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11. 发明授权

US07663753B2 Apparatus and methods for detecting overlay errors using scatterometry 有权
标题翻译：使用散射法检测重叠误差的装置和方法
公开(公告)号：US07663753B2
公开(公告)日：2010-02-16
申请号：US11963730
申请日：2007-12-21
申请人： Walter D. Mieher , Ady Levy , Boris Golovanevsky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant , Christopher F. Bevis , John Fielden , Noah Bareket , Ken Gross , Piotr Zalicki , Dan Wack , Paola Dececco , Thaddeus G. Dziura , Mark Ghinovker
发明人： Walter D. Mieher , Ady Levy , Boris Golovanevsky , Michael Friedmann , Ian Smith , Michael Adel , Anatoly Fabrikant , Christopher F. Bevis , John Fielden , Noah Bareket , Ken Gross , Piotr Zalicki , Dan Wack , Paola Dececco , Thaddeus G. Dziura , Mark Ghinovker
IPC分类号： G01B11/00
CPC分类号： G03F9/7088 , G01N21/956 , G01N2021/213 , G03F7/70625 , G03F7/70633 , G03F7/70683 , G03F9/7049 , G03F9/7084
摘要： Disclosed are techniques, apparatus, and targets for determining overlay error between two layers of a sample. Target A is designed to have an offset Xa between its first and second structures portions; target B is designed to have an offset Xb; target C is designed to have an offset Xc; and target D is designed to have an offset Xd. Each of the offsets Xa, Xb, Xc and Xd is preferably different from zero; Xa is an opposite sign and differ from Xb; and Xc is an opposite sign and differs from Xd. The targets A, B, C and D are illuminated with electromagnetic radiation to obtain spectra SA, SB, SC, and SD from targets A, B, C, and D, respectively. Any overlay error between the first structures and the second structures is then determined using a linear approximation based on the obtained spectra SA, SB, SC, and SD.
摘要翻译：公开了用于确定样品的两层之间的重叠误差的技术，装置和目标。目标A设计成在其第一和第二结构部分之间具有偏移Xa; 目标B设计为具有偏移Xb; 目标C被设计为具有偏移Xc; 并且目标D被设计为具有偏移量Xd。偏移量Xa，Xb，Xc和Xd中的每一个优选地不同于零; Xa是相反的符号，不同于Xb; Xc是相反的符号，与Xd不同。目标A，B，C和D用电磁辐射照射，分别从目标A，B，C和D获得光谱SA，SB，SC和SD。然后使用基于获得的光谱SA，SB，SC和SD的线性近似来确定第一结构和第二结构之间的任何覆盖误差。

12. 发明申请

US20110228263A1 ILLUMINATING A SPECIMEN FOR METROLOGY OR INSPECTION 有权
标题翻译：照亮计量或检验样本
公开(公告)号：US20110228263A1
公开(公告)日：2011-09-22
申请号：US13073986
申请日：2011-03-28
申请人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu , John Fielden
发明人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu , John Fielden
IPC分类号： G01J3/00
CPC分类号： G01N21/9501 , G01N2021/479
摘要： Illumination subsystems of a metrology or inspection system, metrology systems, inspection systems, and methods for illuminating a specimen for metrology measurements or for inspection are provided.
摘要翻译：提供了计量或检查系统的照明子系统，计量系统，检查系统和用于计量测量或检查的照明样本的方法。

13. 发明申请

US20100279213A1 METHODS AND SYSTEMS FOR CONTROLLING VARIATION IN DIMENSIONS OF PATTERNED FEATURES ACROSS A WAFER 审中-公开
标题翻译：用于控制WAFER中图案特征尺寸变化的方法和系统
公开(公告)号：US20100279213A1
公开(公告)日：2010-11-04
申请号：US12778994
申请日：2010-05-12
申请人： Ady Levy , Michael Hanna , Dan Wack , John Fielden , Christopher F. Bevis , Larry Wagner
发明人： Ady Levy , Michael Hanna , Dan Wack , John Fielden , Christopher F. Bevis , Larry Wagner
IPC分类号： G03F7/20 , G03B27/52
CPC分类号： G03F7/70425 , G01B11/24 , G01B2210/56 , G03F7/38 , G03F7/70675 , H01L22/12 , H01L22/20
摘要： Methods and systems for controlling variation in dimensions of patterned features across a wafer are provided. One method includes measuring a characteristic of a latent image formed in a resist at more than one location across a wafer during a lithography process. The method also includes altering a parameter of the lithography process in response to the characteristic to reduce variation in dimensions of patterned features formed across the wafer by the lithography process. Altering the parameter compensates for non-time varying spatial variation in a temperature to which the wafer is exposed during a post exposure bake step of the lithography process and an additional variation in the post exposure bake step.
摘要翻译：提供了用于控制跨晶片的图案化特征的尺寸变化的方法和系统。一种方法包括在光刻过程期间测量跨越晶片的多于一个位置处的抗蚀剂中形成的潜像的特性。该方法还包括响应于特性来改变光刻工艺的参数，以减小通过光刻工艺在晶片上形成的图案化特征的尺寸变化。改变参数补偿在光刻工艺的后曝光烘烤步骤期间晶片曝光的温度中的非时间变化的空间变化以及后曝光烘烤步骤的附加变化。

14. 发明授权

US07359052B2 Systems and methods for measurement of a specimen with vacuum ultraviolet light 有权
标题翻译：用真空紫外光测量样品的系统和方法
公开(公告)号：US07359052B2
公开(公告)日：2008-04-15
申请号：US10846053
申请日：2004-05-14
申请人： John Fielden , Gary Janik , Shing Lee
发明人： John Fielden , Gary Janik , Shing Lee
IPC分类号： G01J4/00
CPC分类号： G01J3/10 , G01J3/0286 , G01J3/36 , G01N21/211 , G01N2021/213
摘要： Various systems for measurement of a specimen are provided. One system includes an optical subsystem configured to perform measurements of a specimen using vacuum ultraviolet light and non-vacuum ultraviolet light. This system also includes a purging subsystem that is configured to maintain a purged environment around the optical subsystem during the measurements. Another system includes a cleaning subsystem configured to remove contaminants from a specimen prior to measurement. In one embodiment, the cleaning subsystem may be a laser-based cleaning subsystem that is configured to remove contaminants from a localized area on the specimen. The system also includes an optical subsystem that is configured to perform measurements of the specimen using vacuum ultraviolet light. The optical subsystem is disposed within a purged environment. In some embodiments, the system may include a differential purging subsystem that is configured to provide the purged environment for the optical subsystem.
摘要翻译：提供了用于测量样本的各种系统。一个系统包括被配置为使用真空紫外光和非真空紫外光进行样本的测量的光学子系统。该系统还包括清洗子系统，其被配置为在测量期间保持围绕光学子系统的净化环境。另一种系统包括清洁子系统，其构造成在测量之前从试样中去除污染物。在一个实施例中，清洁子系统可以是被配置为从样本上的局部区域去除污染物的基于激光的清洁子系统。该系统还包括被配置为使用真空紫外光进行样本的测量的光学子系统。光学子系统设置在净化的环境中。在一些实施例中，系统可以包括差分清洗子系统，其被配置为提供用于光学子系统的净化环境。

15. 发明授权

US07349090B2 Methods and systems for determining a property of a specimen prior to, during, or subsequent to lithography 有权
标题翻译：用于确定在光刻之前，期间或之后的样品的性质的方法和系统
公开(公告)号：US07349090B2
公开(公告)日：2008-03-25
申请号：US09956849
申请日：2001-09-20
申请人： Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
发明人： Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
IPC分类号： G01J4/00
CPC分类号： G03F7/70616 , G01N21/211 , G01N21/47 , G01N21/636 , G01N21/64 , G01N21/9501 , G01N2021/646 , G01N2021/8825 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70658 , G03F7/707 , G03F7/70708 , H01J2237/31701
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, a property of a specimen prior to, during, or subsequent to lithography. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.
摘要翻译：提供了用于监测半导体制造工艺的方法和系统。系统可以包括被配置为支撑样本并耦合到测量装置的台。测量装置可以包括照明系统和检测系统。照明系统和检测系统可以被配置为使得系统可以被配置为确定样本的多个属性。例如，该系统可以被配置为确定样品的多个性质，包括但不限于在光刻之前，期间或之后的样品的性质。以这种方式，测量装置可以执行多个光学和/或非光学测量和/或检查技术。

16. 发明授权

US07130029B2 Methods and systems for determining an adhesion characteristic and a thickness of a specimen 有权
公开(公告)号：US07130029B2
公开(公告)日：2006-10-31
申请号：US09956850
申请日：2001-09-20
申请人： Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
发明人： Dan Wack , Ady Levy , Kyle A. Brown , Gary Bultman , Mehrdad Nikoonahad , John Fielden
IPC分类号： G01N21/88
CPC分类号： G03F7/70708 , G01N21/211 , G01N21/47 , G01N21/636 , G01N21/64 , G01N21/9501 , G01N2021/646 , G01N2021/8825 , G03F7/70616 , G03F7/70625 , G03F7/70633 , G03F7/7065 , G03F7/70658 , G03F7/707 , H01J2237/31701 , H01L22/12 , H01L2924/0002 , H01L2924/00
摘要： Methods and systems for monitoring semiconductor fabrication processes are provided. A system may include a stage configured to support a specimen and coupled to a measurement device. The measurement device may include an illumination system and a detection system. The illumination system and the detection system may be configured such that the system may be configured to determine multiple properties of the specimen. For example, the system may be configured to determine multiple properties of a specimen including, but not limited to, an adhesion characteristic and a thickness. In this manner, a measurement device may perform multiple optical and/or non-optical metrology and/or inspection techniques.

17. 发明授权

US06885190B2 In-situ metalization monitoring using eddy current measurements during the process for removing the film 有权
标题翻译：在去除薄膜的过程中使用涡流测量进行原位金属化监测
公开(公告)号：US06885190B2
公开(公告)日：2005-04-26
申请号：US10623953
申请日：2003-07-21
申请人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
发明人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
IPC分类号： G01N27/72 , G01R33/12
CPC分类号： G01N27/72
摘要： A method for measuring conductance of a sample using an eddy current probe with a sensing coil. The method includes N repetitions of measuring first and second voltage pairs including in-phase and quadrature components of an induced AC voltage in the sensing coil, calibrating the first signal based on the measured second signal at a different separation from the sample and reference material, determining a conductance function relating conductance with location along the selected curve, processing the calibrated first voltage pairs to generate a lift-off curve, determining an intersection voltage pair representing intersection of the lift-off curve with a selected curve, and determining the conductance of the sample from the intersection voltage pair and the conductance function.
摘要翻译：使用具有感测线圈的涡流探头测量样品的电导率的方法。该方法包括测量包括感测线圈中的感应AC电压的同相和正交分量的第一和第二电压对的N次重复，基于在与样本和参考材料不同的分离处测量的第二信号来校准第一信号，确定与所选择的曲线相关的电导与位置的电导函数，处理校准的第一电压对以产生剥离曲线，确定表示取出曲线与选定曲线的交点的交叉电压对，以及确定来自交点电压对的样本和电导函数。

18. 发明授权

US06621264B1 In-situ metalization monitoring using eddy current measurements during the process for removing the film 有权
标题翻译：在去除薄膜的过程中使用涡流测量进行原位金属化监测
公开(公告)号：US06621264B1
公开(公告)日：2003-09-16
申请号：US10166585
申请日：2002-06-05
申请人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
发明人： Kurt R. Lehman , Shing M. Lee , Walter Halmer Johnson, III , John Fielden
IPC分类号： G01B706
CPC分类号： G01N27/72
摘要： A method for measuring conductance of a sample using an eddy current probe with a sensing coil. The method includes N repetitions of measuring first and second voltage pairs including in-phase and quadrature components of an induced AC voltage in the sensing coil, calibrating the first signal based on the measured second signal at a different separation from the sample and reference material, determining a conductance function relating conductance with location along the selected curve, processing the calibrated first voltage pairs to generate a lift-off curve, determining an intersection voltage pair representing intersection of the lift-off curve with a selected curve, and determining the conductance of the sample from the intersection voltage pair and the conductance function.
摘要翻译：使用具有感测线圈的涡流探头测量样品的电导率的方法。该方法包括测量包括感测线圈中的感应AC电压的同相和正交分量的第一和第二电压对的N次重复，基于在与样本和参考材料不同的分离处测量的第二信号来校准第一信号，确定与所选择的曲线相关的电导与位置的电导函数，处理校准的第一电压对以产生剥离曲线，确定表示取出曲线与选定曲线的交点的交叉电压对，以及确定来自交点电压对的样本和电导函数。

19. 发明授权

US09080991B2 Illuminating a specimen for metrology or inspection 有权
标题翻译：照亮样本进行计量或检查
公开(公告)号：US09080991B2
公开(公告)日：2015-07-14
申请号：US13073986
申请日：2011-03-28
申请人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu , John Fielden
发明人： Yung-Ho (Alex) Chuang , Vladimir Levinski , Xuefeng Liu , John Fielden
IPC分类号： G01N21/00 , G01N21/95 , G01N21/47
CPC分类号： G01N21/9501 , G01N2021/479
摘要： Illumination subsystems of a metrology or inspection system, metrology systems, inspection systems, and methods for illuminating a specimen for metrology measurements or for inspection are provided. One illumination subsystem includes a light source configured to generate coherent pulses of light and a dispersive element positioned in the path of the coherent pulses of light, which is configured to reduce coherence of the pulses of light by mixing spatial and temporal characteristics of light distribution in the pulses of light. The illumination subsystem also includes an electro-optic modulator positioned in the path of the pulses of light exiting the dispersive element and which is configured to reduce the coherence of the pulses of light by temporally modulating the light distribution in the pulses of light. The illumination subsystem is configured to direct the pulses of light from the electro-optic modulator to a specimen.
摘要翻译：提供了计量或检查系统的照明子系统，计量系统，检查系统和用于计量测量或检查的照明样本的方法。一个照明子系统包括被配置为产生相干的光脉冲的光源和位于相干脉冲光的路径中的色散元件，该色散元件被配置为通过将光分布的空间和时间特征混合在一起来减小光脉冲的相干性光的脉冲。照明子系统还包括位于离开色散元件的光的脉冲的路径中的电光调制器，其被配置为通过暂时调制光脉冲中的光分布来减小光脉冲的相干性。照明子系统被配置为将来自电光调制器的光脉冲引导到样本。

20. 发明申请

US20120281275A1 Systems and Methods for Determining One or More Characteristics of a Specimen Using Radiation in the Terahertz Range 审中-公开
标题翻译：用于确定在太赫兹范围内使用辐射的样品的一个或多个特性的系统和方法
公开(公告)号：US20120281275A1
公开(公告)日：2012-11-08
申请号：US13552642
申请日：2012-07-19
申请人： Ady Levy , Samuel Ngai , Christopher F. Bevis , Stefano Concina , John Fielden , Walter Mieher , Dieter Mueller , Neil Richardson , Dan Wack , Larry Wagner
发明人： Ady Levy , Samuel Ngai , Christopher F. Bevis , Stefano Concina , John Fielden , Walter Mieher , Dieter Mueller , Neil Richardson , Dan Wack , Larry Wagner
IPC分类号： G06K7/10 , B05C11/00 , B05C9/00 , B05C11/02 , B05C5/02 , C23C16/44
CPC分类号： G01N21/9505 , G01N21/3581 , H01L22/12
摘要： Systems and methods for determining one or more characteristics of a specimen using radiation in the terahertz range are provided. One system includes an illumination subsystem configured to illuminate the specimen with radiation. The system also includes a detection subsystem configured to detect radiation propagating from the specimen in response to illumination of the specimen and to generate output responsive to the detected radiation. The detected radiation includes radiation in the terahertz range. In addition, the system includes a processor configured to determine the one or more characteristics of the specimen using the output.
摘要翻译：提供了使用太赫兹范围内的辐射来确定样本的一个或多个特征的系统和方法。一个系统包括被配置为用辐射照射样本的照明子系统。该系统还包括检测子系统，该检测子系统被配置为响应于样本的照射来检测从样本传播的辐射，并响应于检测到的辐射产生输出。检测到的辐射包括太赫兹范围内的辐射。另外，该系统包括配置成使用该输出来确定样本的一个或多个特性的处理器。

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