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11. 发明授权

US08426808B2 Method of mass spectrometry 有权
标题翻译：质谱法
公开(公告)号：US08426808B2
公开(公告)日：2013-04-23
申请号：US13146681
申请日：2010-02-08
申请人： Emmanuelle Claude , Marten F. Snel , Johannes Petrus Cornelis Vissers , Keith Richardson
发明人： Emmanuelle Claude , Marten F. Snel , Johannes Petrus Cornelis Vissers , Keith Richardson
IPC分类号： H01J49/00 , H01J37/256
CPC分类号： G01N33/6848 , H01J49/0004 , H01J49/0027
摘要： This invention comprises a method of imaging of a substrate in which a sample of interest is first ionized at multiple known positions whereafter a mass spectrum of the ionized sample at each of the multiple known positions is produced using a Mass Spectrometer. An overall spectrum for the whole sample is then created, and a number of peaks within the overall spectrum is selected. A scan distribution for at least some of the selected peaks is created, and the scan distributions are compared to identify correlations between different analytes within the sample.
摘要翻译：本发明包括一种基底成像方法，其中感兴趣的样品首先在多个已知位置离子化，之后使用质谱仪产生多个已知位置的每一个的离子化样品的质谱。然后创建整个样品的总谱，并选择整个谱中的数个峰。创建至少一些所选峰的扫描分布，并比较扫描分布以识别样品中不同分析物之间的相关性。

12. 发明授权

US08164059B2 In-chamber electron detector 有权
标题翻译：室内电子检测器
公开(公告)号：US08164059B2
公开(公告)日：2012-04-24
申请号：US12141723
申请日：2008-06-18
申请人： Robert Gerlach , Mostafa Maazouz , Trevor Dingle , Mark Utlaut , James McGinn
发明人： Robert Gerlach , Mostafa Maazouz , Trevor Dingle , Mark Utlaut , James McGinn
IPC分类号： H01J37/244 , H01J37/256 , H01J37/28
CPC分类号： H01J37/244 , H01J37/28 , H01J2237/2443 , H01J2237/24435 , H01J2237/2445 , H01J2237/2448 , H01J2237/26
摘要： A secondary particle detector 302 for a charged particle beam system 300 includes a scintillator 304 and a transducer 312, such as a photomultiplier tube, positioned within a vacuum chamber 107. Unlike prior art Everhart-Thornley detectors, the photomultiplier is positioned within the vacuum chamber, which improves detection by eliminating optical couplings and provides flexibility in positioning the detector.
摘要翻译：用于带电粒子束系统300的二次粒子检测器302包括闪烁体304和位于真空室107内的诸如光电倍增管的换能器312.与现有技术的Everhart-Thornley检测器不同，光电倍增器位于真空室内，其通过消除光耦合来改进检测并提供灵敏度来定位检测器。

13. 发明授权

US08003940B2 Tool-to-tool matching control method and its system for scanning electron microscope 有权
标题翻译：刀具对刀匹配控制方法及其扫描电子显微镜系统
公开(公告)号：US08003940B2
公开(公告)日：2011-08-23
申请号：US12349751
申请日：2009-01-07
申请人： Mayuka Oosaki , Chie Shishido , Hiroki Kawada , Tatsuya Maeda
发明人： Mayuka Oosaki , Chie Shishido , Hiroki Kawada , Tatsuya Maeda
IPC分类号： H01J37/28 , H01J37/256 , G01N23/00
CPC分类号： H01J37/28 , H01J2237/282
摘要： A system for controlling a tool-to-tool disparity between a plurality of scanning electron microscopes includes a measuring unit for measuring a tool-to-tool disparity between plural scanning electron microscopes based on information extracted from secondary electron images which are captured by imaging a reference pattern formed on a wafer, a tool state monitoring unit for monitoring tool states of each of the plural scanning electron microscopes, and an output unit for displaying on a screen a relationship between the tool-to-tool disparity between the plural scanning electron microscopes and tool states of each of the plural scanning electron microscopes monitored by the tool state monitoring unit. The tool state monitoring unit monitors the tool states of each of the plural scanning electron microscopes while imaging the reference pattern formed on the wafer by using each of the plural scanning electron microscopes.
摘要翻译：用于控制多个扫描电子显微镜之间的工具对工具差异的系统包括：测量单元，用于基于通过成像获得的二次电子图像提取的信息来测量多个扫描电子显微镜之间的工具对工具差异在晶片上形成的参考图案，用于监视多个扫描电子显微镜中的每一个的工具状态的工具状态监视单元和用于在屏幕上显示多个扫描电子显微镜之间的工具与工具之间的差异之间的关系的输出单元以及由工具状态监视单元监视的多个扫描电子显微镜中的每一个的工具状态。工具状态监视单元通过使用多个扫描电子显微镜中的每一个对成像在晶片上的参考图案进行成像，监视多个扫描电子显微镜中的每一个的工具状态。

14. 发明授权

US07605382B2 Ion implanter 失效
标题翻译：离子注入机
公开(公告)号：US07605382B2
公开(公告)日：2009-10-20
申请号：US11927839
申请日：2007-10-30
申请人： Takatoshi Yamashita , Hideki Fujita
发明人： Takatoshi Yamashita , Hideki Fujita
IPC分类号： H01J37/317 , H01J37/256 , G05F3/02
CPC分类号： G01N23/225 , H01J37/08 , H01J37/304 , H01J37/3171 , H01J2237/082 , H01J2237/24542
摘要： The ion implanter has: an ion source which generates an ion beam; electron beam sources which emit an electron beam to be scanned in the Y direction in the ion source; a power source for the sources; an ion beam monitor which, in the vicinity of an implanting position, measures a Y-direction ion beam current density distribution of the ion beam; and a controlling device. The controlling device has a function of homogenizing the Y-direction ion beam current density distribution measured by the monitor, by, while controlling the power sources on the basis of measurement data of the monitor, increasing a scanning speed of the electron beam in a position corresponding to a monitor point where an ion beam current density measured by the monitor is large; and decreasing the scanning speed of the electron beam in a position corresponding to a monitor point where the measured ion beam current density is small.
摘要翻译：离子注入机具有：产生离子束的离子源; 在离子源中发射沿Y方向扫描的电子束的电子束源; 来源的电源; 离子束监测器，其在植入位置附近测量离子束的Y方向离子束电流密度分布; 和控制装置。控制装置具有通过监视器测量的Y方向离子束电流密度分布均匀化的功能，同时基于监视器的测量数据控制电源，增加电子束在某一位置的扫描速度对应于由监视器测量的离子束电流密度大的监视点; 并且在与测量的离子束电流密度小的监视点对应的位置减小电子束的扫描速度。

15. 发明授权

US07435960B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US07435960B2
公开(公告)日：2008-10-14
申请号：US11808376
申请日：2007-06-08
申请人： Makoto Suzuki , Kenji Tanimoto , Yuko Sasaki
发明人： Makoto Suzuki , Kenji Tanimoto , Yuko Sasaki
IPC分类号： H01J37/28 , H01J37/256
CPC分类号： H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/216 , H01J2237/24592 , H01J2237/2487 , H01J2237/2817 , H01J2237/2826
摘要： A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, a memory unit for storing shape, position and physical properties of the charged particle optical system and accuracy of the applied current or voltage, an electromagnetic field calculation unit for calculating an electromagnetic field near a path of the charged particle beam, a charged particle trajectory calculation unit for calculating a trajectory of the charged particle beam in the calculated electromagnetic field, a memory unit for storing a result of the trajectory calculation and a controller for controlling the charged particle optical system on the basis of the result of the trajectory calculation.
摘要翻译：带电粒子束装置通过检测包含从样本产生的二次电子的生成信号来获得图像。该装置具有用于输入要施加到带电粒子光束通过的带电粒子光学系统的电流和电压值的输入单元，用于存储带电粒子光学系统的形状，位置和物理特性的存储单元以及施加电流或电压的电磁场计算单元，用于计算带电粒子束路径附近的电磁场的电磁场计算单元，用于计算计算出的电磁场中的带电粒子束的轨迹的带电粒子轨迹计算单元，存储轨迹计算的结果和基于轨迹计算结果来控制带电粒子光学系统的控制器。

16. 发明授权

US07244932B2 Electron beam apparatus and device fabrication method using the electron beam apparatus 失效
标题翻译：电子束装置和使用电子束装置的装置制造方法
公开(公告)号：US07244932B2
公开(公告)日：2007-07-17
申请号：US09985323
申请日：2001-11-02
申请人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
发明人： Mamoru Nakasuji , Tohru Satake , Nobuharu Noji , Hirosi Sobukawa , Tsutomu Karimata , Shoji Yoshikawa , Toshifumi Kimba , Shin Oowada , Mutsumi Saito , Muneki Hamashima , Yoshiaki Kohama , Yukiharu Okubo
IPC分类号： H01J37/28 , H01J37/256 , G01N23/22
CPC分类号： H01J37/20 , G01N23/225 , G01N23/2251 , H01J37/06 , H01J37/073 , H01J37/185 , H01J37/222 , H01J37/244 , H01J37/28 , H01J2237/082 , H01J2237/202 , H01J2237/20228 , H01J2237/204 , H01J2237/22 , H01J2237/24564 , H01J2237/2806 , H01J2237/2816 , H01J2237/2817
摘要： The purpose of the invention is to provide an improved electron beam apparatus with improvements in throughput, accuracy, etc. One of the characterizing features of the electron beam apparatus of the present invention is that it has a plurality of optical systems, each of which comprises a primary electron optical system for scanning and irradiating a sample with a plurality of primary electron beams; a detector device for detecting a plurality of secondary beams emitted by irradiating the sample with the primary electron beams; and a secondary electron optical system for guiding the secondary electron beams from the sample to the detector device; all configured so that the plurality of optical systems scan different regions of the sample with their primary electron beams, and detect the respective secondary electron beams emitted from each of the respective regions. This is what makes higher throughput possible. To provide high accuracy, the apparatus is configured such that the axes of its optical systems can be aligned, and aberrations corrected, by a variety of methods.
摘要翻译：本发明的目的是提供一种改进的电子束装置，其处理量，精度等得到改进。本发明的电子束装置的特征之一是具有多个光学系统，每个光学系统包括用于扫描和照射具有多个一次电子束的样品的初级电子光学系统; 用于检测通过用一次电子束照射样品而发射的多个次级光束的检测器装置; 以及用于将二次电子束从样品引导到检测器装置的二次电子光学系统; 全部配置成使得多个光学系统用其一次电子束扫描样品的不同区域，并且检测从各个区域中的每一个发射的各个二次电子束。这是什么使得更高的吞吐量成为可能。为了提供高精度，该装置被配置为使得其光学系统的轴线可以通过各种方法对准和校正像差。

17. 发明授权

US07242014B2 Charged particle beam drawing equipment, method of adjusting aperture mask, and method of manufacturing semiconductor device 失效
标题翻译：带电粒子束拉制设备，调整孔径掩模的方法和制造半导体器件的方法
公开(公告)号：US07242014B2
公开(公告)日：2007-07-10
申请号：US11172996
申请日：2005-07-05
申请人： Takumi Ota , Tetsuro Nakasugi
发明人： Takumi Ota , Tetsuro Nakasugi
IPC分类号： H01J37/30 , H01J37/256
CPC分类号： H01J37/3045 , B82Y10/00 , B82Y40/00 , H01J37/3174
摘要： A charged particle beam drawing equipment includes charged particle beam source, first and second shaping aperture masks with first and second opening portions for rotation adjustment, detection section to detect charged particle beam intensity distribution in a plane parallel to the second mask, the beam being emitted from the source and passing through the opening portions, rotation angle control section to control relative rotation angle between the masks, acquisition section to acquire relative rotation angle between the masks such that deviation in relative rotation angle between the masks falls within a predetermined range based on detection results obtained by changing the relative rotation angle between the masks plural times by the control section and by detecting the beam by the detection section for each rotation angle, and instruction section to instruct the rotation angle control section such that the relative rotation angle between the masks be the acquired rotation angle.
摘要翻译：带电粒子束拉制设备包括带电粒子束源，具有用于旋转调节的第一和第二开口部分的第一和第二成形孔径掩模，用于检测平行于第二掩模的平面中的带电粒子束强度分布的检测部分，从源极通过开口部分，旋转角度控制部分，以控制掩模之间的相对旋转角度，获取部分，以获得掩模之间的相对旋转角度，使得掩模之间的相对旋转角度的偏差落在预定范围内，基于通过控制部分多次改变掩模之间的相对旋转角度并且通过每个旋转角度由检测部分检测光束而获得的检测结果，以及指令部分，其指示旋转角度控制部分，使得旋转角度控制部分之间的相对旋转角度掩模是获得的旋转角度。

18. 发明授权

US07241996B2 Charged particle beam apparatus 失效
标题翻译：带电粒子束装置
公开(公告)号：US07241996B2
公开(公告)日：2007-07-10
申请号：US11183906
申请日：2005-07-19
申请人： Makoto Suzuki , Kenji Tanimoto , Yuko Sasaki
发明人： Makoto Suzuki , Kenji Tanimoto , Yuko Sasaki
IPC分类号： H01J37/28 , H01J37/256
CPC分类号： H01J37/21 , H01J37/265 , H01J37/28 , H01J2237/216 , H01J2237/24592 , H01J2237/2487 , H01J2237/2817 , H01J2237/2826
摘要： A charged particle beam apparatus obtains an image by detecting a generation signal inclusively indicative of secondary electrons generated from a specimen. The apparatus has an input unit for inputting current and voltage values to be applied to a charged particle optical system through which the charged particle beam travels, a memory unit for storing shape, position and physical properties of the charged particle optical system and accuracy of the applied current or voltage, an electromagnetic field calculation unit for calculating an electromagnetic field near a path of the charged particle beam, a charged particle trajectory calculation unit for calculating a trajectory of the charged particle beam in the calculated electromagnetic field, a memory unit for storing a result of the trajectory calculation and a controller for controlling the charged particle optical system on the basis of the result of the trajectory calculation.
摘要翻译：带电粒子束装置通过检测包含从样本产生的二次电子的生成信号来获得图像。该装置具有用于输入要施加到带电粒子光束通过的带电粒子光学系统的电流和电压值的输入单元，用于存储带电粒子光学系统的形状，位置和物理特性的存储单元以及施加电流或电压的电磁场计算单元，用于计算带电粒子束路径附近的电磁场的电磁场计算单元，用于计算计算出的电磁场中的带电粒子束的轨迹的带电粒子轨迹计算单元，存储轨迹计算的结果和基于轨迹计算结果来控制带电粒子光学系统的控制器。

19. 发明授权

US07223974B2 Charged particle beam column and method for directing a charged particle beam 有权
标题翻译：带电粒子束柱和引导带电粒子束的方法
公开(公告)号：US07223974B2
公开(公告)日：2007-05-29
申请号：US10154530
申请日：2002-05-22
申请人： Igor Petrov , Zvika Rosenberg
发明人： Igor Petrov , Zvika Rosenberg
IPC分类号： H01J37/256 , H01J37/28
CPC分类号： H01J37/28 , H01J37/1472 , H01J37/153 , H01J37/244
摘要： A method and charged particle beam column are presented for directing a primary charged particle beam onto a sample. The primary charged particle beam, propagating along an initial axis of beam propagation towards a focusing assembly, passes through a beam shaper, that affects the cross section of the primary charged particle beam to compensate for aberrations of focusing caused by astigmatism effect of a focusing field produced by an objective lens arrangement of the focusing assembly, and then passes through a beam axis alignment system, that aligns the axis of the primary charged particle beam with respect to the optical axis of the objective lens arrangement.
摘要翻译：提出了一种方法和带电粒子束柱，用于将初级带电粒子束引导到样品上。沿着波束传播的初始轴向聚焦组件传播的主要带电粒子束通过束形成器，其影响初级带电粒子束的横截面以补偿由聚焦场的散光效应引起的聚焦像差由聚焦组件的物镜布置产生，然后通过光束轴对准系统，其使主要带电粒子束的轴线相对于物镜装置的光轴对准。

20. 发明授权

US07205554B2 Method and apparatus for processing a micro sample 有权
公开(公告)号：US07205554B2
公开(公告)日：2007-04-17
申请号：US11127213
申请日：2005-05-12
申请人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
发明人： Mitsuo Tokuda , Muneyuki Fukuda , Yasuhiro Mitsui , Hidemi Koike , Satoshi Tomimatsu , Hiroyasu Shichi , Hideo Kashima , Kaoru Umemura
IPC分类号： H01J37/256 , G21N23/225
CPC分类号： H04L29/06 , G01N23/225 , H01J37/256 , H01J37/3056 , H01J2237/20 , H01J2237/202 , H01J2237/31745 , H04L67/16 , H04L69/329
摘要： An object of the invention is to realize a method and an apparatus for processing and observing a minute sample which can observe a section of a wafer in horizontal to vertical directions with high resolution, high accuracy and high throughput without splitting any wafer which is a sample. In an apparatus of the invention, there are included a focused ion beam optical system and an electron optical system in one vacuum container, and a minute sample containing a desired area of the sample is separated by forming processing with a charged particle beam, and there are included a manipulator for extracting the separated minute sample, and a manipulator controller for driving the manipulator independently of a wafer sample stage.

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