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1. 发明授权

US08740535B2 Delivery position aligning method for use in vacuum processing apparatus, vacuum processing apparatus and computer storage medium 有权
标题翻译：用于真空处理装置，真空处理装置和计算机存储介质的输送位置对准方法
公开(公告)号：US08740535B2
公开(公告)日：2014-06-03
申请号：US13079356
申请日：2011-04-04
申请人： Keisuke Kondoh , Hiroshi Koizumi
发明人： Keisuke Kondoh , Hiroshi Koizumi
IPC分类号： H01L21/677
CPC分类号： H01L21/68 , H01L21/67196 , H01L21/67259
摘要： In a vacuum transfer chamber, a position detecting mechanism for detecting the positions of semiconductor wafers is arranged. The semiconductor wafers disposed at predetermined positions in a load lock chamber and vacuum processing chambers are transferred to the position detecting mechanism by a vacuum transfer mechanism and the positions of the wafers are detected. Then, based on the detection results, aligning between the load lock chamber and the vacuum processing chambers is performed.
摘要翻译：在真空传送室中，布置有用于检测半导体晶片的位置的位置检测机构。设置在负载锁定室和真空处理室中的预定位置的半导体晶片通过真空传递机构传送到位置检测机构，并且检测晶片的位置。然后，基于检测结果，进行负载锁定室与真空处理室的对准。

2. 发明授权

US08113757B2 Intermediate transfer chamber, substrate processing system, and exhaust method for the intermediate transfer chamber 有权
标题翻译：中间转移室，衬底处理系统和中间转移室的排气方法
公开(公告)号：US08113757B2
公开(公告)日：2012-02-14
申请号：US11831361
申请日：2007-07-31
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： B65G65/34
CPC分类号： H01L21/67201 , Y10S414/135
摘要： An intermediate transfer chamber that can prevent formation of defects in substrates. The intermediate transfer chamber is provided between a loader module being in a first environment where the interior thereof is at a first pressure and contains moisture, and a chamber of a process module being in a second environment where the interior thereof is at a second pressure lower than the first pressure. The intermediate transfer chamber comprises a transfer arm comprising a pick that bidirectionally transfers a substrate between the loader module and the chamber and supports the substrate, a load-lock module exhaust system that exhausts the interior of the intermediate transfer chamber so as to reduce pressure in the intermediate transfer chamber from the first pressure to the second pressure, and a plate-like member that controls the conductance of exhaust on at least a principal surface of the substrate opposite to the pick when the interior of the intermediate transfer chamber is exhausted.
摘要翻译：可以防止在基板中形成缺陷的中间转印室。中间转移室设置在处于第一环境中的第一环境中的装载器模块和处于第二环境中的处于第二环境的第二环境中的第二环境中的处理模块室，比第一个压力。中间传送室包括传送臂，传送臂包括在装载器模块和室之间双向传送衬底并支撑衬底的拾取器，负载锁定模块排气系统，其排出中间转印室的内部，以便减少所述中间转印室从所述第一压力到所述第二压力，以及板状构件，其在所述中间转印室的内部被耗尽时控制与所述拾取器相对的所述基板的至少主表面上的排气的电导。

3. 发明授权

US07942622B2 Transfer/alignment method in vacuum processing apparatus, vacuum processing apparatus and computer storage medium 有权
标题翻译：真空处理装置，真空处理装置和计算机存储介质中的转移/取向方法
公开(公告)号：US07942622B2
公开(公告)日：2011-05-17
申请号：US12094783
申请日：2007-03-12
申请人： Keisuke Kondoh , Hiroshi Koizumi
发明人： Keisuke Kondoh , Hiroshi Koizumi
IPC分类号： H01L21/68
CPC分类号： H01L21/68 , H01L21/67196 , H01L21/67259
摘要： In a vacuum transfer chamber 10, a position detecting mechanism 33 for detecting the positions of semiconductor wafers W is arranged. The semiconductor wafers W disposed at predetermined positions in a load lock chamber 17 and vacuum processing chambers 11 to 16 are transferred to the position detecting mechanism 33 by a vacuum transfer mechanism 30 and the positions of the wafers are detected. Then, based on the detection results, aligning between the load lock chamber 17 and the vacuum processing chambers 11 to 16 is performed.
摘要翻译：在真空传送室10中设置有检测半导体晶片W的位置的位置检测机构33。设置在负载锁定室17和真空处理室11至16中的预定位置的半导体晶片W通过真空传送机构30传送到位置检测机构33，并且检测晶片的位置。然后，基于检测结果，进行负载锁定室17与真空处理室11〜16的对准。

4. 发明申请

US20100172720A1 POSITIONAL DEVIATION DETECTION APPARATUS AND PROCESS SYSTEM EMPLOYING THE SAME 有权
标题翻译：位置偏差检测装置和采用该方法的过程系统
公开(公告)号：US20100172720A1
公开(公告)日：2010-07-08
申请号：US12602174
申请日：2008-05-22
申请人： Keisuke Kondoh
发明人： Keisuke Kondoh
IPC分类号： H01L21/677 , G01B11/14
CPC分类号： H01L21/67742 , H01L21/67766 , H01L21/681
摘要： In a positional deviation detection apparatus provided with a transfer mechanism where plural arm portions are connected pivotably and in series with each other, the transfer mechanism being adapted to hold and transfer an object to be processed with a distal end arm portion, there are provided an edge detection unit that detects at least an edge of the object to be detected held by the distal end arm portion, the edge detection unit being provided in an arm portion among the plural arm portions, except for the distal end arm portion; and a positional deviation detection portion that obtains positional deviation of the object to be processed, in accordance with a detected value of the edge detection unit.
摘要翻译：在设置有多个臂部可枢转地并且彼此串联连接的传送机构的位置偏差检测装置中，传送机构适于用远端臂部保持和传送被处理物体，边缘检测单元，其检测由所述前端臂部保持的所述被检测体的至少一边缘，所述边缘检测单元设置在所述多个臂部中的除了所述前端臂部之外的臂部; 以及位置偏差检测部，其根据边缘检测部的检测值取得被处理物的位置偏差。

5. 发明申请

US20120012254A1 GATE VALVE CLEANING METHOD AND SUBSTRATE PROCESSING SYSTEM 有权
标题翻译：门阀清洗方法和基板处理系统
公开(公告)号：US20120012254A1
公开(公告)日：2012-01-19
申请号：US13243462
申请日：2011-09-23
申请人： Tsuyoshi MORIYA , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi MORIYA , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： B08B13/00 , C23F1/08
CPC分类号： H01L21/67126
摘要： A gate valve cleaning method that can clean a gate valve that brings an atmospheric transfer chamber and an internal pressure variable transfer chamber that transfer a substrate into communication with each other or shuts them off from each other without bringing about a decrease in the throughput of a substrate processing system. Before the gate valve brings the atmospheric transfer chamber and the internal pressure variable transfer chamber into communication with each other, the pressure in the internal pressure variable transfer chamber is increased so that the pressure in the internal pressure variable transfer chamber can become higher than the pressure in the atmospheric transfer chamber.
摘要翻译：一种闸阀清洗方法，其能够清洁使大气传送室和内部压力可变转移室的闸阀彼此连通或彼此连通或将它们彼此关闭，而不会导致生产量的降低基板处理系统。在闸阀将大气传送室和内压可变传送室彼此连通之前，内压可变传送室中的压力增加，使得内压可变传送室中的压力可以变得高于压力在大气传递室。

6. 发明申请

US20100102030A1 SUBSTRATE PROCESSING APPARATUS, SUBSTRATE PROCESSING METHOD, AND COMPUTER READABLE STORAGE MEDIUM 有权
标题翻译：基板处理装置，基板处理方法和计算机可读存储介质
公开(公告)号：US20100102030A1
公开(公告)日：2010-04-29
申请号：US12532190
申请日：2008-03-28
申请人： Keisuke Kondoh
发明人： Keisuke Kondoh
IPC分类号： C23F1/00 , C23F1/08
CPC分类号： H01L21/67778 , H01L21/67769
摘要： A substrate processing apparatus is disclosed for bringing a substrate from a carrier, by a substrate transfer portion inside a transfer chamber, into a processing module to perform a process therein. The substrate processing apparatus includes a substrate storing chamber coupled to an exterior of the transfer chamber via a transfer opening to be in communications with the transfer chamber; a first storing shelf in the substrate storing chamber to store substrates for a first storing purpose; a second storing shelf in the substrate storing chamber to store substrates for a second storing purpose different from the first storing purpose; and a shifting mechanism that shifts the first and the second storing shelves to position a substrate storing area of one of the first and the second storing shelves so that substrate transferring is enabled between the substrate storing area and the substrate transfer portion via the transfer opening.
摘要翻译：公开了一种基板处理装置，用于将来自载体的基板通过传送室内的基板传送部分引入处理模块中以在其中执行处理。基板处理装置包括经由传送开口连接到传送室的外部的基板存储室，以与传送室通信; 在所述基板存储室中存储用于存储用于第一存储目的的基板的第一存储架; 在所述基板存储室中的第二存储架，用于存储用于不同于所述第一存储目的的第二存储目的的基板; 以及移动机构，其移动第一和第二存储架以定位第一和第二存储架中的一个的基板存储区域，使得能够经由传送开口在基板存储区域和基板传送部分之间进行基板传送。

7. 发明申请

US20080069669A1 SUBSTRATE PROCESSING DEVICE, METHOD OF ADJUSTING PRESSURE IN SUBSTRATE PROCESSING DEVICE, AND METHOD OF EXECUTING CHARGE NEUTRALIZATION PROCESSING ON MOUNTING TABLE OF SUBSTRATE PROCESSING DEVICE 审中-公开
标题翻译：基板处理装置，基板处理装置中的压力调整方法以及对基板处理装置的安装表执行充电中和处理的方法
公开(公告)号：US20080069669A1
公开(公告)日：2008-03-20
申请号：US11857271
申请日：2007-09-18
申请人： Keisuke Kondoh , Hiroshi Koizumi
发明人： Keisuke Kondoh , Hiroshi Koizumi
IPC分类号： H01L21/67 , B65D85/86 , H01L21/687
CPC分类号： H01L21/67253 , H01L21/67196 , H01L21/67748 , H01L21/67772
摘要： A method adjusts a pressure in a substrate processing device. The substrate processing device has a processing chamber for executing a predetermined processing for a substrate to be processed mounted on a mounting table; a pressure adjustment unit for the processing chamber which adjusts a pressure within the processing chamber; a transfer chamber connected to the processing chamber via a gate valve; and a pressure adjustment unit for the transfer chamber which adjusts a pressure in the transfer chamber and adjusts a pressure within the processing chamber while the gate valve is opened. The method is to adjust a pressure within the processing chamber to a predetermined pressure by using both the pressure adjustment unit for the processing chamber and the pressure adjustment unit for the transfer chamber.
摘要翻译：一种方法调节衬底处理装置中的压力。基板处理装置具有用于对安装在安装台上的待加工基板进行预定处理的处理室; 用于处理室的压力调节单元，其调节处理室内的压力; 经由闸阀连接到处理室的传送室; 以及用于传送室的压力调节单元，其调节所述传送室中的压力并且在所述闸阀打开时调节所述处理室内的压力。该方法是通过使用用于处理室的压力调节单元和用于传送室的压力调节单元来将处理室内的压力调节到预定压力。

8. 发明授权

US07129147B2 Delivery position aligning method for use in a transfer system and a processing system employing the method 有权
标题翻译：用于传送系统的传送位置对准方法和采用该方法的处理系统
公开(公告)号：US07129147B2
公开(公告)日：2006-10-31
申请号：US11138421
申请日：2005-05-27
申请人： Motohiro Kumagai , Keisuke Kondoh
发明人： Motohiro Kumagai , Keisuke Kondoh
IPC分类号： H01L21/76
CPC分类号： H01L21/67167 , H01L21/67184 , H01L21/67259 , H01L21/68
摘要： A transfer system has a position aligning device, a mounting device, and a transfer mechanism having two pick. In a delivery position aligning method for use in a transfer system, a set of delivery position coordinates that defines an access point of each pick of the transfer mechanism is temporarily determined. Then, a set of delivery position coordinates of each pick of the transfer mechanism to the position aligning device is fixed, and parts of sets of delivery position coordinates of each pick of the transfer mechanism to devices other than the position aligning device are fixed. A position alignment object is transferred to the position aligning device via a transfer route passing an unfixed set of delivery position coordinates, and an amount of positional displacement thereof is calculated. The unfixed set of delivery position coordinates is corrected based on the amount of positional displacement, and fixed.
摘要翻译：传送系统具有位置对准装置，安装装置和具有两个拾取器的传送机构。在用于传送系统的传送位置对准方法中，暂时确定定义传送机构的每个拾取的接入点的一组传送位置坐标。然后，将传送机构的每个拾取的一组传送位置坐标固定到位置对准装置，并且将传送机构的每个拾取的传送位置坐标的一组传送位置坐标的一部分固定到位置对准装置以外的装置。位置对准对象经由传递路线传递到位置对齐装置，该传送路线通过不固定的传送位置坐标组，并且计算其位置偏移量。基于位置位移量校正不固定的传送位置坐标组，并且固定。

9. 发明申请

US20060138367A1 Substrate processing apparatus and transfer positioning method thereof 有权
标题翻译：基板处理装置及其转印定位方法
公开(公告)号：US20060138367A1
公开(公告)日：2006-06-29
申请号：US11304685
申请日：2005-12-16
申请人： Keisuke Kondoh
发明人： Keisuke Kondoh
IPC分类号： G01N21/86 , G01V8/00
CPC分类号： H01L21/67259
摘要： A substrate processing apparatus has a transfer mechanism arranged on a transfer base and configured to transfer a processing substrate between predetermined transfer positions, a mapping sensor arranged on the transfer base and configured to detect an arrangement state of a processing substrate inside a processing substrate accommodating case which accommodates a plurality of processing substrate in a shelf-like form, and a Z-axis teaching jig provided on or in the vicinity of one of the transfer positions. This substrate processing apparatus detects, by the mapping sensor, a height of the Z-axis teaching jig so as to perform teaching of Z-axis to the transfer mechanism with respect to the one of the transfer positions.
摘要翻译：一种基板处理装置，具有设置在转印基板上的转印机构，其被配置为在预定的转印位置之间转印处理基板，布置在转印基板上的配置在检测处理基板容纳壳体内部的处理基板的配置状态其容纳多个处于搁置状态的处理基板，以及设置在其中一个转印位置上或其附近的Z轴示教夹具。该基板处理装置通过映射传感器检测Z轴示教夹具的高度，以便相对于传送位置之一对传送机构进行Z轴的教导。

10. 发明授权

US06950721B2 Positioning substrate for semiconductor process 失效
标题翻译：半导体工艺定位基板
公开(公告)号：US06950721B2
公开(公告)日：2005-09-27
申请号：US10391574
申请日：2003-03-20
申请人： Makoto Tashiro , Keisuke Kondoh , Hiroaki Saeki
发明人： Makoto Tashiro , Keisuke Kondoh , Hiroaki Saeki
IPC分类号： H01L21/027 , H01L21/02 , H01L21/68 , G06F7/00
CPC分类号： H01L21/68 , Y10S414/135
摘要： A positioning substrate is used for performing a teaching operation on a transfer mechanism for transferring a target substrate in a semiconductor processing system. The positioning substrate includes a substrate body made of a material selected from the group consisting of the same material as the target substrate, semiconductor, compound semiconductor, and ceramic. The substrate body has an outer contour sized to be handled by the transfer mechanism as an alternative to the target substrate. The positioning substrate also includes a positioning assistant having a combination of a positioning hole and a positioning reference line formed in the substrate body. The positioning hole is formed to penetrate the substrate body in a thickness direction. The positioning reference line is formed on a surface of the substrate body to extend across an opening of the positioning hole and have a predetermined width.
摘要翻译：定位基板用于对在半导体处理系统中传送目标基板的转印机构进行示教操作。定位基板包括由与靶基板，半导体，化合物半导体和陶瓷相同的材料组成的组中选择的材料制成的基板主体。基板主体具有外形轮廓，其尺寸设置成由作为目标基板的替代的传送机构来处理。定位基板还包括具有定位孔和形成在基板主体中的定位基准线的组合的定位辅助件。定位孔形成为在厚度方向上穿透基体。定位参考线形成在基体的表面上，以延伸穿过定位孔的开口并具有预定的宽度。

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