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11. 发明授权

US07736893B2 Nanobio device of imitative anatomy structure 有权
标题翻译：模拟解剖结构的Nanobio装置
公开(公告)号：US07736893B2
公开(公告)日：2010-06-15
申请号：US11353603
申请日：2006-02-14
申请人： Masanao Munekane , Hiroyuki Wada , Kouji Iwasaki , Toshiaki Fujii , Takahiro Ochiya , Yusuke Yamamoto , Takumi Teratani
发明人： Masanao Munekane , Hiroyuki Wada , Kouji Iwasaki , Toshiaki Fujii , Takahiro Ochiya , Yusuke Yamamoto , Takumi Teratani
IPC分类号： C12N5/00
CPC分类号： G01N33/5088 , Y10T436/11
摘要： Objects to be achieved by the invention are to provide a nanobio device in which cultured cells are organized at a high-level in a state near in vivo, and to provide a method of using the nanobio device of imitative anatomy structure. The nanobio device of imitative anatomy structure of the invention is obtained by manufacturing a substrate with a bio-compatible substance and arranging a plurality of types of cells thereon in a desired array. A method of manufacturing a nanobio device in the invention includes a step of manufacturing a substrate for a nanobio device by a micromachine processing technique and a step of arranging a plurality of cultured cells on the substrate in a desired array with laser optical tweezers.
摘要翻译：通过本发明实现的目的是提供一种纳米生物装置，其中培养细胞在体内接近的状态下组织在高水平，并提供使用模拟解剖结构的纳米装置的方法。本发明的模拟解剖结构的纳米装置通过用生物相容性物质制造衬底并以期望的阵列布置多种类型的细胞而获得。在本发明中制造纳米装置的方法包括通过微机械加工技术制造纳米装置用基板的步骤，以及使用激光光学镊子以期望的阵列在基板上排列多个培养细胞的步骤。

12. 发明授权

US07626165B2 Focused ion beam apparatus and method of preparing/observing sample 有权
标题翻译：聚焦离子束装置及其制备/观察方法
公开(公告)号：US07626165B2
公开(公告)日：2009-12-01
申请号：US11703292
申请日：2007-02-07
申请人： Kouji Iwasaki
发明人： Kouji Iwasaki
IPC分类号： H01J37/26 , G01N13/10 , G01N23/22
CPC分类号： G01N23/2251 , G01N23/2255 , H01J37/3056 , H01J2237/202 , H01J2237/31749
摘要： A focused ion beam apparatus includes a sample base for mounting a sample, a three axis stage capable of moving the sample base in three directions: along two axes on a horizontal face and a vertical axis, and a first focused ion beam barrel and a second focused ion beam barrel for irradiating the sample with focused ion beams, the first focused ion beam barrel and the second focused ion beam barrel being arranged such that directions of the focused ion beams are substantially opposed to each other in a plane view thereof and are inclined in substantial line symmetry with regard to the vertical axis in a side view thereof.
摘要翻译：聚焦离子束装置包括用于安装样品的样品基底，能够沿着三个方向移动样品基底的三轴台：沿着水平面和垂直轴上的两个轴，以及第一聚焦离子束筒和第二聚焦离子束筒聚焦离子束筒，用于用聚焦离子束照射样品，第一聚焦离子束筒和第二聚焦离子束筒布置成使得聚焦离子束的方向在其平面视图中彼此基本相对，并且倾斜在其侧视图中相对于垂直轴线呈大致线对称。

13. 发明申请

US20080073586A1 Focused ion beam apparatus and method of preparing/observing sample 有权
标题翻译：聚焦离子束装置及其制备/观察方法
公开(公告)号：US20080073586A1
公开(公告)日：2008-03-27
申请号：US11703292
申请日：2007-02-07
申请人： Kouji Iwasaki
发明人： Kouji Iwasaki
IPC分类号： H01J37/08
CPC分类号： G01N23/2251 , G01N23/2255 , H01J37/3056 , H01J2237/202 , H01J2237/31749
摘要： Focused ion beam apparatus includes a sample base for mounting a sample, a three axis stage capable of moving the sample base in three directions: along two axes on a horizontal face and a vertical axis, and a first focused ion beam barrel and a second focused ion beam barrel for irradiating the sample with focused ion beams, the first focused ion beam barrel and the second focused ion beam barrel being arranged such that directions of the focused ion beams are substantially opposed to each other in a plane view thereof and are inclined in substantial line symmetry with regard to the vertical axis in a side view thereof.
摘要翻译：聚焦离子束装置包括用于安装样品的样品基底，能够沿着三个方向移动样品基底的三轴台：沿着水平面和垂直轴上的两个轴，以及第一聚焦离子束筒和第二聚焦离子束筒，用于用聚焦离子束照射样品，第一聚焦离子束镜筒和第二聚焦离子束镜筒布置成使得聚焦离子束的方向在其平面视图中彼此基本相对，并且倾斜在其侧视图中相对于垂直轴的实线对称。

14. 发明授权

US07276691B2 Ion beam device and ion beam processing method 有权
标题翻译：离子束装置和离子束处理方法
公开(公告)号：US07276691B2
公开(公告)日：2007-10-02
申请号：US10525311
申请日：2003-08-20
申请人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
发明人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
IPC分类号： H01J37/30
CPC分类号： G01N1/32 , H01J37/3056
摘要： There is provided a liquid metal ion beam irradiation device for irradiating a specific portion of a sample 6 with a prescribed liquid metal ion beam so as to form a cross section, and a gaseous ion beam irradiation device 7 for scanning a prescribed region (observation region) of the cross section using a gaseous ion beam focused to a prescribed diameter and removing a damaged layer on the prescribed region.
摘要翻译：提供了一种液体金属离子束照射装置，用于用规定的液体金属离子束照射特定部分的样品6以形成横截面;以及气体离子束照射装置7，用于扫描规定区域（观察区域）使用聚焦到规定直径的气体离子束并去除规定区域上的损伤层。

15. 发明申请

US20070045560A1 Charged particle beam apparatus 有权
标题翻译：带电粒子束装置
公开(公告)号：US20070045560A1
公开(公告)日：2007-03-01
申请号：US11509520
申请日：2006-08-24
申请人： Haruo Takahashi , Toshiaki Fujii , Yutaka Ikku , Kouji Iwasaki , Yo Yamamoto
发明人： Haruo Takahashi , Toshiaki Fujii , Yutaka Ikku , Kouji Iwasaki , Yo Yamamoto
IPC分类号： H01J37/20 , G01N1/28
CPC分类号： H01J37/304 , G01N1/32 , H01J2237/31745 , H01J2237/31749
摘要： To include a focused ion beam apparatus fabricating a sliced specimen by processing a specimen as well as observing the sliced specimen, a scanning electron microscope observing the slice specimen, a gas-ion beam irradiation apparatus performing finishing processing by irradiating a gas-ion beam onto a surface of the sliced specimen, a specimen stage on which the sliced specimen is fixed and having at least one or more rotation axis, a specimen posture recognition means recognizing positional relation of the sliced specimen with respect to the specimen stage and a specimen stage control means controlling the specimen stage based on a specimen posture recognized by the posture recognition means and an installation angle of the gas-ion beam irradiation apparatus in order to allow an incident angle of the gas-ion beam with respect to the obverse or the reverse of the sliced specimen to be a desired value.
摘要翻译：为了包括聚焦离子束装置，通过加工试样和观察切片试样来制造切片样品，观察切片试样的扫描电子显微镜，气相离子束照射装置，通过将气体离子束照射到切片试样的表面，切片试样固定并具有至少一个以上的旋转轴的试样台，识别切片试样相对于试样台的位置关系的试样姿势识别装置和试样台控制意味着基于由姿势识别装置识别的样本姿势和气体离子束照射装置的安装角度来控制样本台，以便允许气体离子束相对于正面或反向的入射角切片样品为期望值。

16. 发明申请

US20060189021A1 Sample support prepared by semiconductor silicon process technique 有权
标题翻译：采用半导体硅工艺制备样品
公开(公告)号：US20060189021A1
公开(公告)日：2006-08-24
申请号：US11356698
申请日：2006-02-17
申请人： Kouji Iwasaki , Masanso Munekane
发明人： Kouji Iwasaki , Masanso Munekane
IPC分类号： H01L21/00 , H01L21/20 , H01L29/82
CPC分类号： H01J37/20 , G01N1/32
摘要： A sample support of the present invention is prepared such that a silicon substrate is used as a raw material, the thickness structure having a shape and a thickness of 10 μm or less is prepared using a semiconductor silicon process technique. The sample support of the present invention is adhered to a partially-cut mesh in a state that a sample portion is not adhered. Further, a plurality of portions where the samples are mounted is arranged on the same substrate.
摘要翻译：制备本发明的样品载体，使用硅衬底作为原料，使用半导体硅工艺技术制备具有10μm或更小的形状和厚度的厚度结构。本发明的样品支持体在样品部分未被粘附的状态下被粘附到部分切割的网状物上。此外，在同一基板上配置多个安装样品的部分。

17. 发明申请

US20060163497A1 Ion beam device and ion beam processing method 有权
标题翻译：离子束装置和离子束处理方法
公开(公告)号：US20060163497A1
公开(公告)日：2006-07-27
申请号：US10525311
申请日：2003-08-20
申请人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
发明人： Toshio Kodama , Masakatsu Hasuda , Toshiaki Fujii , Kouji Iwasaki , Yasuhiko Sugiyama , Yasuyuki Takagi
IPC分类号： H01J37/08
CPC分类号： G01N1/32 , H01J37/3056
摘要： There is provided a liquid metal ion beam irradiation device for irradiating a specific portion of a sample 6 with a prescribed liquid metal ion beam 80 as to form a cross section, and a gaseous ion beam irradiation device 7 for scanning a prescribed region (observation region) of the cross section using a gaseous ion beam focused to a prescribed diameter and removing a damaged layer on the prescribed region.
摘要翻译：提供了一种液体金属离子束照射装置，用于用规定的液体金属离子束80照射样品6的特定部分以形成横截面;以及气体离子束照射装置7，用于扫描规定区域（观察区域）使用聚焦到规定直径的气体离子束并去除规定区域上的损伤层。

18. 发明授权

US07067823B2 Micro-sample pick-up apparatus and micro-sample pick-up method 有权
标题翻译：微量取样装置和微量取样方法
公开(公告)号：US07067823B2
公开(公告)日：2006-06-27
申请号：US10839508
申请日：2004-05-05
申请人： Kouji Iwasaki , Yo Yamamoto
发明人： Kouji Iwasaki , Yo Yamamoto
IPC分类号： G01N1/00
CPC分类号： H01J37/20 , G01N1/32 , H01J2237/208
摘要： A micro-sample pick-up apparatus has a probe for picking up a micro sample, a probe holder for holding the probe, an XYZ driver mechanism for moving the probe holder in the three-dimensional directions of X, Y and Z, and an observation mechanism for observing the sample and the probe. A low-vibration rotary mechanism disposed in the probe holder for rotating the probe about an axis of the probe.
摘要翻译：微型样品拾取装置具有用于拾取微量样品的探针，用于保持探针的探针支架，用于在X，Y和Z的三维方向上移动探针支架的XYZ驱动机构，以及用于观察样品和探针的观察机制。一种低振动旋转机构，设置在探针保持器中，用于围绕探头的轴线旋转探针。

19. 发明申请

US20060010968A1 Probe and small sample pick up mechanism 有权
标题翻译：探头和小样品拾取机制
公开(公告)号：US20060010968A1
公开(公告)日：2006-01-19
申请号：US11182108
申请日：2005-07-15
申请人： Masanao Munekane , Kouji Iwasaki , Takashi Konno , Hiroki Hayashi
发明人： Masanao Munekane , Kouji Iwasaki , Takashi Konno , Hiroki Hayashi
IPC分类号： G01N19/02
CPC分类号： H01J37/20 , B25J7/00 , B25J15/12 , G01N1/32 , H01J2237/20264
摘要： A probe mechanism and a sample pick up mechanism of the invention are provided at an observing apparatus or an analyzing apparatus and characterized in including a tip member comprising a needle-like member brought into contact with a sample, including a driving electrostatic actuator and means for monitoring a change in an electrostatic capacitance between electrodes of the electrostatic actuator, and capable of sensing that the probe is brought into contact with a sample by the monitor
摘要翻译：本发明的探针机构和取样机构设置在观察装置或分析装置中，其特征在于，包括：尖端部件，包括与样品接触的针状部件，所述针状部件包括驱动静电致动器和用于监测静电致动器的电极之间的静电电容的变化，并且能够感测到探针通过监视器与样品接触

20. 发明授权

US08657962B2 Particle removing method, particle removing device, atomic force microscope, and charged particle beam apparatus 有权
标题翻译：粒子去除法，粒子去除装置，原子力显微镜和带电粒子束装置
公开(公告)号：US08657962B2
公开(公告)日：2014-02-25
申请号：US12139065
申请日：2008-06-13
申请人： Hiroki Hayashi , Takashi Konno , Kouji Iwasaki , Masatoshi Yasutake , Junichi Tashiro
发明人： Hiroki Hayashi , Takashi Konno , Kouji Iwasaki , Masatoshi Yasutake , Junichi Tashiro
IPC分类号： B08B7/00
CPC分类号： B25J7/00 , G01Q80/00
摘要： Small tweezers having a pair of arms openable and closable is moved closer to a sample and grips a particle attached on a surface of the sample and carries it onto an adhesion member to attach it thereto. The small tweezers are opened to release the particle and brought away from the adhesion member to leave the particle on the adhesion member. A particle removing device includes small tweezers having a pair of arms openable and closable; an opening/closing driving unit that drives the arm or arms to open/close the small tweezers; a stage mounting an adhesion member that attaches thereto a particle to withdraw the particle; and a moving mechanism that moves the small tweezers between the sample and the adhesion member mounted on the stage. Also, an atomic force microscope and a charged ion beam apparatus that include the particle removing device are disclosed.
摘要翻译：具有可打开和关闭的一对臂的小镊子移动得更靠近样品并且夹持附着在样品表面上的颗粒并将其携带到粘附构件上以将其附着在其上。打开小镊子以释放颗粒并从附着构件脱离，使颗粒留在粘合构件上。颗粒除去装置包括具有可打开和关闭的一对臂的小镊子; 打开/关闭驱动单元，驱动臂或臂打开/关闭小镊子; 安装附着于其上以吸收颗粒的粘合构件的载物台; 以及移动机构，其将小镊子移动在样品和安装在台架上的粘合构件之间。另外，还公开了包括粒子除去装置的原子力显微镜和带电离子束装置。

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