会员体验
专利管家(专利管理)
工作空间(专利管理)
风险监控(情报监控)
数据分析(专利分析)
侵权分析(诉讼无效)
联系我们
交流群
官方交流:
QQ群: 891211   
微信请扫码    >>>
现在联系顾问~
热词
    • 11. 发明授权
    • RF coil and magnetic resonance imaging apparatus
    • RF线圈和磁共振成像装置
    • US07109713B2
    • 2006-09-19
    • US11180713
    • 2005-07-14
    • Kazuya OkamotoYoshinori HamamuraYoshio Machida
    • Kazuya OkamotoYoshinori HamamuraYoshio Machida
    • G01V3/00A61B5/055
    • G01R33/3415G01R33/3678
    • A magnetic resonance imaging apparatus acquires magnetic resonance signals by the PI method using an RF coil unit having basic coils serving as surface coils which are arrayed with at least two coils along a static magnetic field direction (z direction) and at least two coils along each of two orthogonal x, y directions. The coils are divided into an upper unit and a lower unit. The upper unit and lower unit are fixed by a band or the like to allow them to be mounted on an object to be examined. The signals detected by the respective surface coils are sent to a data processing system through independent receiver units and formed into a magnetic resonance image.
    • 磁共振成像装置使用具有作为表面线圈的基本线圈的RF线圈单元,通过PI法获取磁共振信号,该线圈单元沿着静磁场方向(z方向)排列有至少两个线圈,并且沿着每个线圈具有至少两个线圈 两个正交的x,y方向。 线圈分为上部单元和下部单元。 上部单元和下部单元通过带状物等固定,以便将它们安装在被检查物体上。 由各个表面线圈检测的信号通过独立的接收器单元被发送到数据处理系统并形成磁共振图像。
    • 13. 发明授权
    • Charged-particle-beam mapping projection-optical systems and methods for adjusting same
    • 带电粒子束映射投影光学系统及其调整方法
    • US06765217B1
    • 2004-07-20
    • US09302075
    • 1999-04-28
    • Hiroshi NishimuraNaoto KiharaKinya KatoToru TakagiAkihiro GotoJunji IkedaKazuya Okamoto
    • Hiroshi NishimuraNaoto KiharaKinya KatoToru TakagiAkihiro GotoJunji IkedaKazuya Okamoto
    • G01N2100
    • H01J37/26G01N23/225H01J37/1471H01J37/226H01J37/265H01J2237/0492H01J2237/057H01J2237/1501H01J2237/2482H01J2237/2538H01J2237/262H01J2237/2806H01J2237/2817H01J2237/282H01J2237/2823H01J2237/2826H01J2237/30438
    • Charged-particle-beam (CPB) mapping projection-optical systems and adjustment methods for such systems are disclosed that can be performed quickly and accurately. In a typical system, an irradiation beam is emitted from a source, passes through an irradiation optical system, and enters a Wien filter (“E×B”). Upon passing through the E×B, the irradiation beam passes through an objective optical system and is incident on an object surface. Such impingement generates an observation beam that returns through the objective optical system and the E×B in a different direction to a detector via an imaging optical system. An adjustment-beam source emits an adjustment beam used for adjusting and aligning the position of, e.g., the object surface and/or the Wien's condition of the E×B. The adjustment beam can be off-axis relative to the objective-optical system. For such adjusting and aligning, fiducial marks (situated, e.g., in the plane of the object surface) can be used that are optimized for the CPB optical system and the off-axis optical system. Desirably, the image formed on the detector when electrical voltage and current are not applied to the E×B is in the same position as the image formed on the detector when electrical voltage and current are applied to the E×B. Also provided are “evaluation charts” for use in such alignments that do not require adjustment of the optical axis of the irradiation optical system, and from which the kinetic-energy distribution of the emitted adjustment beam is stable.
    • 公开了可以快速且准确地执行这种系统的带电粒子束(CPB)映射投影光学系统和调整方法。 在典型的系统中,照射光束从光源发射,通过照射光学系统,并进入维恩滤光片(“ExB”)。 当通过ExB时,照射光束通过物镜光学系统并入射到物体表面上。 这种冲击产生观察光束,该观察光束经由成像光学系统通过物镜光学系统和ExB以不同的方向返回到检测器。 调整光束源发射用于调整和对准例如物体表面的位置和/或ExB的维恩状态的调节光束。 调节光束可以相对于物镜光学系统偏轴。 对于这种调整和对准,可以使用为CPB光学系统和离轴光学系统优化的基准标记(例如位于物体表面的平面中)。 理想地,当电压和电流未施加到ExB时,在检测器上形成的图像与当将电压和电流施加到ExB时形成在检测器上的图像位于相同的位置。 还提供了用于这种对准的“评估图”,其不需要调整照射光学系统的光轴,并且发射的调节光束的动能分布从该距离稳定。
    • 15. 发明授权
    • Image formation method with photosensitive material
    • 图像形成方法与感光材料
    • US06291145B1
    • 2001-09-18
    • US09038683
    • 1998-03-09
    • Tadayosi KokuboKazuya OkamotoHiroshi OokiMasato ShibuyaSoichi Owa
    • Tadayosi KokuboKazuya OkamotoHiroshi OokiMasato ShibuyaSoichi Owa
    • G03F524
    • G03F7/70466G03F7/033G03F7/038G03F7/2022
    • Image-formation methods and photosensitive materials used in such methods are disclosed that form very high-resolution patterns. The photosensitive materials comprise an ingredient that is triggered by a radical to undergo a latent-image-forming reaction. The radicals are produced by photons from an illumination light. Alternatively, the ingredient is triggered by a reactive-intermediate compound that is activated by the exposure-produced radical. The photosensitive materials possess a non-linear sensitivity characteristic in which the latent-image reaction density increases according to the mth power (m>1) of the incident light intensity. The photosensitive material can be applied to a sensitive substrate for exposure. Multiple exposures of the sensitive substrate are performed using a projected mask pattern in the presence of a radical deactivator. The multiple exposures can be performed while: (a) changing the exposure intensity distribution on the photosensitive material, or (b) shifting the projected mask pattern and the sensitive substrate relative to each other by a specified amount, or (c) using a different projected mask pattern for each exposure.
    • 公开了在这种方法中使用的图像形成方法和感光材料,其形成非常高分辨率的图案。 感光材料包括由自由基触发以进行潜像形成反应的成分。 自由基由照明光的光子产生。 或者,成分由被暴露产生的自由基活化的反应性中间体化合物触发。 感光材料具有根据入射光强度的第m次幂(m> 1)潜影反应密度增加的非线性灵敏度特性。 可以将感光材料施加到敏感基板上以进行曝光。 在存在自由基失活剂的情况下,使用投影的掩模图案来进行敏感基材的多次曝光。 可以执行多次曝光,同时:(a)改变感光材料上的曝光强度分布,或(b)将投影的掩模图案和敏感基板相对于彼此移动指定量,或(c)使用不同的 每次曝光的投影面具图案。
    • 16. 发明授权
    • High-throughput direct-write electron-beam exposure system and method
    • 高通量直写电子束曝光系统及方法
    • US5969362A
    • 1999-10-19
    • US30653
    • 1998-02-05
    • Shintaro KawataKazuya Okamoto
    • Shintaro KawataKazuya Okamoto
    • H01J37/073H01J37/305H01J37/317H01J37/30H01J37/14
    • B82Y10/00B82Y40/00H01J37/3177
    • An electron-beam exposure system includes: (1) a stage for supporting a wafer, (2) a planar electron-beam source that emits multiple electron beamlets toward the stage, (3) an electric-field generator for forming an electric field to accelerate the electrons in the electron beamlets, (4) a magnetic-field generator for forming a magnetic flux in the space between the planar electron-beam source and the wafer stage. The magnetic filed generator is structured and arranged such that the magnetic flux formed thereby is (1) substantially evenly distributed within a plane perpendicular to the optical axis, and (2) of increasing flux density, ranging from a first density in the vicinity of the planar electron-beam source, to a second density (greater than the first density) in the vicinity of the wafer stage. The electrons in the electron beamlets follow the lines of magnetic flux such that the beamlet width is decreased at the stage compared to the beamlet width at the planar electron-beam source. The electron beamlets are preferably individually switchable, on and off, by word lines and bit lines on the planar electron-beam source. To form a desired pattern on a wafer surface, the stage is moved through a small area, while the electron beamlets are modulated as needed to write the desired pattern.
    • 电子束曝光系统包括:(1)用于支撑晶片的台,(2)朝向平台发射多个电子束的平面电子束源,(3)用于形成电场的电场发生器 加速电子束中的电子,(4)用于在平面电子束源和晶片台之间的空间中形成磁通量的磁场发生器。 磁场发生器的结构和布置使得由此形成的磁通量是(1)在垂直于光轴的平面内基本上均匀分布,以及(2)增加磁通密度,范围从第 平面电子束源在晶片台附近达到第二密度(大于第一密度)。 电子束中的电子遵循磁通线,使得在与平面电子束源处的子束宽度相比较的阶段,子束宽度减小。 电子子束优选地可以通过平面电子束源上的字线和位线单独地切换,打开和关闭。 为了在晶片表面上形成期望的图案,将载物台移动通过小的区域,同时根据需要对电子束进行调制以写入期望的图案。
    • 17. 发明授权
    • Magnetic resonance imaging apparatus with temperature measurement
function
    • 具有温度测量功能的磁共振成像装置
    • US5916161A
    • 1999-06-29
    • US713430
    • 1996-09-13
    • Yasutoshi IshiharaKazuya Okamoto
    • Yasutoshi IshiharaKazuya Okamoto
    • G01R33/48A61B5/00A61B5/055
    • A61B5/015A61B5/055
    • A magnetic resonance imaging apparatus capable of measuring a temperature increase due to an application of RF magnetic fields for data acquisition purpose, and notifying an information on the measured temperature increase regularly to an operator, so as to secure the safety of a body to be examined. In this magnetic resonance imaging apparatus, the image data acquisition operation is controlled to acquire a phase information associated with a temperature change in an interior of the body to be examined, by displacing either an observation start timing or a radio frequency magnetic field application timing for a prescribed magnetic resonance signal in the magnetic resonance signal sequence from a normal timing for acquiring image data.
    • 一种磁共振成像装置,其能够测量由于应用RF磁场而导致的温度升高以用于数据采集目的,并且向操作者通知关于所测量的温度升高的信息,以确保要检查的身体的安全性 。 在该磁共振成像装置中,控制图像数据获取操作,通过将观察开始定时或射频磁场施加定时移位,来取得与被检体内部的温度变化相关的相位信息, 从用于获取图像数据的正常定时的磁共振信号序列中规定的磁共振信号。