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    • 12. 发明授权
    • Annealable layer system
    • 可再生层系统
    • US08367226B2
    • 2013-02-05
    • US12842497
    • 2010-07-23
    • Joerg FiukowskiMatthias ListHans-Christian HechtFalk Milde
    • Joerg FiukowskiMatthias ListHans-Christian HechtFalk Milde
    • B32B15/04
    • C03C17/36C03C17/3618C03C17/3626C03C17/3644C03C17/366C03C17/3681C03C17/3694C23C14/027C23C14/08C23C14/352Y10T428/31504Y10T428/31663
    • A layer system that can be annealed comprises a transparent substrate, preferably a glass substrate, and a first layer sequence which is applied directly to the substrate or to one or more bottom layers that are deposited onto the substrate. The layer sequence includes a substrate-proximal blocking layer, a selective layer and a substrate-distal blocking layer. Also provided is a method for producing a layer system that can be annealed and has a sufficient quality even under critical climatic conditions and/or undefined conditions of the substrate. During the heat treatment (annealing, bending), the color location of the layer system is maintained substantially stable and the color location can be widely varied at a low emissivity of the layer system. For this purpose, a first dielectric intermediate layer is interposed between the substrate-proximal blocking layer and the selective layer and is configured as a substoichiometric gradient layer.
    • 可退火的层系统包括透明衬底,优选玻璃衬底,以及直接施加到衬底或沉积到衬底上的一个或多个底层的第一层序列。 层序列包括基底近端阻挡层,选择层和底物远侧阻断层。 还提供了即使在临界气候条件和/或基板的未定义条件下也可以进行退火并具有足够质量的层系统的制造方法。 在热处理(退火,弯曲)期间,层系统的颜色位置保持基本稳定,并且颜色位置可以在层系统的低发射率下广泛变化。 为此,第一电介质中间层介于基底近端阻挡层和选择层之间,并被构造为亚化学计量梯度层。
    • 13. 发明授权
    • Vacuum coating apparatus
    • 真空镀膜设备
    • US06942768B2
    • 2005-09-13
    • US10259973
    • 2002-09-27
    • Wolfgang ErbkammHans-Christian HechtMichael HofmannFalk Milde
    • Wolfgang ErbkammHans-Christian HechtMichael HofmannFalk Milde
    • C23C14/34C23C14/56C23C14/35C23C16/00
    • C23C14/564C23C14/562C23C14/568
    • A system for coating band-shaped material, where the band-shaped material travels through at least one process chamber in which there is a vacuum, and at least one cooling roller. On the peripheral surface of each cooling roller are at least two magnetron sputter sources that are arranged separate from one another in magnetron chambers, which are formed by separate magnetron chamber walls and allow each chamber to be evacuated, so the pressure in the magnetron chamber can be maintained higher than that in the process chamber. The magnetron chamber walls and the magnetron sputter sources can be mounted on a common carriage, which is displaceable parallel to the cooling roller axis. The result is the reduction in the maintenance costs in cleaning of the magnetron chamber walls and at the same time improvement of the separation of gas between the magnetron chambers and the process chamber.
    • 用于涂覆带状材料的系统,其中带状材料穿过其中存在真空的至少一个处理室,以及至少一个冷却辊。 每个冷却辊的圆周表面上至少有两个磁控溅射源,这些磁控溅射源在磁控管腔室中彼此分开设置,这些磁控管是通过单独的磁控管壁形成的,并允许每个腔室被抽真空,因此磁控管腔中的压力可以 保持比处理室高。 磁控管室壁和磁控溅射源可以安装在平行于冷却辊轴线移动的公共托架上。 结果是在磁控管室壁的清洁中降低了维护成本,同时改善了磁控管室和处理室之间的气体分离。
    • 17. 发明授权
    • Method for monitoring alternating current discharge on a double electrode and apparatus
    • 双电极交流放电监测方法及装置
    • US06420863B1
    • 2002-07-16
    • US09581208
    • 2000-06-21
    • Falk MildeTorsten WinklerAndreas FickertVolker KirchhoffMatthias Fahland
    • Falk MildeTorsten WinklerAndreas FickertVolker KirchhoffMatthias Fahland
    • G01R1716
    • H01J37/3444H01J37/3405H05H1/0081
    • Process for monitoring an alternating-voltage discharge between the electrodes of a double electrode and an apparatus. The process includes measuring values of at least one of a discharge current and a discharge voltage for each half-wave within an alternating-voltage discharge period, determining a difference between the measured values of a second half-wave and the measured values of the first half-wave, and comparing the determined differences to specific tolerance values. When the specific tolerance values are exceeded by the determined differences, a power supply is reduced, whereby the discharge is at least briefly suppressed. The apparatus includes a double magnetron including first and second targets arranged to form a double electrode, and a power supply coupled to supply power to the first and second targets. The power supply includes a measurement unit for measuring values of at least one of discharge current and discharge voltage, such that at least one of a discharge current and a discharge voltage for each half-wave within an alternating-voltage discharge period is measured. A device for determining a difference between the measured values of a second half-wave and the measured values of the first half-wave is provided, as well as a device for comparing the determined differences to specific tolerance values, and a device for at least briefly suppressing the discharge when the specific tolerance values are exceeded by the determined differences.
    • 用于监视双电极的电极与装置之间的交流电压放电的方法。 该过程包括在交流电压放电周期内测量每个半波的放电电流和放电电压中的至少一个的值,确定第二半波的测量值与第一半波的测量值之间的差值 半波,并将确定的差异与特定容差值进行比较。 当通过所确定的差异超过特定公差值时,电源减少,从而至少简化了放电。 该装置包括双重磁控管,其包括布置成形成双电极的第一和第二靶,以及耦合以向第一和第二靶提供电力的电源。 电源包括测量单元,用于测量放电电流和放电电压中的至少一个的值,以便测量交流电压放电周期内的每个半波的放电电流和放电电压中的至少一个。 提供了一种用于确定第二半波的测量值与第一半波的测量值之间的差异的装置,以及用于将确定的差异与特定公差值进行比较的装置,以及用于至少 当确定的差异超过特定公差值时,暂时抑制放电。