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1. 发明授权

US06950721B2 Positioning substrate for semiconductor process 失效
标题翻译：半导体工艺定位基板
公开(公告)号：US06950721B2
公开(公告)日：2005-09-27
申请号：US10391574
申请日：2003-03-20
申请人： Makoto Tashiro , Keisuke Kondoh , Hiroaki Saeki
发明人： Makoto Tashiro , Keisuke Kondoh , Hiroaki Saeki
IPC分类号： H01L21/027 , H01L21/02 , H01L21/68 , G06F7/00
CPC分类号： H01L21/68 , Y10S414/135
摘要： A positioning substrate is used for performing a teaching operation on a transfer mechanism for transferring a target substrate in a semiconductor processing system. The positioning substrate includes a substrate body made of a material selected from the group consisting of the same material as the target substrate, semiconductor, compound semiconductor, and ceramic. The substrate body has an outer contour sized to be handled by the transfer mechanism as an alternative to the target substrate. The positioning substrate also includes a positioning assistant having a combination of a positioning hole and a positioning reference line formed in the substrate body. The positioning hole is formed to penetrate the substrate body in a thickness direction. The positioning reference line is formed on a surface of the substrate body to extend across an opening of the positioning hole and have a predetermined width.
摘要翻译：定位基板用于对在半导体处理系统中传送目标基板的转印机构进行示教操作。定位基板包括由与靶基板，半导体，化合物半导体和陶瓷相同的材料组成的组中选择的材料制成的基板主体。基板主体具有外形轮廓，其尺寸设置成由作为目标基板的替代的传送机构来处理。定位基板还包括具有定位孔和形成在基板主体中的定位基准线的组合的定位辅助件。定位孔形成为在厚度方向上穿透基体。定位参考线形成在基体的表面上，以延伸穿过定位孔的开口并具有预定的宽度。

2. 发明授权

US06699003B2 Carrying device 失效
标题翻译：携带装置
公开(公告)号：US06699003B2
公开(公告)日：2004-03-02
申请号：US10218997
申请日：2002-08-15
申请人： Hiroaki Saeki , Keisuke Kondoh
发明人： Hiroaki Saeki , Keisuke Kondoh
IPC分类号： B66C2300
CPC分类号： H01L21/687 , B25J9/1065 , B25J9/107 , H01L21/67742 , Y10S414/13 , Y10T74/20305 , Y10T74/20329
摘要： In most cases, a hot, corrosive atmosphere is created in, for example, a semiconductor wafer processing chamber. When an arm including belts, such as steel belts, is moved into such a semiconductor wafer processing chamber, the belts are exposed to the hot, corrosive atmosphere. Belts, such as steel belts, have limited heat resistance and corrosion resistance and the hot, corrosive atmosphere in the processing chamber shortens the life of the belts. A carrying device of the present invention has a frog leg type arm (3) and a wafer holder (4) connected to the frog leg type arm (3). The wafer holder (4) is pivotally connected to front end parts of a first front arm (8A) and a second front arm (8B) by coaxial joints (10). The wafer holder (4) is linked to the first front arm (8A) and the second front arm (8B) by a posture maintaining linkage (5) including two antiparallel linkages capable of controlling the turning of the wafer holder (4) relative to the first and the second front arms (8A, 8B).
摘要翻译：在大多数情况下，在例如半导体晶片处理室中产生热的腐蚀性气体。当包括诸如钢带的带的臂移动到这种半导体晶片处理室中时，带暴露于热的腐蚀性气氛中。皮带，如钢带，具有有限的耐热性和耐腐蚀性，加工室内的热腐蚀性气氛缩短了皮带的使用寿命。本发明的携带装置具有连接到青蛙腿型臂（3）的蛙腿式臂（3）和晶片保持架（4）。晶片保持架（4）通过同轴接头（10）枢转地连接到第一前臂（8A）和第二前臂（8B）的前端部分。晶片保持器（4）通过包括两个能够控制晶片保持器（4）的相对转动的两个反平行连杆的姿态保持连杆（5）连接到第一前臂（8A）和第二前臂（8B）第一和第二前臂（8A，8B）。

3. 发明授权

US06450757B1 Conveyor system 失效
标题翻译：输送系统
公开(公告)号：US06450757B1
公开(公告)日：2002-09-17
申请号：US09856097
申请日：2001-05-17
申请人： Hiroaki Saeki , Keisuke Kondoh
发明人： Hiroaki Saeki , Keisuke Kondoh
IPC分类号： B25J906
CPC分类号： H01L21/687 , B25J9/1065 , B25J9/107 , H01L21/67742 , Y10S414/13 , Y10T74/20305 , Y10T74/20329
摘要： In most cases, a hot, corrosive atmosphere is created in, for example, a semiconductor wafer processing chamber. When an arm including belts, such as steel belts, is moved into such a semiconductor wafer processing chamber, the belts are exposed to the hot, corrosive atmosphere. Belts, such as steel belts, have limited heat resistance and corrosion resistance and the hot, corrosive atmosphere in the processing chamber shortens the life of the belts. A carrying device of the present invention has a frog leg type arm (3) and a wafer holder (4) connected to the frog leg type arm (3). The wafer holder (4) is pivotally connected to front end parts of a first front arm (8A) and a second front arm (8B) by coaxial joints (10). The wafer holder (4) is linked to the first front arm (8A) and the second front arm (8B) by a posture maintaining linkage (5) including two antiparallel linkages capable of controlling the turning of the wafer holder (4) relative to the first and the second front arms (8A, 8B).
摘要翻译：在大多数情况下，在例如半导体晶片处理室中产生热的腐蚀性气体。当包括诸如钢带的带的臂移动到这种半导体晶片处理室中时，带暴露于热的腐蚀性气氛中。皮带，如钢带，具有有限的耐热性和耐腐蚀性，加工室内的热腐蚀性气氛缩短了皮带的使用寿命。本发明的携带装置具有连接到青蛙腿型臂（3）的蛙腿式臂（3）和晶片保持架（4）。晶片保持架（4）通过同轴接头（10）枢转地连接到第一前臂（8A）和第二前臂（8B）的前端部分。晶片保持器（4）通过包括两个能够控制晶片保持器（4）的相对转动的两个反平行连杆的姿态保持连杆（5）连接到第一前臂（8A）和第二前臂（8B）第一和第二前臂（8A，8B）。

4. 外观设计

USD556157S1 Load-lock chamber 有权
标题翻译：加载锁定室
公开(公告)号：USD556157S1
公开(公告)日：2007-11-27
申请号：US29217730
申请日：2004-11-22
申请人： Keisuke Kondoh , Hiroki Oka , Makoto Tashiro
设计人： Keisuke Kondoh , Hiroki Oka , Makoto Tashiro

5. 发明授权

US08740535B2 Delivery position aligning method for use in vacuum processing apparatus, vacuum processing apparatus and computer storage medium 有权
标题翻译：用于真空处理装置，真空处理装置和计算机存储介质的输送位置对准方法
公开(公告)号：US08740535B2
公开(公告)日：2014-06-03
申请号：US13079356
申请日：2011-04-04
申请人： Keisuke Kondoh , Hiroshi Koizumi
发明人： Keisuke Kondoh , Hiroshi Koizumi
IPC分类号： H01L21/677
CPC分类号： H01L21/68 , H01L21/67196 , H01L21/67259
摘要： In a vacuum transfer chamber, a position detecting mechanism for detecting the positions of semiconductor wafers is arranged. The semiconductor wafers disposed at predetermined positions in a load lock chamber and vacuum processing chambers are transferred to the position detecting mechanism by a vacuum transfer mechanism and the positions of the wafers are detected. Then, based on the detection results, aligning between the load lock chamber and the vacuum processing chambers is performed.
摘要翻译：在真空传送室中，布置有用于检测半导体晶片的位置的位置检测机构。设置在负载锁定室和真空处理室中的预定位置的半导体晶片通过真空传递机构传送到位置检测机构，并且检测晶片的位置。然后，基于检测结果，进行负载锁定室与真空处理室的对准。

6. 发明授权

US08113757B2 Intermediate transfer chamber, substrate processing system, and exhaust method for the intermediate transfer chamber 有权
标题翻译：中间转移室，衬底处理系统和中间转移室的排气方法
公开(公告)号：US08113757B2
公开(公告)日：2012-02-14
申请号：US11831361
申请日：2007-07-31
申请人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
发明人： Tsuyoshi Moriya , Hiroyuki Nakayama , Keisuke Kondoh , Hiroki Oka
IPC分类号： B65G65/34
CPC分类号： H01L21/67201 , Y10S414/135
摘要： An intermediate transfer chamber that can prevent formation of defects in substrates. The intermediate transfer chamber is provided between a loader module being in a first environment where the interior thereof is at a first pressure and contains moisture, and a chamber of a process module being in a second environment where the interior thereof is at a second pressure lower than the first pressure. The intermediate transfer chamber comprises a transfer arm comprising a pick that bidirectionally transfers a substrate between the loader module and the chamber and supports the substrate, a load-lock module exhaust system that exhausts the interior of the intermediate transfer chamber so as to reduce pressure in the intermediate transfer chamber from the first pressure to the second pressure, and a plate-like member that controls the conductance of exhaust on at least a principal surface of the substrate opposite to the pick when the interior of the intermediate transfer chamber is exhausted.
摘要翻译：可以防止在基板中形成缺陷的中间转印室。中间转移室设置在处于第一环境中的第一环境中的装载器模块和处于第二环境中的处于第二环境的第二环境中的第二环境中的处理模块室，比第一个压力。中间传送室包括传送臂，传送臂包括在装载器模块和室之间双向传送衬底并支撑衬底的拾取器，负载锁定模块排气系统，其排出中间转印室的内部，以便减少所述中间转印室从所述第一压力到所述第二压力，以及板状构件，其在所述中间转印室的内部被耗尽时控制与所述拾取器相对的所述基板的至少主表面上的排气的电导。

7. 发明授权

US07942622B2 Transfer/alignment method in vacuum processing apparatus, vacuum processing apparatus and computer storage medium 有权
标题翻译：真空处理装置，真空处理装置和计算机存储介质中的转移/取向方法
公开(公告)号：US07942622B2
公开(公告)日：2011-05-17
申请号：US12094783
申请日：2007-03-12
申请人： Keisuke Kondoh , Hiroshi Koizumi
发明人： Keisuke Kondoh , Hiroshi Koizumi
IPC分类号： H01L21/68
CPC分类号： H01L21/68 , H01L21/67196 , H01L21/67259
摘要： In a vacuum transfer chamber 10, a position detecting mechanism 33 for detecting the positions of semiconductor wafers W is arranged. The semiconductor wafers W disposed at predetermined positions in a load lock chamber 17 and vacuum processing chambers 11 to 16 are transferred to the position detecting mechanism 33 by a vacuum transfer mechanism 30 and the positions of the wafers are detected. Then, based on the detection results, aligning between the load lock chamber 17 and the vacuum processing chambers 11 to 16 is performed.
摘要翻译：在真空传送室10中设置有检测半导体晶片W的位置的位置检测机构33。设置在负载锁定室17和真空处理室11至16中的预定位置的半导体晶片W通过真空传送机构30传送到位置检测机构33，并且检测晶片的位置。然后，基于检测结果，进行负载锁定室17与真空处理室11〜16的对准。

8. 发明申请

US20100172720A1 POSITIONAL DEVIATION DETECTION APPARATUS AND PROCESS SYSTEM EMPLOYING THE SAME 有权
标题翻译：位置偏差检测装置和采用该方法的过程系统
公开(公告)号：US20100172720A1
公开(公告)日：2010-07-08
申请号：US12602174
申请日：2008-05-22
申请人： Keisuke Kondoh
发明人： Keisuke Kondoh
IPC分类号： H01L21/677 , G01B11/14
CPC分类号： H01L21/67742 , H01L21/67766 , H01L21/681
摘要： In a positional deviation detection apparatus provided with a transfer mechanism where plural arm portions are connected pivotably and in series with each other, the transfer mechanism being adapted to hold and transfer an object to be processed with a distal end arm portion, there are provided an edge detection unit that detects at least an edge of the object to be detected held by the distal end arm portion, the edge detection unit being provided in an arm portion among the plural arm portions, except for the distal end arm portion; and a positional deviation detection portion that obtains positional deviation of the object to be processed, in accordance with a detected value of the edge detection unit.
摘要翻译：在设置有多个臂部可枢转地并且彼此串联连接的传送机构的位置偏差检测装置中，传送机构适于用远端臂部保持和传送被处理物体，边缘检测单元，其检测由所述前端臂部保持的所述被检测体的至少一边缘，所述边缘检测单元设置在所述多个臂部中的除了所述前端臂部之外的臂部; 以及位置偏差检测部，其根据边缘检测部的检测值取得被处理物的位置偏差。

9. 发明授权

US08382088B2 Substrate processing apparatus 有权
标题翻译：基板加工装置
公开(公告)号：US08382088B2
公开(公告)日：2013-02-26
申请号：US12532190
申请日：2008-03-28
申请人： Keisuke Kondoh
发明人： Keisuke Kondoh
IPC分类号： B25B1/22
CPC分类号： H01L21/67778 , H01L21/67769
摘要： A substrate processing apparatus is disclosed for bringing a substrate from a carrier, by a substrate transfer portion inside a transfer chamber, into a processing module to perform a process therein. The substrate processing apparatus includes a substrate storing chamber coupled to an exterior of the transfer chamber via a transfer opening to be in communications with the transfer chamber; a first storing shelf in the substrate storing chamber to store substrates for a first storing purpose; a second storing shelf in the substrate storing chamber to store substrates for a second storing purpose different from the first storing purpose; and a shifting mechanism that shifts the first and the second storing shelves to position a substrate storing area of one of the first and the second storing shelves so that substrate transferring is enabled between the substrate storing area and the substrate transfer portion via the transfer opening.
摘要翻译：公开了一种基板处理装置，用于将来自载体的基板通过传送室内的基板传送部分引入处理模块中以在其中执行处理。基板处理装置包括经由传送开口连接到传送室的外部的基板存储室，以与传送室通信; 在所述基板存储室中存储用于存储用于第一存储目的的基板的第一存储架; 在所述基板存储室中的第二存储架，用于存储用于不同于所述第一存储目的的第二存储目的的基板; 以及移动机构，其移动第一和第二存储架以定位第一和第二存储架中的一个的基板存储区域，使得能够经由传送开口在基板存储区域和基板传送部分之间进行基板传送。

10. 发明授权

US08326468B2 Substrate transfer apparatus, substrate transfer module, substrate transfer method and computer readable storage medium 有权
标题翻译：基板转印装置，基板转印模块，基板转印方法和计算机可读存储介质
公开(公告)号：US08326468B2
公开(公告)日：2012-12-04
申请号：US12440098
申请日：2008-03-19
申请人： Keisuke Kondoh
发明人： Keisuke Kondoh
IPC分类号： G06F19/00 , G05D23/00
CPC分类号： H01L21/67766 , B25J19/00 , H01L21/67248 , H01L21/67742
摘要： Disclosed is a substrate transfer apparatus including a transfer arm of a joint type having an arm portion rotatably connected with a holding portion for holding a substrate, the apparatus including: a heating unit for heating the arm portion; a temperature detection unit for detecting a temperature of the arm portion; and a control unit for heating the arm portion by the heating unit prior to a start of a transfer of the substrate, allowing the transfer of the substrate after a temperature detection value obtained by the temperature detection unit reaches a preset temperature range, and then controlling the heating unit so as to maintain the temperature detection value within the preset temperature range.
摘要翻译：公开了一种基板传送装置，包括具有可旋转地连接有用于保持基板的保持部的臂部的接合型传送臂，该装置包括：用于加热臂部的加热单元; 温度检测单元，用于检测臂部的温度; 以及控制单元，用于在开始转移基板之前通过加热单元加热臂部，允许在由温度检测单元获得的温度检测值达到预设温度范围之后转移基板，然后控制加热单元，以将温度检测值保持在预设温度范围内。

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