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11. 发明授权

US5220454A Cata-dioptric reduction projection optical system 失效
标题翻译： Cata屈光减光投影光学系统
公开(公告)号：US5220454A
公开(公告)日：1993-06-15
申请号：US950765
申请日：1992-09-24
申请人： Yutaka Ichihara , Hideo Mizutani , Sumio Hashimoto , Yutaka Suenaga
发明人： Yutaka Ichihara , Hideo Mizutani , Sumio Hashimoto , Yutaka Suenaga
IPC分类号： G02B17/08 , G02B27/00 , G02B27/28 , G03F7/20
CPC分类号： G02B17/0892 , G02B17/08 , G02B27/283 , G03F7/70225 , G02B27/0018
摘要： In a cata-dioptric optical system having a combination of a reflection system and a refraction system for reduction-projecting an object on a first plane onto a second plane, a polarization beam splitter and a quarter wavelength plate are provided to split the incident light and the reflected light. The light beam directed to the polarization beam splitter is converted to a substantially collimated light beam by a first group of lenses. A second group of lenses are arranged between the polarization beam splitter and a concave reflection mirror to diverge the light beam. The light reflected by the concave reflection mirror is directed back to the polarization beam splitter with a substantially collimated state by the second group of lenses. The light beam from the second group of lenses transmitted through the polarization beam splitter is focused by a third group of lenses having a positive refraction power to form a reduced image.
摘要翻译：在具有用于将第一平面上的物体还原投影到第二平面上的反射系统和折射系统的组合的数位屈光光学系统中，设置偏振分束器和四分之一波长板以分离入射光，反射光。被引导到偏振分束器的光束被第一组透镜转换成基本准直的光束。第二组透镜被布置在偏振分束器和凹面反射镜之间以使光束发散。由第二组透镜将由凹面反射镜反射的光引导回基本准直状态的偏振分束器。通过偏振分束器透射的第二组透镜的光束被具有正折射光焦度的第三组透镜聚焦以形成缩小图像。

12. 发明授权

US4253752A Focus condition detecting device 失效
标题翻译：聚焦条件检测装置
公开(公告)号：US4253752A
公开(公告)日：1981-03-03
申请号：US79087
申请日：1979-09-26
申请人： Yutaka Ichihara
发明人： Yutaka Ichihara
IPC分类号： G03B13/36 , G02B7/34 , G03B3/10 , G01C3/08 , G01J1/20
CPC分类号： G02B7/34
摘要： A focus condition detecting device comprises an image forming optical system for forming a light image of an object on a fixed focal plane, an element for separating a pair of light beams from the light beam from the object, a first and a second photoelectric converting element array disposed in the pair of light beams, a first function generator for generating a first function output and a second function output, a first multiplier for putting out the sum of an output resulting from multiplying the first photoelectrical output of the first photoelectric converting element array by the first function output and an output of the second photoelectric converting element array by the second function output, a first integrator for integrating the output of the first multiplier, a second function generator for generating an output equivalent to an output resulting from differentiating one of the first photoelectrical output and the first function output, a second multiplier for multiplying the other of the first photoelectrical output and the first function output by the output of the second function generator, a second integrator for integrating the output of the second multiplier, and a divider for dividing the output of the first integrator by the output of the second integrator.
摘要翻译：聚焦条件检测装置包括用于在固定焦平面上形成物体的光图像的成像光学系统，用于将来自所述物体的光束分离的一对光束的元件，第一和第二光电转换元件设置在所述一对光束中的第一光电转换元件阵列，用于产生第一功能输出和第二功能输出的第一函数发生器，用于输出由第一光电转换元件阵列的第一光电输出相乘得到的输出的和的第一乘法器通过第一功能输出和通过第二功能输出的第二光电转换元件阵列的输出，第一积分器，用于对第一乘法器的输出进行积分;第二函数发生器，用于产生等效于由微分器第一光电输出和第一功能输出，用于乘以t的第二乘法器他的第一光电输出中的另一个和由第二函数发生器的输出输出的第一函数，用于对第二乘法器的输出进行积分的第二积分器和用于将第一积分器的输出除以第二积分器的输出的第二积分器集成商

13. 发明申请

US20110273543A1 IMAGE PROCESSING APPARATUS, IMAGE PROCESSING METHOD, RECORDING METHOD, AND RECORDING MEDIUM 有权
标题翻译：图像处理装置，图像处理方法，记录方法和记录介质
公开(公告)号：US20110273543A1
公开(公告)日：2011-11-10
申请号：US13187497
申请日：2011-07-20
申请人： Yoshijiro USHIO , Yutaka Ichihara
发明人： Yoshijiro USHIO , Yutaka Ichihara
IPC分类号： H04N13/04
CPC分类号： H04N13/398 , G02B27/0172 , G02B27/22 , G02B2027/0134 , G02B2027/014 , G02B2027/0178 , H04N13/122 , H04N13/128 , H04N13/261 , H04N13/305 , H04N13/31 , H04N13/383
摘要： Provided is an image processing apparatus that stereoscopically displays a two-dimensional image, comprising a generating section that generates a left-side image and a right-side image by shifting the two-dimensional image left and right in a display region; a right-edge processing section that attaches a right-edge image, which is displayed within a prescribed range from a right edge of the display region, to a right side of the left-side image; a left-edge processing section that attaches a left-edge image, which is displayed within a prescribed range from a left edge of the display region, to a left side of the right-side image; and an output section that outputs the left-side image with the right-edge image attached thereto to a left eye of a user and outputs the right-side image with the left-edge image attached thereto to a right eye of the user.
摘要翻译：提供一种立体显示二维图像的图像处理装置，包括通过在显示区域中左右移动二维图像来生成左侧图像和右侧图像的生成部分; 右边缘处理部，将从显示区域的右边缘的规定范围内显示的右边缘图像附加到左侧图像的右侧; 左边缘处理部，将从显示区域的左边缘的规定范围内显示的左边缘图像附加到右侧图像的左侧; 输出部分，其将附着有右边图像的左侧图像输出到用户的左眼，并将附着有左侧图像的右侧图像输出到用户的右眼。

14. 发明授权

US07868997B2 Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method 有权
标题翻译：投影光学系统检查方法和检查装置，以及投影光学系统制造方法
公开(公告)号：US07868997B2
公开(公告)日：2011-01-11
申请号：US11335461
申请日：2006-01-20
申请人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
发明人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G01M11/0271 , G01M11/0214 , G01M11/0257 , G03F7/70341 , G03F7/706
摘要： In the inspection apparatus of this projection optical system, a folding glass member, comprising a flat surface part and a reflecting spherical surface part opposing to the flat surface part, is disposed on the image plane side of the projection optical system so that the flat surface part opposes to the projection optical system. Further, in a state wherein a liquid is supplied between the projection optical system and the folding glass member, a measuring beam emitted from an interferometer unit enters the projection optical system; the measuring beam that transmitted through the projection optical system and the liquid, and entered the folding glass member is reflected by the reflecting spherical surface part, and once again passes through the liquid and the projection optical system; and the interference fringes obtained from the measuring beam and the reference beam generated within the interferometer unit are detected.
摘要翻译：在该投影光学系统的检查装置中，在投影光学系统的像面侧设置有包括平面部和与该平面部相对的反射球面部的折叠玻璃部件，部分反对投影光学系统。此外，在投影光学系统和折叠玻璃构件之间供应液体的状态下，从干涉仪单元发射的测量光束进入投影光学系统; 穿过投影光学系统和液体并进入折叠玻璃构件的测量光被反射球面部反射，再次通过液体和投影光学系统; 并且检测从测量光束获得的干涉条纹和在干涉仪单元内产生的参考光束。

15. 发明申请

US20060176457A1 Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method 有权
标题翻译：投影光学系统检查方法和检查装置，以及投影光学系统制造方法
公开(公告)号：US20060176457A1
公开(公告)日：2006-08-10
申请号：US11335461
申请日：2006-01-20
申请人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
发明人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
IPC分类号： G03B27/42
CPC分类号： G01M11/0271 , G01M11/0214 , G01M11/0257 , G03F7/70341 , G03F7/706
摘要： In the inspection apparatus of this projection optical system, a folding glass member, comprising a flat surface part and a reflecting spherical surface part opposing to the flat surface part, is disposed on the image plane side of the projection optical system so that the flat surface part opposes to the projection optical system. Further, in a state wherein a liquid is supplied between the projection optical system and the folding glass member, a measuring beam emitted from an interferometer unit enters the projection optical system; the measuring beam that transmitted through the projection optical system and the liquid, and entered the folding glass member is reflected by the reflecting spherical surface part, and once again passes through the liquid and the projection optical system; and the interference fringes obtained from the measuring beam and the reference beam generated within the interferometer unit are detected.
摘要翻译：在该投影光学系统的检查装置中，在投影光学系统的像面侧设置有包括平面部和与该平面部相对的反射球面部的折叠玻璃部件，部分反对投影光学系统。此外，在投影光学系统和折叠玻璃构件之间供应液体的状态下，从干涉仪单元发射的测量光束进入投影光学系统; 穿过投影光学系统和液体并进入折叠玻璃构件的测量光被反射球面部反射，再次通过液体和投影光学系统; 并且检测从测量光束获得的干涉条纹和在干涉仪单元内产生的参考光束。

16. 发明授权

US06963408B2 Method and apparatus for point diffraction interferometry 失效
$Method and apparatus for point diffraction interferometry$
标题翻译：点衍射干涉法的方法和装置
公开(公告)号：US06963408B2
公开(公告)日：2005-11-08
申请号：US10802840
申请日：2004-03-18
申请人： Mikihiko Ishii , Hisashi Shiozawa , Jun Kawakami , Yasushi Fukutomi , Yutaka Ichihara
发明人： Mikihiko Ishii , Hisashi Shiozawa , Jun Kawakami , Yasushi Fukutomi , Yutaka Ichihara
IPC分类号： G01B9/02 , G01J9/02
CPC分类号： G01M11/0271 , G01B9/02024 , G01B9/02038 , G01B9/02065 , G01B2290/70 , G01J9/02
摘要： A point diffraction interference measuring method comprises forming a substantially ideal spherical wave by using a point light source-generating unit 101, 102, allowing a light flux composed of the spherical wave to pass through a test sample 109, thereafter dividing the light flux into two light fluxes by using an optical path-dividing element 105, allowing one light flux of the divided light fluxes to pass through a pinhole 129 to covert the one light flux into a reference light beam which is a substantially ideal spherical wave, and detecting interference fringes generated by causing interference between the reference light beam and a measuring light beam which is the other light flux of the divided light fluxes. The wavefront aberration of the test sample can be measured by observing the interference fringes without being affected by the disturbance which would be otherwise caused by any system vibration or the like.
摘要翻译：点衍射干涉测量方法包括通过使用点光源产生单元101,102形成基本上理想的球面波，允许由球面波组成的光通量通过测试样品109，之后将光通量分成两部分通过使用光路分割元件105的光通量，允许分割的光束的一个光束通过针孔129，以将一个光束转换成基本上理想的球面波的参考光束，并且检测干涉条纹通过引起参考光束和作为分割光束的另一光束的测量光束之间的干涉而产生。可以通过观察干涉条纹来测量测试样品的波前像差，而不受由任何系统振动等引起的干扰的影响。

17. 发明授权

US06195213B1 Projection exposure apparatus and method 有权
标题翻译：投影曝光装置及方法
公开(公告)号：US06195213B1
公开(公告)日：2001-02-27
申请号：US09328198
申请日：1999-06-08
申请人： Yasuhiro Omura , Tetsuo Takahashi , Masatoshi Ikeda , Shiwen Li , Yutaka Ichihara
发明人： Yasuhiro Omura , Tetsuo Takahashi , Masatoshi Ikeda , Shiwen Li , Yutaka Ichihara
IPC分类号： G02B1700
CPC分类号： G02B17/0892 , G02B13/143 , G02B17/08 , G03F7/70225 , G03F7/70275 , G03F7/70808 , G03F7/70825 , G03F7/70833
摘要： The present invention relates to a projection exposure apparatus (10) for and method of imaging a reticle (R) having patterned surface onto a substrate (W) in photolithographic processes for manufacturing a variety of devices. The invention further relates to an optical system (C) having a folding member (M1) suited to the projection exposure apparatus, and a method for manufacturing the optical system. The projection exposure apparatus comprises an illumination optical system (IS) and a reticle stage (RS) capable of holding the reticle so the normal line to its patterned surface is in the direction of gravity. The apparatus also includes a substrate stage (WS) capable of holding the substrate with its surface normal parallel to the direction of gravity. The optical system includes a first imaging optical system (A) comprising a concave reflecting mirror and a dioptric optical member arranged along a first optical axis. The first imaging optical system (A) forms an intermediate image of the patterned surface. The optical system also includes a second imaging optical system (B) having a second optical axis, and forms a reduced image of the intermediate image on the substrate. The first folding member is arranged in the optical path from the first imaging optical system to the second imaging optical system. The first and second imaging optical systems and the first and second folding members are positioned so that a reduced image of the pattered surface is formed parallel to the pattern surface of the reticle, and the first and second optical axes are positioned so that they are substantially parallel to the direction of gravity.
摘要翻译：本发明涉及一种投影曝光装置（10），该投影曝光装置（10）用于在具有用于制造各种装置的光刻工艺中将具有图案化表面的掩模版（R）成像到基板（W）上。本发明还涉及一种具有适合于投影曝光装置的折叠构件（M1）的光学系统（C），以及用于制造光学系统的方法。投影曝光装置包括能够保持标线的照明光学系统（IS）和光罩台（RS），使得其图案化表面的法线在重力方向上。该装置还包括能够将其表面保持平行于重力方向的基板的基底台（WS）。光学系统包括第一成像光学系统（A），其包括沿第一光轴布置的凹面反射镜和屈光光学构件。第一成像光学系统（A）形成图案化表面的中间图像。光学系统还包括具有第二光轴的第二成像光学系统（B），并且在基板上形成中间图像的缩小图像。第一折叠构件布置在从第一成像光学系统到第二成像光学系统的光路中。第一和第二成像光学系统以及第一和第二折叠构件被定位成使得图案化表面的缩小图像平行于标线板的图案表面形成，并且第一和第二光轴被定位成使得它们基本上平行于重力方向。

18. 再颁专利

USRE36740E Cata-dioptric reduction projection optical system 失效
标题翻译： Cata屈光减光投影光学系统
公开(公告)号：USRE36740E
公开(公告)日：2000-06-20
申请号：US490700
申请日：1995-06-14
申请人： Yutaka Ichihara , Hideo Mizutani , Sumio Hashimoto , Yutaka Suenaga
发明人： Yutaka Ichihara , Hideo Mizutani , Sumio Hashimoto , Yutaka Suenaga
IPC分类号： G02B17/08 , G02B27/00 , G02B27/28 , G03F7/20 , G02B5/30
CPC分类号： G02B17/08 , G02B17/0892 , G02B27/283 , G03F7/70225 , G02B27/0018
摘要： In a cata-dioptric optical system having a combination of a reflection system and a refraction system for reduction-projecting an object on a first plane onto a second plane, a polarization beam splitter and a quarter wavelength plate are provided to split the incident light and the reflected light. The light beam directed to the polarization beam splitter is converted to a substantially collimated light beam by a first group of lenses. A second group of lenses are arranged between the polarization beam splitter and a concave reflection mirror to diverge the light beam. The light reflected by the concave reflection mirror is directed back to the polarization beam splitter with a substantially collimated state by the second group of lenses. The light beam from the second group of lenses transmitted through the polarization beam splitter is focused by a third group of lenses having a positive refraction power to form a reduced image.
摘要翻译：在具有用于将第一平面上的物体还原投影到第二平面上的反射系统和折射系统的组合的数位屈光光学系统中，设置偏振分束器和四分之一波长板以分离入射光，反射光。被引导到偏振分束器的光束被第一组透镜转换成基本准直的光束。第二组透镜被布置在偏振分束器和凹面反射镜之间以使光束发散。由第二组透镜将由凹面反射镜反射的光引导回基本准直状态的偏振分束器。通过偏振分束器透射的第二组透镜的光束被具有正折射光焦度的第三组透镜聚焦以形成缩小图像。

19. 发明授权

US5528390A Exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques 失效
标题翻译：用于使用全息技术将掩模图案再现到基板的光敏表面上的曝光装置
公开(公告)号：US5528390A
公开(公告)日：1996-06-18
申请号：US461105
申请日：1995-06-05
申请人： Akihiro Goto , Takashi Genma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Toshio Matsuura , Hiroshi Shirasu , Masami Ebi
发明人： Akihiro Goto , Takashi Genma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Toshio Matsuura , Hiroshi Shirasu , Masami Ebi
IPC分类号： G03F7/20 , G03H1/00 , G03H1/04 , G03H1/20
CPC分类号： G03F7/70058 , G03H1/0005 , G03H1/0408 , G03H2001/0094 , G03H2001/0491 , G03H2260/12
摘要： An exposure apparatus for reproducing a mask pattern onto a photo-sensitive surface of a substrate using holographic techniques. The apparatus comprises support means for holding a hologram recording plate at a predetermined position both during recording operation and reconstructing operation, a first illuminating optical system for introducing a light beam from a coherent light source to a mask and irradiating a subject beam produced from the mask into the recording plate, a second illuminating optical system for irradiating the light beam from the coherent light source as a reference beam into the recording plate, a carrier apparatus for disposing during reconstructing operation a substrate at the position of the mask in place of the mask, a third illuminating optical system for irradiating a conjugate beam with the reference beam into the recording plate, in which a hologram has been formed by recording operation, to form an image of the hologram on the photo-sensitive surface of the substrate, and a controller for selectively controlling the first, second and third illuminating optical systems to put an at least selected one of them into an operative condition so as to irradiate a fixing light beam into the recording plate in order to fix the hologram.
摘要翻译：一种用于使用全息技术将掩模图案再现到基板的光敏表面上的曝光装置。该装置包括用于在记录操作和重建操作期间将全息图记录板保持在预定位置的支撑装置，用于将来自相干光源的光束引入到掩模并照射由掩模产生的被摄体光束的第一照明光学系统将用于将来自相干光源的光束作为参考光束照射到记录板中的第二照明光学系统，用于在重建操作期间在掩模的位置处置换基板以代替掩模的载体设备第三照明光学系统，用于将具有参考光束的共轭光束照射到通过记录操作形成全息图的记录板中，以在基板的光敏表面上形成全息图像，并且控制器，用于选择性地控制第一，第二和第三照明光学系统，其中最少选择的一个进入操作状态，以便将固定光束照射到记录板中以固定全息图。

20. 发明授权

US5071240A Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image 失效
标题翻译：使用球面反射器反射光学成像设备并产生中间图像
公开(公告)号：US5071240A
公开(公告)日：1991-12-10
申请号：US578787
申请日：1990-09-07
申请人： Yutaka Ichihara , Akira Higuchi
发明人： Yutaka Ichihara , Akira Higuchi
IPC分类号： G02B17/06 , G03F7/20
CPC分类号： G03F7/70233 , G02B17/0657 , G02B17/0663 , G03F7/70275
摘要： A reflecting imaging optical apparatus comprises a reflecting spherical optical system including a first spherical reflecting optical system and a second spherical reflecting optical system, and a spherical reflecting mirror disposed near the position of an intermediate image formed by the reflecting spherical optical system. The first and second spherical reflecting optical systems form concentric optical systems, respectively.
摘要翻译：反射成像光学装置包括：反射球面光学系统，包括第一球面反射光学系统和第二球面反射光学系统;以及球面反射镜，设置在由反射球面光学系统形成的中间图像的位置附近。第一和第二球面反射光学系统分别形成同心光学系统。

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