264386A1 METHOD AND APPARATUS FOR ATTENUATING FUEL PUMP NOISE IN A DIRECT INJECTION INTERNAL COMBUSTION CHAMBER 有权
标题翻译：直接喷射内燃机室内燃油泵噪声衰减的方法及装置
公开(公告)号：US20080264386A1
公开(公告)日：2008-10-30
申请号：US12166760
申请日：2008-07-02
申请人： Atsushi Watanabe , Atsushi Hohkita , Masahiro Soma , Hiroaki Saeki
发明人： Atsushi Watanabe , Atsushi Hohkita , Masahiro Soma , Hiroaki Saeki
IPC分类号： F02M69/46
CPC分类号： F02M55/02 , F02M61/168 , F02M2200/315 , F02M2200/40 , F02M2200/8023
摘要： An apparatus for attenuating fuel pump noise in a direct injection internal combustion engine. In one proposal, the direct injection fuel nozzle is suspended from a fuel rail in a fashion that avoids direct metal-to-metal contact between the injector and the engine block. The direct injection nozzle may also be connected to the fuel rail by a pair of spaced-apart seals which equalize the longitudinal pressure on the nozzle during operation. Enlarged diameter fuel reservoirs and/or a restricted orifice may be provided fluidly in series between the fuel pump and the direct injection nozzle in order to attenuate noise resulting from fuel pump pulsation. A clip holder and clip plate mount the fuel injector to the injector cup.
摘要翻译：一种用于在直喷式内燃机中减轻燃油泵噪声的装置。在一个方案中，直接喷射燃料喷嘴以避免喷射器和发动机缸体之间的直接金属对金属接触的方式从燃料轨悬挂。直接喷射喷嘴也可以通过一对间隔开的密封件连接到燃料轨道，该密封件在操作期间均衡喷嘴上的纵向压力。可以在燃料泵和直接喷射喷嘴之间流体地串联提供扩大直径的燃料储存器和/或限制孔口，以便减少由燃料泵脉动引起的噪音。夹持器和夹板将燃料喷射器安装到注射器杯。

22. 发明申请

US20080187416A1 SEMICONDUCTOR PROCESSING SYSTEM 有权
标题翻译：半导体加工系统
公开(公告)号：US20080187416A1
公开(公告)日：2008-08-07
申请号：US11774335
申请日：2007-07-06
申请人： Tsutomu Hiroki , Hiroaki Saeki
发明人： Tsutomu Hiroki , Hiroaki Saeki
IPC分类号： H01L21/67
CPC分类号： H01L21/68742 , H01L21/68 , H01L21/68714 , H01L21/6875 , Y10S414/139
摘要： A supporting mechanism (12A) is used for transfer-ring a target substrate (W) in cooperation with a transfer arm (32), in a semiconductor processing system. The supporting mechanism includes first and second holding portions (38A to 38C, 40A to 40C) each configured to be moved up and down and transfer a substrate to and from the transfer arm. The first and second holding portions are configured to be moved relative to each other in a vertical direction without spatially interfering with each other, and support substrates at substantially the same horizontal coordinate position. The supporting mechanism further includes first and second drives (46, 48) configured to move the first and second holding portions up and down, and a controller (68) configured to control the first and second drives. The controller is arranged to control the first and second drives to alternatively support a substrate by the first and second holding portions.
摘要翻译：在半导体处理系统中，支撑机构（12A）用于与传送臂（32）协作传送环目标衬底（W）。支撑机构包括构造成上下移动的第一和第二保持部分（38A至38C，40A至40C），并将基板传送到传送臂和从传送臂传送。第一保持部和第二保持部被配置为在垂直方向上相对于彼此移动而没有彼此空间干涉，并且将基板支撑在基本上相同的水平坐标位置。支撑机构还包括构造成使第一和第二保持部分上下移动的第一和第二驱动器（46,48）以及被配置为控制第一和第二驱动器的控制器（68）。控制器被布置成控制第一和第二驱动器以由第一和第二保持部分交替地支撑衬底。

23. 发明授权

US07393172B1 Untreated body transfer device and semiconductor manufacturing device with the untreated body transfer device 失效
标题翻译：未经处理的身体转移装置和半导体制造装置与未经处理的身体转移装置
公开(公告)号：US07393172B1
公开(公告)日：2008-07-01
申请号：US10048012
申请日：2000-07-26
申请人： Hiroaki Saeki , Masaki Narushima , Tetsu Osawa , Yasushi Taniyama , Shuuji Hagiwara
发明人： Hiroaki Saeki , Masaki Narushima , Tetsu Osawa , Yasushi Taniyama , Shuuji Hagiwara
IPC分类号： H01L21/677
CPC分类号： H01L21/68707 , H01L21/67766 , Y10S414/137
摘要： In a wafer transfer system wherein a wafer transfer robot linearly reciprocates by a linear motor, dust is prevented from adhering to a wafer.A fixed base 9, on which the secondary side 11 of a linear motor M for linearly reciprocating a wafer transfer robot R is mounted, is mounted on the system body 1 of a wafer transfer system A in lateral directions and in vertical directions, so that dust dropping in accordance with the flow of clean air K from a clean air supply system 4 is directly sucked into an exhaust fan 5, which is provided on the bottom portion 1c of the system body 1, to be exhausted without being deposited on the top face of the fixed base 9 and the secondary side 11.
摘要翻译：在其中晶片传送机器人通过线性电动机线性往复运动的晶片传送系统中，防止灰尘附着在晶片上。在晶片传送系统A的系统主体1上沿横向和垂直方向安装固定基座9，其上安装有晶片传送机器人R用于线性往复运动的线性电动机M的次级侧11，使得根据来自清洁空气供给系统4的清洁空气K的流动的粉尘直接吸入设置在系统主体1的底部1c上的排气扇5，而不会沉积在排气扇5上固定底座9和次侧11的顶面。

24. 发明授权

US07013869B2 Fuel supply system for internal combustion engine 失效
标题翻译：内燃机燃油供应系统
公开(公告)号：US07013869B2
公开(公告)日：2006-03-21
申请号：US10681245
申请日：2003-10-09
申请人： Masami Nagano , Takanobu Ichihara , Hiroaki Saeki
发明人： Masami Nagano , Takanobu Ichihara , Hiroaki Saeki
IPC分类号： F02D41/00
CPC分类号： F02M69/32 , F02D41/3094 , F02M31/135 , F02M31/18 , F02M53/02 , F02M69/325 , Y02T10/126
摘要： The present invention provides an electronically-controlled fuel injector, for an internal combustion engine, comprising a downstream fuel injection valve located near an air intake port of each cylinder or inside a cylinder, an air intake passage which bypasses the throttle valve located upstream of a downstream fuel injection valve, and a fuel vaporizing section including an upstream fuel injection valve, and a heater which vaporizes fuel injected from the upstream fuel injection valve; and further having an air intake port located upstream of the throttle valve, air flow control section for controlling an amount of air, said fuel vaporizing section, vaporized-fuel branch section for supplying vaporized fuel to each cylinder, and a vaporized-fuel distribution passage which extends from the vaporized-fuel branch section to an opening located in each air intake pipe located downstream of the throttle valve.
摘要翻译：本发明提供了一种用于内燃机的电子控制燃料喷射器，包括位于每个气缸的进气口附近或气缸内的下游燃料喷射阀，绕过位于气缸的上游的节流阀的进气通道下游燃料喷射阀和包括上游燃料喷射阀的燃料蒸发部和使从上游燃料喷射阀喷射的燃料蒸发的加热器; 并且还具有位于节流阀上游的进气口，用于控制空气量的空气流量控制部分，所述燃料蒸发部分，用于向每个气缸供应蒸发燃料的蒸发燃料分支部分，以及蒸发燃料分配通道其从蒸发燃料分支部分延伸到位于节流阀下游的每个进气管中的开口。

25. 发明授权

US06950721B2 Positioning substrate for semiconductor process 失效
标题翻译：半导体工艺定位基板
公开(公告)号：US06950721B2
公开(公告)日：2005-09-27
申请号：US10391574
申请日：2003-03-20
申请人： Makoto Tashiro , Keisuke Kondoh , Hiroaki Saeki
发明人： Makoto Tashiro , Keisuke Kondoh , Hiroaki Saeki
IPC分类号： H01L21/027 , H01L21/02 , H01L21/68 , G06F7/00
CPC分类号： H01L21/68 , Y10S414/135
摘要： A positioning substrate is used for performing a teaching operation on a transfer mechanism for transferring a target substrate in a semiconductor processing system. The positioning substrate includes a substrate body made of a material selected from the group consisting of the same material as the target substrate, semiconductor, compound semiconductor, and ceramic. The substrate body has an outer contour sized to be handled by the transfer mechanism as an alternative to the target substrate. The positioning substrate also includes a positioning assistant having a combination of a positioning hole and a positioning reference line formed in the substrate body. The positioning hole is formed to penetrate the substrate body in a thickness direction. The positioning reference line is formed on a surface of the substrate body to extend across an opening of the positioning hole and have a predetermined width.
摘要翻译：定位基板用于对在半导体处理系统中传送目标基板的转印机构进行示教操作。定位基板包括由与靶基板，半导体，化合物半导体和陶瓷相同的材料组成的组中选择的材料制成的基板主体。基板主体具有外形轮廓，其尺寸设置成由作为目标基板的替代的传送机构来处理。定位基板还包括具有定位孔和形成在基板主体中的定位基准线的组合的定位辅助件。定位孔形成为在厚度方向上穿透基体。定位参考线形成在基体的表面上，以延伸穿过定位孔的开口并具有预定的宽度。

26. 发明申请

US20050022783A1 Fuel supply system for internal combustion engine 失效
标题翻译：内燃机燃油供应系统
公开(公告)号：US20050022783A1
公开(公告)日：2005-02-03
申请号：US10681245
申请日：2003-10-09
申请人： Masami Nagano , Takanobu Ichihara , Hiroaki Saeki
发明人： Masami Nagano , Takanobu Ichihara , Hiroaki Saeki
IPC分类号： F02M69/00 , F02D41/06 , F02M31/135 , F02M31/18 , F02M45/02 , F02M53/02 , F02M69/32 , F02D41/16 , F02M31/12
CPC分类号： F02M69/32 , F02D41/3094 , F02M31/135 , F02M31/18 , F02M53/02 , F02M69/325 , Y02T10/126
摘要： The present invention provides an electronically-controlled fuel injector, for an internal combustion engine, comprising a downstream fuel injection valve located near an air intake port of each cylinder or inside a cylinder, an air intake passage which bypasses the throttle valve located upstream of a downstream fuel injection valve, and a fuel vaporizing section including an upstream fuel injection valve, and a heater which vaporizes fuel injected from the upstream fuel injection valve; and further having an air intake port located upstream of the throttle valve, air flow control section for controlling an amount of air, said fuel vaporizing section, vaporized-fuel branch section for supplying vaporized fuel to each cylinder, and a vaporized-fuel distribution passage which extends from the vaporized-fuel branch section to an opening located in each air intake pipe located downstream of the throttle valve.
摘要翻译：本发明提供了一种用于内燃机的电子控制燃料喷射器，包括位于每个气缸的进气口附近或气缸内的下游燃料喷射阀，绕过位于气缸的上游的节流阀的进气通道下游燃料喷射阀和包括上游燃料喷射阀的燃料蒸发部和使从上游燃料喷射阀喷射的燃料蒸发的加热器; 并且还具有位于节流阀上游的进气口，用于控制空气量的空气流量控制部分，所述燃料蒸发部分，用于向每个气缸供应蒸发燃料的蒸发燃料分支部分，以及蒸发燃料分配通道其从蒸发燃料分支部分延伸到位于节流阀下游的每个进气管中的开口。

27. 发明授权

US06802934B2 Processing apparatus 失效
标题翻译：处理装置
公开(公告)号：US06802934B2
公开(公告)日：2004-10-12
申请号：US10378890
申请日：2003-03-05
申请人： Hiroaki Saeki , Keiichi Matsushima , Teruo Asakawa , Masaki Narushima
发明人： Hiroaki Saeki , Keiichi Matsushima , Teruo Asakawa , Masaki Narushima
IPC分类号： H01L2100
CPC分类号： H01L21/67766 , H01L21/67167 , H01L21/67201 , H01L21/67742 , H01L21/67745 , Y10S414/135 , Y10S414/136
摘要： Two load lock chambers 130 and 132 are arranged between a first transfer chamber 122 and a second transfer chamber 133. Each of the load lock chambers is capable of accommodating a single wafer W. The first transfer chamber 122 is provided with a first transfer unit 124 having two substrate holders 124a, 124b each capable of holding a single object to be processed, in order to transport the wafer W among a load port site 120, the first load lock chamber 130, the second load lock chamber 132 and a positioning unit 150. The second transfer chamber 133 is provided with a second transfer unit 156 having two substrate holders 156a, 156b each capable of holding the single object to be processed, in order to transport the wafer between the first load lock chamber 130, the second load lock chamber 132 and respective vacuum processing chambers 158 to 164. Since the volume of each load lock chamber can be minimized, it is possible to perform the prompt control of atmospheres in the load lock chambers. Additionally, it is possible to perform the delivery of the wafers promptly.
摘要翻译：两个负载锁定室130和132设置在第一传送室122和第二传送室133之间。每个负载锁定室能够容纳单个晶片W.第一传送室122设置有第一传送单元124 具有能够保持单个待处理物体的两个基板保持件124a，124b，以便在载荷端口位置120，第一加载锁定室130，第二加载锁定室132和定位单元150之间输送晶片W 第二传送室133设置有第二传送单元156，第二传送单元156具有两个能够保持单个待处理物体的基板保持器156a，156b，以便在第一加载锁定室130，第二加载锁室132和相应的真空处理室158至164.由于每个负载锁定室的体积可以最小化，因此可以对负载锁中的气氛进行即时控制 mbers。此外，可以及时执行晶片的传送。

28. 发明授权

US06776142B2 Apparatus and method for supplying fuel in internal combustion engine with variable valve lifter 失效
标题翻译：在具有可变气门挺杆的内燃机中供给燃料的装置和方法
公开(公告)号：US06776142B2
公开(公告)日：2004-08-17
申请号：US10372816
申请日：2003-02-26
申请人： Yoshihiro Sukegawa , Toshiharu Nogi , Takanobu Ichihara , Hiroaki Saeki
发明人： Yoshihiro Sukegawa , Toshiharu Nogi , Takanobu Ichihara , Hiroaki Saeki
IPC分类号： F02M5100
CPC分类号： F02D13/0226 , F02D41/0002 , F02D41/003 , F02D41/3094 , F02D41/34 , F02D2041/001 , F02M69/044 , F02M69/325 , Y02T10/18 , Y02T10/42 , Y02T10/44
摘要： On supplying fuel in an internal combustion engine, a control signal for changing a degree of vaporization of the fuel passing the air intake valve in accordance with the opening degree of the air intake valve or a load of the internal combustion engine so that the fuel of liquid state is restrained from existing in the combustion chamber is generated, and subsequently a vaporizing speed of the supplied fuel is changed in accordance with the control signal to adjust the degree of vaporization of the fuel.
摘要翻译：在内燃机中供给燃料时，控制信号用于根据进气门的开度或内燃机的负荷来改变通过进气阀的燃料的汽化程度，使得燃料产生燃烧室中存在的液体状态，随后根据控制信号改变供给燃料的蒸发速度，以调节燃料的蒸发度。

29. 发明授权

US06575691B1 Transfer arm 失效
标题翻译：转臂
公开(公告)号：US06575691B1
公开(公告)日：2003-06-10
申请号：US09744175
申请日：2001-01-19
申请人： Hiroaki Saeki
发明人： Hiroaki Saeki
IPC分类号： B66C2300
CPC分类号： B25J9/107 , H01L21/67766 , H01L21/68707 , Y10T74/20305 , Y10T74/20329
摘要： A conveying arm of the invention includes a first pivotable shaft connected to a first arm which is also pivotably connected to a third arm having an intermediate pivotable portion. The third arm is also pivotably connected to a fifth arm which is also pivotably connected to a seventh arm which has a holding portion for an object to be conveyed. The conveying arm also includes a second pivotable shaft connected to a second arm which is also pivotably connected to a fourth arm having an intermediate pivotable portion. The fourth arm is also pivotably connected to a sixth arm which is also pivotably connected to the seventh arm. With respect to both the third and fourth arms, a line linking one-side end portion to an intermediate pivotable portion is substantially perpendicular to a line linking the other-side end portion to the intermediate pivotable portion.
摘要翻译：本发明的传送臂包括连接到第一臂的第一可枢转轴，其也可枢转地连接到具有中间可枢转部分的第三臂。第三臂也可枢转地连接到第五臂，第五臂也可枢转地连接到具有用于待传送物体的保持部分的第七臂。输送臂还包括连接到第二臂的第二可枢转轴，第二臂也可枢转地连接到具有中间可枢转部分的第四臂。第四臂也可枢转地连接到也可枢转地连接到第七臂的第六臂。相对于第三臂和第四臂，连接单侧端部与中间枢转部分的线基本上垂直于将另一侧端部连接到中间枢转部分的线。

30. 发明授权

US5314541A Reduced pressure processing system and reduced pressure processing method 失效
标题翻译：减压处理系统和减压处理方法
公开(公告)号：US5314541A
公开(公告)日：1994-05-24
申请号：US889378
申请日：1992-05-28
申请人： Masasi Saito , Teruo Iwata , Nobuo Ishii , Towl Ikeda , Hiroaki Saeki
发明人： Masasi Saito , Teruo Iwata , Nobuo Ishii , Towl Ikeda , Hiroaki Saeki
IPC分类号： C23C14/56 , H01L21/00 , C23C16/00
CPC分类号： H01L21/67213 , C23C14/566 , H01L21/67115 , H01L21/67126 , H01L21/67173 , H01L21/67201 , H01L21/67276
摘要： A reduced pressure processing system includes a load lock chamber having an opening communicating with a process atmosphere in which a wafer is processed and/or the outer air atmosphere, a gate valve which is arranged at the opening to close/open the chamber with respect to the process atmosphere and/or the outer air atmosphere, a robot for loading/unloading the wafer into/from the chamber, an evacuation pump for evacuating the chamber, a heater for heating the wall of the chamber, and a controller for controlling the gate valve, the robot, the evacuation pump, and the heater.
摘要翻译：减压处理系统包括：负载锁定室，具有与处理晶片进行处理的处理气氛和/或外部空气气氛连通的开口;闸阀，其布置在开口处，以关闭/打开室处理气氛和/或外部空气气氛，用于将晶片装入/从室中卸载的机器人，用于抽空室的抽空泵，用于加热室壁的加热器和用于控制门的控制器阀门，机器人，排气泵和加热器。

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