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1. 发明申请

US20070076181A1 Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method 有权
标题翻译：投影光学系统检查方法和检查装置，以及投影光学系统制造方法
公开(公告)号：US20070076181A1
公开(公告)日：2007-04-05
申请号：US11606909
申请日：2006-12-01
申请人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
发明人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
IPC分类号： G03B27/42
CPC分类号： G01M11/0271 , G01M11/0214 , G01M11/0257 , G03F7/70341 , G03F7/706
摘要： In the inspection apparatus of this projection optical system, a folding glass member, comprising a flat surface part and a reflecting spherical surface part opposing to the flat surface part, is disposed on the image plane side of the projection optical system so that the flat surface part opposes to the projection optical system. Further, in a state wherein a liquid is supplied between the projection optical system and the folding glass member, a measuring beam emitted from an interferometer unit enters the projection optical system; the measuring beam that transmitted through the projection optical system and the liquid, and entered the folding glass member is reflected by the reflecting spherical surface part, and once again passes through the liquid and the projection optical system; and the interference fringes obtained from the measuring beam and the reference beam generated within the interferometer unit are detected.
摘要翻译：在该投影光学系统的检查装置中，在投影光学系统的像面侧设置有包括平面部和与该平面部相对的反射球面部的折叠玻璃部件，部分反对投影光学系统。此外，在投影光学系统和折叠玻璃构件之间供应液体的状态下，从干涉仪单元发射的测量光束进入投影光学系统; 穿过投影光学系统和液体并进入折叠玻璃构件的测量光被反射球面部反射，再次通过液体和投影光学系统; 并且检测从测量光束获得的干涉条纹和在干涉仪单元内产生的参考光束。

2. 发明授权

US07843550B2 Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method 有权
标题翻译：投影光学系统检查方法和检查装置，以及投影光学系统制造方法
公开(公告)号：US07843550B2
公开(公告)日：2010-11-30
申请号：US11606909
申请日：2006-12-01
申请人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
发明人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
IPC分类号： G03B27/42 , G03B27/52
CPC分类号： G01M11/0271 , G01M11/0214 , G01M11/0257 , G03F7/70341 , G03F7/706
摘要： In the inspection apparatus of this projection optical system, a folding glass member, comprising a flat surface part and a reflecting spherical surface part opposing to the flat surface part, is disposed on the image plane side of the projection optical system so that the flat surface part opposes to the projection optical system. Further, in a state wherein a liquid is supplied between the projection optical system and the folding glass member, a measuring beam emitted from an interferometer unit enters the projection optical system; the measuring beam that transmitted through the projection optical system and the liquid, and entered the folding glass member is reflected by the reflecting spherical surface part, and once again passes through the liquid and the projection optical system; and the interference fringes obtained from the measuring beam and the reference beam generated within the interferometer unit are detected.
摘要翻译：在该投影光学系统的检查装置中，在投影光学系统的像面侧设置有包括平面部和与该平面部相对的反射球面部的折叠玻璃部件，部分反对投影光学系统。此外，在投影光学系统和折叠玻璃构件之间供应液体的状态下，从干涉仪单元发射的测量光束进入投影光学系统; 穿过投影光学系统和液体并进入折叠玻璃构件的测量光被反射球面部反射，再次通过液体和投影光学系统; 并且检测从测量光束获得的干涉条纹和在干涉仪单元内产生的参考光束。

3. 发明授权

US07868997B2 Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method 有权
标题翻译：投影光学系统检查方法和检查装置，以及投影光学系统制造方法
公开(公告)号：US07868997B2
公开(公告)日：2011-01-11
申请号：US11335461
申请日：2006-01-20
申请人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
发明人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
IPC分类号： G03B27/42 , G03B27/54
CPC分类号： G01M11/0271 , G01M11/0214 , G01M11/0257 , G03F7/70341 , G03F7/706
摘要： In the inspection apparatus of this projection optical system, a folding glass member, comprising a flat surface part and a reflecting spherical surface part opposing to the flat surface part, is disposed on the image plane side of the projection optical system so that the flat surface part opposes to the projection optical system. Further, in a state wherein a liquid is supplied between the projection optical system and the folding glass member, a measuring beam emitted from an interferometer unit enters the projection optical system; the measuring beam that transmitted through the projection optical system and the liquid, and entered the folding glass member is reflected by the reflecting spherical surface part, and once again passes through the liquid and the projection optical system; and the interference fringes obtained from the measuring beam and the reference beam generated within the interferometer unit are detected.
摘要翻译：在该投影光学系统的检查装置中，在投影光学系统的像面侧设置有包括平面部和与该平面部相对的反射球面部的折叠玻璃部件，部分反对投影光学系统。此外，在投影光学系统和折叠玻璃构件之间供应液体的状态下，从干涉仪单元发射的测量光束进入投影光学系统; 穿过投影光学系统和液体并进入折叠玻璃构件的测量光被反射球面部反射，再次通过液体和投影光学系统; 并且检测从测量光束获得的干涉条纹和在干涉仪单元内产生的参考光束。

4. 发明申请

US20060176457A1 Projection optical system inspecting method and inspection apparatus, and a projection optical system manufacturing method 有权
标题翻译：投影光学系统检查方法和检查装置，以及投影光学系统制造方法
公开(公告)号：US20060176457A1
公开(公告)日：2006-08-10
申请号：US11335461
申请日：2006-01-20
申请人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
发明人： Mikihiko Ishii , Yutaka Ichihara , Takashi Gemma
IPC分类号： G03B27/42
CPC分类号： G01M11/0271 , G01M11/0214 , G01M11/0257 , G03F7/70341 , G03F7/706
摘要： In the inspection apparatus of this projection optical system, a folding glass member, comprising a flat surface part and a reflecting spherical surface part opposing to the flat surface part, is disposed on the image plane side of the projection optical system so that the flat surface part opposes to the projection optical system. Further, in a state wherein a liquid is supplied between the projection optical system and the folding glass member, a measuring beam emitted from an interferometer unit enters the projection optical system; the measuring beam that transmitted through the projection optical system and the liquid, and entered the folding glass member is reflected by the reflecting spherical surface part, and once again passes through the liquid and the projection optical system; and the interference fringes obtained from the measuring beam and the reference beam generated within the interferometer unit are detected.
摘要翻译：在该投影光学系统的检查装置中，在投影光学系统的像面侧设置有包括平面部和与该平面部相对的反射球面部的折叠玻璃部件，部分反对投影光学系统。此外，在投影光学系统和折叠玻璃构件之间供应液体的状态下，从干涉仪单元发射的测量光束进入投影光学系统; 穿过投影光学系统和液体并进入折叠玻璃构件的测量光被反射球面部反射，再次通过液体和投影光学系统; 并且检测从测量光束获得的干涉条纹和在干涉仪单元内产生的参考光束。

5. 发明授权

US6008904A Apparatus and methods for detecting and correcting distortion of interference fringes 失效
标题翻译：用于检测和校正干涉条纹失真的装置和方法
公开(公告)号：US6008904A
公开(公告)日：1999-12-28
申请号：US932232
申请日：1997-09-17
申请人： Mikihiko Ishii , Takashi Gemma , Katsuya Miyoshi
发明人： Mikihiko Ishii , Takashi Gemma , Katsuya Miyoshi
IPC分类号： G01B9/02 , G01B11/24 , G01B11/255 , G01M11/00 , G01M11/02 , G03F7/20
CPC分类号： G01M11/0271 , G01B11/255 , G01M11/005 , G01M11/0242 , G03F7/706
摘要： Wavefront aberration-measuring apparatus are disclosed that can easily and accurately correct interference-fringe distortions arising from aberrations of an optical system in an interferometer and that can reduce wavefront aberration-measurement errors arising from such distortion. The apparatus comprise an interferometer that forms an interference fringe from a synthesis of a wavefront of light reflecting from a reference surface and a wavefront of light from a test object (such as a reflective surface or lens). The apparatus also comprises an image-pickup element for detecting the interference fringe, and an arithmetical calculator that calculates the wavefront aberration between the test object and the reference surface based on an output from the image-pickup element. Between the test object and the image-pickup element is an optical system (e.g., converging lens) that transmits a wavefront that is perpendicularly incident to a surface of the test object. An interference-fringe distortion corrector corrects the interference-fringe distortion based on a distortion aberration calculated in advance.
摘要翻译：公开了一种波前像差测量装置，其可以容易且准确地校正由干涉仪中的光学系统的像差引起的干涉条纹失真，并且可以减少由这种失真引起的波前像差测量误差。该装置包括干涉仪，该干涉仪从反射从参考表面的光的波前合成和来自测试对象（例如反射表面或透镜）的光的波前的合成形成干涉条纹。该装置还包括用于检测干涉条纹的图像拾取元件和算术计算器，该算术计算器基于来自图像拾取元件的输出来计算测试对象和参考表面之间的波前像差。在测试对象和图像拾取元件之间是透射垂直入射到测试对象表面的波前的光学系统（例如会聚透镜）。干涉条纹失真校正器基于预先计算的失真像差校正干涉条纹失真。

6. 发明授权

US5563706A Interferometric surface profiler with an alignment optical member 失效
标题翻译：具有对准光学构件的干涉表面轮廓仪
公开(公告)号：US5563706A
公开(公告)日：1996-10-08
申请号：US292956
申请日：1994-08-22
申请人： Masato Shibuya , Yutaka Ichihara , Takashi Gemma , Shuji Toyonaga , Keiji Inada
发明人： Masato Shibuya , Yutaka Ichihara , Takashi Gemma , Shuji Toyonaga , Keiji Inada
IPC分类号： G01B9/02
CPC分类号： G01B9/02061 , G01B9/02039 , G01B9/02042 , G01B9/02057 , G01B9/02072 , G01B2290/70
摘要： In an interferometer, reflected light from a reference surface and a subject surface are introduced to an imaging optical system through a beam splitter, and an interference fringe formed from light reflected from the both surfaces is observed with a detection optical system. An alignment optical member is disposed in an optical path between the imaging optical system and an image plane of the interference fringe such that the rear focal point of the alignment optical member is located at the image plane. The alignment optical member is inserted in the optical path in aligning the subject surface and is removed in measuring the interference fringe. Accurate alignment of the subject surface is easily attained. A beam expander is interposed between a polarizing beam splitter and the subject surface and a 90.degree. retarder is interposed between the beam expander and the subject surface. The 90.degree. retarder is constructed of one or a plurality of reflecting mirrors formed of dielectric multilayer films. Noise introduced to the imaging optical system is minimized.
摘要翻译：在干涉仪中，通过分束器将来自参考面和被摄体表面的反射光引入成像光学系统，并且用检测光学系统观察由从两个表面反射的光形成的干涉条纹。对准光学构件设置在成像光学系统和干涉条纹的像平面之间的光路中，使得对准光学构件的后焦点位于像平面。对准光学构件在对准该物体表面的光路中被插入，并且在测量干涉条纹时被移除。容易实现对象表面的准确对准。光束扩展器插入在偏振分束器和被摄体表面之间，并且90度延迟器插入在光束扩展器和被摄体表面之间。 90度缓凝剂由由电介质多层膜形成的一个或多个反射镜构成。引入到成像光学系统的噪声被最小化。

7. 发明授权

US5504596A Exposure method and apparatus using holographic techniques 失效
标题翻译：使用全息技术的曝光方法和装置
公开(公告)号：US5504596A
公开(公告)日：1996-04-02
申请号：US169055
申请日：1993-12-20
申请人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
发明人： Akihiro Goto , Takashi Gemma , Yutaka Ichihara , Nobutaka Magome , Naomasa Shiraishi , Hiroshi Shirasu , Toshio Matsuura
IPC分类号： G03F7/20 , G03H1/00 , G03H1/26
CPC分类号： G03F7/70558 , G03F7/70625 , G03H1/00
摘要： An exposure apparatus is used for reproducing a mask pattern of a semiconductor device or the like onto a photosensitive substrate using a holography. The holography is utilized also in a process for alignment between a mask pattern hologram and an exposure region of the substrate. The pattern hologram is recorded to a recording medium by interference between an object wave from the pattern and a reference wave, and a second hologram is formed to the medium by diffraction light from an alignment mark formed on the mask. Prior to reconstruction of the pattern image, reconstruction light from the second hologram, illuminated with a reconstruction wave, is irradiated onto the substrate arranged in place of the mask. A reproduction image of the alignment mark on the substrate surface illuminated with the reconstruction light is measured, and relative displacement between the medium and the substrate is detected from a result of the measurement. The relative positional relationship between the medium and the substrate is corrected in accordance with the displacement information, and, thereafter, the surface is exposed with a reconstruction image of the pattern hologram.
摘要翻译：使用曝光装置将半导体装置等的掩模图案再现到使用全息术的感光基板上。全息术也用于掩模图案全息图和衬底的曝光区域之间的对准的过程。图案全息图通过来自图案的对象波与参考波之间的干涉而被记录到记录介质上，并且通过衍射光从形成在掩模上的对准标记的衍射光形成第二全息图。在图案图像重建之前，用重建波照射的来自第二全息图的重建光被照射到布置在掩模上的衬底上。测量用重建光照射的基板表面上的对准标记的再现图像，并且从测量结果检测介质和基板之间的相对位移。根据位移信息来校正介质和基板之间的相对位置关系，然后用图案全息图的重构图像曝光表面。

8. 发明授权

US5898501A Apparatus and methods for measuring wavefront aberrations of a microlithography projection lens 失效
标题翻译：用于测量微光刻投影透镜的波前像差的装置和方法
公开(公告)号：US5898501A
公开(公告)日：1999-04-27
申请号：US899688
申请日：1997-07-24
申请人： Jun Suzuki , Takashi Gemma , Yutaka Ichihara
发明人： Jun Suzuki , Takashi Gemma , Yutaka Ichihara
IPC分类号： G01M11/02 , G03F7/20 , G01B9/02
CPC分类号： G01M11/0271 , G03F7/706
摘要： Apparatus and methods are disclosed for measuring wavefront aberrations microlithography projection lenses such as i-line or excimer laser projection lenses. The apparatus comprises an argon-ion laser irradiating a Fizeau surface that reflects reference light and transmits test light. The test light is reflected by a spherical reflecting surface to pass twice through the test lens and the Fizeau surface, to interfere with the reference light. A piezoelectric element changes the fringes slightly. An image-pickup device receives the interference fringes and outputs data to a processor that calculates corresponding wavefront aberrations of the test lens. For testing an i-line lens, the argon laser can be a single-mode, 363.8 nm laser. For testing a lens used with a KrF excimer laser, the argon laser can emit second-harmonic light at 248.25 nm.
摘要翻译：公开了用于测量诸如i线或准分子激光投影透镜的微平面投影透镜的波前像差的装置和方法。该装置包括照射反映参考光并传送测试光的Fizeau表面的氩离子激光。测试光被球面反射表面反射通过两次穿过测试透镜和Fizeau表面，以干扰参考光。压电元件稍微改变边缘。图像拾取装置接收干涉条纹并将数据输出到计算相应的测试透镜的波前像差的处理器。为了测试i线透镜，氩激光器可以是单模，363.8nm的激光器。为了测试与KrF准分子激光器一起使用的透镜，氩激光器可以发射248.25nm的二次谐波光。

9. 发明授权

US5561525A Interferometer for observing the interference pattern of a surface under test utilizing an adjustable aperture stop 失效
标题翻译：干涉仪，用于利用可调节的孔径光阑观察受试表面的干涉图案
公开(公告)号：US5561525A
公开(公告)日：1996-10-01
申请号：US575442
申请日：1995-12-20
申请人： Shuji Toyonaga , Takashi Gemma
发明人： Shuji Toyonaga , Takashi Gemma
IPC分类号： G01B9/02 , G01B11/24 , G11B9/02
CPC分类号： G01B11/2441 , G01B9/02057 , G01B2290/70
摘要： An interferometer is used for observing the shape of a surface to be detected with the desired spatial resolution. A variable aperture stop is arranged at a Fourier transform image plane of the surface to be detected within an imaging optical system for forming an interference pattern of a reference light and a measuring light. The aperture diameter of the variable aperture stop is adjusted by a control in accordance with the desired spatial resolution.
摘要翻译：干涉仪用于以期望的空间分辨率观察待检测的表面的形状。在用于形成参考光和测量光的干涉图案的成像光学系统中，可变孔径光阑被布置在待检测表面的傅里叶变换图像平面上。通过根据期望的空间分辨率的控制来调节可变孔径光阑的孔径直径。

10. 发明授权

US4812042A Holographic interferometer 失效
标题翻译：全息干涉仪
公开(公告)号：US4812042A
公开(公告)日：1989-03-14
申请号：US96609
申请日：1987-09-11
申请人： Takashi Yokokura , Takashi Gemma , Takuji Satoh
发明人： Takashi Yokokura , Takashi Gemma , Takuji Satoh
IPC分类号： G01B9/021 , G01B11/24 , G01B9/02
CPC分类号： G01B11/2441 , G01B9/021
摘要： A holographic interferometer comprising a source of laser beams, a condenser lens for converging a laser beam supplied from said laser-beam source, a pinhole which allows the passage of said converged laser beam, a collimator lens having a focal point which lies on said pinhole, a beam splitter disposed in an inclined manner between said pinhole and said collimator lens, a spacial filter disposed on the optical axis of a light reflected from said beam splitter and at an optically conjugate position relative to said pinhole, and a hologram standard disposed between said spacial filter and said beam splitter.
摘要翻译：一种全息干涉仪，包括激光束源，用于会聚从所述激光束源提供的激光束的聚光透镜，允许所述会聚激光束通过的针孔，具有位于所述针孔上的焦点的准直透镜设置在所述针孔和所述准直透镜之间的倾斜方式的分束器，设置在从所述分束器反射并在相对于所述针孔的光学共轭位置的光轴的光轴上的空间滤光器，以及设置在所述空间滤波器和所述分束器。

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