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    • 14. 发明授权
    • Method for rapidly heating or cooking a food product
    • 快速加热或烹饪食品的方法
    • US5154940A
    • 1992-10-13
    • US579224
    • 1990-09-05
    • W. James BudzynaDavid J. HoweWilliam A. JohnsonGregory J. McCabe
    • W. James BudzynaDavid J. HoweWilliam A. JohnsonGregory J. McCabe
    • A47J37/04A47J39/00
    • A21B1/26A47J37/047
    • Method of and apparatus for heating or cooking a food product packaged within a container by using heated air. The oven apparatus includes a substantially closed-loop heated air system that starts with a blower that blows air into a heating barrel where a heating element heats the air to a high temperature. The heated air exits the heating barrel, passes through an air flow channel in the oven's door, and enters the oven's heating chamber. The heated air passes through the container inside the heating chamber and heats the food product within the container. In a preferred embodiment of the invention, the heating chamber is rotated while the heated air passes through the container to tumble the food product and ensure even heating thereof. The air exiting from the food product container enters a recirculation chamber which directs the air back into the blower to repeat the cycle. Heated air is recirculated through the food product container for either a fixed period of time, or until the temperature of the air exiting from the container reaches a predetermined value. In a preferred embodiment of the invention, the oven includes a central processing unit that is programmed to control the oven's overall operation based on signals received from various transducers, e.g., a door switch, various temperature sensors, an air flow switch, and product-in switch. Also disclosed are various embodiments of containers that are particularly adapted for heating food products by utilizing the oven apparatuses of the present invention.
    • 通过使用加热的空气来加热或烹饪包装在容器内的食品的方法和设备。 烤箱装置包括基本上闭环加热的空气系统,该空气系统从鼓风机开始,吹风机将空气吹入加热筒,加热元件将空气加热到高温。 加热的空气离开加热桶,通过烤箱门的空气流通道,并进入烤箱的加热室。 加热的空气通过加热室内的容器并加热容器内的食品。 在本发明的优选实施例中,加热室旋转,同时加热的空气通过容器以翻转食品并确保其均匀加热。 从食品容器中排出的空气进入再循环室,该再循环室将空气引导回鼓风机重复循环。 加热空气通过食品容器再循环一段固定的时间,或者直到从容器出来的空气的温度达到预定值。 在本发明的优选实施例中,烤箱包括中央处理单元,该中央处理单元被编程为基于从各种换能器接收的信号来控制烤箱的总体操作,例如门开关,各种温度传感器,气流开关和产品 - 在开关。 还公开了容器的各种实施例,其特别适用于通过利用本发明的烘箱装置来加热食品。
    • 15. 发明授权
    • Exception handling in a pipelined microprocessor
    • 流水线微处理器中的异常处理
    • US4970641A
    • 1990-11-13
    • US344429
    • 1989-04-26
    • Phillip D. HesterWilliam A. Johnson
    • Phillip D. HesterWilliam A. Johnson
    • G06F11/00G06F12/10G11C29/00
    • G11C29/88G06F12/10G06F11/076
    • A method for processing address translation exceptions occurring in a virtual memory system employing demand paging and having a plurality of registers and a real storage area, includes the steps of: (a) temporarily storing for each storage operation; (i) the effective storage address for the operation; (ii) exception control word information relative to the ones of the registers involved in the operation and the length and type of the operation; and (iii) any data to be stored during the operation; (b) retrieving the temporarily stored information to form an exception status block if an exception is generated indicating a failed operation; and (c) reinitiating the failed operation based on the information contained in the exception status block.
    • 一种用于处理在采用需求寻呼并具有多个寄存器和实际存储区域的虚拟存储器系统中发生的地址转换异常的方法包括以下步骤:(a)为每个存储操作临时存储; (i)操作的有效存储地址; (ii)相对于操作中涉及的寄存器的异常控制字信息以及操作的长度和类型; 和(iii)在操作期间要存储的任何数据; (b)如果产生指示故障操作的异常,则检索临时存储的信息以形成异常状态块; (c)根据异常状态块中包含的信息重新启动失败的操作。
    • 17. 发明授权
    • Mask-to-wafer alignment utilizing zone plates
    • 使用区域的掩模到晶片对准
    • US4614433A
    • 1986-09-30
    • US629056
    • 1984-07-09
    • Martin FeldmanPeter A. HeimannWilliam A. JohnsonTheodore F. Retajczyk, Jr.Donald L. White
    • Martin FeldmanPeter A. HeimannWilliam A. JohnsonTheodore F. Retajczyk, Jr.Donald L. White
    • G01B11/24G03F1/00G03F9/00H01L21/027H01L21/30G01B11/27
    • G03F9/7076G03F9/7023
    • Mask-to-wafer alignment in X-ray lithography is advantageously carried out utilizing zone plate marks formed on the mask and wafer. In practice, it has been observed that the intensity and in some cases even the location of the centroid of the light spot formed by a zone plate mask can vary during alignment as the mask-to-wafer spacing is changed.The present invention is based on the discovery and analysis of the causes of such variations. Based thereon, applicants have devised a modified mask structure which, when used with a wafer in a zone plate alignment system, enables mask-to-wafer alignment to be made more easily and more reliably than was possible heretofore. The modified mask structure includes a localized blocking layer over each zone plate on the mask. This layer allows only a negligible portion of the light employed to illuminate the zone plates on the mask to propagate into the mask-to-wafer space. Also, the modified mask structure includes an antireflection layer that reduces interference effects between light spots imaged by the wafer zone plates and light reflected from the mask. Further, one layer of the modified mask structure is designed to have a quarter-wavelength thickness thereby minimizing interfering light reflected from that layer.
    • 利用在掩模和晶片上形成的区域板标记有利地进行X射线光刻中的掩模到晶片对准。 在实践中,已经观察到,随着掩模到晶片间隔的改变,强度以及在某些情况下甚至由区域板掩模形成的光斑的质心的位置可以在对准期间变化。 本发明基于对这种变化的原因的发现和分析。 基于此,申请人已经设计了改进的掩模结构,当与区板对准系统中的晶片一起使用时,能够使得掩模到晶片对准比以前更容易和更可靠地进行。 修改的掩模结构包括在掩模上的每个区域板上的局部阻挡层。 该层仅允许用于照射掩模上的区域板的光的可忽略部分传播到掩模到晶片空间。 此外,修改的掩模结构包括减少由晶片区域板成像的光点和从掩模反射的光线之间的干涉效应的抗反射层。 此外,修改的掩模结构的一层被设计为具有四分之一波长厚度,从而使从该层反射的干扰光最小化。