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    • 5. 发明授权
    • System for depositing a film
    • 沉积薄膜的系统
    • US06872285B2
    • 2005-03-29
    • US10233272
    • 2002-08-30
    • Shinji FurukawaMiho Sakai
    • Shinji FurukawaMiho Sakai
    • C23C14/34C23C14/04C23C14/22C23C14/35G11B5/851H01J37/34
    • C23C14/225C23C14/044C23C14/352G11B5/851H01J37/3408H01J37/3426H01J37/3447
    • This application discloses a system for depositing a magnetic film for a magnetic recording layer or depositing an underlying film prior to depositing a magnetic film as a recording layer. The system comprises; a chamber in which the film is deposited onto a substrate by sputtering, a target that is provided in the chamber and made of material of the film to be deposited, a sputter power source for applying voltage to the target for the sputtering, and a direction control member for controlling sputter-particles released from the target during the sputtering. The direction control member is provided between the substrate and the target. The direction control member provides a passage for the sputter-particles. The direction control member lets the sputter-particles selectively pass through, thereby allowing magnetic anisotropy to the magnetic film. The passage is not close but open in its cross section.
    • 本申请公开了一种用于在沉积磁性膜作为记录层之前沉积用于磁记录层的磁性膜或沉积下面的膜的系统。 该系统包括 通过溅射将膜沉积在基板上的室,设置在室中并由要沉积的膜的材料制成的靶,用于向溅射靶施加电压的溅射电源,以及用于溅射的方向 用于控制在溅射期间从靶释放的溅射颗粒的控制构件。 方向控制构件设置在基板和靶之间。 方向控制构件为溅射颗粒提供通道。 方向控制部件使溅射粒子选择性地通过,从而允许对磁性膜的磁各向异性。 通道不近,但在其横截面上开放。