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11. 发明授权

US5744381A Method of inspecting a pattern formed on a sample for a defect, and an apparatus thereof 失效
标题翻译：检查形成在缺陷的样品上的图案的方法及其装置
公开(公告)号：US5744381A
公开(公告)日：1998-04-28
申请号：US614063
申请日：1996-03-12
申请人： Mitsuo Tabata , Toru Tojo , Toshiyuki Watanabe , Hideo Tsuchiya
发明人： Mitsuo Tabata , Toru Tojo , Toshiyuki Watanabe , Hideo Tsuchiya
IPC分类号： G01N21/956 , G03F1/84 , H01L21/66 , G01R31/26 , G01N21/00 , G03F9/00
CPC分类号： G03F1/84 , G01N21/95607 , H01L22/12
摘要： A pattern defect inspection apparatus comprises a light irradiating portion, a light receive element, a light receive element amplifier, a preparation portion for preparing multi-valued design pattern image data, an offset adjusting portion, a gain adjusting portion, and an inspecting portion. The offset adjusting portion adjusts the offset of the light receive element amplifier such that measurement data of a translucent portion of a pattern on a sample surface corresponds to design pattern image data corresponding to the translucent portion, regarding the translucent portion as a non-transparent portion. The gain adjusting portion adjusts the gain of the light receive element amplifier such that measurement data of a transparent portion of the pattern on the sample surface corresponds to design pattern image data corresponding to the transparent portion.
摘要翻译：图案缺陷检查装置包括光照射部分，光接收元件，光接收元件放大器，用于制备多值设计图案图像数据的准备部分，偏移调整部分，增益调节部分和检查部分。偏移调整部分调节光接收元件放大器的偏移，使得样本表面上的图案的透光部分的测量数据对应于与半透明部分对应的设计图案图像数据，关于作为不透明部分的半透明部分。增益调整部分调节光接收元件放大器的增益，使得样品表面上的图案的透明部分的测量数据对应于对应于透明部分的设计图案图像数据。

12. 发明授权

US4558225A Target body position measuring method for charged particle beam fine pattern exposure system 失效
标题翻译：带电粒子束精细图案曝光系统的目标体位置测量方法
公开(公告)号：US4558225A
公开(公告)日：1985-12-10
申请号：US527486
申请日：1983-08-29
申请人： Mineo Gotou , Ryoichi Yoshikawa , Toru Tojo , Hirotsugu Wada
发明人： Mineo Gotou , Ryoichi Yoshikawa , Toru Tojo , Hirotsugu Wada
IPC分类号： G01B15/00 , H01J37/304 , H01L21/027 , H01L21/30 , G03F9/00
CPC分类号： H01J37/3045 , H01L21/30
摘要： Disclosed is a method for measuring the position of a silicon wafer as a workpiece to be exposed. The method is suitably used in an electron beam exposure system. A wafer has a plurality of chip alignment marks which respectively designate a plurality of chip field areas, included in a dicing line area. When the wafer is contained ion a holder and is fixed in the exposure system, edge portions of the wafer are partially scanned with the electron beam to roughly measure the position of the wafer. In accordance with this wafer position data, a wafer surface portion required for detecting only the marks is defined within the dicing line area. In the mark detection with the electron beam, the electron beam irradiates only the defined wafer surface portion of the wafer surface, thereby providing highly precise measurement of the wafer position and avoiding undesirable irritation of the circuit formation area.
摘要翻译：公开了一种用于测量作为待曝光的工件的硅晶片的位置的方法。该方法适用于电子束曝光系统。晶片具有分别指定在切割线区域中的多个芯片场区域的多个芯片对准标记。当晶片被包含在保持器上并固定在曝光系统中时，晶片的边缘部分被电子束部分地扫描以粗略地测量晶片的位置。根据该晶片位置数据，在切割线区域内限定仅检测标记所需的晶片表面部分。在用电子束进行的标记检测中，电子束仅照射晶片表面的限定的晶片表面部分，从而提供对晶片位置的高精度测量，并避免对电路形成区域的不期望的刺激。

13. 发明授权

US07421109B2 Pattern inspection apparatus 失效
标题翻译：图案检验仪
公开(公告)号：US07421109B2
公开(公告)日：2008-09-02
申请号：US10642760
申请日：2003-08-19
申请人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
发明人： Hideo Tsuchiya , Kyoji Yamashita , Toshiyuki Watanabe , Ikunao Isomura , Toru Tojo , Yasushi Sanada
IPC分类号： G06K9/00 , G01B11/00 , G01J1/10
CPC分类号： G06T7/0004 , G06T2207/30148
摘要： A pattern inspecting method, comprising preparing a sample having a first and a second inspection regions and an imaging device having a plurality of pixels, scanning the first inspection region to a first direction using the imaging device to obtain a first measurement pattern representing at least parts of the first inspection region, scanning the second inspection region to the first direction using the imaging device to obtain a second measurement pattern representing at least parts of the second inspection region, comparing the first measurement pattern and the second measurement pattern with each other to determine presence or absence of a defect formed on the sample, and controlling a scanning condition for scanning a pattern of the second inspection region by the imaging device so as to keep the same with the scanning condition when the pattern of the first inspection region is scanned by the imaging device.
摘要翻译：一种图案检查方法，包括准备具有第一和第二检查区域的样本和具有多个像素的成像装置，使用成像装置将第一检查区域扫描到第一方向，以获得表示至少部分的第一测量图案使用所述成像装置将所述第二检查区域扫描到所述第一方向，以获得表示所述第二检查区域的至少一部分的第二测量图案，将所述第一测量图案和所述第二测量图案彼此进行比较，以确定存在或不存在形成在样品上的缺陷，以及控制用于通过成像装置扫描第二检查区域的图案的扫描条件，以便当第一检查区域的图案被扫描时与扫描条件保持相同成像装置。

14. 发明申请

US20050128451A1 Alignment method 有权
标题翻译：对齐方法
公开(公告)号：US20050128451A1
公开(公告)日：2005-06-16
申请号：US11012257
申请日：2004-12-16
申请人： Soichiro Mitsui , Toru Tojo , Kiminobu Akeno
发明人： Soichiro Mitsui , Toru Tojo , Kiminobu Akeno
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/68 , G03B27/42
CPC分类号： H01L21/681
摘要： An alignment apparatus for substrates comprises a first movement mechanism moving a substrate to be treated in a horizontal direction, a second movement mechanism moving the substrate in a vertical direction, a rotation mechanism rotating the substrate in a substrate plane, an illumination tool irradiating the substrate from a sidewise direction in a state where the substrate is held in a desired height position by the second movement mechanism, an image sensor picking up an image on a back surface of the substrate in an irradiated state, an edge position sensor sensing plural edge positions of the substrate from an image obtained by the image sensor, and a control computer obtaining a positional shift of the substrate based on the edge positions sensed by the edge position sensor and correcting a positional shift of the horizontal and rotation directions by the first movement and rotation mechanisms.
摘要翻译：基板对准装置包括：沿水平方向移动待处理基板的第一移动机构，沿垂直方向移动基板的第二移动机构，在基板平面内旋转基板的旋转机构，照射基板的照明工具在通过第二移动机构将基板保持在期望的高度位置的状态下的侧面方向上，以照射状态在基板的背面拾取图像的图像传感器，感测多个边缘位置的边缘位置传感器根据由图像传感器获得的图像获得基板的位置偏移;以及控制计算机，基于由边缘位置传感器感测的边缘位置获得基板的位置偏移，并且通过第一移动来校正水平和旋转方向的位置偏移，以及旋转机制。

15. 发明申请

US20050052634A1 Automatic focusing apparatus 有权
标题翻译：自动对焦装置
公开(公告)号：US20050052634A1
公开(公告)日：2005-03-10
申请号：US10897120
申请日：2004-07-23
申请人： Shinji Sugihara , Riki Ogawa , Toru Tojo
发明人： Shinji Sugihara , Riki Ogawa , Toru Tojo
IPC分类号： G01B11/02 , G02B7/28 , G02B21/26 , G03B27/52 , G03F7/20 , G03F9/00 , H01L21/027
CPC分类号： G03F9/7088 , G03F7/70725 , G03F9/7003 , G03F9/7026 , G03F9/7034
摘要： An automatic focusing apparatus comprises a stage holding a substrate, an objective lens disposed facing the substrate surface, an illumination optics illuminating the substrate surface with a spotted light beam from an oblique direction, a photodetector detecting reflected light from the substrate surface, a position detection circuit detecting a vertical position of the substrate surface from an electric signal obtained from the photodetector to output a position signal, a correction circuit monitoring the position signal in real time and subtracting a surplus exceeding a signal change corresponding to a surface shape change of the substrate from the position signal, when a change amount per unit time of the position signal exceeds a predetermined level and outputting a corrected position signal, and a stage control circuit controlling the vertical position of the stage based on the corrected position signal.
摘要翻译：一种自动对焦装置，包括：保持基板的台阶，与基板面对面配置的物镜;从倾斜方向用点状光束照射基板表面的照明光学元件;检测来自基板面的反射光的光电检测器;位置检测检测从光电检测器获得的电信号的基板表面的垂直位置以输出位置信号，校正电路实时监控位置信号，并减去超过与基板的表面形状变化相对应的信号变化的剩余量当位置信号的每单位时间的变化量超过预定值并输出校正的位置信号时，根据位置信号，以及基于校正位置信号控制舞台的垂直位置的舞台控制电路。

16. 发明申请

US20050002020A1 Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask 有权
标题翻译：具有两个传感器的检查装置，用于检查物体的方法和用于制造光刻掩模的方法
公开(公告)号：US20050002020A1
公开(公告)日：2005-01-06
申请号：US10852434
申请日：2004-05-25
申请人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
发明人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
IPC分类号： G01N21/956 , G03F1/84 , H01L21/66 , G01N21/88
CPC分类号： G01N21/956 , G01N2021/95676
摘要： A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a first portion of the object with a first light beam, and a second optical system is arranged to expose a second portion of the object, spaced form the first portion, with a second light beam. A third optical system focuses the transmitted light on to the first sensor, as well as the reflected light on to the second sensor. A defect detecting circuit is also provided to detect a defect of the object, based upon image data associated with the reflected and transmitted light.
摘要翻译：光刻掩模检查装置具有至少两个传感器。一个传感器被配置为感测通过待检查对象传播的光，另一个传感器感测从物体反射的光。第一光学系统布置成用第一光束曝光物体的第一部分，并且第二光学系统布置成用第二光束暴露出与第一部分间隔开的物体的第二部分。第三光学系统将透射光聚焦到第一传感器，以及将反射光聚焦到第二传感器上。还提供缺陷检测电路，用于基于与反射和透射光相关联的图像数据来检测物体的缺陷。

17. 发明授权

US06676289B2 Temperature measuring method in pattern drawing apparatus 有权
标题翻译：图案绘图装置中的温度测量方法
公开(公告)号：US06676289B2
公开(公告)日：2004-01-13
申请号：US09933719
申请日：2001-08-22
申请人： Ryoichi Hirano , Shusuke Yoshitake , Toru Tojo , Shuichiro Fukutome , Teruaki Yamamoto , Masaki Toriumi
发明人： Ryoichi Hirano , Shusuke Yoshitake , Toru Tojo , Shuichiro Fukutome , Teruaki Yamamoto , Masaki Toriumi
IPC分类号： G01K1300
CPC分类号： G01K7/42
摘要： According to one embodiment of the present invention, the present invention may provide a temperature measuring method in a pattern drawing apparatus having a drawing chamber for drawing a pattern on a substrate to be transferred inside, a stage installed inside the drawing chamber, a standby chamber connected to the drawing chamber, and a thermostatic device installed inside the standby chamber, characterized in that a dummy substrate having a temperature measuring device and a recording device for recording the temperature measured by the temperature measuring device is transferred to the thermostatic device, then transferred into the drawing chamber, and then put on the stage, thus the temperature history of the dummy substrate in the transfer route from the thermostatic device to the stage is measured by the temperature measuring device and recorded in the recording device.
摘要翻译：根据本发明的一个实施例，本发明可以提供一种图形绘制装置中的温度测量方法，该图形绘制装置具有用于在待传送内部的基板上绘制图案的拉伸室，安装在拉伸室内的台，备用室连接到拉伸室，以及安装在备用室内的恒温装置，其特征在于，具有用于记录由温度测量装置测量的温度的温度测量装置和记录装置的虚拟基板被传送到恒温装置，然后转移进入拉伸室，然后放在平台上，由温度测量装置测量从恒温装置到载物台的传输路径中的虚拟基板的温度历史记录在记录装置中。

18. 发明授权

US4811062A Method for aligning first and second objects relative to each other and apparatus for practicing this method 失效
标题翻译：用于使第一和第二物体相对于彼此对准的方法以及用于实施该方法的装置
公开(公告)号：US4811062A
公开(公告)日：1989-03-07
申请号：US214821
申请日：1988-07-01
申请人： Mitsuo Tabata , Toru Tojo , Hiroaki Shimozono
发明人： Mitsuo Tabata , Toru Tojo , Hiroaki Shimozono
IPC分类号： H01L21/00 , G03F9/00 , H01L21/027 , H01L21/30 , H01L21/67 , H01L21/68 , G01B11/26
CPC分类号： G03F9/7049
摘要： In a method for aligning first and second objects relative to each other, according to this invention, the first and second objects are arranged opposite to each other, and are aligned in a direction perpendicular to their opposing direction. A grating pattern is formed, as an alignment mark, on the first object, and a checkerboard-like grating pattern is formed, also as an alignment mark, on the second object. A light beam emitted from an alignment light source is radiated onto the checkerboard-like grating pattern of the second object. The light beam diffracted by the checkerboard-like grating pattern is guided onto the grating pattern of the first object. The light beam diffracted by the grating pattern of the first object is detected by a detector. Since the light beam emitted from the light source is diffracted by the checkerboard-like grating pattern, a relative position of the first and second objects can be detected, irrespective of the distance therebetween. The first and second objects are accurately aligned, based on the detection result. This invention can be applied to a method for aligning a mask and a wafer when a circuit pattern pre-formed on the mask is to be transferred onto the wafer.
摘要翻译：在第一和第二物体相对于彼此对准的方法中，根据本发明，第一和第二物体彼此相对布置，并且在垂直于它们的相反方向的方向上对齐。在第一物体上形成作为对准标记的光栅图案，并且在第二物体上形成棋盘状光栅图案，也作为对准标记。从对准光源发射的光束被辐射到第二物体的棋盘状光栅图案上。由棋盘状光栅图案衍射的光束被引导到第一物体的光栅图案上。由第一物体的光栅图案衍射的光束由检测器检测。由于从光源发射的光束被棋盘状光栅图案衍射，所以可以检测第一和第二物体的相对位置，而与它们之间的距离无关。基于检测结果，第一和第二物体被精确对准。当将掩模上预先形成的电路图案转印到晶片上时，本发明可以应用于将掩模和晶片对准的方法。

19. 发明授权

US4480284A Electrostatic chuck plate 失效
标题翻译：静电吸盘
公开(公告)号：US4480284A
公开(公告)日：1984-10-30
申请号：US428341
申请日：1982-09-29
申请人： Toru Tojo , Ichiro Mori , Shunichi Sano
发明人： Toru Tojo , Ichiro Mori , Shunichi Sano
IPC分类号： B23Q3/15 , H01L21/683 , H02N13/00
CPC分类号： H01L21/6831 , H01L21/6833
摘要： An electrostatic chuck plate comprises an electrode plate made of electrically conductive material and a dielectric layer formed on one surface of the electrode plate by flame-spraying dielectric material. The surface region of the dielectric layer is impregnated with plastic material, and the surface of the dielectric layer is smooth and flat. A sample is electrostatically attracted toward the electrode plate and is thus held on the smooth and flat surface of the dielectric layer.
摘要翻译：静电卡盘包括由导电材料制成的电极板和通过火焰喷涂介电材料形成在电极板的一个表面上的电介质层。电介质层的表面区域用塑料材料浸渍，电介质层的表面光滑平坦。样品被静电吸引到电极板上，因此被保持在电介质层的光滑平坦的表面上。

20. 发明授权

US4467210A Electron-beam image transfer device 失效
标题翻译：电子束图像传输装置
公开(公告)号：US4467210A
公开(公告)日：1984-08-21
申请号：US379712
申请日：1982-05-18
申请人： Kazuyoshi Sugihara , Toru Tojo , Ichiro Mori , Toshiaki Shinozaki
发明人： Kazuyoshi Sugihara , Toru Tojo , Ichiro Mori , Toshiaki Shinozaki
IPC分类号： H01L21/027 , B65G49/07 , H01J37/18 , H01L21/30 , H01L21/677 , H01L21/68 , B23Q3/157
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , G03F7/2037 , H01J37/18 , H01L21/30 , H01L21/67766 , H01L21/67796 , H01L21/682
摘要： An electron-beam image transfer device includes an evacuated vessel having a main chamber and spare chamber extended therefrom and a specimen holder and mask holder disposed in the main chamber. A subchamber is formed near the spare chamber to house a specimen. The specimen in the subchamber is transferred to the spare chamber by a movable support through an opening which is always kept in an airtight state, and then brought to the specimen holder by a transferring mechanism.
摘要翻译：电子束图像转印装置包括具有从其延伸的主室和备用室的抽真空容器和设置在主室中的试样保持器和掩模保持架。在备用室附近形成一个子室以容纳样品。子室中的样品通过可移动的支撑件通过总是保持在气密状态的开口转移到备用室，然后通过传送机构带到样品保持器。

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