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21. 发明授权

US08808960B2 Compound and chemically amplified positive resist composition 有权
标题翻译：化合物和化学放大阳性抗蚀剂组合物
公开(公告)号：US08808960B2
公开(公告)日：2014-08-19
申请号：US12719505
申请日：2010-03-08
申请人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： G03F7/039 , C08F32/08 , C08F20/30
CPC分类号： C07C69/00 , C07C69/78 , C07C2603/24 , C08F12/24 , C08F212/14 , C08F220/30 , G03F7/0045 , G03F7/0397 , C08F220/18 , C08F2220/185 , C08F2220/303
摘要： A compound represented by the formula (I): wherein R1 represents a hydrogen atom etc., R2 and R3 each independently represent a hydrogen atom etc., R4 represents a C1-C8 divalent hydrocarbon group, R5 represents a single bond etc., and R6 represents an unsubstituted or substituted C6-C20 aromatic hydrocarbon group, a polymer comprising a structural unit derived from the compound represented by the formula (I) and a chemically amplified positive resist composition comprising the polymer, at least one acid generator and at least one solvent.
摘要翻译：由式（I）表示的化合物：其中R1表示氢原子等，R2和R3各自独立地表示氢原子等，R4表示C1-C8二价烃基，R5表示单键等，以及 R6表示未取代或取代的C6-C20芳族烃基，包含衍生自由式（I）表示的化合物的结构单元的聚合物和包含聚合物，至少一种酸产生剂和至少一种酸溶剂。

22. 发明授权

US07893293B2 Chemically amplified positive resist composition 有权
标题翻译：化学放大正光刻胶组合物
公开(公告)号：US07893293B2
公开(公告)日：2011-02-22
申请号：US12143268
申请日：2008-06-20
申请人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
发明人： Makoto Akita , Isao Yoshida , Kazuhiko Hashimoto
IPC分类号： C07C69/753 , C07C43/21 , C07C43/215 , C08F12/32 , G03F7/039
CPC分类号： G03F7/0397 , C07C69/00 , C07C2603/24 , C08F212/14 , C08F212/34 , C08F220/18 , G03F7/0045 , G03F7/0046 , Y10S430/106
摘要： A chemically amplified positive resist composition comprising (A) a resin which comprises (i) a polymerization unit represented by the formula (I): wherein R7 represents a hydrogen atom etc., R8 represents a C1-C4 alkyl group, p represents an integer of 1 to 3, and q represents an integer of 0 to 2, (ii) at least one polymerization unit selected from a group consisting of a polymerization unit represented by the formula (II): wherein R1 represents a hydrogen atom etc., R2 represents a C1-C8 alkyl group and ring X represents an alicyclic hydrocarbon group, and a polymerization unit represented by the formula (IV): wherein R3 represents a hydrogen atom etc., R4 and R5 independently represents a hydrogen atom etc., R10 represents a C1-C6 alkyl group etc., and (iii) a polymerization unit represented by the formula (III): wherein R3, R4 and R5 are the same as defined above, E represents a divalent hydrocarbon group, G represents a single bond etc., Z represents a carbonyl group etc. and L represents an anthryl group etc., and (B) at least one acid generator.
摘要翻译：一种化学放大正型抗蚀剂组合物，其包含（A）树脂，其包含（i）由式（I）表示的聚合单元：其中R7表示氢原子等，R8表示C1-C4烷基，p表示整数为1〜3，q为0〜2的整数，（ii）至少一种选自由式（II）表示的聚合单元的聚合单元：其中，R1表示氢原子等，R2 代表C1-C8烷基，X代表脂环族烃基，和由式（Ⅳ）表示的聚合单元：其中R3表示氢原子等，R4和R5独立地表示氢原子等，R10表示 C 1 -C 6烷基等，和（iii）由式（III）表示的聚合单元：其中R3，R4和R5与上述定义相同，E表示二价烃基，G表示单键等 Z表示羰基等，L r 表示蒽基等，和（B）至少一种酸发生剂。

23. 发明申请

US20080153036A1 Chemically amplified positive resist compostion 有权
标题翻译：化学放大阳性抗蚀剂组合
公开(公告)号：US20080153036A1
公开(公告)日：2008-06-26
申请号：US11984098
申请日：2007-11-13
申请人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
发明人： Masumi Suetsugu , Makoto Akita , Kazuhiko Hashimoto
IPC分类号： G03F7/004
CPC分类号： G03F7/0045 , G03F7/0392 , Y10S430/106
摘要： The present invention provides a chemically amplified positive resist composition comprising (A) a resin obtainable by reacting a novolak resin, a poly(hydroxystyrene) and a compound having at least two vinyl ether structures, and (B) an acid generator.
摘要翻译：本发明提供了一种化学放大正型抗蚀剂组合物，其包含（A）可通过使酚醛清漆树脂，聚（羟基苯乙烯）和具有至少两个乙烯基醚结构的化合物反应获得的树脂和（B）酸产生剂。

24. 发明授权

US07205090B2 Chemical amplification type positive resist composition 有权
标题翻译：化学放大型正光刻胶组合物
公开(公告)号：US07205090B2
公开(公告)日：2007-04-17
申请号：US11037286
申请日：2005-01-19
申请人： Ichiki Takemoto , Kazuhiko Hashimoto , Satoshi Yamaguchi
发明人： Ichiki Takemoto , Kazuhiko Hashimoto , Satoshi Yamaguchi
IPC分类号： G03F7/004
CPC分类号： G03F7/0397 , G03F7/0045 , Y10S430/115 , Y10S430/122
摘要： The present invention provides a chemical amplification type positive resist composition comprising (A) a resin which comprises (i) 5 to 50% by mol of a structural unit of the formula (I), (ii) 5 to 50% by mol of a structural unit of the formula (II) and (iii) 5 to 50% by mol of at least one selected from the group consisting of structural units of the formulas (III) and (IV), and (B) an acid generator. The present composition is suitable for excimer laser lithography using ArF, KrF and the like, and shows various outstanding resist abilities, specifically, gives better effective sensitivity and resolution to resist patterns obtained therefrom, and gives particularly excellent pattern shape and excellent line edge roughness.
摘要翻译：本发明提供化学放大型正型抗蚀剂组合物

25. 发明授权

US06894100B2 Electrically conductive resin composition and production process thereof 失效
标题翻译：导电树脂组合物及其制备方法
公开(公告)号：US06894100B2
公开(公告)日：2005-05-17
申请号：US10284376
申请日：2002-10-31
申请人： Takaaki Miyoshi , Kazuhiko Hashimoto
发明人： Takaaki Miyoshi , Kazuhiko Hashimoto
IPC分类号： C08K3/04
CPC分类号： C08L77/00 , C08L71/00 , C08L71/12 , C08L71/123 , C08L77/02 , C08L77/06 , Y10S977/753
摘要： An electrically conductive resin composition comprising a polyamide, a polyphenylene ether, an impact modifier and an electrically conductive filler, wherein more than 0 and less than 50 wt. % of all of the filler used is preliminarily compounded with a mixture containing the impact modifier and the polyphenylene ether. The resin composition has an excellent balance of electrical conductivity and Dart impact strength at low temperatures, and excellent stiffness at high temperatures, thermal resistance, fluidity, and surface appearance.
摘要翻译：一种包含聚酰胺，聚苯醚，抗冲改性剂和导电填料的导电树脂组合物，其中大于0重量％使用的所有填料的％都预先与含有抗冲改性剂和聚苯醚的混合物混合。该树脂组合物在低温下具有优异的电导率和落镖冲击强度的平衡，并且在高温下具有优异的刚度，耐热性，流动性和表面外观。

26. 发明授权

US06788620B2 Acoustic matching member, ultrasound transducer, ultrasonic flowmeter and method for manufacturing the same 有权
标题翻译：声匹配构件，超声波换能器，超声波流量计及其制造方法
公开(公告)号：US06788620B2
公开(公告)日：2004-09-07
申请号：US10434516
申请日：2003-05-07
申请人： Seigo Shiraishi , Norihisa Takahara , Masaaki Suzuki , Kazuhiko Hashimoto , Takashi Hashida , Hidetomo Nagahara , Masahiko Hashimoto
发明人： Seigo Shiraishi , Norihisa Takahara , Masaaki Suzuki , Kazuhiko Hashimoto , Takashi Hashida , Hidetomo Nagahara , Masahiko Hashimoto
IPC分类号： H04R100
CPC分类号： G10K11/02 , Y10T29/42 , Y10T29/49005 , Y10T29/49007 , Y10T29/4913 , Y10T29/49155 , Y10T29/49165
摘要： An acoustic matching member that is incorporated into an ultrasonic transducer for transmitting and receiving ultrasonic waves, includes: at least two layers including a first layer and a second layer that have different acoustic impedance values from each other. The first layer is made of a composite material of a porous member and a filing material supported by void portions of the porous member, the second layer is made of the filling material or the porous member, and the first layer and the second layer are present in this stated order. A piezoelectric member is disposed on a side of the first layer of the acoustic matching member to form an ultrasonic transducer or an ultrasonic flowmeter. The acoustic matching member does not have independent intermediate layers between the layers, so that delamination hardly occurs and the difficulty in the designing associated with the presence of intermediate layers can be avoided.
摘要翻译：包括在用于发送和接收超声波的超声波换能器中的声匹配构件包括：包括彼此具有不同声阻抗值的第一层和第二层的至少两层。第一层由多孔构件的复合材料和由多孔构件的空隙部分支撑的填充材料制成，第二层由填充材料或多孔构件制成，并且第一层和第二层存在按照这个命令。压电构件设置在声匹配构件的第一层的一侧，以形成超声波换能器或超声波流量计。声匹配构件在层之间不具有独立的中间层，使得几乎不发生分层，并且可以避免与中间层的存在相关的设计的困难。

27. 发明授权

US06709799B2 Resist compositions 失效
标题翻译：抗蚀剂组合物
公开(公告)号：US06709799B2
公开(公告)日：2004-03-23
申请号：US09742084
申请日：2000-12-22
申请人： Kazuhiko Hashimoto
发明人： Kazuhiko Hashimoto
IPC分类号： G03C173
CPC分类号： G03F7/004 , G03F7/0757 , Y10S430/106 , Y10S430/11 , Y10S430/111
摘要： There is provided a resist composition containing a photosensitive resin and used in photolithography, said photosensitive resin having a transmittance of 40% or more for a light having a wavelength of 157 nm in applying to a thickness of 0.1 &mgr;m. The composition has a characteristic that it allows easy formation of a fine pattern having a good profile, particularly at a wavelength for exposure with an F2 excimer laser.
摘要翻译：提供了含有感光性树脂并用于光刻的抗蚀剂组合物，所述感光性树脂在施加厚度为0.1μm的情况下对波长为157nm的光具有40％以上的透射率。该组合物具有容易形成具有良好外形的细微图案的特征，特别是在用F2准分子激光曝光的波长下。

28. 发明授权

US06635495B2 Infrared detecting element, infrared two-dimensional image sensor, and method of manufacturing the same 有权
公开(公告)号：US06635495B2
公开(公告)日：2003-10-21
申请号：US09866881
申请日：2001-05-30
申请人： Kazuhiko Hashimoto , Tomonori Mukaigawa , Ryuichi Kubo , Hiroyuki Kishihara , Minoru Noda , Masanori Okuyama
发明人： Kazuhiko Hashimoto , Tomonori Mukaigawa , Ryuichi Kubo , Hiroyuki Kishihara , Minoru Noda , Masanori Okuyama
IPC分类号： H01L2100
CPC分类号： H01L37/02 , G01J5/34 , H01L27/16
摘要： An infrared detecting capacitor formed of a ferroelectric film has its capacitor portion supported by first and second interconnecting lines to be held on an Si substrate located on both sides of a trench. A lower electrode is coupled with the first interconnecting line while an upper electrode is coupled with the second interconnecting line. The capacitor portion is a rectangle in shape in plan view without small triangular sections opposite to each other in the diagonal direction.

29. 发明授权

US5527662A Process for forming fine pattern 失效
标题翻译：形成精细图案的工艺
公开(公告)号：US5527662A
公开(公告)日：1996-06-18
申请号：US185237
申请日：1994-01-24
申请人： Kazuhiko Hashimoto , Noboru Nomura
发明人： Kazuhiko Hashimoto , Noboru Nomura
IPC分类号： G03F7/004 , G03F7/038 , G03F7/039 , G03F7/09 , G03F7/20 , H01L21/027 , H01L21/30 , G03C5/00 , G03F7/38 , G03F7/40
CPC分类号： G03F7/039 , G03F7/038 , G03F7/094 , G03F7/2059 , Y10S430/143 , Y10S438/949
摘要： In a process using a single-layer or multi-layer resist, by using a resist material comprising an acid-decomposable polymer, an acid generator and a conducting polymer or a resist material comprising a monomer to be made reactive by an acid, an acid generator and a conducting polymer, there can be formed a fine pattern precisely without inviting charging during charged beam writing.
摘要翻译：在使用单层或多层抗蚀剂的方法中，通过使用包含酸可分解聚合物，酸产生剂和导电聚合物的抗蚀剂材料或包含由酸反应的单体的抗蚀材料，酸发电机和导电聚合物，可以精确地形成精细图案，而不会在带电波束写入期间带电充电。

30. 发明授权

US5401932A Method of producing a stencil mask 失效
标题翻译：生产模板掩模的方法
公开(公告)号：US5401932A
公开(公告)日：1995-03-28
申请号：US13100
申请日：1993-02-03
申请人： Kazuhiko Hashimoto , Masayuki Endo , Masaru Sasago
发明人： Kazuhiko Hashimoto , Masayuki Endo , Masaru Sasago
IPC分类号： B23H9/00 , B23H9/14 , G03F1/20 , B23H1/00 , G03F1/16
CPC分类号： G03F1/20 , B23H9/00 , B23H9/14
摘要： The reverse side of a substrate made of stainless steel is subjected to electro-discharge machining using a thick electrode having a diameter of about 10 .mu.m, thus selectively etching other part than the edge of the reverse side of the substrate. This electro-discharge machining causes the other part than the edge of the substrate to be thinned to a thickness of about 10 .mu.m. The surface of the substrate thus thinned is subjected to electro-discharge machining using a slender electrode having a diameter of about 3 .mu.m, thus forming a pattern having a predetermined configuration in the surface of the substrate. Further, the surface of the substrate is etched with the use of the slender electrode, so that the pattern of the silicon substrate is pierced, thus forming a pattern having vertical through-holes. Thus, by using, as a mask material, a substrate solely made of stainless steel as it is, there can be produced a stencil mask which is excellent in mechanical strength and thermal stability and which is not thermally distorted.
摘要翻译：使用直径约10μm的厚电极对由不锈钢制成的基板的背面进行放电加工，从而选择性地蚀刻比衬底背面的其它部分的其它部分。这种放电加工使得除了衬底的边缘之外的其它部分被减薄到约10μm的厚度。使用直径约3μm的细长电极对如此减薄的基板的表面进行放电加工，从而在基板的表面形成具有预定构造的图案。此外，利用细长的电极蚀刻衬底的表面，使得硅衬底的图案被刺穿，从而形成具有垂直通孔的图案。因此，通过使用仅由不锈钢制成的基材作为掩模材料，可以制造机械强度和热稳定性优异且不发生热变形的模板掩模。

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