专利快速检索-快速检索全球专利，免费商用专利数据库-IPRDB

1. 发明授权

US09036896B2 Inspection system and method for inspecting line width and/or positional errors of a pattern 有权
标题翻译：用于检查图案的线宽和/或位置误差的检查系统和方法
公开(公告)号：US09036896B2
公开(公告)日：2015-05-19
申请号：US13083157
申请日：2011-04-08
申请人： Takanao Touya , Shuichi Tamamushi , Hidenori Sato , Hiroyuki Tanizaki , Takeshi Fujiwara , Eiji Sawa , Kentaro Okuda , Hiroyuki Ikeda , Hiromu Inoue , Hiroshi Tsukada
发明人： Takanao Touya , Shuichi Tamamushi , Hidenori Sato , Hiroyuki Tanizaki , Takeshi Fujiwara , Eiji Sawa , Kentaro Okuda , Hiroyuki Ikeda , Hiromu Inoue , Hiroshi Tsukada
IPC分类号： G06K9/00 , G06T7/00
CPC分类号： G06T7/001 , G01N21/9501 , G01N21/9503 , G01N21/956 , G06T7/0004 , G06T7/0006 , G06T7/70 , G06T7/74 , G06T2207/10004 , G06T2207/30141 , G06T2207/30148
摘要： A method and system for imaging an object to be inspected and obtaining an optical image; creating a reference image from design pattern data; preparing an inspection recipe including one or more templates and parameter settings necessary for the inspection; checking the pattern and the template against each other, and selecting the reference image which corresponds to the template; detecting first and second edges in the selected reference image in accordance with the parameter setting using determined coordinates as a reference; detecting first and second edges in the optical image, this optical image corresponds to the selected reference image; and determining an inspection value by acquiring the difference between the line width of the optical image and the reference image using the first edge and second edge of the reference image and the first edge and second edges of the optical image.
摘要翻译：一种用于对待检查对象进行成像并获得光学图像的方法和系统; 从设计模式数据创建参考图像; 准备包括一个或多个模板和检查所需的参数设置的检查配方; 检查图案和模板，并选择与模板对应的参考图像; 根据使用确定的坐标作为参考的参数设置来检测所选参考图像中的第一和第二边缘; 检测光学图像中的第一和第二边缘，该光学图像对应于所选择的参考图像; 以及通过使用参考图像的第一边缘和第二边缘以及光学图像的第一边缘和第二边缘获取光学图像的线宽和参考图像之间的差来确定检查值。

2. 发明授权

US08761518B2 Pattern inspection apparatus 有权
标题翻译：图案检验仪
公开(公告)号：US08761518B2
公开(公告)日：2014-06-24
申请号：US13183792
申请日：2011-07-15
申请人： Hiromu Inoue , Takeshi Fujiwara , Hiroshi Tsukada , Takashi Hirano
发明人： Hiromu Inoue , Takeshi Fujiwara , Hiroshi Tsukada , Takashi Hirano
IPC分类号： G06K9/48
CPC分类号： G01N21/95607 , G03F1/84
摘要： According to one embodiment, a pattern inspection apparatus includes a first inspection data creation section, a first delay section, a first recognition section, a first extraction section, a first and a second level difference calculation section, a first and a second determination section, and a first logic OR calculation section. The first extraction section extracts data of a sub-resolution pattern from the first inspection data and the first delay data. The first and second level difference calculation section calculate differences between an average output level of a surrounding region for a target pixel of the extracted data from the first inspection data or the first delay data and an output level of the extracted data. The first and second determination sections determine presence or absence of a defect. The first logic OR calculation section calculates logic OR of determination results of the first and second determination sections.
摘要翻译：根据一个实施例，图案检查装置包括第一检查数据创建部，第一延迟部，第一识别部，第一提取部，第一和第二等级差计算部，第一和第二判定部，和第一逻辑或计算部分。第一提取部分从第一检查数据和第一延迟数据提取子分辨率图案的数据。第一和第二电平差计算部分计算来自第一检查数据或第一延迟数据的提取数据的目标像素的周围区域的平均输出电平与提取的数据的输出电平之间的差。第一和第二确定部分确定缺陷的存在或不存在。第一逻辑或计算部分计算第一和第二确定部分的确定结果的逻辑或。

3. 发明申请

US20060257756A1 Method for repairing a photomask, method for inspecting a photomask, method for manufacturing a photomask, and method for manufacturing a semiconductor device 有权
公开(公告)号：US20060257756A1
公开(公告)日：2006-11-16
申请号：US11478650
申请日：2006-07-03
申请人： Katsuki Ohashi , Hiromu Inoue , Akira Ono , Hiroyuki Ikeda
发明人： Katsuki Ohashi , Hiromu Inoue , Akira Ono , Hiroyuki Ikeda
IPC分类号： G03F1/00 , G06K9/00 , G03C5/00
CPC分类号： G03F7/70058 , G01N21/956 , G01N2021/95676 , G03F1/72 , G03F1/84 , Y10S430/146
摘要： A method for inspecting a photomask, comprising generating a laser beam, changing a phase of the laser beam to smooth the brightness distribution of the laser beam, applying the smoothed laser beam to the photomask, acquiring an image of the photomask using a sensor while the laser beam and the photomask are relatively moved, examining the image of the photomask for a defect of the mask-pattern of the photomask.

4. 发明申请

US20050002020A1 Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask 有权
标题翻译：具有两个传感器的检查装置，用于检查物体的方法和用于制造光刻掩模的方法
公开(公告)号：US20050002020A1
公开(公告)日：2005-01-06
申请号：US10852434
申请日：2004-05-25
申请人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
发明人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
IPC分类号： G01N21/956 , G03F1/84 , H01L21/66 , G01N21/88
CPC分类号： G01N21/956 , G01N2021/95676
摘要： A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a first portion of the object with a first light beam, and a second optical system is arranged to expose a second portion of the object, spaced form the first portion, with a second light beam. A third optical system focuses the transmitted light on to the first sensor, as well as the reflected light on to the second sensor. A defect detecting circuit is also provided to detect a defect of the object, based upon image data associated with the reflected and transmitted light.
摘要翻译：光刻掩模检查装置具有至少两个传感器。一个传感器被配置为感测通过待检查对象传播的光，另一个传感器感测从物体反射的光。第一光学系统布置成用第一光束曝光物体的第一部分，并且第二光学系统布置成用第二光束暴露出与第一部分间隔开的物体的第二部分。第三光学系统将透射光聚焦到第一传感器，以及将反射光聚焦到第二传感器上。还提供缺陷检测电路，用于基于与反射和透射光相关联的图像数据来检测物体的缺陷。

5. 发明授权

US5574800A Pattern defect inspection method and apparatus 失效
标题翻译：图案缺陷检查方法和装置
公开(公告)号：US5574800A
公开(公告)日：1996-11-12
申请号：US294510
申请日：1994-08-23
申请人： Hiromu Inoue , Kentaro Okuda
发明人： Hiromu Inoue , Kentaro Okuda
IPC分类号： G01B11/24 , G01N21/88 , G01N21/93 , G01N21/956 , G06K9/00
CPC分类号： G01N21/95607
摘要： The pattern edge direction in reference image data of an object to be examined is detected, the reference image data is differentiated using a differential operator in a direction along the pattern edge direction, and inspection image data obtained by picking up an image of the object to be inspected is differentiated using the differential operator in the direction along the pattern edge direction. The differential data obtained by the differential processing are compared with the inspection image data, and a pattern defect on the object to be inspected is detected based on the difference between these data.
摘要翻译：检测被检查物体的参照图像数据中的图形边缘方向，使用差分算子在沿着图案边缘方向的方向上对参考图像数据进行微分，并且通过将对象的图像拾取而获得的检查图像数据在沿图案边缘方向的方向上使用微分算子进行检查。通过差分处理获得的差分数据与检查图像数据进行比较，并且基于这些数据之间的差异检测待检查对象上的图案缺陷。

6. 发明授权

US5204025A Conductive paste composition 失效
标题翻译：导电膏组成
公开(公告)号：US5204025A
公开(公告)日：1993-04-20
申请号：US681899
申请日：1991-04-08
申请人： Kimiko Yamada , Katuyosi Yada , Hiromu Inoue , Yousui Nemoto
发明人： Kimiko Yamada , Katuyosi Yada , Hiromu Inoue , Yousui Nemoto
IPC分类号： C08G59/00 , C08G59/28 , C08G59/32 , C08K3/08 , C08L63/00 , H01B1/22 , H05K1/09 , H05K9/00
CPC分类号： H05K1/095 , C08G59/28 , C08G59/3227 , C08K3/08 , C08L63/00 , H01B1/22
摘要： A conductive paste composition is described, which comprises an epoxy resin having a diglycidylamino group, a resol type phenol curing agent, and copper powder. The paste composition exhibits excellent moisture resistance and adhesion and provides a cured film of high conductivity level.
摘要翻译：描述了一种导电糊剂组合物，其包含具有二缩水甘油氨基的环氧树脂，甲阶酚醛型酚固化剂和铜粉。糊剂组合物表现出优异的耐湿性和粘合性，并提供高导电率的固化膜。

7. 发明授权

US09841385B2 Pattern characteristic-detection apparatus for photomask and pattern characteristic-detection method for photomask 有权
公开(公告)号：US09841385B2
公开(公告)日：2017-12-12
申请号：US12857906
申请日：2010-08-17
申请人： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
发明人： Hiromu Inoue , Hiroyuki Ikeda , Eiji Sawa
IPC分类号： G03F1/84 , G01N21/956 , G03F7/20
CPC分类号： G01N21/956 , G03F1/84 , G03F7/70525 , G03F7/70625 , G03F7/7065
摘要： According to one embodiment, a pattern characteristic detection apparatus for a photomask includes a detection-data creating portion, a reference-data creating portion, an extracting portion, a first area-setting portion, a detecting portion and an collecting portion. The detection-data creating portion is configured to create detection data on the basis of an optical image of a pattern formed on a photomask. The reference-data creating portion is configured to create reference data of the pattern. The extracting portion is configured to extract a pattern for pattern characteristic detection and positional information of the extracted pattern. The first area-setting portion is configured to set an area where pattern characteristics are to be detected, and configured to extract a target pattern. The detecting portion is configured to detect pattern characteristics of the target pattern within the area. In addition, the collecting portion is configured to collect the detected pattern characteristics.

8. 发明授权

US09290971B2 Door device for vehicle 有权
标题翻译：车辆门装置
公开(公告)号：US09290971B2
公开(公告)日：2016-03-22
申请号：US14009389
申请日：2012-02-28
申请人： Toyohisa Amagai , Kinji Hoshikawa , Hiromu Inoue
发明人： Toyohisa Amagai , Kinji Hoshikawa , Hiromu Inoue
IPC分类号： E05B85/12 , E05B79/20 , E05B53/00 , E05B79/06 , E05B79/22
CPC分类号： E05B85/12 , E05B53/003 , E05B79/06 , E05B79/20 , E05B79/22 , E05B85/13
摘要： A door device for a vehicle includes a cable for connecting a handle device and a lock unit. A cable holding member mounted to the handle device is displaced between an engagement position in which the cable holding member engages with the cable and a non-engagement position in which the cable holding member does not engage with the cable. A contact portion of a door panel is configured such that when the handle device is being mounted to the door panel, the contact portion contacts the cable holding member in the non-engagement position and interferes with the assembly of the handle device to the door panel and the contact portion does not contact the cable holding member in the engagement position.
摘要翻译：用于车辆的门装置包括用于连接手柄装置和锁定单元的电缆。安装到手柄装置的电缆保持构件在电缆保持构件与电缆接合的接合位置和电缆保持构件不与电缆接合的非接合位置之间移动。门板的接触部分被构造成使得当把手装置被安装到门板时，接触部分在非接合位置处接触电缆保持构件并且妨碍把手装置的组件到门板并且接触部分在接合位置不接触电缆保持构件。

9. 发明授权

US07394048B2 Focusing device, focusing method and a pattern inspecting apparatus 失效
标题翻译：聚焦装置，聚焦方法和图案检查装置
公开(公告)号：US07394048B2
公开(公告)日：2008-07-01
申请号：US11679411
申请日：2007-02-27
申请人： Hiromu Inoue , Tomohide Watanabe , Satoshi Endo , Masami Ikeda
发明人： Hiromu Inoue , Tomohide Watanabe , Satoshi Endo , Masami Ikeda
IPC分类号： G02B7/04
CPC分类号： G03F7/70641
摘要： A focusing device comprises a first imaging optical system, a second imaging optical system which splits the optical image in the direction of an AF sensor and further splits the optical image so that a front focus image in which the point that is in focus is in front of the optical image on the inspecting sensor and a back focus image in which the point that is in focus is behind the optical image on the inspecting sensor are formed on the AF sensor, a focus detecting circuit which detects an optimum focus position on the basis of a high-frequency component of a front sensor image in a front focus position and a high-frequency component of a back sensor image in a back focus position, and a focus control circuit which controls the focusing of the first imaging optical system on the basis of the focus position.
摘要翻译：聚焦装置包括第一成像光学系统，第二成像光学系统，其在AF传感器的方向上分割光学图像，并进一步分割光学图像，使得其中焦点点在前面的前焦点图像在AF传感器上形成检查传感器上的光学图像的背焦点图像和焦点上的焦点位于检测传感器上的光学图像之后的焦点检测电路，该焦点检测电路基于检测传感器的最佳聚焦位置在前焦点位置处的前传感器图像的高频分量和后聚焦位置中的背传感器图像的高频分量的焦点控制电路，以及控制第一成像光学系统的聚焦在基础的焦点位置。

10. 发明申请

US20080030719A1 Inspection apparatus having two sensors, method for inspecting an object, and a method for manufacturing a photolithography mask 审中-公开
标题翻译：具有两个传感器的检查装置，用于检查物体的方法和用于制造光刻掩模的方法
公开(公告)号：US20080030719A1
公开(公告)日：2008-02-07
申请号：US11896146
申请日：2007-08-30
申请人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
发明人： Hiromu Inoue , Toru Tojo , Takehiko Nomura , Shinichi Imai
IPC分类号： G01N21/00
CPC分类号： G01N21/956 , G01N2021/95676
摘要： A photolithography mask inspection apparatus has at least two sensors. One sensor is configured to sense light transmitted through an object to be inspected, and the other sensor senses light reflected off the object. A first optical system is arranged to expose a first portion of the object with a first light beam, and a second optical system is arranged to expose a second portion of the object, spaced form the first portion, with a second light beam. A third optical system focuses the transmitted light on to the first sensor, as well as the reflected light on to the second sensor. A defect detecting circuit is also provided to detect a defect of the object, based upon image data associated with the reflected and transmitted light.
摘要翻译：光刻掩模检查装置具有至少两个传感器。一个传感器被配置为感测通过待检查对象传播的光，另一个传感器感测从物体反射的光。第一光学系统布置成用第一光束曝光物体的第一部分，并且第二光学系统布置成用第二光束暴露出与第一部分间隔开的物体的第二部分。第三光学系统将透射光聚焦到第一传感器，以及将反射光聚焦到第二传感器上。还提供缺陷检测电路，用于基于与反射和透射光相关联的图像数据来检测物体的缺陷。

你已经成功收藏专利！

检索式保存成功!

IPRDB

热门服务

关于我们

友情链接

联系方式