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    • 4. 发明授权
    • Projection exposure system and method
    • 投影曝光系统和方法
    • US5847812A
    • 1998-12-08
    • US874687
    • 1997-06-13
    • Hiroshi OokiMasato ShibuyaKazuya OkamotoSoichi Owa
    • Hiroshi OokiMasato ShibuyaKazuya OkamotoSoichi Owa
    • G03F7/20G03B27/42G03B27/72
    • G03F7/70075G03F7/2022G03F7/2053G03F7/70358G03F7/70475
    • Projection exposure systems and methods are disclosed that achieve higher light intensities and reduce the time required for each exposure in multiple exposures of non-linear resists such as a two-photon-absorption resist. Using spatial redistribution of laser light, an illumination optical system forms an illumination region that illuminates only a portion of the pattern on a mask with spatially coherent light from a light source. The system forms the entire mask pattern on a substrate by repeating a non-linear exposure while moving the illumination region and the mask pattern relative to one another. To exploit temporal redistribution of laser light, an illumination optical system employs a pulsed-oscillation-type laser light source to form a mask pattern while varying the light intensity profile on a mask.
    • 公开了投射曝光系统和方法,其实现更高的光强度并减少在多次曝光非线性抗蚀剂(例如双光子吸收抗蚀剂)中每次曝光所需的时间。 使用激光的空间重新分配,照明光学系统形成照明区域,其仅使用来自光源的空间相干光照射掩模上的图案的一部分。 该系统通过在相对于彼此移动照明区域和掩模图案的同时重复非线性曝光来在基板上形成整个掩模图案。 为了利用激光的时间再分配,照明光学系统采用脉冲振荡型激光光源来形成掩模图案,同时改变掩模上的光强度分布。
    • 8. 发明授权
    • Image formation method with photosensitive material
    • 图像形成方法与感光材料
    • US06291145B1
    • 2001-09-18
    • US09038683
    • 1998-03-09
    • Tadayosi KokuboKazuya OkamotoHiroshi OokiMasato ShibuyaSoichi Owa
    • Tadayosi KokuboKazuya OkamotoHiroshi OokiMasato ShibuyaSoichi Owa
    • G03F524
    • G03F7/70466G03F7/033G03F7/038G03F7/2022
    • Image-formation methods and photosensitive materials used in such methods are disclosed that form very high-resolution patterns. The photosensitive materials comprise an ingredient that is triggered by a radical to undergo a latent-image-forming reaction. The radicals are produced by photons from an illumination light. Alternatively, the ingredient is triggered by a reactive-intermediate compound that is activated by the exposure-produced radical. The photosensitive materials possess a non-linear sensitivity characteristic in which the latent-image reaction density increases according to the mth power (m>1) of the incident light intensity. The photosensitive material can be applied to a sensitive substrate for exposure. Multiple exposures of the sensitive substrate are performed using a projected mask pattern in the presence of a radical deactivator. The multiple exposures can be performed while: (a) changing the exposure intensity distribution on the photosensitive material, or (b) shifting the projected mask pattern and the sensitive substrate relative to each other by a specified amount, or (c) using a different projected mask pattern for each exposure.
    • 公开了在这种方法中使用的图像形成方法和感光材料,其形成非常高分辨率的图案。 感光材料包括由自由基触发以进行潜像形成反应的成分。 自由基由照明光的光子产生。 或者,成分由被暴露产生的自由基活化的反应性中间体化合物触发。 感光材料具有根据入射光强度的第m次幂(m> 1)潜影反应密度增加的非线性灵敏度特性。 可以将感光材料施加到敏感基板上以进行曝光。 在存在自由基失活剂的情况下,使用投影的掩模图案来进行敏感基材的多次曝光。 可以执行多次曝光,同时:(a)改变感光材料上的曝光强度分布,或(b)将投影的掩模图案和敏感基板相对于彼此移动指定量,或(c)使用不同的 每次曝光的投影面具图案。