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1. 发明授权

US07075621B2 Alignment method 有权
标题翻译：对齐方法
公开(公告)号：US07075621B2
公开(公告)日：2006-07-11
申请号：US11012257
申请日：2004-12-16
申请人： Soichiro Mitsui , Toru Tojo , Kiminobu Akeno
发明人： Soichiro Mitsui , Toru Tojo , Kiminobu Akeno
IPC分类号： G03B27/42 , G03B27/32
CPC分类号： H01L21/681
摘要： An alignment method for substrates includes preparing an alignment apparatus having a movement mechanism to move a target substrate in horizontal and vertical directions, a rotation mechanism to rotate the substrate in a horizontal plane, an illumination tool to irradiate the substrate, an image sensor to pick up an substrate image, an edge position sensor to sense the substrate edge positions, and a control computer, transferring the substrate from a previous stage using the moving mechanism, measuring the substrate position using the image sensor which picks up the image on a back surface of the substrate, while irradiating the substrate with the illumination tool from a sidewise direction, calculating positional shifts regarding X, Y, and θ of the mask, using the edge position sensor and control computer, correcting the positional shifts of the mask by the moving and rotation mechanisms, and transferring the substrate to a next stage.
摘要翻译：基板的对准方法包括准备具有移动机构的移动机构以使水平和垂直方向移动目标基板的对准装置，使水平面上的基板旋转的旋转机构，照射基板的照明工具，图像传感器衬底图像的边缘位置传感器，用于感测衬底边缘位置的边缘位置传感器，以及控制计算机，使用移动机构从前一级传送衬底，使用在后表面上拾取图像的图像传感器来测量衬底位置在使用边缘位置传感器和控制计算机的情况下，使用边缘位置传感器和控制计算机计算关于掩模的X，Y和θ的位置偏移，通过移动来校正掩模的位置偏移，同时利用照明工具从侧向照射基板和旋转机构，并将衬底转移到下一阶段。

2. 发明授权

US06901314B2 Alignment apparatus for substrates 有权
标题翻译：基板对准装置
公开(公告)号：US06901314B2
公开(公告)日：2005-05-31
申请号：US10397288
申请日：2003-03-27
申请人： Soichiro Mitsui , Toru Tojo , Kiminobu Akeno
发明人： Soichiro Mitsui , Toru Tojo , Kiminobu Akeno
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/68 , G05B19/00
CPC分类号： H01L21/681
摘要： An alignment apparatus for substrates comprises a first movement mechanism moving a substrate to be treated in a horizontal direction, a second movement mechanism moving the substrate in a vertical direction, a rotation mechanism rotating the substrate in a substrate plane, an illumination tool irradiating the substrate from a sidewise direction in a state where the substrate is held in a desired height position by the second movement mechanism, an image sensor picking up an image on a back surface of the substrate in an irradiated state, an edge position sensor sensing plural edge positions of the substrate from an image obtained by the image sensor, and a control computer obtaining a positional shift of the substrate based on the edge positions sensed by the edge position sensor and correcting a positional shift of the horizontal and rotation directions by the first movement and rotation mechanisms.
摘要翻译：基板对准装置包括：沿水平方向移动待处理基板的第一移动机构，沿垂直方向移动基板的第二移动机构，在基板平面内旋转基板的旋转机构，照射基板的照明工具在通过第二移动机构将基板保持在期望的高度位置的状态下的侧面方向上，以照射状态在基板的背面拾取图像的图像传感器，感测多个边缘位置的边缘位置传感器根据由图像传感器获得的图像获得基板的位置偏移;以及控制计算机，基于由边缘位置传感器感测的边缘位置获得基板的位置偏移，并且通过第一移动来校正水平和旋转方向的位置偏移，以及旋转机制。

3. 发明申请

US20050128451A1 Alignment method 有权
标题翻译：对齐方法
公开(公告)号：US20050128451A1
公开(公告)日：2005-06-16
申请号：US11012257
申请日：2004-12-16
申请人： Soichiro Mitsui , Toru Tojo , Kiminobu Akeno
发明人： Soichiro Mitsui , Toru Tojo , Kiminobu Akeno
IPC分类号： G01B11/00 , G03F9/00 , H01L21/027 , H01L21/68 , G03B27/42
CPC分类号： H01L21/681
摘要： An alignment apparatus for substrates comprises a first movement mechanism moving a substrate to be treated in a horizontal direction, a second movement mechanism moving the substrate in a vertical direction, a rotation mechanism rotating the substrate in a substrate plane, an illumination tool irradiating the substrate from a sidewise direction in a state where the substrate is held in a desired height position by the second movement mechanism, an image sensor picking up an image on a back surface of the substrate in an irradiated state, an edge position sensor sensing plural edge positions of the substrate from an image obtained by the image sensor, and a control computer obtaining a positional shift of the substrate based on the edge positions sensed by the edge position sensor and correcting a positional shift of the horizontal and rotation directions by the first movement and rotation mechanisms.
摘要翻译：基板对准装置包括：沿水平方向移动待处理基板的第一移动机构，沿垂直方向移动基板的第二移动机构，在基板平面内旋转基板的旋转机构，照射基板的照明工具在通过第二移动机构将基板保持在期望的高度位置的状态下的侧面方向上，以照射状态在基板的背面拾取图像的图像传感器，感测多个边缘位置的边缘位置传感器根据由图像传感器获得的图像获得基板的位置偏移;以及控制计算机，基于由边缘位置传感器感测的边缘位置获得基板的位置偏移，并且通过第一移动来校正水平和旋转方向的位置偏移，以及旋转机制。

4. 发明申请

US20110155930A1 SUBSTRATE COVER AND CHARGED PARTICLE BEAM WRITING METHOD USING SAME 失效
标题翻译：基板封装和使用相同的充电颗粒光束写入方法
公开(公告)号：US20110155930A1
公开(公告)日：2011-06-30
申请号：US12970084
申请日：2010-12-16
申请人： Michihiro KAWAGUCHI , Keisuke Yamaguchi , Shun Kanezawa , Soichiro Mitsui , Kiminobu Akeno
发明人： Michihiro KAWAGUCHI , Keisuke Yamaguchi , Shun Kanezawa , Soichiro Mitsui , Kiminobu Akeno
IPC分类号： G21K5/10
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/0044
摘要： A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate cover 40 placed thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover 40, the edge portion of the substrate is then irradiated with light from the irradiation means.
摘要翻译：基板盖40包括具有与基板的周缘区域对应的形状的导电部41。由于导电部分的至少一部分包括由透光构件形成的透射部分47，所以它被构造成允许期望的光穿透。以这样的方式检测基板的每个边缘部分的位置，使得基板设置在其上放置有光照射装置和光检测单元之间的基板盖40，从位于基板上方的光照射装置引导的照射光使基板的边缘部分穿过基板盖40的至少一部分，然后用来自照射装置的光照射基板的边缘部分。

5. 发明授权

US08779397B2 Substrate cover and charged particle beam writing method using same 失效
标题翻译：基板盖和带电粒子束写入方法使用相同
公开(公告)号：US08779397B2
公开(公告)日：2014-07-15
申请号：US12970084
申请日：2010-12-16
申请人： Michihiro Kawaguchi , Keisuke Yamaguchi , Shun Kanezawa , Soichiro Mitsui , Kiminobu Akeno
发明人： Michihiro Kawaguchi , Keisuke Yamaguchi , Shun Kanezawa , Soichiro Mitsui , Kiminobu Akeno
IPC分类号： H01J37/317 , H01J37/20
CPC分类号： H01J37/3174 , B82Y10/00 , B82Y40/00 , H01J2237/0044
摘要： A substrate cover 40 includes a conductive portion 41 having a shape corresponding to a peripheral edge region of a substrate. Since at least part of the conductive portion includes transmissive portions 47 each formed of a light transmissive member, it is configured so as to allow desired light to penetrate through. The position of each edge portion of the substrate is detected in such a manner that the substrate is disposed with the substrate cover 40 placed thereon between light irradiation means and a light detecting unit, irradiation light directed from the light irradiation means located above the substrate to the edge portion of the substrate is made to penetrate through at least part of the substrate cover 40, the edge portion of the substrate is then irradiated with light from the irradiation means.
摘要翻译：基板盖40包括具有与基板的周缘区域对应的形状的导电部41。由于导电部分的至少一部分包括由透光构件形成的透射部分47，所以它被构造成允许期望的光穿透。以这样的方式检测基板的每个边缘部分的位置，使得基板设置在其上放置有光照射装置和光检测单元之间的基板盖40，从位于基板上方的光照射装置引导的照射光使基板的边缘部分穿过基板盖40的至少一部分，然后用来自照射装置的光照射基板的边缘部分。

6. 发明授权

US07491959B2 Defect inspection apparatus 有权
标题翻译：缺陷检查装置
公开(公告)号：US07491959B2
公开(公告)日：2009-02-17
申请号：US11526638
申请日：2006-09-26
申请人： Riki Ogawa , Soichiro Mitsui
发明人： Riki Ogawa , Soichiro Mitsui
IPC分类号： G01V8/00
CPC分类号： G01N21/95607 , G01N21/94 , G01N2021/8841 , G01N2021/95676 , G03F1/84 , G03F7/7065
摘要： A defect inspection apparatus includes an illumination optical system which sets a transmission illumination region and a reflection illumination region on an inspection target surface of a mask, first and second imaging units having first and second visual fields which are set on the inspection target surface, an imaging optical system that provides images, which are present on the first and second visual fields, on the first and second imaging units, a defect detection unit which detects a defect of the mask on the basis of the images provided on the first and second imaging units, and a control unit which controls a positional relationship between setting positions of the transmission illumination region and the reflection illumination region and setting positions of the first and second visual fields.
摘要翻译：缺陷检查装置包括在掩模的检查对象面上设置透射照明区域和反射照明区域的照明光学系统，具有设置在检查对象面上的第一和第二视野的第一和第二摄像单元，成像光学系统，其提供第一和第二视野上存在于第一和第二成像单元上的图像;缺陷检测单元，其基于第一和第二成像上提供的图像检测掩模的缺陷; 控制单元，其控制透射照明区域和反射照明区域的设定位置和第一和第二视野的设定位置之间的位置关系。

7. 发明申请

US20070070334A1 Defect inspection apparatus 有权
标题翻译：缺陷检查装置
公开(公告)号：US20070070334A1
公开(公告)日：2007-03-29
申请号：US11526638
申请日：2006-09-26
申请人： Riki Ogawa , Soichiro Mitsui
发明人： Riki Ogawa , Soichiro Mitsui
IPC分类号： G01N21/88
CPC分类号： G01N21/95607 , G01N21/94 , G01N2021/8841 , G01N2021/95676 , G03F1/84 , G03F7/7065
摘要： A defect inspection apparatus includes an illumination optical system which sets a transmission illumination region and a reflection illumination region on an inspection target surface of a mask, first and second imaging units having first and second visual fields which are set on the inspection target surface, an imaging optical system that provides images, which are present on the first and second visual fields, on the first and second imaging units, a defect detection unit which detects a defect of the mask on the basis of the images provided on the first and second imaging units, and a control unit which controls a positional relationship between setting positions of the transmission illumination region and the reflection illumination region and setting positions of the first and second visual fields.
摘要翻译：缺陷检查装置包括在掩模的检查对象面上设置透射照明区域和反射照明区域的照明光学系统，具有设置在检查对象面上的第一和第二视野的第一和第二摄像单元，成像光学系统，其提供第一和第二视野上存在于第一和第二成像单元上的图像;缺陷检测单元，其基于第一和第二成像上提供的图像检测掩模的缺陷; 控制单元，其控制透射照明区域和反射照明区域的设定位置和第一和第二视野的设定位置之间的位置关系。

8. 发明申请

US20060240335A1 Mask blank and process for producing and process for using the same, and mask and process for producing and process for using the same 审中-公开
标题翻译：掩模空白和用于生产和加工使用该掩模的方法，以及用于生产和加工使用它的掩模和工艺
公开(公告)号：US20060240335A1
公开(公告)日：2006-10-26
申请号：US11387954
申请日：2006-03-24
申请人： Soichiro Mitsui
发明人： Soichiro Mitsui
IPC分类号： B32B9/00 , B32B17/10 , B32B17/06 , G03F1/00
CPC分类号： C03C17/36 , C03C17/3649 , C03C17/3652 , C03C17/3655 , C03C17/3665 , C03C17/3668 , C03C23/0055 , C03C2218/10 , C03C2218/31 , C03C2218/32 , C03C2218/34 , C03C2218/365 , G03F1/38 , G03F7/70708 , Y10T428/31616
摘要： By applying a transparent electroconductive film to a mask blank or by forming an electroconductive layer by doping metallic ions thereto, such a mask blank can be provided that an electrostatic chuck having a sufficient retaining force can be applied, the front and back surfaces of the mask blank can be measured simultaneously with ultimate accuracy, generation of dusts is extremely reduced, and charge prevention and prevention of particle adhesion are enabled, and a process for producing the mask blank, a process for using the mask blank, a mask using the mask blank, a process for producing the mask, and a process for using the mask can be also provided.
摘要翻译：通过将透明导电膜施加到掩模板或通过将金属离子掺入其中形成导电层，可以提供这样的掩模坯料，即可以施加具有足够的保持力的静电卡盘，掩模的前表面和后表面空白可以以极高的精度同时测量，从而极大地减少了灰尘的产生，并且能够实现电荷防止和防止颗粒附着，以及掩模坯料的制造方法，使用掩模坯料的方法，使用掩模坯料的掩模，制造掩模的方法，以及使用该掩模的方法。

9. 发明授权

US07704645B2 Method of generating writing pattern data of mask and method of writing mask 有权
标题翻译：生成掩模的写入模式数据的方法和写入掩码的方法
公开(公告)号：US07704645B2
公开(公告)日：2010-04-27
申请号：US11068904
申请日：2005-03-02
申请人： Soichiro Mitsui
发明人： Soichiro Mitsui
IPC分类号： G03F1/00
CPC分类号： B82Y40/00 , B82Y10/00 , G03F1/24 , G03F1/70 , G03F7/70433 , G03F7/70783
摘要： A method of generating writing pattern data of a reflective mask for use in a non-telecentric exposure tool comprises obtaining a vertical position profile by measuring vertical positions of a plurality of X, Y coordinates arbitrarily set on the surface of a blank mask substrate when mounted on a mask stage, or by measuring and calculating a flatness profile, calculating unevenness of the blank mask substrate surface from the vertical position profile, calculating a shift amount of an image position, generated in a wafer mounted on a wafer stage of the exposure tool, in accordance with the unevenness of the blank mask substrate and parameters of a non-telecentric optics of the exposure tool, and obtaining corrected writing pattern data by correcting design pattern data of the reflective mask based on the shift amount of the image position and a reduction ratio of a projection optics of the exposure tool.
摘要翻译：一种产生用于非远心曝光工具的反射掩模的书写图案数据的方法包括通过测量当安装在空白掩模基板的表面上时任意设置的多个X，Y坐标的垂直位置来获得垂直位置分布或者通过测量和计算平坦度轮廓，计算坯料掩模基板表面与垂直位置分布的不均匀性，计算在安装在曝光工具的晶片台上的晶片中产生的图像位置的偏移量根据曝光工具的非远心光学元件的不平整度和曝光工具的非远心光学元件的参数，通过基于图像位置的偏移量校正反射掩模的设计图案数据，并且曝光工具的投影光学元件的减小比例。

10. 发明申请

US20050214657A1 Method of generating writing pattern data of mask and method of writing mask 有权
标题翻译：生成掩模的写入模式数据的方法和写入掩码的方法
公开(公告)号：US20050214657A1
公开(公告)日：2005-09-29
申请号：US11068904
申请日：2005-03-02
申请人： Soichiro Mitsui
发明人： Soichiro Mitsui
IPC分类号： G03C11/00 , G03F1/00 , G03F1/24 , G03F1/36 , G03F1/68 , G03F1/70 , G03F7/20 , G03F9/00 , G06F17/50 , H01L21/027
CPC分类号： B82Y40/00 , B82Y10/00 , G03F1/24 , G03F1/70 , G03F7/70433 , G03F7/70783
摘要： A method of generating writing pattern data of a reflective mask for use in a non-telecentric exposure tool comprises obtaining a vertical position profile by measuring vertical positions of a plurality of X, Y coordinates arbitrarily set on the surface of a blank mask substrate when mounted on a mask stage, or by measuring and calculating a flatness profile, calculating unevenness of the blank mask substrate surface from the vertical position profile, calculating a shift amount of an image position, generated in a wafer mounted on a wafer stage of the exposure tool, in accordance with the unevenness of the blank mask substrate and parameters of a non-telecentric optics of the exposure tool, and obtaining corrected writing pattern data by correcting design pattern data of the reflective mask based on the shift amount of the image position and a reduction ratio of a projection optics of the exposure tool.
摘要翻译：一种产生用于非远心曝光工具的反射掩模的书写图案数据的方法包括通过测量当安装在空白掩模基板的表面上时任意设置的多个X，Y坐标的垂直位置来获得垂直位置分布或者通过测量和计算平坦度轮廓，计算坯料掩模基板表面与垂直位置分布的不均匀性，计算在安装在曝光工具的晶片台上的晶片中产生的图像位置的偏移量根据曝光工具的非远心光学元件的不平整度和曝光工具的非远心光学元件的参数，通过基于图像位置的偏移量校正反射掩模的设计图案数据，并且曝光工具的投影光学元件的减小比例。

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