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11. 发明授权

US5181020A Thin-film magnetic material and process of production thereof 失效
标题翻译：薄膜磁性材料及其生产工艺
公开(公告)号：US5181020A
公开(公告)日：1993-01-19
申请号：US673550
申请日：1991-03-22
申请人： Shinji Furukawa , Kazuki Oka , Akira Tanimura
发明人： Shinji Furukawa , Kazuki Oka , Akira Tanimura
IPC分类号： C23C14/14 , C23C14/56 , G01D5/14 , G01R33/02 , G01V15/00 , G08B13/24 , H01F1/03 , H01F10/12 , H01F10/13 , H01F41/18
CPC分类号： G08B13/2411 , G01D5/14 , G01R33/02 , G01V15/00 , G08B13/2442 , H01F1/0304 , H01F10/13 , H01F41/18 , Y10S428/90
摘要： A thin-film magnetic material is formed on a polymer substrate. The material exhibits large Barkhausen discontinuity without intentional application of external tensile or torsional stress. The thin-film material may be produced by a sputtering technique wherein the normal to the substrate is directed obliquely to a target member. A biasing magnetic field in proximity to the substrate may also be used during film formation, and the substrate may be supported by a curved holder or a cylindrical roll-to-roll apparatus. The thin-film thus produced may be used as a marker in an article surveillance system or as a magnetic sensor.

12. 发明授权

US4657605A Fine amorphous metal wires 失效
标题翻译：精细非晶金属线
公开(公告)号：US4657605A
公开(公告)日：1987-04-14
申请号：US889973
申请日：1986-07-28
申请人： Isamu Ogasawara , Kiyotsugu Maekawa , Hiroyuki Tomioka , Shinji Furukawa
发明人： Isamu Ogasawara , Kiyotsugu Maekawa , Hiroyuki Tomioka , Shinji Furukawa
IPC分类号： H01F1/153 , C22C19/07 , C22C45/04 , H01F1/14 , H01F1/04
CPC分类号： C22C45/04
摘要： A fine amorphous metallic wire having a circular cross section and stability to a bias magnetic field, said wire being composed of an alloy having the following composition formula(Co.sub.1-a Fe.sub.a).sub.100-x-y-z Si.sub.x B.sub.y Mn.sub.zwherein x
摘要翻译：一种具有圆形横截面和偏磁场稳定性的细非晶金属线，所述导线由具有以下组成式（Co1-aFea）100-xy-zSixByMnz的合金组成，其中x <20原子％，7原子％

13. 发明授权

US08837924B2 Vacuum heating/cooling apparatus and manufacturing method of magnetoresistance element 有权
标题翻译：真空加热/冷却装置和磁阻元件的制造方法
公开(公告)号：US08837924B2
公开(公告)日：2014-09-16
申请号：US13307673
申请日：2011-11-30
申请人： Koji Tsunekawa , Yoshinori Nagamine , Shinji Furukawa
发明人： Koji Tsunekawa , Yoshinori Nagamine , Shinji Furukawa
IPC分类号： F27B5/14 , F27B5/16 , F27D5/00 , H01L21/68 , H01L43/12 , H01L21/67
CPC分类号： H01L21/6719 , H01L21/67109 , H01L21/67115 , H01L43/12
摘要： The present invention provides a vacuum heating/cooling apparatus capable of rapidly heating and also rapidly cooling only a substrate while a high vacuum degree is maintained after film-formation processing. The vacuum heating/cooling apparatus according to an embodiment of the present invention includes a vacuum chamber (1), a halogen lamp (2) which emits heating light, a quartz window (3) for allowing the heating light to enter the vacuum chamber (1), a substrate supporting base (9) having a cooling function, and a lift pin (13) which causes the substrate (5) to stand still at a heating position P3 and a cooling position P1 and moves the substrate (5) between the heating position P3 and the cooling position P1.
摘要翻译：本发明提供了一种真空加热/冷却装置，其能够在成膜处理之后保持高真空度的同时快速加热并且仅快速冷却基板。根据本发明实施例的真空加热/冷却装置包括真空室（1），发出加热灯的卤素灯（2），用于使加热光进入真空室的石英窗（3） 1），具有冷却功能的基板支撑基座（9）和提升销（13），其使基板（5）静止在加热位置P3和冷却位置P1，并使基板（5）在加热位置P3和冷却位置P1。

14. 发明申请

US20120193071A1 VACUUM HEATING/COOLING APPARATUS AND MANUFACTURING METHOD OF MAGNETORESISTANCE ELEMENT 有权
标题翻译：真空加热/冷却装置及其制造方法
公开(公告)号：US20120193071A1
公开(公告)日：2012-08-02
申请号：US13307673
申请日：2011-11-30
申请人： Koji Tsunekawa , Yoshinori Nagamine , Shinji Furukawa
发明人： Koji Tsunekawa , Yoshinori Nagamine , Shinji Furukawa
IPC分类号： H01L21/477 , F27D11/12 , F25B29/00
CPC分类号： H01L21/6719 , H01L21/67109 , H01L21/67115 , H01L43/12
摘要： The present invention provides a vacuum heating/cooling apparatus capable of rapidly heating and also rapidly cooling only a substrate while a high vacuum degree is maintained after film-formation processing. The vacuum heating/cooling apparatus according to an embodiment of the present invention includes a vacuum chamber (1), a halogen lamp (2) which emits heating light, a quartz window (3) for allowing the heating light to enter the vacuum chamber (1), a substrate supporting base (9) having a cooling function, and a lift pin (13) which causes the substrate (5) to stand still at a heating position P3 and a cooling position P1 and moves the substrate (5) between the heating position P3 and the cooling position P1.
摘要翻译：本发明提供了一种真空加热/冷却装置，其能够在成膜处理之后保持高真空度的同时快速加热并且仅快速冷却基板。根据本发明实施例的真空加热/冷却装置包括真空室（1），发出加热灯的卤素灯（2），用于使加热光进入真空室的石英窗（3） 1），具有冷却功能的基板支撑基座（9）和提升销（13），其使基板（5）静止在加热位置P3和冷却位置P1，并使基板（5）在加热位置P3和冷却位置P1。

15. 发明申请

US20110192344A1 FILM FORMING APPARATUS 有权
标题翻译：电影制作装置
公开(公告)号：US20110192344A1
公开(公告)日：2011-08-11
申请号：US13089042
申请日：2011-04-18
申请人： Shinji FURUKAWA , Masahiro SHIBAMOTO
发明人： Shinji FURUKAWA , Masahiro SHIBAMOTO
IPC分类号： C23C14/00
CPC分类号： C23C14/564 , C23C14/568 , C23C16/54
摘要： The invention provides a multi-film forming apparatus including a substrate holder stock chamber for storing a plurality of substrate holders separately from a path in the multi-film forming apparatus, so that production can be performed without being affected by the process of removing a film accumulated on the surface of the substrate holder and the process of replacing the substrate holder, or by the process of removing a film accumulated on the surface of the substrate holder or the process of replacing the substrate holder, and hence high-throughput production is possible. A branch path is provided on the path of the multi-film forming apparatus, and a substrate holder stock chamber for storing a plurality of substrate holders which enables retrieval of the substrate holder from the path and feeding of the substrate holder to the path is provided.
摘要翻译：本发明提供了一种多层膜形成装置，其包括：基板保持架储存室，用于与多膜成形装置中的路径分开地存储多个基板保持器，从而可以进行生产而不受去除膜的处理积聚在基板保持器的表面上，更换基板保持器的过程，或者通过去除积聚在基板保持器的表面上的膜或者更换基板保持器的过程，因此可以进行高通量生产。在多层膜形成装置的路径上设置分支路径，并且设置用于存储多个基板保持件的基板保持架存放室，该基板保持器能够使基板保持器从路径中回收并且将基板保持器馈送到路径。

16. 发明申请

US20090011140A1 Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus 有权
公开(公告)号：US20090011140A1
公开(公告)日：2009-01-08
申请号：US12202813
申请日：2008-09-02
申请人： Naoki Watanabe , Nobuyoshi Watanabe , Kazunori Tani , Shinji Furukawa , Hiromi Sasaki , Osamu Watabe
发明人： Naoki Watanabe , Nobuyoshi Watanabe , Kazunori Tani , Shinji Furukawa , Hiromi Sasaki , Osamu Watabe
IPC分类号： B05D3/06 , B05D5/00
CPC分类号： C23C14/352 , C23C14/50 , C23C14/568 , C23C16/26 , G11B5/84 , G11B5/8408 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/138 , Y10S414/139 , Y10S414/14 , Y10S414/141
摘要： An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.

17. 发明申请

US20080178804A1 Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus 审中-公开
公开(公告)号：US20080178804A1
公开(公告)日：2008-07-31
申请号：US12037006
申请日：2008-02-25
申请人： Naoki WATANABE , Nobuyoshi WATANABE , Kazunori TANI , Shinji FURUKAWA , Hiromi SASAKI , Osamu WATABE
发明人： Naoki WATANABE , Nobuyoshi WATANABE , Kazunori TANI , Shinji FURUKAWA , Hiromi SASAKI , Osamu WATABE
IPC分类号： C23C16/455
CPC分类号： C23C14/352 , C23C14/50 , C23C14/568 , C23C16/26 , G11B5/84 , G11B5/8408 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/138 , Y10S414/139 , Y10S414/14 , Y10S414/141
摘要： An apparatus for manufacturing a magnetic recording disk includes a magnetic-film deposition chamber in which a magnetic film for a recording layer is deposited on a substrate; a lubricant-layer preparation chamber in which a lubricant layer is prepared on the substrate in vacuum; and a cleaning chamber in which the substrate is cleaned in vacuum after the magnetic-film deposition in the magnetic-film chamber and before the lubricant-layer preparation in the lubricant-layer chamber. The apparatus may further include a transfer system that transfers the substrate from the cleaning chamber to the lubricant-layer preparation chamber without exposing the substrate to the atmosphere.

18. 发明申请

US20070234958A1 Apparatus for Manufacturing Magnetic Recording Disk, and In-Line Type Substrate Processing Apparatus 审中-公开
标题翻译：磁记录盘制造装置及在线式基板处理装置
公开(公告)号：US20070234958A1
公开(公告)日：2007-10-11
申请号：US11735281
申请日：2007-04-13
申请人： Naoki WATANABE , Nobuyoshi WATANABE , Kazunori TANI , Shinji FURUKAWA , Hiromi SASAKI , Osamu WATABE
发明人： Naoki WATANABE , Nobuyoshi WATANABE , Kazunori TANI , Shinji FURUKAWA , Hiromi SASAKI , Osamu WATABE
IPC分类号： C23C16/06
CPC分类号： C23C14/352 , C23C14/50 , C23C14/568 , C23C16/26 , G11B5/84 , G11B5/8408 , Y10S414/135 , Y10S414/136 , Y10S414/137 , Y10S414/138 , Y10S414/139 , Y10S414/14 , Y10S414/141
摘要： This invention presents a method and an apparatus for manufacturing a magnetic recording disk, where steps from magnetic-film deposition to lubricant-layer preparation are carried out without vacuum breaking. The invention also presents a method and an apparatus for manufacturing a magnetic recording disk, where a substrate is cleaned prior to the lubricant-layer preparation. The invention also presents a method and an apparatus for manufacturing a magnetic recording disk, where burnishing is carried out in vacuum after the magnetic-film deposition. The invention also presents a method and an apparatus for manufacturing a magnetic recording disk, where post-preparation treatment to coordinate adhesive strength and surface lubricity of the lubricant layer is carried out in vacuum. The invention also presents an in-line type substrate processing apparatus comprising a plurality of vacuum chambers provided along each of a plurality of circumventive transfer paths, a connection transfer path connecting at least two of the circumventive transfer paths, and a transfer system that transfers a substrate to be processed along the circumventive transfer paths and transfers the substrate along the connection transfer path without exposing the substrate to the atmosphere.
摘要翻译：本发明提供一种用于制造磁记录盘的方法和装置，其中在没有真空破坏的情况下执行从磁膜沉积到润滑剂层制备的步骤。本发明还提出了一种用于制造磁记录盘的方法和装置，其中在润滑剂层制备之前清洁基底。本发明还提出了一种用于制造磁记录盘的方法和装置，其中在磁膜沉积之后在真空中进行抛光。本发明还提出了一种用于制造磁记录盘的方法和装置，其中在真空中进行用于协调润滑剂层的粘合强度和表面润滑性的后处理处理。本发明还提供了一种在线型基板处理装置，其包括沿着多个绕规传送路径中的每一个设置的多个真空室，连接至少两个周向传送路径的连接传送路径，以及传送系统沿着绕绕传送路径进行处理的基板，并且沿着连接传送路径传送基板，而不将基板暴露在大气中。

19. 发明授权

US06872285B2 System for depositing a film 失效
标题翻译：沉积薄膜的系统
公开(公告)号：US06872285B2
公开(公告)日：2005-03-29
申请号：US10233272
申请日：2002-08-30
申请人： Shinji Furukawa , Miho Sakai
发明人： Shinji Furukawa , Miho Sakai
IPC分类号： C23C14/34 , C23C14/04 , C23C14/22 , C23C14/35 , G11B5/851 , H01J37/34
CPC分类号： C23C14/225 , C23C14/044 , C23C14/352 , G11B5/851 , H01J37/3408 , H01J37/3426 , H01J37/3447
摘要： This application discloses a system for depositing a magnetic film for a magnetic recording layer or depositing an underlying film prior to depositing a magnetic film as a recording layer. The system comprises; a chamber in which the film is deposited onto a substrate by sputtering, a target that is provided in the chamber and made of material of the film to be deposited, a sputter power source for applying voltage to the target for the sputtering, and a direction control member for controlling sputter-particles released from the target during the sputtering. The direction control member is provided between the substrate and the target. The direction control member provides a passage for the sputter-particles. The direction control member lets the sputter-particles selectively pass through, thereby allowing magnetic anisotropy to the magnetic film. The passage is not close but open in its cross section.
摘要翻译：本申请公开了一种用于在沉积磁性膜作为记录层之前沉积用于磁记录层的磁性膜或沉积下面的膜的系统。该系统包括通过溅射将膜沉积在基板上的室，设置在室中并由要沉积的膜的材料制成的靶，用于向溅射靶施加电压的溅射电源，以及用于溅射的方向用于控制在溅射期间从靶释放的溅射颗粒的控制构件。方向控制构件设置在基板和靶之间。方向控制构件为溅射颗粒提供通道。方向控制部件使溅射粒子选择性地通过，从而允许对磁性膜的磁各向异性。通道不近，但在其横截面上开放。

20. 发明授权

US6154028A Miniature magnetic sensor device using an inductor device 有权
标题翻译：使用电感器件的微型磁传感器装置
公开(公告)号：US6154028A
公开(公告)日：2000-11-28
申请号：US192334
申请日：1998-11-16
申请人： Kenichi Bushida , Shuji Ueno , Shinji Furukawa , Isamu Ogasawara
发明人： Kenichi Bushida , Shuji Ueno , Shinji Furukawa , Isamu Ogasawara
IPC分类号： G01R33/02 , G01R33/04 , H01F17/04 , G01K33/02
CPC分类号： G01R33/02
摘要： A magnetic sensor device comprising a magnetic element and a wire wound around the magnetic element. The magnetic element has a cross-sectional area of not more than 0.55 mm.sup.2 and a saturation magnetostriction constant .lambda.s whose absolute value is smaller than 1.times.10.sup.-6, with Sw/Sm being equal to or smaller than 9, provided that Sw is the cross-sectional area of the wire and Sm is the cross-sectional area of the magnetic element. Preferably, the magnetic element has an elastic limit .sigma.m greater than 1,000 MPa, and the elongation the magnetic element experiences upon application of a stress equal to the elastic limit .sigma.m is between 1.0% and 5.0%. It is also preferable that the magnetic element and the wire are covered with a resin layer to form an integral unit.
摘要翻译：一种磁传感器装置，包括磁性元件和缠绕在磁性元件周围的电线。磁性元件的截面积不大于0.55mm 2，其绝对值小于1×10 -6的饱和磁致伸缩常数λs，Sw / Sm等于或小于9，条件是Sw是十字形导线的截面积和Sm是磁性元件的横截面面积。优选地，磁性元件具有大于1000MPa的弹性极限σm，并且在施加等于弹性极限σm的应力时，磁性元件的伸长率在1.0％至5.0％之间。还优选的是，磁性元件和电线被树脂层覆盖以形成一体的单元。

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