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1. 发明申请

US20060176466A1 Chucking system for modulating shapes of substrates 有权
公开(公告)号：US20060176466A1
公开(公告)日：2006-08-10
申请号：US11389731
申请日：2006-03-27
申请人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
发明人： Byung Choi , Ronald Voisin , Sidlgata Sreenivasan , Michael Watts , Daniel Babbs , Mario Meissl , Hillman Bailey , Norman Schumaker
IPC分类号： G03B27/58
CPC分类号： G03F7/70875 , B29C33/20 , B29C43/003 , B29C43/021 , B29C43/36 , B29C43/58 , B29C2043/025 , B29C2043/3233 , B29C2043/3488 , B29C2043/5841 , B29D11/00365 , G03B27/62 , G03F7/707
摘要： The present invention is directed to a chucking system to modulate substrates so as to properly shape and position the same with respect to a wafer upon which a pattern is to be formed with the substrate. The chucking system includes a chuck body having first and second opposed sides. A side surface extends therebetween. The first side includes first and second spaced-apart recesses defining first and second spaced-apart support regions. The first support region cinctures the second support region and the first and second recesses. The second support region cinctures the second recess, with a portion of the body in superimposition with the second recess being transparent to radiation having a predetermined wavelength. The second side and the side surface define exterior surfaces. The body includes throughways placing the first and second recesses in fluid communication with one of the exterior surfaces.

2. 发明申请

US20060076717A1 Step and repeat imprint lithography processes 有权
公开(公告)号：US20060076717A1
公开(公告)日：2006-04-13
申请号：US11127041
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
发明人： Sidlgata Sreenivasan , Byung Choi , Norman Schumaker , Ronald Voisin , Michael Watts , Mario Meissl
IPC分类号： B29C35/08 , B29C41/02 , B29C41/12
CPC分类号： B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , G03F7/0002
摘要： The present invention is directed to methods for patterning a substrate by imprint lithography. Imprint lithography is a process in which a liquid is dispensed onto a substrate. A template is brought into contact with the liquid and the liquid is cured. The cured liquid includes an imprint of any patterns formed in the template. In one embodiment, the imprint process is designed to imprint only a portion of the substrate. The remainder of the substrate is imprinted by moving the template to a different portion of the template and repeating the imprint lithography process.

3. 发明申请

US20060077374A1 Step and repeat imprint lithography systems 审中-公开
标题翻译：步骤和重复刻印光刻系统
公开(公告)号：US20060077374A1
公开(公告)日：2006-04-13
申请号：US11127060
申请日：2005-05-11
申请人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
发明人： Sidlgata Sreenivasan , Michael Watts , Byung Choi , Mario Meissl , Norman Schumaker , Ronald Voisin
IPC分类号： G03B27/58
CPC分类号： B82Y10/00 , B29C35/0888 , B29C59/022 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y40/00 , G03F7/0002 , H01L21/0271
摘要： Described are systems for patterning a substrate by imprint lithography. Imprint lithography systems include an imprint head configured to hold a template in a spaced relation to a substrate. The imprint lithography system is configured to dispense an activating light curable liquid onto a substrate or template. The system includes a light source that applies activating light to cure the activating light curable liquid.
摘要翻译：描述的是通过压印光刻来图案化衬底的系统。压印光刻系统包括压印头，其被配置为将模板保持为与衬底间隔开的关系。压印光刻系统被配置为将激活光可固化液体分配到基底或模板上。该系统包括施加激活光以固化活化光可固化液体的光源。

4. 发明申请

US20060172549A1 Method of separating a mold from a solidified layer disposed on a substrate 有权
公开(公告)号：US20060172549A1
公开(公告)日：2006-08-03
申请号：US11108208
申请日：2005-04-18
申请人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario Meissl , Sidlgata Sreenivasan , Norman Schumaker , Xiaoming Lu , Ian McMackin , Daniel Babbs
发明人： Byung-Jin Choi , Anshuman Cherala , Yeong-jun Choi , Mario Meissl , Sidlgata Sreenivasan , Norman Schumaker , Xiaoming Lu , Ian McMackin , Daniel Babbs
IPC分类号： H01L21/31 , H01L21/469
CPC分类号： H01L21/6875 , B82Y10/00 , B82Y40/00 , G03F7/0002 , H01L21/6838 , Y10S977/887
摘要： The present invention is directed towards a method of separating a mold, included in a template, from a layer disposed on a substrate, the method including, inter alia, applying a separation force to the template to separate the template from the layer; and facilitating localized deformation in the substrate to reduce the separation force required to achieve separation.

5. 发明申请

US20050006343A1 Systems for magnification and distortion correction for imprint lithography processes 有权
标题翻译：用于压印光刻工艺的放大和失真校正系统
公开(公告)号：US20050006343A1
公开(公告)日：2005-01-13
申请号：US10616294
申请日：2003-07-09
申请人： Byung Choi , Sidlgata Sreenivasan , Mario Meissl
发明人： Byung Choi , Sidlgata Sreenivasan , Mario Meissl
IPC分类号： G01L21/30 , G03F20060101 , G03F7/00
CPC分类号： G03F7/0002 , B29C43/003 , B29C2043/025 , B82Y10/00 , B82Y40/00
摘要： The present invention is directed toward a system to vary dimensions of a template in order to attenuate if not prevent distortions in an underlying pattern formed by the template. To that end, the system features a compression device that includes a pair of spaced-apart contact members to compress a perimeter surface of the template between the pair of spaced-apart contact members. The compression device includes first and second bodies, each has a contact member and an actuator arm. One of the actuator arms is coupled to the first body to reciprocate about an axis in response to variations of a volume of a bladder disposed adjacent to the actuator arm. In this manner, the distance between the two contact members may be varied.
摘要翻译：本发明涉及一种改变模板尺寸的系统，以便衰减如果不是防止由模板形成的底层图案的失真。为此，该系统具有压缩装置，该压缩装置包括一对间隔开的接触构件，以在一对间隔开的接触构件之间压缩模板的周边表面。压缩装置包括第一和第二主体，每个具有接触构件和致动器臂。致动器臂中的一个联接到第一主体以响应于邻近致动器臂设置的气囊的体积的变化而围绕轴线往复运动。以这种方式，可以改变两个接触构件之间的距离。

6. 发明申请

US20060062867A1 Formation of discontinuous films during an imprint lithography process 有权
标题翻译：在压印光刻过程中形成不连续膜
公开(公告)号：US20060062867A1
公开(公告)日：2006-03-23
申请号：US11126946
申请日：2005-05-11
申请人： Byung Jin Choi , Mario Meissl , Sidlgata Sreenivasan , Michael Watts
发明人： Byung Jin Choi , Mario Meissl , Sidlgata Sreenivasan , Michael Watts
IPC分类号： B29C35/08
CPC分类号： G03F7/0002 , B29C35/0888 , B29C59/022 , B29C59/026 , B29C2035/0827 , B29C2059/023 , B81C1/0046 , B82Y10/00 , B82Y30/00 , B82Y40/00 , H01L21/0271
摘要： The present invention is directed to a template having a body including a surface with first and second regions. The first region has first wetting characteristics for a given material and the second region has second wetting characteristics for the given material. The first wetting characteristics differ from the second wetting characteristics. Specifically, the first region is formed from a surface treatment layer with a first surface energy to provide the first wetting characteristics. The second region is exposed portions of the body, typically quartz of fused silica, having a second surface energy associated therewith. The second surface energy is greater than the first surface energy to provide the second region with the second wetting characteristics.
摘要翻译：本发明涉及一种具有主体的模板，该主体包括具有第一和第二区域的表面。第一区域对于给定材料具有第一润湿特性，并且第二区域对于给定材料具有第二润湿特性。第一润湿特性与第二润湿特性不同。具体地说，第一区域由具有第一表面能的表面处理层形成，以提供第一润湿特性。第二区域是具有与其相关联的第二表面能的身体的暴露部分，通常为熔融石英的石英。第二表面能大于第一表面能量，以向第二区域提供第二润湿特性。

7. 发明申请

US20060001857A1 Apparatus to vary dimensions of a substrate during nano-scale manufacturing 有权
标题翻译：用于在纳米级制造期间改变衬底尺寸的装置
公开(公告)号：US20060001857A1
公开(公告)日：2006-01-05
申请号：US11142839
申请日：2005-06-01
申请人： Anshuman Cherala , Byung-Jin Choi , Pawan Nimmakayala , Mario Meissl , Sidlgata Sreenivasan
发明人： Anshuman Cherala , Byung-Jin Choi , Pawan Nimmakayala , Mario Meissl , Sidlgata Sreenivasan
IPC分类号： G03B27/58
CPC分类号： G03F7/0002 , B82Y10/00
摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.
摘要翻译：本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。多个杠杆组件中的一个适于改变主体和相对主体之间的距离。以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。柔性构件被构造成衰减由响应于压缩力产生的基板卡盘感测的结果力的大小。

8. 发明申请

US20050270516A1 System for magnification and distortion correction during nano-scale manufacturing 审中-公开
标题翻译：纳米尺寸制造中的放大和失真校正系统
公开(公告)号：US20050270516A1
公开(公告)日：2005-12-08
申请号：US10999898
申请日：2004-11-30
申请人： Anshuman Cherala , Byung-Jin Choi , Pawan Nimmakayala , Mario Meissl , Sidlgata Sreenivasan
发明人： Anshuman Cherala , Byung-Jin Choi , Pawan Nimmakayala , Mario Meissl , Sidlgata Sreenivasan
IPC分类号： B29C43/02 , B81C99/00 , G03B27/58 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03B27/58
摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting forces sensed by the substrate chuck generated in response to the compressive forces.
摘要翻译：本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。多个杠杆组件中的一个适于改变主体和相对主体之间的距离。以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。柔性构件被构造成衰减由响应于压缩力产生的基板卡盘感测的结果力的大小。

9. 发明申请

US20050269745A1 Method of varying dimensions of a substrate during nano-scale manufacturing 有权
标题翻译：纳米级制造过程中衬底尺寸变化的方法
公开(公告)号：US20050269745A1
公开(公告)日：2005-12-08
申请号：US11142834
申请日：2005-06-01
申请人： Anshuman Cherala , Byung-Jin Choi , Pawan Nimmakayala , Mario Meissl , Sidlgata Sreenivasan
发明人： Anshuman Cherala , Byung-Jin Choi , Pawan Nimmakayala , Mario Meissl , Sidlgata Sreenivasan
IPC分类号： B29C43/02 , B81C99/00 , G03B27/58 , G03F7/00
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03B27/58
摘要： The present invention is directed toward a method to vary dimensions of a substrate supported by a chuck. The method includes applying compressive forces to the substrate with the actuator assembly while facilitating movement of the actuator assembly with respect to the substrate to minimize reactive forces generated in response to the compressive forces being sensed by the chuck.
摘要翻译：本发明涉及一种改变由卡盘支撑的基底的尺寸的方法。该方法包括使用致动器组件向基板施加压缩力，同时促进致动器组件相对于基板的移动，以最小化响应于卡盘感测到的压缩力产生的反作用力。

10. 发明申请

US20060001194A1 System for varying dimensions of a substrate during nanoscale manufacturing 有权
标题翻译：在纳米级制造期间用于改变衬底尺寸的系统
公开(公告)号：US20060001194A1
公开(公告)日：2006-01-05
申请号：US11142808
申请日：2005-06-01
申请人： Anshuman Cherala , Byung-Jin Choi , Pawan Nimmakayala , Mario Meissl , Sidlgata Sreenivasan
发明人： Anshuman Cherala , Byung-Jin Choi , Pawan Nimmakayala , Mario Meissl , Sidlgata Sreenivasan
IPC分类号： B29C59/02
CPC分类号： G03F7/0002 , B82Y10/00 , B82Y40/00 , G03B27/58
摘要： The present invention is directed toward a system to vary dimensions of a substrate, such as a template having a patterned mold. To that end, the system includes a substrate chuck adapted to position the substrate in a region; a pliant member; and an actuator sub-assembly elastically coupled to the substrate chuck through the pliant member. The actuator assembly includes a plurality of lever sub-assemblies, one of which includes a body lying in the region and spaced-apart from an opposing body associated with one of the remaining lever sub-assemblies of the plurality of lever sub-assemblies. One of the plurality of lever assemblies is adapted to vary a distance between the body and the opposing body. In this manner, compressive forces may be applied to the template to remove unwanted magnification or other distortions in the pattern on the mold. The pliant member is configured to attenuate a magnitude of resulting Forces sensed by the substrate chuck generated in response to the compressive forces.
摘要翻译：本发明涉及一种改变基底的尺寸的系统，例如具有图案化模具的模板。为此，系统包括适于将衬底定位在区域中的衬底卡盘; 柔顺的会员以及致动器子组件，其通过柔性构件弹性地联接到基板卡盘。所述致动器组件包括多个杠杆子组件，其中一个杆子组件包括位于所述区域中并与与所述多个杠杆子组件中的剩余杠杆子组件之一相关联的相对主体间隔开的主体。多个杠杆组件中的一个适于改变主体和相对主体之间的距离。以这种方式，可以对模板施加压缩力以去除模具上的图案中的不期望的放大或其它变形。柔性构件被构造成衰减由响应于压缩力产生的衬底卡盘感测到的结果力的大小。

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