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11. 发明申请

US20080204694A1 Controlling shape of a reticle with low friction film coating at backside 失效
标题翻译：控制后面具有低摩擦膜涂层的掩模版的形状
公开(公告)号：US20080204694A1
公开(公告)日：2008-08-28
申请号：US11712192
申请日：2007-02-28
申请人： Emily Y. Shu , George Chen
发明人： Emily Y. Shu , George Chen
IPC分类号： G03B27/62
CPC分类号： G03B27/62
摘要： In an embodiment of the invention, an apparatus includes a reticle having a frontside including a pattern to be imaged onto a semiconductor wafer, a thin film located over a backside of the reticle to form a global convex shape and to reduce friction when sliding on a chuck, and the chuck having a topside to which the backside of the reticle conforms.
摘要翻译：在本发明的一个实施例中，一种装置包括具有正面的掩模版，该掩模版包括要成像到半导体晶片上的图案，位于掩模版背面之上的薄膜，以形成全局凸形，并且当在卡盘，并且卡盘具有顶盖的背面符合的顶侧。

12. 发明申请

US20070242257A1 Reticle stages for lithography systems and lithography methods 有权
标题翻译：用于光刻系统和光刻方法的掩模版阶段
公开(公告)号：US20070242257A1
公开(公告)日：2007-10-18
申请号：US11403483
申请日：2006-04-13
申请人： Stefan Wurm , Siegfried Schwarzl
发明人： Stefan Wurm , Siegfried Schwarzl
IPC分类号： G03B27/62
CPC分类号： G03B27/62 , G03F7/707
摘要： Reticle stages for lithography systems and lithography methods are disclosed. In a preferred embodiment, a lithography reticle stage includes a first region adapted to support a first reticle, and at least one second region adapted to support a second reticle.
摘要翻译：公开了用于光刻系统和光刻方法的掩模版阶段。在优选实施例中，光刻掩模版台包括适于支撑第一掩模版的第一区域和适于支撑第二掩模版的至少一个第二区域。

13. 发明授权

US07221434B2 Exposure method and apparatus 有权
标题翻译：曝光方法和装置
公开(公告)号：US07221434B2
公开(公告)日：2007-05-22
申请号：US11365045
申请日：2006-02-28
申请人： Yoshihiro Shiode , Seiya Miura
发明人： Yoshihiro Shiode , Seiya Miura
IPC分类号： G03B27/62 , G03B27/52 , G03B27/32
CPC分类号： G03B27/62 , G03F7/70516 , G03F7/70641
摘要： An exposure method for an exposure apparatus that exposes a mask pattern onto a plate using a projection optical system includes the steps of obtaining information about flatness of a first mask, condition of an image plane when projecting a pattern of the first mask by using the projection optical system, information about a driving amount of a driving system, which can change an imaging condition on the plate based on the condition of the image plane, and information about flatness of a second mask, changing information about the driving amount by using information about flatness of the first and second masks, and driving the driving system based on changed information about the driving amount of the driving system to project a pattern of the second mask onto the plate using the projection optical system.
摘要翻译：用于使用投影光学系统将掩模图案曝光在平板上的曝光装置的曝光方法包括以下步骤：获得关于第一掩模的平坦度的信息，通过使用投影来投影第一掩模的图案时的图像平面的状态光学系统，关于驱动系统的驱动量的信息，其可以基于图像平面的状况改变印版上的成像条件，以及关于第二掩模的平坦度的信息，通过使用关于驱动量的信息来改变关于驾驶量的信息第一和第二掩模的平坦度，并且基于关于驱动系统的驱动量的改变的信息来驱动驱动系统，以使用投影光学系统将第二掩模的图案投影到板上。

14. 发明授权

US07206061B2 Mask supporting apparatus using vacuum and light exposing system, and method using the same 有权
标题翻译：使用真空和曝光系统的面罩支撑装置及其使用方法
公开(公告)号：US07206061B2
公开(公告)日：2007-04-17
申请号：US10967367
申请日：2004-10-18
申请人： Chang-Won Lee , Yong-Hui Bae
发明人： Chang-Won Lee , Yong-Hui Bae
IPC分类号： G03B27/62 , G03B27/58
CPC分类号： G03B27/62
摘要： A mask supporting apparatus includes an absorption glass provided with at least one vacuum hole, a mask provided with a predetermined pattern and attached on a bottom surface of the absorption glass, and an absorption pad disposed between the absorption glass and the mask to define a space between the absorption glass and the mask. Air in the space is exhausted through the vacuum hole to securely fix the mask on the absorption glass.
摘要翻译：掩模支撑装置包括设置有至少一个真空孔的吸收玻璃，设置有预定图案并附着在吸收玻璃的底表面上的掩模，以及设置在吸收玻璃和掩模之间以限定空间的吸收垫在吸收玻璃和面罩之间。空间中的空气通过真空孔排出，以将面罩牢固地固定在吸收玻璃上。

15. 发明申请

US20060176466A1 Chucking system for modulating shapes of substrates 有权
公开(公告)号：US20060176466A1
公开(公告)日：2006-08-10
申请号：US11389731
申请日：2006-03-27
申请人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
发明人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
IPC分类号： G03B27/58
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.

16. 发明授权

US07061590B2 Pellicle distortion reduction 失效
公开(公告)号：US07061590B2
公开(公告)日：2006-06-13
申请号：US10737046
申请日：2003-12-16
申请人： Michael S. Hibbs
发明人： Michael S. Hibbs
IPC分类号： G03B27/62 , G03B27/58
CPC分类号： G03F1/64 , G03B27/62
摘要： The invention provides systems and a method for reducing pellicle distortion. One feature of the invention reduces distortion of a pellicle by providing an airtight mounting structure for coupling a pellicle to a mask; and a port on the mounting structure though which a pressure difference can be created between the interior portion and an exterior environment. Hence, distortion can be reduced by controlling the pressure in the interior portion between the pellicle, the pellicle mounting structure and the mask. Another feature places an aerodynamic fairing adjacent the mask to reduce aerodynamic drag and, hence, suppress turbulent air flow over the pellicle. The features can be used separately or in combination.

17. 发明授权

US06982783B2 Chucking system for modulating shapes of substrates 有权
标题翻译：用于调制基板形状的卡盘系统
公开(公告)号：US06982783B2
公开(公告)日：2006-01-03
申请号：US10864591
申请日：2004-06-09
申请人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
发明人： Byung J. Choi , Ronald D. Voisin , Sidlgata V. Sreenivasan , Michael P. C. Watts , Daniel Babbs , Mario J. Meissl , Hillman Bailey , Norman E. Schumaker
IPC分类号： G03B27/58 , G03B27/42
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate.
摘要翻译：本发明涉及一种夹持系统，用于调制基板，以便相对于其上将与基底形成图案的晶片适当地成形和定位基板。

18. 发明申请

US20050117143A1 Supply control system and method, program, and information storage medium 有权
标题翻译：供应控制系统及方法，程序和信息存储介质
公开(公告)号：US20050117143A1
公开(公告)日：2005-06-02
申请号：US10978270
申请日：2004-10-29
申请人： Kazufumi Kato , Akira Tadano , Yuki Sugawara
发明人： Kazufumi Kato , Akira Tadano , Yuki Sugawara
IPC分类号： H01L21/027 , G03B27/62
CPC分类号： G03B27/62 , Y10S414/135
摘要： A supply control apparatus is provided and includes a memory for storing lot control data for controlling a plurality of lots, reticule control data for controlling a plurality of masks, and inline photo device control data; an update section for updating the data; a control information generating section generating lot supply control information for controlling lot supply based on the lot control data and the reticule control data, as well as mask supply control information for controlling mask supply; and a communications section for transmitting the lot supply control information to a lot supply device that supplies lots to the photo device, transmitting the mask supply control information to a mask supply device that supplies masks to the photo device, while receiving notification information on the current position of a lot or a mask from the lot supply device, the mask supply device or the photo device.
摘要翻译：提供一种供应控制装置，并且包括用于存储用于控制多个批次的批次控制数据的存储器，用于控制多个掩模的网状控制数据和在线的照片装置控制数据; 用于更新数据的更新部分; 控制信息生成部，基于批次控制数据和网格控制数据生成用于控制批量供给的批量供给控制信息，以及掩模用于控制面具供给的供给控制信息; 以及通信部件，用于将批量供应控制信息发送到向照相装置提供批量的批量供应装置，将掩模供应控制信息发送到向照相装置提供掩模的掩模供应装置，同时接收关于当前批量供应装置，面罩供应装置或照相装置的大量位置或面罩。

19. 发明授权

US06873402B2 Reticle stop block apparatus and method 失效
标题翻译：光栅挡块装置及方法
公开(公告)号：US06873402B2
公开(公告)日：2005-03-29
申请号：US10631613
申请日：2003-07-31
申请人： Daniel Lawson Greene, Jr. , Ron Sinicki , Kurt Woolley
发明人： Daniel Lawson Greene, Jr. , Ron Sinicki , Kurt Woolley
IPC分类号： G03B27/62 , G03B27/42
CPC分类号： G03B27/62 , Y10S414/135
摘要： Methods and apparatus for ensuring the proper handling of reticles in the manufacturing of microdevices are disclosed. The methods and apparatus employ one or more reticle stop blocks fixed to a reticle handling arm. The one or more reticle stop blocks are designed and arranged to engage an edge of the reticle in order to place the reticle in a desired position on the reticle handling arm should the reticle be improperly arranged in a cassette in which the reticle is stored. By ensuring proper placement of the reticle on the reticle handling arm when the reticle is removed from the cassette, the likelihood of a subsequent fault in handling the reticle is greatly reduced.
摘要翻译：公开了用于确保在微型器件制造中正确处理光罩的方法和装置。所述方法和装置采用固定在掩模版处理臂上的一个或多个掩模块挡块。一个或多个掩模版阻挡块被设计和布置成接合掩模版的边缘，以便如果掩模版被不正确地布置在其中存储有掩模版的盒中，则将掩模版放置在掩模版处理臂上的期望位置。当掩模版从盒中取出时，通过确保掩模版处理臂的正确放置，大大减少了处理光罩后续故障的可能性。

20. 发明授权

US06842228B2 Fusion attachment of rigid pellicles and/or frames 失效
标题翻译：刚性薄膜和/或框架的融合附件
公开(公告)号：US06842228B2
公开(公告)日：2005-01-11
申请号：US10713504
申请日：2003-11-14
申请人： Emily Yixie Shu
发明人： Emily Yixie Shu
IPC分类号： G03B27/62 , G03F1/62 , G03F1/64 , G03B27/32 , G03F9/00
CPC分类号： G03F1/64 , G03B27/62 , G03F1/62
摘要： A rigid pellicle, used to protect a patterned reticle from contamination in a lithographic process in the manufacture of integrated circuits, is attached to a mounting frame by fusing the pellicle and frame together. In one embodiment, an infrared laser beam is used to produce the fusion along the seam between the pellicle and the frame. The frame may also be attached to the reticle through a similar fusion process. In one embodiment, the pellicle, frame, and reticle are all comprised of fused silica.
摘要翻译：通过将防护薄膜组件和框架固定在一起，用于在制造集成电路的光刻工艺中保护图案化的掩模版免受污染的刚性防护薄片组件附接到安装框架。在一个实施例中，使用红外激光束沿着防护薄膜组件和框架之间的接缝产生熔合。框架也可以通过类似的融合过程附着到掩模版上。在一个实施例中，防护薄膜组件，框架和掩模版都由熔融二氧化硅构成。

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